KR940014881A - 산화물 코팅된 절삭공구 - Google Patents

산화물 코팅된 절삭공구 Download PDF

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KR940014881A
KR940014881A KR1019930027386A KR930027386A KR940014881A KR 940014881 A KR940014881 A KR 940014881A KR 1019930027386 A KR1019930027386 A KR 1019930027386A KR 930027386 A KR930027386 A KR 930027386A KR 940014881 A KR940014881 A KR 940014881A
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coating
layer
hkl
coating according
nucleation
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KR1019930027386A
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KR100292292B1 (ko
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르윤그버그 비요른
레난데르 안데르스
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레나르트 타퀴스트
샌드빅 에이비
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T407/00—Cutters, for shaping
    • Y10T407/27—Cutters, for shaping comprising tool of specific chemical composition

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Chemical Vapour Deposition (AREA)
  • Dental Preparations (AREA)
  • Medicinal Preparation (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Oxide Ceramics (AREA)

Abstract

본 발명에 따르면 단일층 또는 다수의 내화층으로 피복하고 각층은 피복체 표면에서 한 방향으로 성장한 결정평면과 미세구조와 상 조성을 조절하는 것을 특징으로 하는 피복체를 제공한다.
코팅은 한층이상이(012)방향으로 조직된 치밀한 미립자 a-Al2O3층인 것으로된 하나 또는 수개의 내화층으로 구성된다.
본 발명에 따른 공구는 탁월한 표면완성도를 나타내고 강주철 특히 결절형 주철 가공시 사용할 때 공지된것과 비교하여 내마모성과 강도가 훨씬 개선된다.

Description

산화물 코팅된 절삭공구
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 정상적인 Al2O3-코팅은 2,000x배율로 확대한 주사 전자현미경(SEM)평면 사진을 보여준다.

Claims (8)

  1. 하나이상의 층이 알루미나인 하나 또는 다수의 내화층으로 부분 피복되고 알루미나층의 두께는 d=0.5-25um 이고 다음과 같은 입자 크기를 단일상 a-구조를 같은 것을 특징으로 하는 피복체 :
    0.5um<d<2.5um일 때 0.5um<d<1um 이고 2.5um<d<25um 일 때 0.5um<s<3um.
  2. 제1항에 있어서, 내화코팅의 표면강도(Ra)는 0.25㎜의 길이에 걸쳐 0.3um인 것을 특징으로 하는 피복체.
  3. 전술한 항중 한항에 있어서, 알루미나층은 다음처럼 정의된 결정학상 평면의 (012) 성장방향에서 1.3이상 특히 1.5이상의 조직상수를 나타내는 것을 특징으로 하는 피복체 :
    여기서 I(hkl)=(hkl)반사강도 측정치 I(hkl)=ASTM 표준 분말형 회절 데이터의 강도 n=계산에 사용되는 반사수, (hkl) 반사는 (012), (104), (110), (113), (16)이다.
  4. 전술한 항중 한항에 있어서, 알루니마층은 가장 바깥층인 것을 특징으로 하는 피복체.
  5. 전솔한 항중 한항에 있어서, 알루미나층은 TiCXNYOZ층과 접촉하는 것을 특징으로 하는 피복체.
  6. 제5항에 있어서, TiCXNYOZ층은 코팅의 가장 안쪽층인 것을 특징으로 하는 피복체.
  7. 전술한 항중 한항에 있어서, 피복체가 초경합금, 티타늄 기초 탄소질화물이나 세라믹체의 절삭공구 인서어트인 것을 특징으로 하는 피복체.
  8. 피복체를 하나이상의 알루미늄 할로겐물과 가수분해에 또는 산화제를 함유하는 수소운반 기체와 고온에서 접촉시키는 것으로서 수소 운반기체의 산화전위가 Al2O3의 핵형성에 앞서 20ppm이하 특히 5ppm이하의 H2O이고 Al2O3핵형성은 CO2, CO 및 AlCl2차례대로 반응기체를 수반하여 개시되고 온도는 핵형성시 1000℃정도인 것을 특징으로 하는 피복체에 대한 a-알루미나 피복방법.
    ※참고사항:최초출원 내용에 의하여 공개하는 것임.
KR1019930027386A 1992-12-18 1993-12-13 산화물 코팅된 코팅체 KR100292292B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE9203852-0 1992-12-18
SE9203852A SE501527C2 (sv) 1992-12-18 1992-12-18 Sätt och alster vid beläggning av ett skärande verktyg med ett aluminiumoxidskikt

Publications (2)

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KR940014881A true KR940014881A (ko) 1994-07-19
KR100292292B1 KR100292292B1 (ko) 2001-06-01

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US (2) US5487625A (ko)
EP (1) EP0603144B1 (ko)
JP (1) JP3325987B2 (ko)
KR (1) KR100292292B1 (ko)
CN (1) CN1051263C (ko)
AT (1) ATE145437T1 (ko)
BR (1) BR9305108A (ko)
DE (1) DE69306089T2 (ko)
IL (1) IL107977A (ko)
RU (1) RU2117074C1 (ko)
SE (1) SE501527C2 (ko)

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CN1051263C (zh) 2000-04-12
SE9203852D0 (sv) 1992-12-18
SE501527C2 (sv) 1995-03-06
DE69306089D1 (de) 1997-01-02
KR100292292B1 (ko) 2001-06-01
US5654035A (en) 1997-08-05
JPH06316758A (ja) 1994-11-15
ATE145437T1 (de) 1996-12-15
RU2117074C1 (ru) 1998-08-10
IL107977A (en) 1997-08-14
EP0603144B1 (en) 1996-11-20
EP0603144A1 (en) 1994-06-22
IL107977A0 (en) 1994-04-12
US5487625A (en) 1996-01-30
SE9203852L (sv) 1994-06-19
DE69306089T2 (de) 1997-03-13
CN1091683A (zh) 1994-09-07
JP3325987B2 (ja) 2002-09-17

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