KR950032707A - 코팅된 절단 공구 - Google Patents

코팅된 절단 공구 Download PDF

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KR950032707A
KR950032707A KR1019950005932A KR19950005932A KR950032707A KR 950032707 A KR950032707 A KR 950032707A KR 1019950005932 A KR1019950005932 A KR 1019950005932A KR 19950005932 A KR19950005932 A KR 19950005932A KR 950032707 A KR950032707 A KR 950032707A
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cemented carbide
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레난더 앤더스
애케손 라이프
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레나르트 태퀴스트
산드빅 에이비
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Abstract

본 발명은 칩 형성 기계용 CVD-코팅딘 시멘티드 카바이드 공구에 관한 것이다. 특히, 본 발명은 확산 방지제로서 작용하여 코팅 구조체 및 후속 층의 코팅접착에 영향을 미치는 중간 층을 구비한 코팅체에 관한 것이다.

Description

코팅된 절단 공구
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 의한 연마되고 에칭된 코팅부를 1600배 확대한 도면, 제2도는 제1도와 동일한 코팅을 4000배 확대한 부분 표면을 도시한 도면.

Claims (15)

  1. 코팅된 시멘티드 카바이드 본체에 있어서, 코팅은, 기판에 인접한 하나 또는 1조의 MetCxN1-x(0≤x≤1) 제1층과, 0.7≤x+y+z≤1.3 및 0.2＜y＜0.8의 조건, 양호하게는 0.4＜y＜0.6인 조건의 MetCxOyNz로 구성되는 제2층과, MetCxN|1-x(0≤x≤1) 내마모성 제3층을 포함하고, 여기서 금속 Met는 Ti, Zr, Hf, V, Nb 및 Ta의 금속 군으로부터 선택되며, 상기 기판이 표면 코발트와 무관하게 될 때 하나 또는 1조의 MetCxN1-x(0≤x≤1) 제1층의 두께가 1.0 내지 5.0㎛의 범위이거나, 또는 선택적으로 0.5 내지 5.0㎛인 것을 특징으로 하는 코팅된 시멘티드 카바이드 본체.
  2. 제1항에 있어서, MetCxN1-x(0≤x≤1)의 상기 제3층이 제1 및 제2층의 전체 두께를 초과하는 코팅 두께를 갖는 것을 특징으로 하는 시멘티드 카바이드 본체.
  3. 제1항 또는 제2항에 있어서, 상기 제2층의 두께가 0.1 내지 0.5㎛, 양호하게는 0.2 내지 1.0㎛인 것을 특징으로 하는 시켄티드 바카이드 본체.
  4. 전술한 항 중의 어느 한 항에 있어서, 기판에 인접한 하나 또는 1조의 MetCxN1-x(0≤x≤1)의 제1층이 두께는 상기 기판이 표면 코발트와 무관하게 될 때 1.3 내지 3.0㎛, 또는 선택적으로 0.5 내지 2.0㎛인 것을 특징으로 하는 시멘티드 카바이드 본체.
  5. 제3항 또는 제4항에 있어서, MetCxN1-x(0≤x≤1)의 내마모성의 제3층의 두께가 20㎛이하이고, 양호하게는 5내지 12㎛인 것을 특징으로 하는 시켄티드 카바이드 본체.
  6. 전술한 항 중의 어느 한 항에 있어서, MetCxN1-x(0≤x≤1)의 내마모성의 제3층은 0.05≤x≤0.95의 조건, 양호하게는 0.3≤x≤0.7의 조건에서 TicxN1-x로 구성되는 것을 특징으로 하는 시멘티드 카바이드 본체.
  7. 제6항에 있어서, 내마모성 제3층은 아래와 같이 정의된 조직 계수(TC)가 1.3, 양호하게는 1.5, 가장 양호하게는 1.8보다 큰 상태에서 (220)방향으로의 우수한 결정학적 성장 방향을 갖는 것을 특징으로 하는 시멘티드 카바이드 본체.
    이 경우, I(hk1)은 (hk1)반사의 측정 강도이고, Io(hk1)은 ASTM 표준 분말 패턴 회절 데이타의 표준 강도이고, n은 계산에 사용된 반사 회수이고, 사용된 (hk1)반사방향은 (111), (200), (220)이다.
  8. 전술한 항 중의 어느 한 항에 있어서, 상기 코팅된 본체가 외측의 알루미나층을 포함하는 것을 특징으로 하는 시멘티드 카바이드 본체.
  9. 제8항에 있어서, 상기 알루미나 층은 입자 크기(S)가 0.5 내지 3.0㎛인 단일 상태의 α-알루미나로 구성되는 것을 특징으로 하는 시멘티드 카바이드 본체.
  10. 제8항 또는 제9항에 있어서, 상기 본체가 TiN 최외측 층을 포함하는 것을 특징으로 하는 시멘티드 카바이드 본체.
  11. 제10항에 있어서, 상기 TiN 최외측 층이 0.01 내지 1.0㎛의 두께를 가지는 것을 특징으로 하는 시멘티드 카바이드 본체.
  12. 코팅을 구비한 시멘티드 카바이드 기판을 포함하는 본체를 제조하기 위한 방법에 있어서, 기판에 인접한 하나 또는 1조의 MetCxN1-x(0≤x≤1) 제1층을 제조하기 위하여, 상기 금속(Met)은 Ti, Zr, Hf, V, Ta, Nb의 금속 군에서 선택되고, 상기 기판에 800 내지 1200℃, 양호하게는 900 내지 1070℃의 온도 범위와 5 내지 1050mber,양호하게는 30 내지 100mber의 공정 압력으로 수소, 질소 및 탄화수소를 함유한 기체와 카보니트리드를 형성하는 전술한 금속들의 하나 또는 그 이상의 할로겐 화합물이 접촉되는 단계와, 상기 제1층에 직접 인가되는 MetCxOyNz의 제2층을 제조하기 위하여, 상기 MetCxOyNz0.7≤x+y+z≤1.3의 조건과 0.2≤y≤0.8, 양호하게는 0.4≤y≤0.6의 조건을 만족시키며, 800 내지 1200℃, 양호하게는 900 내지 1070℃의 온도 범위와 50 내지 100mber,양호하게는 30 내지 100mber의 공정 압력으로 수소, 질소 및 일산화 탄소를 함유하는 기체와 옥시카바이드 및 옥시니트로카이드를 형성하는 전술한 금속들의 하나 또는 그 이상의 할로겐 화합물로써 증착되는 단계와, 그리고 상기 제2층에 직접 인가되는 MetCxN1-x(0≤x≤1) 제3층을 제조하기 위하여, 800 내지 1200℃, 양호하게는 900 내지 1070℃의 온도 범위와 5 내지 1050mber, 양호하게는 200 내지 600mber의 공정 압력으로 수소, 질소 및 탄화수소를 함유하는 기체와 카보니트리드를 형성하는 전술한 금속들의 하나 또는 그 이상의 할로겐화합물로써 증착되는 단계를, 포함하는 것을 특징으로 하는 시멘티드 카바이드 본체의 제조 방법.
  13. 제12항에 있어서, 외측의 알루미나 층이 수소 및 이산화탄소를 함유하는 기체와 알루미늄 할로겐 화합물의 증착에 의해 부착되는 것을 특징으로 하는 제조 방법.
  14. 제12항에 있어서, 외측의 α-알루미나 층이 수소 및 이산화탄소를 함유하는 기체와 알루미늄 할로겐 화합물의 증착에 의해 부착되는 것을 특징으로 하는 제조 방법.
  15. 제13항 또는 제14항에 있어서, 최외측의 TiN층이 수소, 질소 및 티타늄 할로겐 화합물을 함유하는 기체의 증착에 의해 상기 알루미나 층의 상부 상에 부착되는 것을 특징으로 하는 제조 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
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