KR920017223A - 반도체장치 및 그 제조방법 - Google Patents

반도체장치 및 그 제조방법 Download PDF

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KR920017223A
KR920017223A KR1019920002157A KR920002157A KR920017223A KR 920017223 A KR920017223 A KR 920017223A KR 1019920002157 A KR1019920002157 A KR 1019920002157A KR 920002157 A KR920002157 A KR 920002157A KR 920017223 A KR920017223 A KR 920017223A
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semiconductor chip
wiring pattern
film
hole
polymerized
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KR1019920002157A
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KR950006439B1 (ko
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야스히로 야마지
요이치 히루타
츠토무 나카자와
가츠토 가토
요시히로 아츠미
나오히토 히라노
아키히토 마세
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아오이 죠이치
가부시키가이샤 도시바
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Abstract

내용 없음

Description

반도체장치 및 그 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 제1실시예에 따른 반도체장치의 패키지구조를 나타낸 종단면도, 제2도는 본 발명의 제1실시예에 따른 반도체장치를 제조하는 순서를 나타낸 공정별 소자단면도, 제3도는 본 발명의 제2실시예에 따른 반도체장치의 패키지구조를 나타낸 종단면도.

Claims (3)

  1. 복수개의 반도체칩(12)과, 표면에 배선패턴(15)이 형성된 복수개의 필름기판(21)을 구비하고, 상기 반도체칩(12)은 전극패드(13)와 상기 배선패턴(15)이 전기적으로 접속된 상태에서 중합된 상기 필름기판(21)의 내부에 실장되어 있는 것을 특징으로 하는 반도체장치.
  2. 복수개의 반도체칩(12)과, 열가소성 수지로 이루어지고, 표면에 상기 배선패턴(15)이 형성되어 있으며, 관통구멍(via hole)을 이용한 접속이 행해져야 할 위치에 구멍(22)이 개공되어 있는 복수개의 필름기판(21)을 구비하고, 중합된 상태에서 가열 및 가압되어 경화된 중합된 상태에서 가열 및 상기 필름기판(21)의 내부에, 상기 반도체칩(12)이 전극패드(13)와 상기 배선패턴(15)이 직접 접속되거나 또는 상기 구멍(22)을 통하여 접속된 상태에서 실장되어 있는 것을 특징으로 하는 반도체장치.
  3. 복수개의 필름기판(21)상에 도체 페이스트(23)를 인쇄하여 배선패턴(15)을 형성하고, 관통구멍을 이용한 접속을 행해야 할 위치에 구멍(22)을 개공하는 공정과, 상기 필름기판(21)을 중합시키고, 그 내부의 반도체칩(12)의 전극 패드(13)와 상기 배선패턴(15)이 접속될 위치에 상기 반도체칩(12)을 설치한 상태에서 가열 및 가압을 행하여 상기 필름기판(21)의 적층과, 상기 반도체칩(12)과 상기 필름기판(21)과의 전기적 접속 및 상기 반도체칩(12)의 밀봉을 동시에 행하는 공정을 구비하여 구성된 것을 특징으로 하는 반도체장치의 제조 방법.
    ※참고사항:최초출원 내용에 의하여 공개하는 것임.
KR1019920002157A 1991-02-18 1992-02-14 반도체장치 및 그 제조방법 KR950006439B1 (ko)

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