KR920007083A - 반도체 장치 - Google Patents
반도체 장치 Download PDFInfo
- Publication number
- KR920007083A KR920007083A KR1019910015953A KR910015953A KR920007083A KR 920007083 A KR920007083 A KR 920007083A KR 1019910015953 A KR1019910015953 A KR 1019910015953A KR 910015953 A KR910015953 A KR 910015953A KR 920007083 A KR920007083 A KR 920007083A
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor device
- identification
- section
- convex portion
- identification information
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims description 19
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2884—Testing of integrated circuits [IC] using dedicated test connectors, test elements or test circuits on the IC under test
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54406—Marks applied to semiconductor devices or parts comprising alphanumeric information
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54413—Marks applied to semiconductor devices or parts comprising digital information, e.g. bar codes, data matrix
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54433—Marks applied to semiconductor devices or parts containing identification or tracking information
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54433—Marks applied to semiconductor devices or parts containing identification or tracking information
- H01L2223/5444—Marks applied to semiconductor devices or parts containing identification or tracking information for electrical read out
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54473—Marks applied to semiconductor devices or parts for use after dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54473—Marks applied to semiconductor devices or parts for use after dicing
- H01L2223/5448—Located on chip prior to dicing and remaining on chip after dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Measurement Of Radiation (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 제1의 실시예에 관한 반도체 장치를 도시하는 평면도,
제2도는 상기 제1도의 X-X선에 따르는 단면도,
제3도는 복수의 반도체 정치부가 형성되는 실리콘 웨이퍼를 도시하는 평면도.
Claims (5)
- 복수의 반도체장치부(B1-B46)가 동시에 형성된 반도체 장치에 있어서 각각의 반도체 장치부에는 다른 반도체 장치부터 식별할 수 있는 식별부(11,21,23)가 형성되는 것을 특징으로 하는 반도체 장치.
- 제1항에 있어서, 상기 식별부는 그 반도체 장치부에 특유의 오목부 또는 볼록부로 구성되는 것을 특징으로 하는 반도체 장치.
- 제2항에 있어서, 상기 오목부 또는 볼록부가 다른 반도체 장치부로부터 식별하기 위한 식별정보인 것을 특징으로 하는 반도체 장치.
- 제2항에 있어서, 상기 오목부 또는 볼록부는 그 반도체 장치부를 형성하는 반도체 장치의 정보 및 그 반도체 장치의 위치 정보를 포함하는 것을 특징으로 하는 반도체 장치.
- 복수의 반도체장치부(B1-B46)가 동시에 형성된 반도체 장치에 있어서, 각각의 반도체 장치부에 다른 반도체 장치로부터 식별하는 식별정보가 등록되는 등록부(25)와 제어신호(ø)의 입력에 따라서 상기 등록부로부터 상기 식별정보를 독출하는 독출수단(24)을 설치한 것을 특징으로 하는 반도체 장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2242464A JPH07123101B2 (ja) | 1990-09-14 | 1990-09-14 | 半導体装置 |
JP02-242464 | 1990-09-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR920007083A true KR920007083A (ko) | 1992-04-28 |
KR950014606B1 KR950014606B1 (ko) | 1995-12-11 |
Family
ID=17089476
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910015953A KR950014606B1 (ko) | 1990-09-14 | 1991-09-13 | 반도체 장치 |
Country Status (3)
Country | Link |
---|---|
US (1) | US5294812A (ko) |
JP (1) | JPH07123101B2 (ko) |
KR (1) | KR950014606B1 (ko) |
Families Citing this family (59)
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US5408131A (en) * | 1992-04-20 | 1995-04-18 | Motorola, Inc. | Circuit identifier for use with focused ion beam equipment |
US5403753A (en) * | 1993-07-15 | 1995-04-04 | Texas Instruments Incorporated | Method of forming implant indicators for implant verification |
FR2728104A1 (fr) * | 1994-12-09 | 1996-06-14 | Sgs Thomson Microelectronics | Procede de marquage de circuits integres avec un laser, et appareil de marquage s'y rapportant |
US5963881A (en) * | 1995-09-22 | 1999-10-05 | Texas Instruments Incorporated | Method and system for enhancing the identification of causes of variations in the performance of manufactured articles |
US6100486A (en) | 1998-08-13 | 2000-08-08 | Micron Technology, Inc. | Method for sorting integrated circuit devices |
US5927512A (en) | 1997-01-17 | 1999-07-27 | Micron Technology, Inc. | Method for sorting integrated circuit devices |
US6072574A (en) | 1997-01-30 | 2000-06-06 | Micron Technology, Inc. | Integrated circuit defect review and classification process |
US5844803A (en) | 1997-02-17 | 1998-12-01 | Micron Technology, Inc. | Method of sorting a group of integrated circuit devices for those devices requiring special testing |
US5915231A (en) | 1997-02-26 | 1999-06-22 | Micron Technology, Inc. | Method in an integrated circuit (IC) manufacturing process for identifying and redirecting IC's mis-processed during their manufacture |
US5856923A (en) * | 1997-03-24 | 1999-01-05 | Micron Technology, Inc. | Method for continuous, non lot-based integrated circuit manufacturing |
US5984190A (en) * | 1997-05-15 | 1999-11-16 | Micron Technology, Inc. | Method and apparatus for identifying integrated circuits |
US5907492A (en) | 1997-06-06 | 1999-05-25 | Micron Technology, Inc. | Method for using data regarding manufacturing procedures integrated circuits (IC's) have undergone, such as repairs, to select procedures the IC's will undergo, such as additional repairs |
US7120513B1 (en) | 1997-06-06 | 2006-10-10 | Micron Technology, Inc. | Method for using data regarding manufacturing procedures integrated circuits (ICS) have undergone, such as repairs, to select procedures the ICS will undergo, such as additional repairs |
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JP3406817B2 (ja) * | 1997-11-28 | 2003-05-19 | 株式会社東芝 | 金属層へのマーク付け方法および半導体装置 |
US6023094A (en) | 1998-01-14 | 2000-02-08 | National Semiconductor Corporation | Semiconductor wafer having a bottom surface protective coating |
US6049624A (en) * | 1998-02-20 | 2000-04-11 | Micron Technology, Inc. | Non-lot based method for assembling integrated circuit devices |
US6265232B1 (en) | 1998-08-21 | 2001-07-24 | Micron Technology, Inc. | Yield based, in-line defect sampling method |
US6240329B1 (en) * | 1998-11-09 | 2001-05-29 | Chin-Yang Sun | Method and apparatus for a semiconductor wafer inspection system using a knowledge-based system |
SE522531C2 (sv) * | 1999-11-24 | 2004-02-17 | Micronic Laser Systems Ab | Metod och anordning för märkning av halvledare |
IL150784A0 (en) * | 2000-01-20 | 2003-02-12 | Zavitan Semiconductors Inc | Personalized hardware |
JP2001210730A (ja) * | 2000-01-25 | 2001-08-03 | Oki Electric Ind Co Ltd | 不揮発性半導体記憶装置の製造方法 |
JP3555859B2 (ja) * | 2000-03-27 | 2004-08-18 | 広島日本電気株式会社 | 半導体生産システム及び半導体装置の生産方法 |
US6524881B1 (en) * | 2000-08-25 | 2003-02-25 | Micron Technology, Inc. | Method and apparatus for marking a bare semiconductor die |
US7316934B2 (en) * | 2000-12-18 | 2008-01-08 | Zavitan Semiconductors, Inc. | Personalized hardware |
KR100393214B1 (ko) | 2001-02-07 | 2003-07-31 | 삼성전자주식회사 | 패드의 수를 최소화하기 위한 칩 식별 부호 인식 장치 및이를 내장한 반도체 장치 |
GB2374426B (en) * | 2001-02-07 | 2003-10-29 | Samsung Electronics Co Ltd | Apparatus for recognizing chip identification and semiconductor device comprising the apparatus |
US6792365B2 (en) * | 2001-08-10 | 2004-09-14 | Micron Technology, Inc. | Sequential unique marking |
US7135356B2 (en) * | 2002-02-07 | 2006-11-14 | Semiconductor Components Industries, L.L.C. | Semiconductor device and method of producing a high contrast identification mark |
CN100487891C (zh) * | 2002-02-07 | 2009-05-13 | 半导体元件工业有限责任公司 | 半导体器件及半导体管芯的制造方法 |
US7169685B2 (en) | 2002-02-25 | 2007-01-30 | Micron Technology, Inc. | Wafer back side coating to balance stress from passivation layer on front of wafer and be used as die attach adhesive |
US7668702B2 (en) * | 2002-07-19 | 2010-02-23 | Applied Materials, Inc. | Method, system and medium for controlling manufacturing process using adaptive models based on empirical data |
JP3614418B2 (ja) * | 2002-10-04 | 2005-01-26 | 株式会社Neomax | 薄膜磁気ヘッド用基板およびその製造方法 |
JP2004158768A (ja) * | 2002-11-08 | 2004-06-03 | Disco Abrasive Syst Ltd | 半導体ウエーハおよびサブストレート |
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ITMI20082344A1 (it) | 2008-12-30 | 2010-06-30 | St Microelectronics Srl | Metodo per indicizzare piastrine comprendenti circuiti integrati |
US8539395B2 (en) | 2010-03-05 | 2013-09-17 | Micronic Laser Systems Ab | Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image |
KR20120105828A (ko) * | 2011-03-16 | 2012-09-26 | 삼성전자주식회사 | 반도체 발광다이오드 칩, 그 제조방법 및 품질관리방법 |
US8415813B2 (en) * | 2011-06-15 | 2013-04-09 | Truesense Imaging, Inc. | Identification of dies on a semiconductor wafer |
US8415175B2 (en) | 2011-06-15 | 2013-04-09 | Truesense Imaging, Inc. | Identification of dies on a semiconductor wafer |
US9136222B2 (en) | 2012-05-11 | 2015-09-15 | GlobalFoundries, Inc. | Chip identification pattern and method of forming |
JP2014036134A (ja) * | 2012-08-09 | 2014-02-24 | Disco Abrasive Syst Ltd | デバイスの加工方法 |
US20140070404A1 (en) * | 2012-09-12 | 2014-03-13 | Shing-Ren Sheu | Semiconductor package structure and interposer therefor |
US20180269091A1 (en) * | 2017-03-16 | 2018-09-20 | Elenion Technologies, Llc | Chip identification system |
CN107221509B (zh) * | 2017-06-20 | 2020-10-13 | 南京矽邦半导体有限公司 | 一种识别单颗产品在qfn框架上位置信息的方法 |
Family Cites Families (11)
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JPS5793519A (en) * | 1980-12-02 | 1982-06-10 | Nec Corp | Semiconductor device |
JPS5897834U (ja) * | 1981-12-25 | 1983-07-02 | 株式会社日立製作所 | 半導体装置 |
JPS58188127A (ja) * | 1982-04-28 | 1983-11-02 | Nec Corp | 半導体ウエハ− |
JPS5966112A (ja) * | 1982-10-08 | 1984-04-14 | Hitachi Ltd | 半導体チツプ |
JPS6158966A (ja) * | 1984-08-29 | 1986-03-26 | Sanshin Ind Co Ltd | 横置き型2サイクル内燃機関 |
JPH0611076B2 (ja) * | 1985-10-08 | 1994-02-09 | 三菱電機株式会社 | 半導体装置の製造方法 |
JPH06101532B2 (ja) * | 1986-10-29 | 1994-12-12 | 三菱電機株式会社 | 半導体集積回路装置 |
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JP2969659B2 (ja) * | 1989-07-27 | 1999-11-02 | 日本電気株式会社 | 不揮発性半導体記憶装置 |
US5105235A (en) * | 1989-12-22 | 1992-04-14 | Matsushita Electric Industrial Co., Ltd. | Semiconductor integrated circuit having light emitting MOS devices |
US5177567A (en) * | 1991-07-19 | 1993-01-05 | Energy Conversion Devices, Inc. | Thin-film structure for chalcogenide electrical switching devices and process therefor |
-
1990
- 1990-09-14 JP JP2242464A patent/JPH07123101B2/ja not_active Expired - Fee Related
-
1991
- 1991-09-13 KR KR1019910015953A patent/KR950014606B1/ko not_active IP Right Cessation
-
1993
- 1993-03-26 US US08/038,063 patent/US5294812A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH04123417A (ja) | 1992-04-23 |
US5294812A (en) | 1994-03-15 |
JPH07123101B2 (ja) | 1995-12-25 |
KR950014606B1 (ko) | 1995-12-11 |
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