KR20230117553A - 경화성 수지 조성물, 경화막 및 표시 장치 - Google Patents

경화성 수지 조성물, 경화막 및 표시 장치 Download PDF

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Publication number
KR20230117553A
KR20230117553A KR1020230099999A KR20230099999A KR20230117553A KR 20230117553 A KR20230117553 A KR 20230117553A KR 1020230099999 A KR1020230099999 A KR 1020230099999A KR 20230099999 A KR20230099999 A KR 20230099999A KR 20230117553 A KR20230117553 A KR 20230117553A
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South Korea
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resin composition
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KR1020230099999A
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English (en)
Korean (ko)
Inventor
요시히로 하라다
메구미 하야사카
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스미또모 가가꾸 가부시키가이샤
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Priority claimed from KR1020180017870A external-priority patent/KR102683436B1/ko
Application filed by 스미또모 가가꾸 가부시키가이샤 filed Critical 스미또모 가가꾸 가부시키가이샤
Publication of KR20230117553A publication Critical patent/KR20230117553A/ko

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/06Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0042Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/35Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being liquid crystals

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Optical Filters (AREA)
  • Paints Or Removers (AREA)
  • Electroluminescent Light Sources (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
KR1020230099999A 2017-02-16 2023-07-31 경화성 수지 조성물, 경화막 및 표시 장치 KR20230117553A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017026786 2017-02-16
JPJP-P-2017-026786 2017-02-16
KR1020180017870A KR102683436B1 (ko) 2017-02-16 2018-02-13 경화성 수지 조성물, 경화막 및 표시 장치

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020180017870A Division KR102683436B1 (ko) 2017-02-16 2018-02-13 경화성 수지 조성물, 경화막 및 표시 장치

Publications (1)

Publication Number Publication Date
KR20230117553A true KR20230117553A (ko) 2023-08-08

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KR1020230099999A KR20230117553A (ko) 2017-02-16 2023-07-31 경화성 수지 조성물, 경화막 및 표시 장치

Country Status (4)

Country Link
JP (1) JP6630754B2 (ja)
KR (1) KR20230117553A (ja)
CN (2) CN115657421A (ja)
TW (2) TW202402826A (ja)

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TWI824082B (zh) * 2018-12-13 2023-12-01 南韓商東友精細化工有限公司 量子點、量子點分散體、量子點光轉換組合物、自發光感光性樹脂組合物、量子點發光二極體、量子點膜、濾色器、光轉換層疊基材及影像顯示裝置
WO2020162552A1 (ja) * 2019-02-07 2020-08-13 Dic株式会社 カラーフィルタ用インクジェットインク、光変換層及びカラーフィルタ
US11920069B2 (en) 2019-03-12 2024-03-05 Merck Patent Gmbh Compositions containing semiconducting nanoparticles, and polymer or composite layers formed therefrom, and optical devices
CN113249112A (zh) * 2020-02-12 2021-08-13 东友精细化工有限公司 量子点及其应用
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Also Published As

Publication number Publication date
CN108445714A (zh) 2018-08-24
JP2018131612A (ja) 2018-08-23
CN108445714B (zh) 2022-12-09
TW201835114A (zh) 2018-10-01
CN115657421A (zh) 2023-01-31
TW202402826A (zh) 2024-01-16
TWI817939B (zh) 2023-10-11
JP6630754B2 (ja) 2020-01-15
KR20180094805A (ko) 2018-08-24

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