KR20070072385A - 기판의 세척 장치 및 방법 - Google Patents

기판의 세척 장치 및 방법 Download PDF

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Publication number
KR20070072385A
KR20070072385A KR1020060135452A KR20060135452A KR20070072385A KR 20070072385 A KR20070072385 A KR 20070072385A KR 1020060135452 A KR1020060135452 A KR 1020060135452A KR 20060135452 A KR20060135452 A KR 20060135452A KR 20070072385 A KR20070072385 A KR 20070072385A
Authority
KR
South Korea
Prior art keywords
substrate
foam
head unit
fluid
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1020060135452A
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English (en)
Korean (ko)
Inventor
에릭 엠 프리어
라리오스 존 엠 드
카트리나 미카리켄코
마이클 래브킨
미하일 코로리크
프레드 씨 리데커
클린트 토마스
존 파크
Original Assignee
램 리써치 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 램 리써치 코포레이션 filed Critical 램 리써치 코포레이션
Publication of KR20070072385A publication Critical patent/KR20070072385A/ko
Abandoned legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/003—Cleaning involving contact with foam
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
KR1020060135452A 2005-12-30 2006-12-27 기판의 세척 장치 및 방법 Abandoned KR20070072385A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US75537705P 2005-12-30 2005-12-30
US60/755,377 2005-12-30
US11/532,493 2006-09-15
US11/532,493 US8522799B2 (en) 2005-12-30 2006-09-15 Apparatus and system for cleaning a substrate

Publications (1)

Publication Number Publication Date
KR20070072385A true KR20070072385A (ko) 2007-07-04

Family

ID=37998277

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060135452A Abandoned KR20070072385A (ko) 2005-12-30 2006-12-27 기판의 세척 장치 및 방법

Country Status (7)

Country Link
US (1) US8522799B2 (https=)
EP (1) EP1803503A3 (https=)
JP (1) JP2007208247A (https=)
KR (1) KR20070072385A (https=)
CN (1) CN102601078A (https=)
SG (1) SG133543A1 (https=)
TW (2) TWI350561B (https=)

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KR20180131345A (ko) * 2017-05-31 2018-12-10 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 반도체 디바이스의 화학적 세정

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TWI350561B (en) 2011-10-11
TW200805467A (en) 2008-01-16
TW201133595A (en) 2011-10-01
CN102601078A (zh) 2012-07-25
EP1803503A3 (en) 2012-06-20
US20090308413A1 (en) 2009-12-17
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US8522799B2 (en) 2013-09-03
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