KR102318084B1 - 유기 el 표시 장치, 그리고 화소 분할층 및 평탄화층의 형성 방법 - Google Patents
유기 el 표시 장치, 그리고 화소 분할층 및 평탄화층의 형성 방법 Download PDFInfo
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- KR102318084B1 KR102318084B1 KR1020207004118A KR20207004118A KR102318084B1 KR 102318084 B1 KR102318084 B1 KR 102318084B1 KR 1020207004118 A KR1020207004118 A KR 1020207004118A KR 20207004118 A KR20207004118 A KR 20207004118A KR 102318084 B1 KR102318084 B1 KR 102318084B1
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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- H01L27/32—
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- H01L51/50—
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
- H10K59/8792—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. black layers
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- Wood Science & Technology (AREA)
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- Chemical Kinetics & Catalysis (AREA)
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- Electroluminescent Light Sources (AREA)
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| WO (1) | WO2019065359A1 (zh) |
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| JP6892002B2 (ja) * | 2019-11-19 | 2021-06-18 | 大日本印刷株式会社 | 樹脂パネル及び赤外線センサー |
| EP4159815A1 (en) * | 2020-05-25 | 2023-04-05 | Mitsubishi Engineering-Plastics Corporation | Light-transmissive resin composition for laser welding, kit, molded product, and method for producing molded product |
| JP7406458B2 (ja) * | 2020-06-05 | 2023-12-27 | 日本化薬株式会社 | 水溶性ペリレン系二色性蛍光染料、又はその塩を用いた偏光機能を有する偏光発光膜、偏光発光板及び表示装置 |
| US20230101363A1 (en) * | 2020-08-13 | 2023-03-30 | Dic Corporation | Coloring composition, and color filter |
| WO2022070946A1 (ja) * | 2020-09-29 | 2022-04-07 | 東レ株式会社 | 感光性樹脂組成物、硬化物、及び表示装置、並びに、硬化物の製造方法 |
| JPWO2022270182A1 (zh) | 2021-06-22 | 2022-12-29 | ||
| WO2023190218A1 (ja) * | 2022-03-30 | 2023-10-05 | 東レ株式会社 | 表示装置及び感光性組成物 |
| WO2023190317A1 (ja) * | 2022-03-31 | 2023-10-05 | 東レ株式会社 | 表示装置 |
| WO2023195319A1 (ja) * | 2022-04-04 | 2023-10-12 | 東レ株式会社 | ポジ型感光性顔料組成物およびその硬化物を含む硬化膜ならびに有機ｅｌ表示装置 |
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Family Cites Families (25)
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| DE3926564A1 (de) * | 1989-08-11 | 1991-02-14 | Hoechst Ag | Neue pigmentzubereitungen auf basis von perylenverbindungen |
| JPH05117541A (ja) * | 1991-10-24 | 1993-05-14 | Toyo Ink Mfg Co Ltd | 顔料組成物および顔料分散体 |
| DE4325247A1 (de) * | 1993-07-28 | 1995-02-02 | Basf Ag | Pigmentzubereitungen mit Perylenderivaten als Dispergiermitteln |
| JPH09137075A (ja) * | 1995-11-14 | 1997-05-27 | Nippon Kayaku Co Ltd | 顔料分散剤及びこれを用いた顔料組成物 |
| US6986811B2 (en) | 2003-01-31 | 2006-01-17 | Basf Aktiengesellschaft | Perylene derivatives and their application as dispersants |
| US6884563B2 (en) * | 2003-05-20 | 2005-04-26 | Eastman Kodak Company | Thermal imaging material containing combustible nitro-resin particles |
| JP5016831B2 (ja) * | 2006-03-17 | 2012-09-05 | キヤノン株式会社 | 酸化物半導体薄膜トランジスタを用いた発光素子及びこれを用いた画像表示装置 |
| US20070284687A1 (en) * | 2006-06-13 | 2007-12-13 | Rantala Juha T | Semiconductor optoelectronics devices |
| WO2007147701A1 (en) * | 2006-06-22 | 2007-12-27 | Basf Se | Azoline compounds for combating arthropod pests |
| TWI431071B (zh) | 2007-10-17 | 2014-03-21 | Clariant Finance Bvi Ltd | 用於彩色濾光片中的二酮基吡咯并吡咯顏料組成物 |
| EP2668156B1 (en) * | 2011-01-28 | 2018-10-31 | Basf Se | Polymerizable composition comprising an oxime sulfonate as thermal curing agent |
| JP2012190951A (ja) * | 2011-03-10 | 2012-10-04 | Sony Corp | 固体撮像装置およびカメラ |
| JP2013030293A (ja) | 2011-07-27 | 2013-02-07 | Sony Corp | 表示装置および表示装置用基板 |
| CN102268215B (zh) * | 2011-08-09 | 2013-04-24 | 东莞大宝化工制品有限公司 | 一种3c产品镁铝合金素材专用的溶剂型底漆及其制备方法 |
| CN102645785B (zh) * | 2012-02-24 | 2014-08-13 | 京东方科技集团股份有限公司 | 一种彩膜基板及其制作方法 |
| JP2013207124A (ja) | 2012-03-29 | 2013-10-07 | Toyo Ink Sc Holdings Co Ltd | 感光性黒色組成物、ブラックマトリクス及び有機ｅｌ発光表示装置 |
| CN102881654B (zh) * | 2012-09-29 | 2016-03-23 | 京东方科技集团股份有限公司 | 薄膜晶体管阵列基板及其制备方法、有源矩阵驱动显示装置 |
| CN103996794A (zh) * | 2013-02-18 | 2014-08-20 | 东丽先端材料研究开发（中国）有限公司 | 有机发光元件 |
| JP6075763B2 (ja) * | 2013-03-22 | 2017-02-08 | 日本化薬株式会社 | 活性エネルギー線硬化型樹脂組成物、及びそれを用いた表示素子用着色スペーサー及び／またはブラックマトリックス |
| TW201510103A (zh) | 2013-08-01 | 2015-03-16 | Dainippon Ink & Chemicals | 彩色濾光片用顏料組成物及彩色濾光片 |
| KR102485543B1 (ko) * | 2013-09-25 | 2023-01-09 | 미쯔비시 케미컬 주식회사 | 감광성 착색 조성물, 블랙 매트릭스, 착색 스페이서, 화상 표시 장치 및 안료 분산액 |
| JP6444099B2 (ja) * | 2013-10-09 | 2018-12-26 | キヤノン株式会社 | 電子写真感光体、電子写真感光体の製造方法、プロセスカートリッジおよび電子写真装置 |
| US9413740B2 (en) | 2014-07-22 | 2016-08-09 | Microsoft Technology Licensing, Llc | Establishing secure computing devices for virtualization and administration |
| WO2016047483A1 (ja) | 2014-09-26 | 2016-03-31 | 東レ株式会社 | 有機ｅｌ表示装置 |
| KR102121343B1 (ko) * | 2015-09-30 | 2020-06-10 | 도레이 카부시키가이샤 | 네가티브형 감광성 수지 조성물, 경화막, 경화막을 구비하는 소자 및 표시 장치, 및 그의 제조 방법 |
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- 2018-09-18 KR KR1020207004118A patent/KR102318084B1/ko active IP Right Grant
- 2018-09-18 WO PCT/JP2018/034409 patent/WO2019065359A1/ja active Application Filing
- 2018-09-18 CN CN201880056323.9A patent/CN111051982B/zh active Active
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| WO2016143740A1 (ja) | 2015-03-11 | 2016-09-15 | 東レ株式会社 | 有機ｅｌ表示装置、およびその製造方法 |
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| JP7120022B2 (ja) | 2022-08-17 |
| TW201920200A (zh) | 2019-06-01 |
| CN111051982A (zh) | 2020-04-21 |
| JPWO2019065359A1 (ja) | 2020-09-03 |
| CN111051982B (zh) | 2023-04-25 |
| KR20200051584A (ko) | 2020-05-13 |
| TWI786189B (zh) | 2022-12-11 |
| WO2019065359A1 (ja) | 2019-04-04 |
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