KR102314416B1 - 연마 장치 - Google Patents
연마 장치 Download PDFInfo
- Publication number
- KR102314416B1 KR102314416B1 KR1020150095813A KR20150095813A KR102314416B1 KR 102314416 B1 KR102314416 B1 KR 102314416B1 KR 1020150095813 A KR1020150095813 A KR 1020150095813A KR 20150095813 A KR20150095813 A KR 20150095813A KR 102314416 B1 KR102314416 B1 KR 102314416B1
- Authority
- KR
- South Korea
- Prior art keywords
- polishing
- rotary joint
- ring
- rotation stop
- spherical sliding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H01L21/304—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/015—Temperature control
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
- B24B37/105—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
- B24B37/107—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement in a rotary movement only, about an axis being stationary during lapping
-
- H01L21/02024—
-
- H01L21/67092—
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014141732A JP6259366B2 (ja) | 2014-07-09 | 2014-07-09 | 研磨装置 |
| JPJP-P-2014-141732 | 2014-07-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160006611A KR20160006611A (ko) | 2016-01-19 |
| KR102314416B1 true KR102314416B1 (ko) | 2021-10-19 |
Family
ID=55066894
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020150095813A Active KR102314416B1 (ko) | 2014-07-09 | 2015-07-06 | 연마 장치 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9522453B2 (enExample) |
| JP (1) | JP6259366B2 (enExample) |
| KR (1) | KR102314416B1 (enExample) |
| SG (1) | SG10201505284QA (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20190299360A1 (en) * | 2018-04-02 | 2019-10-03 | Ebara Corporation | Polishing apparatus and substrate processing apparatus |
| JP7050560B2 (ja) * | 2018-04-18 | 2022-04-08 | 株式会社荏原製作所 | 研磨装置及び基板処理装置 |
| DE102018121626A1 (de) * | 2018-09-05 | 2020-03-05 | Rud. Starcke Gmbh & Co. Kg | Poliervorrichtung |
| CN109015314A (zh) * | 2018-09-07 | 2018-12-18 | 杭州众硅电子科技有限公司 | 一种化学机械平坦化设备 |
| SG11202103477TA (en) * | 2018-09-07 | 2021-05-28 | Hangzhou Zhonggui Electronic Technology Co Ltd | Chemical-mechanical planarization device, wafer transfer method and wafer planarization unit |
| CN119368489A (zh) * | 2024-11-28 | 2025-01-28 | 江苏科沛达半导体科技有限公司 | 一种晶圆底面清洗装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000254356A (ja) * | 1999-03-12 | 2000-09-19 | Kinki Sharyo Co Ltd | 揺動装置 |
| JP2009079652A (ja) * | 2007-09-26 | 2009-04-16 | Minebea Co Ltd | 樹脂ライナ付き球面すべり軸受およびロッドエンド軸受 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3002300B2 (ja) * | 1991-07-12 | 2000-01-24 | 日本トムソン株式会社 | 球面滑り軸受及びその製造方法 |
| US5303959A (en) * | 1993-02-01 | 1994-04-19 | The Johnson Corporation | High speed rotary joint |
| JP3663728B2 (ja) * | 1996-03-28 | 2005-06-22 | 信越半導体株式会社 | 薄板の研磨機 |
| US6021695A (en) * | 1996-11-11 | 2000-02-08 | Hitachi Seiki Co., Ltd. | Lathe and a machining system of a lathe |
| JPH10235552A (ja) * | 1997-02-24 | 1998-09-08 | Ebara Corp | ポリッシング装置 |
| JP3192396B2 (ja) * | 1997-11-07 | 2001-07-23 | 日本ピラー工業株式会社 | 流体用ロータリジョイント |
| GB9726981D0 (en) * | 1997-12-22 | 1998-02-18 | Rolls Royce Plc | Method and apparatus for grinding |
| JP2000000730A (ja) * | 1998-06-12 | 2000-01-07 | Yamato Kikai Kigu Kk | 冷凍チャック |
| JP2000177984A (ja) * | 1998-12-16 | 2000-06-27 | Tadano Ltd | 油圧作業機のロータリージョイント取付構造 |
| JP2000205469A (ja) * | 1999-01-13 | 2000-07-25 | Surpass Kogyo Kk | ロ―タリ―ジョイント |
| US6126207A (en) * | 1999-03-08 | 2000-10-03 | The Johnson Corporation | Rotary joint with shear pins |
| SG90746A1 (en) * | 1999-10-15 | 2002-08-20 | Ebara Corp | Apparatus and method for polishing workpiece |
| JP3797861B2 (ja) * | 2000-09-27 | 2006-07-19 | 株式会社荏原製作所 | ポリッシング装置 |
| US6402602B1 (en) * | 2001-01-04 | 2002-06-11 | Speedfam-Ipec Corporation | Rotary union for semiconductor wafer applications |
| JP2004042163A (ja) * | 2002-07-09 | 2004-02-12 | Ebara Corp | 研磨装置及びその消耗・交換部品の貼付け剥がし方法 |
| JP2004181586A (ja) * | 2002-12-04 | 2004-07-02 | Koyo Seiko Co Ltd | 油圧ロータリージョイント及びこれを用いた超仕上機 |
| JP2007222965A (ja) | 2006-02-21 | 2007-09-06 | Ebara Corp | 研磨テーブルの定盤製造方法、研磨テーブル、及び研磨装置 |
| KR101358645B1 (ko) * | 2007-09-04 | 2014-02-05 | 삼성전자주식회사 | 웨이퍼 연마 캐리어 장치 및 그가 채용되는 화학적 기계적연마 설비 |
| US20150118944A1 (en) * | 2013-01-31 | 2015-04-30 | Ebara Corporation | Polishing apparatus, method for attaching polishing pad, and method for replacing polishing pad |
| US20150017889A1 (en) * | 2013-07-12 | 2015-01-15 | Ebara Corporation | Polishing apparatus |
| JP6362390B2 (ja) * | 2014-04-10 | 2018-07-25 | 株式会社荏原製作所 | ロータリージョイント、及び、研磨装置 |
-
2014
- 2014-07-09 JP JP2014141732A patent/JP6259366B2/ja active Active
-
2015
- 2015-07-03 SG SG10201505284QA patent/SG10201505284QA/en unknown
- 2015-07-06 US US14/792,062 patent/US9522453B2/en active Active
- 2015-07-06 KR KR1020150095813A patent/KR102314416B1/ko active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000254356A (ja) * | 1999-03-12 | 2000-09-19 | Kinki Sharyo Co Ltd | 揺動装置 |
| JP2009079652A (ja) * | 2007-09-26 | 2009-04-16 | Minebea Co Ltd | 樹脂ライナ付き球面すべり軸受およびロッドエンド軸受 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20160006611A (ko) | 2016-01-19 |
| SG10201505284QA (en) | 2016-02-26 |
| JP2016016491A (ja) | 2016-02-01 |
| JP6259366B2 (ja) | 2018-01-10 |
| US9522453B2 (en) | 2016-12-20 |
| US20160008948A1 (en) | 2016-01-14 |
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| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
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| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
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| A201 | Request for examination | ||
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| P13-X000 | Application amended |
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