KR102229484B1 - 워크 스테이지 및 노광 장치 - Google Patents

워크 스테이지 및 노광 장치 Download PDF

Info

Publication number
KR102229484B1
KR102229484B1 KR1020170088468A KR20170088468A KR102229484B1 KR 102229484 B1 KR102229484 B1 KR 102229484B1 KR 1020170088468 A KR1020170088468 A KR 1020170088468A KR 20170088468 A KR20170088468 A KR 20170088468A KR 102229484 B1 KR102229484 B1 KR 102229484B1
Authority
KR
South Korea
Prior art keywords
work
sheet
stage
vacuum
holding surface
Prior art date
Application number
KR1020170088468A
Other languages
English (en)
Korean (ko)
Other versions
KR20180011710A (ko
Inventor
다카유키 하라
Original Assignee
우시오덴키 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 우시오덴키 가부시키가이샤 filed Critical 우시오덴키 가부시키가이샤
Publication of KR20180011710A publication Critical patent/KR20180011710A/ko
Application granted granted Critical
Publication of KR102229484B1 publication Critical patent/KR102229484B1/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020170088468A 2016-07-25 2017-07-12 워크 스테이지 및 노광 장치 KR102229484B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2016-145551 2016-07-25
JP2016145551A JP6774714B2 (ja) 2016-07-25 2016-07-25 ワークステージ及び露光装置

Publications (2)

Publication Number Publication Date
KR20180011710A KR20180011710A (ko) 2018-02-02
KR102229484B1 true KR102229484B1 (ko) 2021-03-18

Family

ID=61081706

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170088468A KR102229484B1 (ko) 2016-07-25 2017-07-12 워크 스테이지 및 노광 장치

Country Status (4)

Country Link
JP (1) JP6774714B2 (zh)
KR (1) KR102229484B1 (zh)
CN (1) CN107656425B (zh)
TW (1) TWI718309B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230027872A (ko) 2021-08-20 2023-02-28 주식회사 에스디에이 구획화된 플레이트가 구비된 노광장치

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7239388B2 (ja) * 2019-05-09 2023-03-14 株式会社アドテックエンジニアリング 直描式露光装置
JP7140052B2 (ja) * 2019-05-31 2022-09-21 株式会社オートネットワーク技術研究所 配線部材
CN112114499B (zh) * 2019-06-19 2022-02-11 上海微电子装备（集团）股份有限公司 一种曝光装置、光刻设备及太阳能电池电极的制备方法
CN112415856B (zh) * 2019-08-23 2022-04-22 上海微电子装备（集团）股份有限公司 柔性吸附装置及光刻设备
CN114521116B (zh) * 2019-09-23 2024-02-23 耐克创新有限合伙公司 用于将材料施加到服饰物品的制造系统及其使用方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010153419A (ja) * 2008-12-24 2010-07-08 Ushio Inc ワークステージおよびこのワークステージを使った露光装置
JP2014072510A (ja) * 2012-10-02 2014-04-21 Disco Abrasive Syst Ltd チャックテーブル
JP2016111343A (ja) 2014-11-28 2016-06-20 キヤノン株式会社 基板保持装置、リソグラフィ装置、及び物品の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54164982U (zh) * 1978-05-11 1979-11-19
JPS5917159U (ja) * 1982-07-27 1984-02-02 株式会社東芝 真空チヤツク装置
JP2001060618A (ja) * 1999-08-20 2001-03-06 Canon Inc 基板吸着保持方法、基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法
TW520526B (en) * 2000-05-22 2003-02-11 Nikon Corp Exposure apparatus, method for manufacturing thereof, method for exposing and method for manufacturing micro-device
JP2002151449A (ja) * 2000-11-10 2002-05-24 Disco Abrasive Syst Ltd 加工装置のバキューム生成機構
JP2002217276A (ja) * 2001-01-17 2002-08-02 Ushio Inc ステージ装置
US8149382B2 (en) * 2005-07-08 2012-04-03 Nikon Corporation Surface position detection apparatus, exposure apparatus, and exposure method
JP4589198B2 (ja) 2005-08-16 2010-12-01 富士フイルム株式会社 ワーク搬送装置とそれを備えた画像形成装置並びにワーク搬送方法
JP4949195B2 (ja) 2007-10-26 2012-06-06 株式会社アドテックエンジニアリング 露光装置及び基板の矯正装置
JP5305012B2 (ja) * 2009-02-22 2013-10-02 ウシオ電機株式会社 ワークステージ及びそのワークステージを備えた露光装置
JP5424803B2 (ja) 2009-10-07 2014-02-26 株式会社オーク製作所 露光装置
WO2011096208A1 (ja) * 2010-02-05 2011-08-11 東京エレクトロン株式会社 基板保持具及び基板搬送装置及び基板処理装置
JP6142450B2 (ja) * 2011-09-09 2017-06-07 株式会社ブイ・テクノロジー 密着露光装置及び密着露光方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010153419A (ja) * 2008-12-24 2010-07-08 Ushio Inc ワークステージおよびこのワークステージを使った露光装置
JP2014072510A (ja) * 2012-10-02 2014-04-21 Disco Abrasive Syst Ltd チャックテーブル
JP2016111343A (ja) 2014-11-28 2016-06-20 キヤノン株式会社 基板保持装置、リソグラフィ装置、及び物品の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230027872A (ko) 2021-08-20 2023-02-28 주식회사 에스디에이 구획화된 플레이트가 구비된 노광장치

Also Published As

Publication number Publication date
JP6774714B2 (ja) 2020-10-28
KR20180011710A (ko) 2018-02-02
TWI718309B (zh) 2021-02-11
CN107656425B (zh) 2021-03-26
JP2018017771A (ja) 2018-02-01
TW201810506A (zh) 2018-03-16
CN107656425A (zh) 2018-02-02

Similar Documents

Publication Publication Date Title
KR102229484B1 (ko) 워크 스테이지 및 노광 장치
JP2010076929A (ja) 基板搬送アーム
JP6894034B2 (ja) ワーク吸着保持方法、ワークステージ及び露光装置
JP2007171621A (ja) 密着型露光装置
TWI427441B (zh) 曝光裝置及基板之矯正裝置
JP4621136B2 (ja) 露光装置
CN111913363B (zh) 直描式曝光装置
WO2007020761A1 (ja) ワーク固定装置及びその位置決め方法並びに画像形成装置
TWI782139B (zh) 光罩單元及曝光裝置
JP5424803B2 (ja) 露光装置
JP2009036796A (ja) 基板貼り合せ装置及び基板貼り合せ方法
KR102126456B1 (ko) 프린트 기판용 노광 장치
KR20180109045A (ko) 노광 장치
JP4959271B2 (ja) 露光システムおよびワーク搬送方法
JP6789368B2 (ja) プリント基板用露光装置
JPH10161320A (ja) 露光装置
JP2007133145A (ja) 基板貼合せ装置及び基板貼合せ方法
JP4374984B2 (ja) シート貼付け装置、及び、フィルムシートが貼り付けられた表示パネルの製造方法
JP6646556B2 (ja) コンタクト露光装置
JP2008304640A (ja) 位置決め設備および方法ならびに組立設備および方法
JPH0369366A (ja) スクリーン印刷工程における薄肉基板の整合方法
JP6844804B1 (ja) 露光装置及び露光方法
JPS62156660A (ja) 自動露光装置

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right