JP6774714B2 - ワークステージ及び露光装置 - Google Patents

ワークステージ及び露光装置 Download PDF

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Publication number
JP6774714B2
JP6774714B2 JP2016145551A JP2016145551A JP6774714B2 JP 6774714 B2 JP6774714 B2 JP 6774714B2 JP 2016145551 A JP2016145551 A JP 2016145551A JP 2016145551 A JP2016145551 A JP 2016145551A JP 6774714 B2 JP6774714 B2 JP 6774714B2
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Japan
Prior art keywords
work
sheet
stage
holding surface
vacuum
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JP2016145551A
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English (en)
Japanese (ja)
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JP2018017771A (ja
Inventor
貴之 原
貴之 原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adtec Engineering Co Ltd
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Adtec Engineering Co Ltd
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Filing date
Publication date
Application filed by Adtec Engineering Co Ltd filed Critical Adtec Engineering Co Ltd
Priority to JP2016145551A priority Critical patent/JP6774714B2/ja
Priority to TW106119318A priority patent/TWI718309B/zh
Priority to KR1020170088468A priority patent/KR102229484B1/ko
Priority to CN201710610850.7A priority patent/CN107656425B/zh
Publication of JP2018017771A publication Critical patent/JP2018017771A/ja
Priority to JP2020141249A priority patent/JP6894034B2/ja
Application granted granted Critical
Publication of JP6774714B2 publication Critical patent/JP6774714B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2016145551A 2016-07-25 2016-07-25 ワークステージ及び露光装置 Active JP6774714B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2016145551A JP6774714B2 (ja) 2016-07-25 2016-07-25 ワークステージ及び露光装置
TW106119318A TWI718309B (zh) 2016-07-25 2017-06-09 工件平台及曝光裝置
KR1020170088468A KR102229484B1 (ko) 2016-07-25 2017-07-12 워크 스테이지 및 노광 장치
CN201710610850.7A CN107656425B (zh) 2016-07-25 2017-07-25 工作台以及曝光装置
JP2020141249A JP6894034B2 (ja) 2016-07-25 2020-08-24 ワーク吸着保持方法、ワークステージ及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016145551A JP6774714B2 (ja) 2016-07-25 2016-07-25 ワークステージ及び露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2020141249A Division JP6894034B2 (ja) 2016-07-25 2020-08-24 ワーク吸着保持方法、ワークステージ及び露光装置

Publications (2)

Publication Number Publication Date
JP2018017771A JP2018017771A (ja) 2018-02-01
JP6774714B2 true JP6774714B2 (ja) 2020-10-28

Family

ID=61081706

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016145551A Active JP6774714B2 (ja) 2016-07-25 2016-07-25 ワークステージ及び露光装置

Country Status (4)

Country Link
JP (1) JP6774714B2 (zh)
KR (1) KR102229484B1 (zh)
CN (1) CN107656425B (zh)
TW (1) TWI718309B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7239388B2 (ja) * 2019-05-09 2023-03-14 株式会社アドテックエンジニアリング 直描式露光装置
JP7140052B2 (ja) 2019-05-31 2022-09-21 株式会社オートネットワーク技術研究所 配線部材
CN112114499B (zh) * 2019-06-19 2022-02-11 上海微电子装备（集团）股份有限公司 一种曝光装置、光刻设备及太阳能电池电极的制备方法
CN112415856B (zh) * 2019-08-23 2022-04-22 上海微电子装备（集团）股份有限公司 柔性吸附装置及光刻设备
KR20220062416A (ko) * 2019-09-23 2022-05-16 나이키 이노베이트 씨.브이. 의류 물품에 재료를 적용하기 위한 제조 시스템 및 그 사용 방법
KR20230027872A (ko) 2021-08-20 2023-02-28 주식회사 에스디에이 구획화된 플레이트가 구비된 노광장치

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54164982U (zh) * 1978-05-11 1979-11-19
JPS5917159U (ja) * 1982-07-27 1984-02-02 株式会社東芝 真空チヤツク装置
JP2001060618A (ja) * 1999-08-20 2001-03-06 Canon Inc 基板吸着保持方法、基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法
TW520526B (en) * 2000-05-22 2003-02-11 Nikon Corp Exposure apparatus, method for manufacturing thereof, method for exposing and method for manufacturing micro-device
JP2002151449A (ja) * 2000-11-10 2002-05-24 Disco Abrasive Syst Ltd 加工装置のバキューム生成機構
JP2002217276A (ja) * 2001-01-17 2002-08-02 Ushio Inc ステージ装置
KR20180067714A (ko) * 2005-07-08 2018-06-20 가부시키가이샤 니콘 면 위치 검출 장치, 노광 장치 및 노광 방법
JP4589198B2 (ja) 2005-08-16 2010-12-01 富士フイルム株式会社 ワーク搬送装置とそれを備えた画像形成装置並びにワーク搬送方法
JP4949195B2 (ja) 2007-10-26 2012-06-06 株式会社アドテックエンジニアリング 露光装置及び基板の矯正装置
JP2010153419A (ja) * 2008-12-24 2010-07-08 Ushio Inc ワークステージおよびこのワークステージを使った露光装置
JP5305012B2 (ja) * 2009-02-22 2013-10-02 ウシオ電機株式会社 ワークステージ及びそのワークステージを備えた露光装置
JP5424803B2 (ja) 2009-10-07 2014-02-26 株式会社オーク製作所 露光装置
US20120315113A1 (en) * 2010-02-05 2012-12-13 Tokyo Electron Limited Substrate holder, substrate transfer apparatus, and substrate processing apparatus
JP6142450B2 (ja) * 2011-09-09 2017-06-07 株式会社ブイ・テクノロジー 密着露光装置及び密着露光方法
JP2014072510A (ja) * 2012-10-02 2014-04-21 Disco Abrasive Syst Ltd チャックテーブル
JP6732429B2 (ja) * 2014-11-28 2020-07-29 キヤノン株式会社 基板保持装置、リソグラフィ装置、及び物品の製造方法

Also Published As

Publication number Publication date
CN107656425B (zh) 2021-03-26
TW201810506A (zh) 2018-03-16
TWI718309B (zh) 2021-02-11
CN107656425A (zh) 2018-02-02
KR20180011710A (ko) 2018-02-02
JP2018017771A (ja) 2018-02-01
KR102229484B1 (ko) 2021-03-18

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