JP6774714B2 - ワークステージ及び露光装置 - Google Patents
ワークステージ及び露光装置 Download PDFInfo
- Publication number
- JP6774714B2 JP6774714B2 JP2016145551A JP2016145551A JP6774714B2 JP 6774714 B2 JP6774714 B2 JP 6774714B2 JP 2016145551 A JP2016145551 A JP 2016145551A JP 2016145551 A JP2016145551 A JP 2016145551A JP 6774714 B2 JP6774714 B2 JP 6774714B2
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- Prior art keywords
- work
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- vacuum
- Prior art date
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
- G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016145551A JP6774714B2 (ja) | 2016-07-25 | 2016-07-25 | ワークステージ及び露光装置 |
TW106119318A TWI718309B (zh) | 2016-07-25 | 2017-06-09 | 工件平台及曝光裝置 |
KR1020170088468A KR102229484B1 (ko) | 2016-07-25 | 2017-07-12 | 워크 스테이지 및 노광 장치 |
CN201710610850.7A CN107656425B (zh) | 2016-07-25 | 2017-07-25 | 工作台以及曝光装置 |
JP2020141249A JP6894034B2 (ja) | 2016-07-25 | 2020-08-24 | ワーク吸着保持方法、ワークステージ及び露光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016145551A JP6774714B2 (ja) | 2016-07-25 | 2016-07-25 | ワークステージ及び露光装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020141249A Division JP6894034B2 (ja) | 2016-07-25 | 2020-08-24 | ワーク吸着保持方法、ワークステージ及び露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018017771A JP2018017771A (ja) | 2018-02-01 |
JP6774714B2 true JP6774714B2 (ja) | 2020-10-28 |
Family
ID=61081706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016145551A Active JP6774714B2 (ja) | 2016-07-25 | 2016-07-25 | ワークステージ及び露光装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6774714B2 (zh) |
KR (1) | KR102229484B1 (zh) |
CN (1) | CN107656425B (zh) |
TW (1) | TWI718309B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7239388B2 (ja) * | 2019-05-09 | 2023-03-14 | 株式会社アドテックエンジニアリング | 直描式露光装置 |
JP7140052B2 (ja) | 2019-05-31 | 2022-09-21 | 株式会社オートネットワーク技術研究所 | 配線部材 |
CN112114499B (zh) * | 2019-06-19 | 2022-02-11 | 上海微电子装备(集团)股份有限公司 | 一种曝光装置、光刻设备及太阳能电池电极的制备方法 |
CN112415856B (zh) * | 2019-08-23 | 2022-04-22 | 上海微电子装备(集团)股份有限公司 | 柔性吸附装置及光刻设备 |
KR20220062416A (ko) * | 2019-09-23 | 2022-05-16 | 나이키 이노베이트 씨.브이. | 의류 물품에 재료를 적용하기 위한 제조 시스템 및 그 사용 방법 |
KR20230027872A (ko) | 2021-08-20 | 2023-02-28 | 주식회사 에스디에이 | 구획화된 플레이트가 구비된 노광장치 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54164982U (zh) * | 1978-05-11 | 1979-11-19 | ||
JPS5917159U (ja) * | 1982-07-27 | 1984-02-02 | 株式会社東芝 | 真空チヤツク装置 |
JP2001060618A (ja) * | 1999-08-20 | 2001-03-06 | Canon Inc | 基板吸着保持方法、基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイスの製造方法 |
TW520526B (en) * | 2000-05-22 | 2003-02-11 | Nikon Corp | Exposure apparatus, method for manufacturing thereof, method for exposing and method for manufacturing micro-device |
JP2002151449A (ja) * | 2000-11-10 | 2002-05-24 | Disco Abrasive Syst Ltd | 加工装置のバキューム生成機構 |
JP2002217276A (ja) * | 2001-01-17 | 2002-08-02 | Ushio Inc | ステージ装置 |
KR20180067714A (ko) * | 2005-07-08 | 2018-06-20 | 가부시키가이샤 니콘 | 면 위치 검출 장치, 노광 장치 및 노광 방법 |
JP4589198B2 (ja) | 2005-08-16 | 2010-12-01 | 富士フイルム株式会社 | ワーク搬送装置とそれを備えた画像形成装置並びにワーク搬送方法 |
JP4949195B2 (ja) | 2007-10-26 | 2012-06-06 | 株式会社アドテックエンジニアリング | 露光装置及び基板の矯正装置 |
JP2010153419A (ja) * | 2008-12-24 | 2010-07-08 | Ushio Inc | ワークステージおよびこのワークステージを使った露光装置 |
JP5305012B2 (ja) * | 2009-02-22 | 2013-10-02 | ウシオ電機株式会社 | ワークステージ及びそのワークステージを備えた露光装置 |
JP5424803B2 (ja) | 2009-10-07 | 2014-02-26 | 株式会社オーク製作所 | 露光装置 |
US20120315113A1 (en) * | 2010-02-05 | 2012-12-13 | Tokyo Electron Limited | Substrate holder, substrate transfer apparatus, and substrate processing apparatus |
JP6142450B2 (ja) * | 2011-09-09 | 2017-06-07 | 株式会社ブイ・テクノロジー | 密着露光装置及び密着露光方法 |
JP2014072510A (ja) * | 2012-10-02 | 2014-04-21 | Disco Abrasive Syst Ltd | チャックテーブル |
JP6732429B2 (ja) * | 2014-11-28 | 2020-07-29 | キヤノン株式会社 | 基板保持装置、リソグラフィ装置、及び物品の製造方法 |
-
2016
- 2016-07-25 JP JP2016145551A patent/JP6774714B2/ja active Active
-
2017
- 2017-06-09 TW TW106119318A patent/TWI718309B/zh active
- 2017-07-12 KR KR1020170088468A patent/KR102229484B1/ko active IP Right Grant
- 2017-07-25 CN CN201710610850.7A patent/CN107656425B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN107656425B (zh) | 2021-03-26 |
TW201810506A (zh) | 2018-03-16 |
TWI718309B (zh) | 2021-02-11 |
CN107656425A (zh) | 2018-02-02 |
KR20180011710A (ko) | 2018-02-02 |
JP2018017771A (ja) | 2018-02-01 |
KR102229484B1 (ko) | 2021-03-18 |
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