KR102211255B1 - 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법 - Google Patents

이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법 Download PDF

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KR102211255B1
KR102211255B1 KR1020197035191A KR20197035191A KR102211255B1 KR 102211255 B1 KR102211255 B1 KR 102211255B1 KR 1020197035191 A KR1020197035191 A KR 1020197035191A KR 20197035191 A KR20197035191 A KR 20197035191A KR 102211255 B1 KR102211255 B1 KR 102211255B1
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South Korea
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stage
mask
sub
axis direction
main stage
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KR1020197035191A
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English (en)
Korean (ko)
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KR20190135553A (ko
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야스오 아오키
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가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/062—Easels, stands or shelves, e.g. castor-shelves, supporting means on vehicles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020197035191A 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법 KR102211255B1 (ko)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JPJP-P-2009-118197 2009-05-15
JP2009118202 2009-05-15
JPJP-P-2009-118199 2009-05-15
JP2009118199 2009-05-15
JPJP-P-2009-118203 2009-05-15
JP2009118197 2009-05-15
JPJP-P-2009-118202 2009-05-15
JP2009118203 2009-05-15
PCT/JP2010/003284 WO2010131485A1 (ja) 2009-05-15 2010-05-14 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020187016854A Division KR102051842B1 (ko) 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20190135553A KR20190135553A (ko) 2019-12-06
KR102211255B1 true KR102211255B1 (ko) 2021-02-02

Family

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Family Applications (4)

Application Number Title Priority Date Filing Date
KR1020197035191A KR102211255B1 (ko) 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법
KR1020187016854A KR102051842B1 (ko) 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법
KR1020117029995A KR101693168B1 (ko) 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법
KR1020167036987A KR101869463B1 (ko) 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법

Family Applications After (3)

Application Number Title Priority Date Filing Date
KR1020187016854A KR102051842B1 (ko) 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법
KR1020117029995A KR101693168B1 (ko) 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법
KR1020167036987A KR101869463B1 (ko) 2009-05-15 2010-05-14 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법

Country Status (4)

Country Link
JP (5) JP5626206B2 (zh)
KR (4) KR102211255B1 (zh)
TW (3) TWI754036B (zh)
WO (1) WO2010131485A1 (zh)

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JP2013046044A (ja) * 2011-08-26 2013-03-04 Canon Inc リソグラフィ装置及びデバイスの製造方法
KR102226989B1 (ko) * 2011-08-30 2021-03-11 가부시키가이샤 니콘 기판 처리 장치 및 기판 처리 방법, 노광 방법 및 노광 장치 그리고 디바이스 제조 방법 및 플랫 패널 디스플레이의 제조 방법
CN103325724A (zh) * 2012-03-19 2013-09-25 雅科贝思精密机电(上海)有限公司 一种惯量少移动质量轻的直驱取放装置
WO2015147319A1 (ja) * 2014-03-28 2015-10-01 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び移動体駆動方法
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JP6828688B2 (ja) 2015-09-30 2021-02-10 株式会社ニコン 露光装置及び露光方法、並びにフラットパネルディスプレイ製造方法
KR20210119582A (ko) 2016-09-30 2021-10-05 가부시키가이샤 니콘 이동체 장치, 이동 방법, 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 그리고 디바이스 제조 방법
KR102478705B1 (ko) 2016-09-30 2022-12-16 가부시키가이샤 니콘 이동체 장치, 이동 방법, 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 그리고 디바이스 제조 방법
CN112965345B (zh) 2016-09-30 2023-05-16 株式会社尼康 移动体装置、曝光装置、平板显示器的制造方法
KR102296327B1 (ko) 2016-09-30 2021-09-01 가부시키가이샤 니콘 이동체 장치, 이동 방법, 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 그리고 디바이스 제조 방법
CN108328333B (zh) * 2018-02-08 2024-04-16 苏州精濑光电有限公司 一种旋转工作台及面板检测装置
KR102248226B1 (ko) 2018-06-12 2021-05-03 주식회사 엘지화학 이차전지용 이동형 온도측정기구 및 이를 포함하는 충방전 장치
JP6810911B2 (ja) * 2019-04-26 2021-01-13 株式会社ニコン 物体搬送装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP7389597B2 (ja) * 2019-09-20 2023-11-30 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品製造方法
DE112020005518T5 (de) * 2020-01-30 2022-09-01 Hitachi High-Tech Corporation Ladungsträgerstrahlvorrichtung und schwingungsunterdrückungsmechanismus
JP7452649B2 (ja) 2020-06-15 2024-03-19 株式会社ニコン ステージ装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
CN115132630B (zh) * 2022-08-29 2022-11-15 赫冉新能源科技(扬州)有限公司 光伏组件生产系统用车间堆站
TWI827400B (zh) * 2022-12-16 2023-12-21 友達光電股份有限公司 加工裝置、顯示面板以及顯示面板的製造方法

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Publication number Publication date
JP2018110271A (ja) 2018-07-12
JPWO2010131485A1 (ja) 2012-11-01
KR20180067737A (ko) 2018-06-20
WO2010131485A1 (ja) 2010-11-18
TWI623819B (zh) 2018-05-11
KR20120041177A (ko) 2012-04-30
KR20190135553A (ko) 2019-12-06
JP2016145996A (ja) 2016-08-12
JP5929993B2 (ja) 2016-06-08
JP6881530B2 (ja) 2021-06-02
TW201827945A (zh) 2018-08-01
TWI754036B (zh) 2022-02-01
JP6579501B2 (ja) 2019-09-25
TW201621477A (zh) 2016-06-16
KR20170005161A (ko) 2017-01-11
JP2015057833A (ja) 2015-03-26
TWI526787B (zh) 2016-03-21
JP2019211791A (ja) 2019-12-12
JP6315294B2 (ja) 2018-04-25
KR102051842B1 (ko) 2019-12-04
JP5626206B2 (ja) 2014-11-19
KR101693168B1 (ko) 2017-01-17
KR101869463B1 (ko) 2018-06-20
TW201100976A (en) 2011-01-01

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