JP5626206B2 - 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法 - Google Patents

移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法 Download PDF

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Publication number
JP5626206B2
JP5626206B2 JP2011513255A JP2011513255A JP5626206B2 JP 5626206 B2 JP5626206 B2 JP 5626206B2 JP 2011513255 A JP2011513255 A JP 2011513255A JP 2011513255 A JP2011513255 A JP 2011513255A JP 5626206 B2 JP5626206 B2 JP 5626206B2
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moving body
axis
direction parallel
moving
pattern
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JPWO2010131485A1 (ja
Inventor
青木　保夫
保夫 青木
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Nikon Corp
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Nikon Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/062—Easels, stands or shelves, e.g. castor-shelves, supporting means on vehicles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2011513255A 2009-05-15 2010-05-14 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法 Active JP5626206B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011513255A JP5626206B2 (ja) 2009-05-15 2010-05-14 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
JP2009118202 2009-05-15
JP2009118197 2009-05-15
JP2009118199 2009-05-15
JP2009118199 2009-05-15
JP2009118197 2009-05-15
JP2009118203 2009-05-15
JP2009118202 2009-05-15
JP2009118203 2009-05-15
JP2011513255A JP5626206B2 (ja) 2009-05-15 2010-05-14 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法
PCT/JP2010/003284 WO2010131485A1 (ja) 2009-05-15 2010-05-14 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014202847A Division JP5929993B2 (ja) 2009-05-15 2014-10-01 露光装置、及び露光方法

Publications (2)

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JPWO2010131485A1 JPWO2010131485A1 (ja) 2012-11-01
JP5626206B2 true JP5626206B2 (ja) 2014-11-19

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JP2011513255A Active JP5626206B2 (ja) 2009-05-15 2010-05-14 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法
JP2014202847A Active JP5929993B2 (ja) 2009-05-15 2014-10-01 露光装置、及び露光方法
JP2016092219A Active JP6315294B2 (ja) 2009-05-15 2016-05-02 移動体装置、露光装置、デバイス製造方法、及びフラットパネルディスプレイの製造方法
JP2018063425A Active JP6579501B2 (ja) 2009-05-15 2018-03-29 移動体装置、露光装置、デバイス製造方法及びフラットパネルディスプレイの製造方法
JP2019161482A Active JP6881530B2 (ja) 2009-05-15 2019-09-04 移動体装置、露光装置、デバイス製造方法及びフラットパネルディスプレイの製造方法

Family Applications After (4)

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JP2014202847A Active JP5929993B2 (ja) 2009-05-15 2014-10-01 露光装置、及び露光方法
JP2016092219A Active JP6315294B2 (ja) 2009-05-15 2016-05-02 移動体装置、露光装置、デバイス製造方法、及びフラットパネルディスプレイの製造方法
JP2018063425A Active JP6579501B2 (ja) 2009-05-15 2018-03-29 移動体装置、露光装置、デバイス製造方法及びフラットパネルディスプレイの製造方法
JP2019161482A Active JP6881530B2 (ja) 2009-05-15 2019-09-04 移動体装置、露光装置、デバイス製造方法及びフラットパネルディスプレイの製造方法

Country Status (4)

Country Link
JP (5) JP5626206B2 (zh)
KR (4) KR101869463B1 (zh)
TW (3) TWI623819B (zh)
WO (1) WO2010131485A1 (zh)

Cited By (1)

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JP2016145996A (ja) * 2009-05-15 2016-08-12 株式会社ニコン 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法

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JP2013046044A (ja) * 2011-08-26 2013-03-04 Canon Inc リソグラフィ装置及びデバイスの製造方法
KR102105809B1 (ko) * 2011-08-30 2020-05-28 가부시키가이샤 니콘 기판 처리 장치 및 기판 처리 방법, 노광 방법 및 노광 장치 그리고 디바이스 제조 방법 및 플랫 패널 디스플레이의 제조 방법
CN103325724A (zh) * 2012-03-19 2013-09-25 雅科贝思精密机电(上海)有限公司 一种惯量少移动质量轻的直驱取放装置
CN108957966B (zh) * 2014-03-28 2021-02-02 株式会社尼康 移动体装置
DE102014005547B4 (de) * 2014-04-16 2016-09-15 Mecatronix Ag Vorrichtung und Verfahren zum Halten, Positionieren und/oder Bewegen eines Objekts
JP6365105B2 (ja) * 2014-08-18 2018-08-01 岩崎電気株式会社 照射装置
KR20180059811A (ko) * 2015-09-30 2018-06-05 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 플랫 패널 디스플레이 제조 방법
KR102633248B1 (ko) 2015-09-30 2024-02-02 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 플랫 패널 디스플레이 제조 방법
WO2018062491A1 (ja) 2016-09-30 2018-04-05 株式会社ニコン 移動体装置、移動方法、露光装置、露光方法、フラットパネルディスプレイの製造方法、並びにデバイス製造方法
KR102478705B1 (ko) 2016-09-30 2022-12-16 가부시키가이샤 니콘 이동체 장치, 이동 방법, 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 그리고 디바이스 제조 방법
CN109819673B (zh) 2016-09-30 2021-08-20 株式会社尼康 移动体装置、移动方法、曝光装置、曝光方法、平板显示器的制造方法、以及器件制造方法
JP6752450B2 (ja) 2016-09-30 2020-09-09 株式会社ニコン 移動体装置、移動方法、露光装置、露光方法、フラットパネルディスプレイの製造方法、並びにデバイス製造方法
CN108328333B (zh) * 2018-02-08 2024-04-16 苏州精濑光电有限公司 一种旋转工作台及面板检测装置
KR102248226B1 (ko) 2018-06-12 2021-05-03 주식회사 엘지화학 이차전지용 이동형 온도측정기구 및 이를 포함하는 충방전 장치
JP6810911B2 (ja) * 2019-04-26 2021-01-13 株式会社ニコン 物体搬送装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP7389597B2 (ja) * 2019-09-20 2023-11-30 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品製造方法
US20230035686A1 (en) * 2020-01-30 2023-02-02 Hitachi High-Tech Corporation Charged Particle Beam Device and Vibration-Suppressing Mechanism
CN115803684A (zh) 2020-06-15 2023-03-14 株式会社尼康 台装置、曝光装置、平板显示器的制造方法及元件制造方法
CN115132630B (zh) * 2022-08-29 2022-11-15 赫冉新能源科技(扬州)有限公司 光伏组件生产系统用车间堆站
TWI827400B (zh) * 2022-12-16 2023-12-21 友達光電股份有限公司 加工裝置、顯示面板以及顯示面板的製造方法

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JPH0863231A (ja) * 1994-06-27 1996-03-08 Nikon Corp 目標物移動装置、位置決め装置及び可動ステージ装置
JP2002043213A (ja) * 2000-07-25 2002-02-08 Nikon Corp ステージ装置および露光装置
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016145996A (ja) * 2009-05-15 2016-08-12 株式会社ニコン 移動体装置、用力伝達装置、及び露光装置、並びにデバイス製造方法

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JPWO2010131485A1 (ja) 2012-11-01
JP6881530B2 (ja) 2021-06-02
WO2010131485A1 (ja) 2010-11-18
KR102051842B1 (ko) 2019-12-04
TW201827945A (zh) 2018-08-01
JP5929993B2 (ja) 2016-06-08
TW201100976A (en) 2011-01-01
KR20190135553A (ko) 2019-12-06
JP2018110271A (ja) 2018-07-12
KR101869463B1 (ko) 2018-06-20
KR20170005161A (ko) 2017-01-11
KR102211255B1 (ko) 2021-02-02
KR20180067737A (ko) 2018-06-20
JP6579501B2 (ja) 2019-09-25
TW201621477A (zh) 2016-06-16
TWI623819B (zh) 2018-05-11
JP6315294B2 (ja) 2018-04-25
JP2015057833A (ja) 2015-03-26
JP2019211791A (ja) 2019-12-12
TWI526787B (zh) 2016-03-21
KR20120041177A (ko) 2012-04-30
KR101693168B1 (ko) 2017-01-17
TWI754036B (zh) 2022-02-01
JP2016145996A (ja) 2016-08-12

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