KR101540415B1 - 보강 실리콘 관통 비아를 구비하는 반도체 칩 - Google Patents
보강 실리콘 관통 비아를 구비하는 반도체 칩 Download PDFInfo
- Publication number
- KR101540415B1 KR101540415B1 KR1020137007015A KR20137007015A KR101540415B1 KR 101540415 B1 KR101540415 B1 KR 101540415B1 KR 1020137007015 A KR1020137007015 A KR 1020137007015A KR 20137007015 A KR20137007015 A KR 20137007015A KR 101540415 B1 KR101540415 B1 KR 101540415B1
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor chip
- silicon
- vias
- die seal
- die
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W42/00—Arrangements for protection of devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/01—Manufacture or treatment
- H10W20/021—Manufacture or treatment of interconnections within wafers or substrates
- H10W20/023—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/01—Manufacture or treatment
- H10W20/021—Manufacture or treatment of interconnections within wafers or substrates
- H10W20/023—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias
- H10W20/0245—Manufacture or treatment of interconnections within wafers or substrates the interconnections being through-semiconductor vias comprising use of blind vias during the manufacture
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/20—Interconnections within wafers or substrates, e.g. through-silicon vias [TSV]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/20—Interconnections within wafers or substrates, e.g. through-silicon vias [TSV]
- H10W20/211—Through-semiconductor vias, e.g. TSVs
- H10W20/212—Top-view shapes or dispositions, e.g. top-view layouts of the vias
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W42/00—Arrangements for protection of devices
- H10W42/60—Arrangements for protection of devices protecting against electrostatic charges or discharges, e.g. Faraday shields
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/131—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
- H10W74/137—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed the encapsulations being directly on the semiconductor body
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/0198—Manufacture or treatment batch processes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/20—Configurations of stacked chips
- H10W90/297—Configurations of stacked chips characterised by the through-semiconductor vias [TSVs] in the stacked chips
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/722—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between stacked chips
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/889,615 US8193039B2 (en) | 2010-09-24 | 2010-09-24 | Semiconductor chip with reinforcing through-silicon-vias |
| US12/889,615 | 2010-09-24 | ||
| PCT/US2011/052469 WO2012040274A1 (en) | 2010-09-24 | 2011-09-21 | Semiconductor chip with reinforcing through-silicon-vias |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20130109117A KR20130109117A (ko) | 2013-10-07 |
| KR101540415B1 true KR101540415B1 (ko) | 2015-08-05 |
Family
ID=44800231
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020137007015A Expired - Fee Related KR101540415B1 (ko) | 2010-09-24 | 2011-09-21 | 보강 실리콘 관통 비아를 구비하는 반도체 칩 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8193039B2 (https=) |
| EP (1) | EP2619794B1 (https=) |
| JP (1) | JP5779652B2 (https=) |
| KR (1) | KR101540415B1 (https=) |
| CN (1) | CN103109368B (https=) |
| WO (1) | WO2012040274A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20180030391A (ko) * | 2016-09-14 | 2018-03-22 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | 더미 커넥터를 구비한 반도체 패키지와 이를 형성하는 방법 |
Families Citing this family (58)
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| US8168529B2 (en) * | 2009-01-26 | 2012-05-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Forming seal ring in an integrated circuit die |
| JP5574639B2 (ja) * | 2009-08-21 | 2014-08-20 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
| US8232115B2 (en) * | 2009-09-25 | 2012-07-31 | International Business Machines Corporation | Test structure for determination of TSV depth |
| US20110080184A1 (en) * | 2009-10-01 | 2011-04-07 | National Tsing Hua University | Method for testing through-silicon-via and the circuit thereof |
| JP2011082450A (ja) * | 2009-10-09 | 2011-04-21 | Elpida Memory Inc | 半導体装置及びこれを備える情報処理システム |
| EP3734645B1 (en) | 2010-12-24 | 2025-09-10 | Qualcomm Incorporated | Trap rich layer for semiconductor devices |
| US8481405B2 (en) * | 2010-12-24 | 2013-07-09 | Io Semiconductor, Inc. | Trap rich layer with through-silicon-vias in semiconductor devices |
| US9624096B2 (en) | 2010-12-24 | 2017-04-18 | Qualcomm Incorporated | Forming semiconductor structure with device layers and TRL |
| US8536021B2 (en) | 2010-12-24 | 2013-09-17 | Io Semiconductor, Inc. | Trap rich layer formation techniques for semiconductor devices |
| US9553013B2 (en) | 2010-12-24 | 2017-01-24 | Qualcomm Incorporated | Semiconductor structure with TRL and handle wafer cavities |
| US9754860B2 (en) | 2010-12-24 | 2017-09-05 | Qualcomm Incorporated | Redistribution layer contacting first wafer through second wafer |
| US8362613B2 (en) * | 2010-12-30 | 2013-01-29 | Stmicroelectronics Pvt Ltd. | Flip chip device having simplified routing |
| CN102610532A (zh) * | 2011-01-20 | 2012-07-25 | 涂嘉晋 | 裸晶圆灌孔封装技术 |
| TWI436466B (zh) * | 2011-04-27 | 2014-05-01 | 財團法人工業技術研究院 | 直通矽晶穿孔結構及其製程 |
| US9728507B2 (en) * | 2011-07-19 | 2017-08-08 | Pfg Ip Llc | Cap chip and reroute layer for stacked microelectronic module |
| US20130073755A1 (en) * | 2011-09-20 | 2013-03-21 | Advanced Micro Devices, Inc. | Device protocol translator for connection of external devices to a processing unit package |
| US8993432B2 (en) * | 2011-11-16 | 2015-03-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Test structure and method of testing electrical characteristics of through vias |
| US8860185B2 (en) * | 2012-01-25 | 2014-10-14 | Globalfoundries Singapore Pte Ltd | Crack-arresting structure for through-silicon vias |
| US9165875B2 (en) * | 2012-04-25 | 2015-10-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Low profile interposer with stud structure |
| US8866287B2 (en) * | 2012-09-29 | 2014-10-21 | Intel Corporation | Embedded structures for package-on-package architecture |
| US8664761B1 (en) * | 2012-12-21 | 2014-03-04 | Macronix International Co., Ltd. | Semiconductor structure and manufacturing method of the same |
| TWI517328B (zh) * | 2013-03-07 | 2016-01-11 | 矽品精密工業股份有限公司 | 半導體裝置 |
| US20140266286A1 (en) * | 2013-03-13 | 2014-09-18 | Qualcomm Incorporated | Through-substrate via with a fuse structure |
| US8927427B2 (en) | 2013-04-29 | 2015-01-06 | International Business Machines Corporation | Anticipatory implant for TSV |
| US9093462B2 (en) | 2013-05-06 | 2015-07-28 | Qualcomm Incorporated | Electrostatic discharge diode |
| KR102057210B1 (ko) * | 2013-07-05 | 2020-01-22 | 에스케이하이닉스 주식회사 | 반도체 칩 및 이를 갖는 적층형 반도체 패키지 |
| KR101514137B1 (ko) * | 2013-08-06 | 2015-04-21 | 앰코 테크놀로지 코리아 주식회사 | 반도체 패키지 제조 방법 및 이를 이용한 반도체 패키지 |
| TW201513242A (zh) * | 2013-09-02 | 2015-04-01 | 畢歐特羅尼克歐洲股份及有限兩合公司 | 晶片及晶片製造方法 |
| US9768147B2 (en) * | 2014-02-03 | 2017-09-19 | Micron Technology, Inc. | Thermal pads between stacked semiconductor dies and associated systems and methods |
| US9312205B2 (en) | 2014-03-04 | 2016-04-12 | International Business Machines Corporation | Methods of forming a TSV wafer with improved fracture strength |
| US9299572B2 (en) | 2014-03-07 | 2016-03-29 | Invensas Corporation | Thermal vias disposed in a substrate without a liner layer |
| US9515035B2 (en) | 2014-12-19 | 2016-12-06 | International Business Machines Corporation | Three-dimensional integrated circuit integration |
| US9570399B2 (en) * | 2014-12-23 | 2017-02-14 | Mediatek Inc. | Semiconductor package assembly with through silicon via interconnect |
| CN105990282B (zh) * | 2015-02-27 | 2019-03-01 | 华为技术有限公司 | 一种转接板及电子组件 |
| KR20170051085A (ko) * | 2015-11-02 | 2017-05-11 | 삼성전자주식회사 | 3차원 크랙 검출 구조물을 포함하는 반도체 장치 및 크랙 검출 방법 |
| JP6711046B2 (ja) * | 2016-03-17 | 2020-06-17 | 株式会社デンソー | 半導体装置 |
| KR102634946B1 (ko) * | 2016-11-14 | 2024-02-07 | 삼성전자주식회사 | 반도체 칩 |
| CN116190326A (zh) * | 2016-12-29 | 2023-05-30 | 英特尔公司 | 超芯片 |
| CN107369722B (zh) * | 2017-06-27 | 2019-12-13 | 上海集成电路研发中心有限公司 | 一种传感器封装结构及其制备方法 |
| US10074618B1 (en) * | 2017-08-14 | 2018-09-11 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor structure and manufacturing method thereof |
| US10510691B2 (en) * | 2017-08-14 | 2019-12-17 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor structure and manufacturing method thereof |
| CN108054154B (zh) * | 2017-12-15 | 2020-10-27 | 吉安品位环保科技有限公司 | 用于系统级封装的tsv转接板 |
| CN108054155B (zh) * | 2017-12-15 | 2020-05-05 | 佛山金航向电子科技有限公司 | 用于三维集成电路封装的硅通孔转接板 |
| CN108074923B (zh) * | 2017-12-15 | 2019-12-20 | 唐山国芯晶源电子有限公司 | 用于系统级封装的防静电装置 |
| CN110660809B (zh) * | 2018-06-28 | 2023-06-16 | 西部数据技术公司 | 包含分支存储器裸芯模块的垂直互连的半导体装置 |
| US11756977B2 (en) | 2018-06-21 | 2023-09-12 | Semiconductor Components Industries, Llc | Backside illumination image sensors |
| US11387187B2 (en) * | 2018-06-28 | 2022-07-12 | Intel Corporation | Embedded very high density (VHD) layer |
| DE102019117199A1 (de) * | 2018-09-28 | 2020-04-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Fan-out-packages und verfahren zu deren herstellung |
| US11164754B2 (en) | 2018-09-28 | 2021-11-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Fan-out packages and methods of forming the same |
| US10825692B2 (en) | 2018-12-20 | 2020-11-03 | Advanced Micro Devices, Inc. | Semiconductor chip gettering |
| TWI705547B (zh) * | 2019-03-12 | 2020-09-21 | 力成科技股份有限公司 | 晶片封裝結構及其製造方法 |
| US12538814B2 (en) * | 2019-06-24 | 2026-01-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor structure with a bridge embedded therein and method manufacturing the same |
| US11984403B2 (en) | 2019-11-15 | 2024-05-14 | Dyi-chung Hu | Integrated substrate structure, redistribution structure, and manufacturing method thereof |
| CN112820711A (zh) * | 2019-11-15 | 2021-05-18 | 胡迪群 | 集成基板结构、重布线结构及其制造方法 |
| CN114981951B (zh) * | 2020-04-28 | 2024-07-30 | 华为技术有限公司 | 一种集成电路、制作方法及电子设备 |
| KR102834550B1 (ko) | 2020-06-30 | 2025-07-14 | 삼성전자주식회사 | 집적회로 소자 및 이를 포함하는 반도체 패키지 |
| JP2026510132A (ja) | 2022-10-31 | 2026-04-01 | キョーセラ・エーブイエックス・コンポーネンツ・コーポレーション | 多層コンデンサ |
| KR20250018296A (ko) * | 2023-07-28 | 2025-02-05 | 삼성전자주식회사 | 반도체 장치 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090134500A1 (en) * | 2007-11-26 | 2009-05-28 | Chen-Cheng Kuo | Structures for Preventing Cross-talk Between Through-Silicon Vias and Integrated Circuits |
| JP2010161367A (ja) * | 2009-01-07 | 2010-07-22 | Taiwan Semiconductor Manufacturing Co Ltd | ダイ、スタック構造、及びシステム |
| JP2010205849A (ja) * | 2009-03-02 | 2010-09-16 | Toshiba Corp | 半導体装置 |
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| JPS6124240A (ja) | 1984-07-13 | 1986-02-01 | Toshiba Corp | 半導体基板 |
| US6537849B1 (en) * | 2001-08-22 | 2003-03-25 | Taiwan Semiconductor Manufacturing Company | Seal ring structure for radio frequency integrated circuits |
| JP3897036B2 (ja) * | 2004-07-27 | 2007-03-22 | 株式会社ザイキューブ | 半導体集積回路装置およびその製造方法 |
| JP4776195B2 (ja) * | 2004-09-10 | 2011-09-21 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| JP2007059449A (ja) * | 2005-08-22 | 2007-03-08 | Fujitsu Ltd | 半導体装置 |
| US20080237844A1 (en) | 2007-03-28 | 2008-10-02 | Aleksandar Aleksov | Microelectronic package and method of manufacturing same |
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| US7872332B2 (en) * | 2008-09-11 | 2011-01-18 | Micron Technology, Inc. | Interconnect structures for stacked dies, including penetrating structures for through-silicon vias, and associated systems and methods |
| GB0817831D0 (en) * | 2008-09-30 | 2008-11-05 | Cambridge Silicon Radio Ltd | Improved packaging technology |
| JP2010192561A (ja) * | 2009-02-17 | 2010-09-02 | Renesas Electronics Corp | 半導体装置とその製造方法 |
| US20100206370A1 (en) * | 2009-02-18 | 2010-08-19 | Qualcomm Incorporated | Photovoltaic Cell Efficiency Using Through Silicon Vias |
| US8169055B2 (en) * | 2009-03-18 | 2012-05-01 | International Business Machines Corporation | Chip guard ring including a through-substrate via |
-
2010
- 2010-09-24 US US12/889,615 patent/US8193039B2/en active Active
-
2011
- 2011-09-21 KR KR1020137007015A patent/KR101540415B1/ko not_active Expired - Fee Related
- 2011-09-21 CN CN201180044970.6A patent/CN103109368B/zh active Active
- 2011-09-21 JP JP2013530243A patent/JP5779652B2/ja active Active
- 2011-09-21 WO PCT/US2011/052469 patent/WO2012040274A1/en not_active Ceased
- 2011-09-21 EP EP11769967.8A patent/EP2619794B1/en active Active
-
2012
- 2012-04-26 US US13/456,968 patent/US8338961B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090134500A1 (en) * | 2007-11-26 | 2009-05-28 | Chen-Cheng Kuo | Structures for Preventing Cross-talk Between Through-Silicon Vias and Integrated Circuits |
| JP2010161367A (ja) * | 2009-01-07 | 2010-07-22 | Taiwan Semiconductor Manufacturing Co Ltd | ダイ、スタック構造、及びシステム |
| JP2010205849A (ja) * | 2009-03-02 | 2010-09-16 | Toshiba Corp | 半導体装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20180030391A (ko) * | 2016-09-14 | 2018-03-22 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | 더미 커넥터를 구비한 반도체 패키지와 이를 형성하는 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5779652B2 (ja) | 2015-09-16 |
| CN103109368A (zh) | 2013-05-15 |
| US8338961B2 (en) | 2012-12-25 |
| WO2012040274A1 (en) | 2012-03-29 |
| US20120205791A1 (en) | 2012-08-16 |
| EP2619794B1 (en) | 2016-03-16 |
| EP2619794A1 (en) | 2013-07-31 |
| JP2013542596A (ja) | 2013-11-21 |
| US8193039B2 (en) | 2012-06-05 |
| CN103109368B (zh) | 2015-06-17 |
| KR20130109117A (ko) | 2013-10-07 |
| US20120074579A1 (en) | 2012-03-29 |
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