KR101512515B1 - 마스크 블랭크용 기판의 제조 방법, 마스크 블랭크의 제조방법, 마스크의 제조 방법, 및 마스크 블랭크용 기판 - Google Patents

마스크 블랭크용 기판의 제조 방법, 마스크 블랭크의 제조방법, 마스크의 제조 방법, 및 마스크 블랭크용 기판 Download PDF

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Publication number
KR101512515B1
KR101512515B1 KR20080076792A KR20080076792A KR101512515B1 KR 101512515 B1 KR101512515 B1 KR 101512515B1 KR 20080076792 A KR20080076792 A KR 20080076792A KR 20080076792 A KR20080076792 A KR 20080076792A KR 101512515 B1 KR101512515 B1 KR 101512515B1
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South Korea
Prior art keywords
substrate
mask blank
marker
mask
end faces
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Expired - Fee Related
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KR20080076792A
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Korean (ko)
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KR20090014988A (ko
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야스시 오꾸보
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호야 가부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR20080076792A 2007-08-07 2008-08-06 마스크 블랭크용 기판의 제조 방법, 마스크 블랭크의 제조방법, 마스크의 제조 방법, 및 마스크 블랭크용 기판 Expired - Fee Related KR101512515B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007204922 2007-08-07
JPJP-P-2007-00204922 2007-08-07

Publications (2)

Publication Number Publication Date
KR20090014988A KR20090014988A (ko) 2009-02-11
KR101512515B1 true KR101512515B1 (ko) 2015-04-15

Family

ID=40227139

Family Applications (1)

Application Number Title Priority Date Filing Date
KR20080076792A Expired - Fee Related KR101512515B1 (ko) 2007-08-07 2008-08-06 마스크 블랭크용 기판의 제조 방법, 마스크 블랭크의 제조방법, 마스크의 제조 방법, 및 마스크 블랭크용 기판

Country Status (6)

Country Link
US (2) US7648807B2 (enExample)
JP (1) JP5046394B2 (enExample)
KR (1) KR101512515B1 (enExample)
CN (1) CN101364042B (enExample)
DE (1) DE102008036471A1 (enExample)
TW (1) TWI452417B (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4536804B2 (ja) * 2008-06-27 2010-09-01 Ｈｏｙａ株式会社 フォトマスクの製造方法
CN101833235B (zh) * 2009-03-13 2012-11-14 中芯国际集成电路制造(上海)有限公司 掩模版原片的质量检测系统和方法
TW201113631A (en) * 2009-10-14 2011-04-16 Evervision Electronics Co Ltd Improved light mask manufacturing process
JP5296260B2 (ja) * 2010-03-30 2013-09-25 Ｈｏｙａ株式会社 マスクブランク用基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法及び半導体デバイスの製造方法
JP6460619B2 (ja) * 2012-03-12 2019-01-30 Hoya株式会社 反射型マスクブランク及び反射型マスクの製造方法
FR2994605B1 (fr) * 2012-08-20 2014-08-22 Commissariat Energie Atomique Procede de fabrication de masques euv minimisant l'impact des defauts de substrat
DE102013107215B3 (de) * 2013-07-09 2014-10-09 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Spiegelsubstrat-Rohlings aus Titan-dotiertem Kieselglas für die EUV-Lithographie, sowie System zur Positionsbestimmung von Defekten in einem Rohling
FR3017478A1 (fr) * 2014-02-11 2015-08-14 Saint Gobain Procede de lecture d'un code d'identification sur une feuille de verre
US11141370B2 (en) 2017-06-06 2021-10-12 The Procter And Gamble Company Hair compositions comprising a cationic polymer mixture and providing improved in-use wet feel
EP3727323A1 (en) 2017-12-20 2020-10-28 The Procter & Gamble Company Clear shampoo composition containing silicone polymers

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0571855U (ja) * 1992-02-28 1993-09-28 大日本印刷株式会社 フォトマスク用ガラス基板
US20010020643A1 (en) * 1997-08-19 2001-09-13 Ken Matsumoto Substrate for device manufacture
JP2002116533A (ja) 2000-10-11 2002-04-19 Dainippon Printing Co Ltd エリアコード付きフォトマスク用ブランクスとエリアコード付きフォトマスク、およびフォトマスクの製造方法
KR20060106745A (ko) * 2005-03-30 2006-10-12 호야 가부시키가이샤 마스크 블랭크 유리기판의 제조방법, 마스크 블랭크의제조방법, 마스크의 제조방법, 마스크 블랭크 유리기판,마스크 블랭크, 및 마스크

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58144829A (ja) * 1982-02-22 1983-08-29 Hoya Corp フオトマスクブランクス用基板のマ−キング方法
JPS5915938A (ja) * 1982-07-19 1984-01-27 Hoya Corp マ−キングを施されたフオトマスクブランクス用基板
JPS6354146U (enExample) * 1986-09-26 1988-04-12
JPH02962A (ja) * 1988-05-25 1990-01-05 Mitsubishi Electric Corp フォトマスクの作成方法
JPH03255445A (ja) * 1990-03-05 1991-11-14 Nec Corp フォトマスク基板
US5956564A (en) * 1997-06-03 1999-09-21 Ultratech Stepper, Inc. Method of making a side alignment mark
JPH1165093A (ja) * 1997-08-19 1999-03-05 Canon Inc 基板管理装置、基板収納容器、基板収納装置、およびデバイス製造方法
JP3673632B2 (ja) * 1997-12-26 2005-07-20 Ｈｏｙａ株式会社 透光性物質の不均一性検査方法及びその装置、並びに透明基板
JP3898326B2 (ja) * 1998-02-10 2007-03-28 大日本印刷株式会社 生産工程管理方法、およびｉｄ付基板
JP2001033941A (ja) * 1999-07-16 2001-02-09 Toshiba Corp パターン形成方法及び露光装置
JP4122735B2 (ja) * 2001-07-24 2008-07-23 株式会社日立製作所 半導体デバイスの検査方法および検査条件設定方法
JPWO2004051369A1 (ja) * 2002-12-03 2006-04-06 Hoya株式会社 フォトマスクブランク、及びフォトマスク
US7323276B2 (en) * 2003-03-26 2008-01-29 Hoya Corporation Substrate for photomask, photomask blank and photomask
TWI230846B (en) * 2003-11-04 2005-04-11 Grace Semiconductor Mfg Corp Photo mask with photolithography photoresist detecting pattern and its detecting method
WO2005079470A2 (en) 2004-02-17 2005-09-01 Toppan Photomasks, Inc. Photomask and method for conveying information associated with a photomask substrate
JP4339214B2 (ja) * 2004-09-13 2009-10-07 Ｈｏｙａ株式会社 マスクブランク用透明基板とその製造方法及びマスクブランクとその製造方法
CN1841189A (zh) * 2005-03-30 2006-10-04 Hoya株式会社 掩模板玻璃衬底制造方法、掩模板制造方法、掩模制造方法、掩模板玻璃衬底、掩模板和掩模
JP4591367B2 (ja) 2006-01-31 2010-12-01 トヨタ自動車株式会社 壁間防水構造

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0571855U (ja) * 1992-02-28 1993-09-28 大日本印刷株式会社 フォトマスク用ガラス基板
US20010020643A1 (en) * 1997-08-19 2001-09-13 Ken Matsumoto Substrate for device manufacture
JP2002116533A (ja) 2000-10-11 2002-04-19 Dainippon Printing Co Ltd エリアコード付きフォトマスク用ブランクスとエリアコード付きフォトマスク、およびフォトマスクの製造方法
KR20060106745A (ko) * 2005-03-30 2006-10-12 호야 가부시키가이샤 마스크 블랭크 유리기판의 제조방법, 마스크 블랭크의제조방법, 마스크의 제조방법, 마스크 블랭크 유리기판,마스크 블랭크, 및 마스크

Also Published As

Publication number Publication date
US20100081069A1 (en) 2010-04-01
US7648807B2 (en) 2010-01-19
DE102008036471A1 (de) 2009-02-12
CN101364042A (zh) 2009-02-11
JP5046394B2 (ja) 2012-10-10
KR20090014988A (ko) 2009-02-11
CN101364042B (zh) 2012-10-24
TWI452417B (zh) 2014-09-11
JP2009058950A (ja) 2009-03-19
US20090042109A1 (en) 2009-02-12
TW200907561A (en) 2009-02-16
US7794900B2 (en) 2010-09-14

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