KR101217312B1 - 진공 증착 장치, 진공 증착 방법 및 유기 ｅｌ 표시 장치의 제조 방법 - Google Patents

진공 증착 장치, 진공 증착 방법 및 유기 ｅｌ 표시 장치의 제조 방법 Download PDF

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KR101217312B1
KR101217312B1 KR1020100108936A KR20100108936A KR101217312B1 KR 101217312 B1 KR101217312 B1 KR 101217312B1 KR 1020100108936 A KR1020100108936 A KR 1020100108936A KR 20100108936 A KR20100108936 A KR 20100108936A KR 101217312 B1 KR101217312 B1 KR 101217312B1
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South Korea
Prior art keywords
evaporation
substrate
vacuum
head
organic
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KR1020100108936A
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English (en)
Korean (ko)
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KR20110052469A (ko
Inventor
다쯔야 미야께
다께시 다마꼬시
신고 이시하라
히로야스 마쯔우라
히데아끼 미네까와
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가부시키가이샤 히다치 하이테크놀로지즈
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Publication of KR20110052469A publication Critical patent/KR20110052469A/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020100108936A 2009-11-12 2010-11-04 진공 증착 장치, 진공 증착 방법 및 유기 ｅｌ 표시 장치의 제조 방법 KR101217312B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2009-258963 2009-11-12
JP2009258963A JP5452178B2 (ja) 2009-11-12 2009-11-12 真空蒸着装置、真空蒸着方法、および、有機ｅｌ表示装置の製造方法

Publications (2)

Publication Number Publication Date
KR20110052469A KR20110052469A (ko) 2011-05-18
KR101217312B1 true KR101217312B1 (ko) 2012-12-31

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KR1020100108936A KR101217312B1 (ko) 2009-11-12 2010-11-04 진공 증착 장치, 진공 증착 방법 및 유기 ｅｌ 표시 장치의 제조 방법

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JP (1) JP5452178B2 (zh)
KR (1) KR101217312B1 (zh)
CN (1) CN102061445B (zh)
TW (1) TW201127973A (zh)

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KR101799156B1 (ko) * 2014-10-28 2017-11-17 도쿄엘렉트론가부시키가이샤 원료 가스 공급 장치 및 성막 장치

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JP2012140671A (ja) * 2010-12-28 2012-07-26 Canon Tokki Corp 成膜装置
KR101879805B1 (ko) * 2012-01-20 2018-08-17 삼성디스플레이 주식회사 박막 증착 장치 및 방법
JP6021377B2 (ja) * 2012-03-28 2016-11-09 日立造船株式会社 真空蒸着装置および真空蒸着装置におけるるつぼ交換方法
JP2014025098A (ja) * 2012-07-25 2014-02-06 Canon Tokki Corp 蒸着装置
KR101370326B1 (ko) * 2012-08-07 2014-03-05 한국표준과학연구원 증발 증착 장치
KR101432079B1 (ko) 2012-12-27 2014-08-21 주식회사 선익시스템 유기물 피딩 장치
DE102013206598B4 (de) * 2013-04-12 2019-06-27 VON ARDENNE Asset GmbH & Co. KG Vakuumbeschichtungsanlage
CN104131251A (zh) * 2013-05-02 2014-11-05 上海和辉光电有限公司 电磁蒸镀装置
JP6207319B2 (ja) * 2013-09-25 2017-10-04 日立造船株式会社 真空蒸着装置
WO2016204022A1 (ja) * 2015-06-16 2016-12-22 株式会社アルバック 成膜方法及び成膜装置
CN108966658A (zh) * 2017-03-17 2018-12-07 应用材料公司 沉积设备、真空系统、及操作沉积设备的方法
CN106978590B (zh) * 2017-04-26 2019-06-25 武汉华星光电技术有限公司 蒸镀装置
KR102407350B1 (ko) * 2017-07-27 2022-06-10 (주)선익시스템 증착챔버용 퍼니스
CN107400861B (zh) * 2017-09-21 2020-05-08 深圳市华格纳米科技有限公司 一种自动化连续式电阻蒸发镀膜装置
CN109536894B (zh) * 2017-09-22 2020-08-11 清华大学 有机发光二极管的制备装置
CN109546008B (zh) * 2017-09-22 2020-11-06 清华大学 有机发光二极管的制备方法
CN108570645B (zh) * 2017-11-30 2023-09-29 上海微电子装备（集团）股份有限公司 真空蒸镀装置及其蒸发头、真空蒸镀方法
CN108728801B (zh) * 2018-05-28 2019-11-12 深圳市华星光电技术有限公司 蒸镀装置及蒸镀方法
CN109576648A (zh) * 2018-12-29 2019-04-05 福建华佳彩有限公司 一种防着板
KR102199746B1 (ko) * 2019-02-08 2021-01-07 트인로드 주식회사 직접분사용 dlc 코팅 장치 및 이를 이용한 직접 분사방식의 dlc 코팅 형성 방법
CN112111707A (zh) * 2019-06-21 2020-12-22 合肥欣奕华智能机器有限公司 一种蒸发源及卷对卷蒸镀装置
KR102265193B1 (ko) * 2019-12-16 2021-06-15 주식회사 포스코 신축 연결 장치 및 이를 이용한 연속 코팅 장치
CN111519143B (zh) * 2020-04-26 2021-09-28 昆明理工大学 一种耐高温颗粒表面真空蒸镀锌的方法及装置
CN112853308A (zh) * 2021-02-26 2021-05-28 赖南昌 一种有机膜蒸镀机及蒸镀工艺
KR102648127B1 (ko) * 2021-08-30 2024-03-15 주식회사 야스 수직증착용 점증발원

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JP2004146369A (ja) * 2002-09-20 2004-05-20 Semiconductor Energy Lab Co Ltd 製造装置および発光装置の作製方法
JP2004220852A (ja) * 2003-01-10 2004-08-05 Sony Corp 成膜装置および有機ｅｌ素子の製造装置
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JP4366226B2 (ja) * 2004-03-30 2009-11-18 東北パイオニア株式会社 有機ｅｌパネルの製造方法、有機ｅｌパネルの成膜装置
JP2006032010A (ja) * 2004-07-13 2006-02-02 Hitachi Displays Ltd 有機ｅｌ表示装置
JP4516499B2 (ja) * 2004-08-25 2010-08-04 三星モバイルディスプレイ株式會社 有機物蒸着装置
KR100579406B1 (ko) * 2004-08-25 2006-05-12 삼성에스디아이 주식회사 수직 이동형 유기물 증착 장치
JP4667057B2 (ja) * 2005-02-08 2011-04-06 キヤノン株式会社 成膜装置および成膜方法
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KR100748451B1 (ko) 2006-05-25 2007-08-10 에이엔 에스 주식회사 유기발광소자의 증착장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101799156B1 (ko) * 2014-10-28 2017-11-17 도쿄엘렉트론가부시키가이샤 원료 가스 공급 장치 및 성막 장치

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Publication number Publication date
JP5452178B2 (ja) 2014-03-26
KR20110052469A (ko) 2011-05-18
JP2011105962A (ja) 2011-06-02
CN102061445B (zh) 2013-09-25
TW201127973A (en) 2011-08-16
CN102061445A (zh) 2011-05-18

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