KR101152366B1 - 액침 리소그래피 시스템에서의 이미징을 모니터링하고제어하기 위한 방법 및 장치 - Google Patents

액침 리소그래피 시스템에서의 이미징을 모니터링하고제어하기 위한 방법 및 장치 Download PDF

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KR101152366B1
KR101152366B1 KR1020067002882A KR20067002882A KR101152366B1 KR 101152366 B1 KR101152366 B1 KR 101152366B1 KR 1020067002882 A KR1020067002882 A KR 1020067002882A KR 20067002882 A KR20067002882 A KR 20067002882A KR 101152366 B1 KR101152366 B1 KR 101152366B1
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South Korea
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wafer
immersion medium
immersion
laser beam
exposure pattern
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KR20060058713A (ko
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해리 제이. 레빈슨
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글로벌파운드리즈 인크.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
KR1020067002882A 2003-08-11 2004-07-23 액침 리소그래피 시스템에서의 이미징을 모니터링하고제어하기 위한 방법 및 장치 Expired - Fee Related KR101152366B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/638,927 2003-08-11
US10/638,927 US7061578B2 (en) 2003-08-11 2003-08-11 Method and apparatus for monitoring and controlling imaging in immersion lithography systems

Publications (2)

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KR20060058713A KR20060058713A (ko) 2006-05-30
KR101152366B1 true KR101152366B1 (ko) 2012-06-05

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KR1020067002882A Expired - Fee Related KR101152366B1 (ko) 2003-08-11 2004-07-23 액침 리소그래피 시스템에서의 이미징을 모니터링하고제어하기 위한 방법 및 장치

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Country Link
US (1) US7061578B2 (https=)
EP (1) EP1654593B1 (https=)
JP (1) JP2007502539A (https=)
KR (1) KR101152366B1 (https=)
CN (1) CN1826559A (https=)
DE (1) DE602004027261D1 (https=)
TW (1) TWI359470B (https=)
WO (1) WO2005017625A2 (https=)

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EP1654593B1 (en) 2010-05-19
US7061578B2 (en) 2006-06-13
CN1826559A (zh) 2006-08-30
TW200511470A (en) 2005-03-16
WO2005017625A3 (en) 2005-09-01
WO2005017625A2 (en) 2005-02-24
EP1654593A2 (en) 2006-05-10
DE602004027261D1 (de) 2010-07-01
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US20050037269A1 (en) 2005-02-17
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