TWI359470B - Method and apparatus for monitoring and controllin - Google Patents

Method and apparatus for monitoring and controllin Download PDF

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Publication number
TWI359470B
TWI359470B TW093122003A TW93122003A TWI359470B TW I359470 B TWI359470 B TW I359470B TW 093122003 A TW093122003 A TW 093122003A TW 93122003 A TW93122003 A TW 93122003A TW I359470 B TWI359470 B TW I359470B
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TW
Taiwan
Prior art keywords
wafer
immersion
volume
medium
immersion medium
Prior art date
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TW093122003A
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English (en)
Chinese (zh)
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TW200511470A (en
Inventor
Harry J Levinson
Original Assignee
Globalfoundries Us Inc
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Application filed by Globalfoundries Us Inc filed Critical Globalfoundries Us Inc
Publication of TW200511470A publication Critical patent/TW200511470A/zh
Application granted granted Critical
Publication of TWI359470B publication Critical patent/TWI359470B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
TW093122003A 2003-08-11 2004-07-23 Method and apparatus for monitoring and controllin TWI359470B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/638,927 US7061578B2 (en) 2003-08-11 2003-08-11 Method and apparatus for monitoring and controlling imaging in immersion lithography systems

Publications (2)

Publication Number Publication Date
TW200511470A TW200511470A (en) 2005-03-16
TWI359470B true TWI359470B (en) 2012-03-01

Family

ID=34135772

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093122003A TWI359470B (en) 2003-08-11 2004-07-23 Method and apparatus for monitoring and controllin

Country Status (8)

Country Link
US (1) US7061578B2 (https=)
EP (1) EP1654593B1 (https=)
JP (1) JP2007502539A (https=)
KR (1) KR101152366B1 (https=)
CN (1) CN1826559A (https=)
DE (1) DE602004027261D1 (https=)
TW (1) TWI359470B (https=)
WO (1) WO2005017625A2 (https=)

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EP1654593B1 (en) 2010-05-19
TW200511470A (en) 2005-03-16
WO2005017625A2 (en) 2005-02-24
US20050037269A1 (en) 2005-02-17
KR20060058713A (ko) 2006-05-30
EP1654593A2 (en) 2006-05-10
KR101152366B1 (ko) 2012-06-05
DE602004027261D1 (de) 2010-07-01
WO2005017625A3 (en) 2005-09-01
US7061578B2 (en) 2006-06-13
CN1826559A (zh) 2006-08-30

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