KR100991590B1 - 침지 리소그래피용 굴절 투영 대물렌즈 - Google Patents

침지 리소그래피용 굴절 투영 대물렌즈 Download PDF

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Publication number
KR100991590B1
KR100991590B1 KR1020047014023A KR20047014023A KR100991590B1 KR 100991590 B1 KR100991590 B1 KR 100991590B1 KR 1020047014023 A KR1020047014023 A KR 1020047014023A KR 20047014023 A KR20047014023 A KR 20047014023A KR 100991590 B1 KR100991590 B1 KR 100991590B1
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KR
South Korea
Prior art keywords
lens
lens group
projection objective
refractive power
image
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Expired - Fee Related
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KR1020047014023A
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English (en)
Korean (ko)
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KR20040099307A (ko
Inventor
로슈탈스키한스-위르겐
울리히빌헬름
Original Assignee
칼 짜이스 에스엠티 아게
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/60—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having five components only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
KR1020047014023A 2002-03-08 2003-02-26 침지 리소그래피용 굴절 투영 대물렌즈 Expired - Fee Related KR100991590B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10210899.4 2002-03-08
DE10210899A DE10210899A1 (de) 2002-03-08 2002-03-08 Refraktives Projektionsobjektiv für Immersions-Lithographie
PCT/EP2003/001954 WO2003077037A1 (en) 2002-03-08 2003-02-26 Refractive projection objective for immersion lithography

Publications (2)

Publication Number Publication Date
KR20040099307A KR20040099307A (ko) 2004-11-26
KR100991590B1 true KR100991590B1 (ko) 2010-11-04

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ID=27762884

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020047014023A Expired - Fee Related KR100991590B1 (ko) 2002-03-08 2003-02-26 침지 리소그래피용 굴절 투영 대물렌즈

Country Status (8)

Country Link
US (4) US6891596B2 (https=)
EP (2) EP1483625A1 (https=)
JP (2) JP2005519347A (https=)
KR (1) KR100991590B1 (https=)
CN (1) CN100573222C (https=)
AU (2) AU2002312872A1 (https=)
DE (1) DE10210899A1 (https=)
WO (2) WO2003077036A1 (https=)

Families Citing this family (263)

* Cited by examiner, † Cited by third party
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US20050141098A1 (en) 2005-06-30
US7203008B2 (en) 2007-04-10
KR20040099307A (ko) 2004-11-26
AU2002312872A1 (en) 2003-09-22
US7495840B2 (en) 2009-02-24
CN1639644A (zh) 2005-07-13
US20050231814A1 (en) 2005-10-20
DE10210899A1 (de) 2003-09-18
WO2003077037A1 (en) 2003-09-18
JP2005519347A (ja) 2005-06-30
JP2005519348A (ja) 2005-06-30
US7312847B2 (en) 2007-12-25
CN100573222C (zh) 2009-12-23
US6891596B2 (en) 2005-05-10
US20030174408A1 (en) 2003-09-18
WO2003077036A1 (de) 2003-09-18
EP1483625A1 (de) 2004-12-08
EP1485760A1 (en) 2004-12-15
US20070188880A1 (en) 2007-08-16
AU2003221490A1 (en) 2003-09-22

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