KR100882988B1 - 유기 피막의 제거 방법 - Google Patents

유기 피막의 제거 방법 Download PDF

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Publication number
KR100882988B1
KR100882988B1 KR1020020064786A KR20020064786A KR100882988B1 KR 100882988 B1 KR100882988 B1 KR 100882988B1 KR 1020020064786 A KR1020020064786 A KR 1020020064786A KR 20020064786 A KR20020064786 A KR 20020064786A KR 100882988 B1 KR100882988 B1 KR 100882988B1
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South Korea
Prior art keywords
liquid
ozone
treatment
treatment liquid
substrate
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Expired - Fee Related
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KR1020020064786A
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English (en)
Korean (ko)
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KR20030033988A (ko
Inventor
히사시 무라오까
리에꼬 무라오까
아스까 사또
미쯔루 엔도
Original Assignee
유겐가이샤 유에무에스
노무라 마이크로 싸이언스 가부시키가이샤
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Publication of KR20030033988A publication Critical patent/KR20030033988A/ko
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Publication of KR100882988B1 publication Critical patent/KR100882988B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • H10P50/613—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D9/00—Chemical paint or ink removers
    • C09D9/005—Chemical paint or ink removers containing organic solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/266—Esters or carbonates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/005—Details of cleaning machines or methods involving the use or presence of liquid or steam the liquid being ozonated
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

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  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Emergency Medicine (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Materials Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Liquid Crystal (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
KR1020020064786A 2001-10-23 2002-10-23 유기 피막의 제거 방법 Expired - Fee Related KR100882988B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2001325516 2001-10-23
JPJP-P-2001-00325516 2001-10-23
JPJP-P-2002-00061096 2002-03-06
JP2002061096 2002-03-06
JPJP-P-2002-00229394 2002-08-07
JP2002229394A JP3914842B2 (ja) 2001-10-23 2002-08-07 有機被膜の除去方法および除去装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020050111295A Division KR100806476B1 (ko) 2001-10-23 2005-11-21 유기 피막의 제거 장치

Publications (2)

Publication Number Publication Date
KR20030033988A KR20030033988A (ko) 2003-05-01
KR100882988B1 true KR100882988B1 (ko) 2009-02-12

Family

ID=27347717

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020020064786A Expired - Fee Related KR100882988B1 (ko) 2001-10-23 2002-10-23 유기 피막의 제거 방법
KR1020050111295A Expired - Fee Related KR100806476B1 (ko) 2001-10-23 2005-11-21 유기 피막의 제거 장치

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020050111295A Expired - Fee Related KR100806476B1 (ko) 2001-10-23 2005-11-21 유기 피막의 제거 장치

Country Status (5)

Country Link
US (2) US6696228B2 (enExample)
JP (1) JP3914842B2 (enExample)
KR (2) KR100882988B1 (enExample)
CN (1) CN1286154C (enExample)
TW (1) TW584893B (enExample)

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US6851873B2 (en) 2005-02-08
US20030108823A1 (en) 2003-06-12
CN1286154C (zh) 2006-11-22
KR20050115844A (ko) 2005-12-08
US20040076912A1 (en) 2004-04-22
KR20030033988A (ko) 2003-05-01
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