KR100876318B1 - 진공배기장치 및 진공배기장치의 운전방법 - Google Patents

진공배기장치 및 진공배기장치의 운전방법 Download PDF

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Publication number
KR100876318B1
KR100876318B1 KR1020047002269A KR20047002269A KR100876318B1 KR 100876318 B1 KR100876318 B1 KR 100876318B1 KR 1020047002269 A KR1020047002269 A KR 1020047002269A KR 20047002269 A KR20047002269 A KR 20047002269A KR 100876318 B1 KR100876318 B1 KR 100876318B1
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KR
South Korea
Prior art keywords
pump
vacuum
exhaust
pressure
valve
Prior art date
Application number
KR1020047002269A
Other languages
English (en)
Korean (ko)
Other versions
KR20040030968A (ko
Inventor
시바야마코우지
야마시타유우이치
야하기미츠루
타시마타카히코
아이카와준이치
타나카토모나리
칸케유키오
후카우라유우지
Original Assignee
가부시키가이샤 아루박
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2001327229A external-priority patent/JP4045362B2/ja
Priority claimed from JP2001328674A external-priority patent/JP3992176B2/ja
Priority claimed from JP2001332632A external-priority patent/JP3906973B2/ja
Priority claimed from JP2001333772A external-priority patent/JP3982673B2/ja
Application filed by 가부시키가이샤 아루박 filed Critical 가부시키가이샤 아루박
Publication of KR20040030968A publication Critical patent/KR20040030968A/ko
Application granted granted Critical
Publication of KR100876318B1 publication Critical patent/KR100876318B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K15/00—Check valves
    • F16K15/02—Check valves with guided rigid valve members
    • F16K15/04—Check valves with guided rigid valve members shaped as balls
    • F16K15/042—Check valves with guided rigid valve members shaped as balls with a plurality of balls
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/10—Vacuum
    • F04C2220/12—Dry running

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
KR1020047002269A 2001-09-06 2002-09-05 진공배기장치 및 진공배기장치의 운전방법 KR100876318B1 (ko)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
JP2001269742 2001-09-06
JPJP-P-2001-00269742 2001-09-06
JPJP-P-2001-00327229 2001-10-25
JP2001327229A JP4045362B2 (ja) 2001-09-06 2001-10-25 多段式容積移送型ドライ真空ポンプ
JPJP-P-2001-00328674 2001-10-26
JP2001328674A JP3992176B2 (ja) 2001-10-26 2001-10-26 真空排気方法および真空排気装置
JP2001332632A JP3906973B2 (ja) 2001-10-30 2001-10-30 真空排気装置
JPJP-P-2001-00332632 2001-10-30
JPJP-P-2001-00333772 2001-10-31
JP2001333772A JP3982673B2 (ja) 2001-10-31 2001-10-31 真空排気装置の運転方法
PCT/JP2002/009048 WO2003023229A1 (fr) 2001-09-06 2002-09-05 Systeme de pompe a vide et procede de fonctionnement d'un systeme de pompe a vide

Publications (2)

Publication Number Publication Date
KR20040030968A KR20040030968A (ko) 2004-04-09
KR100876318B1 true KR100876318B1 (ko) 2008-12-31

Family

ID=27531990

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020047002269A KR100876318B1 (ko) 2001-09-06 2002-09-05 진공배기장치 및 진공배기장치의 운전방법

Country Status (5)

Country Link
US (2) US20040173312A1 (zh)
KR (1) KR100876318B1 (zh)
CN (1) CN100348865C (zh)
TW (1) TWI267581B (zh)
WO (1) WO2003023229A1 (zh)

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KR20170062513A (ko) * 2014-10-02 2017-06-07 아뜰리에 부쉬 에스.아. 진공을 발생시키기 위한 펌핑 시스템 및 이 펌핑 시스템에 의한 펌핑 방법

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JP2008088879A (ja) * 2006-09-29 2008-04-17 Anest Iwata Corp 真空排気装置
TWI467092B (zh) * 2008-09-10 2015-01-01 Ulvac Inc 真空排氣裝置
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FR2952683B1 (fr) * 2009-11-18 2011-11-04 Alcatel Lucent Procede et dispositif de pompage a consommation d'energie reduite
KR101327715B1 (ko) * 2009-12-28 2013-11-11 가부시키가이샤 알박 진공 배기 장치 및 진공 배기 방법, 그리고 기판 처리 장치
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KR101039875B1 (ko) * 2011-01-21 2011-06-09 솔로몬산업 주식회사 유지보수가 용이한 조립식 방음벽
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JP6632973B2 (ja) * 2013-10-08 2020-01-22 デイコ アイピー ホールディングス, エルエルシーDayco Ip Holdings, Llc チェックバルブユニットにおけるノイズ減衰
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KR102240986B1 (ko) 2014-07-10 2021-04-15 데이코 아이피 홀딩스 엘엘시 이중 벤튜리 장치
KR102167821B1 (ko) 2014-08-27 2020-10-20 데이코 아이피 홀딩스 엘엘시 조정식 벤튜리 틈을 갖는 저렴한 엔진용 흡출기
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JP6554552B2 (ja) 2015-04-13 2019-07-31 デイコ アイピー ホールディングス, エルエルシーDayco Ip Holdings, Llc ベンチュリ効果を使用して真空を生じさせるための装置
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CN106762650A (zh) * 2015-11-25 2017-05-31 中国科学院沈阳科学仪器股份有限公司 一种用于真空获得设备的节能控制系统及方法
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CN106321435A (zh) * 2016-09-09 2017-01-11 武汉华星光电技术有限公司 降低干泵功耗的系统及方法
FR3065040B1 (fr) * 2017-04-07 2019-06-21 Pfeiffer Vacuum Groupe de pompage et utilisation
KR101978736B1 (ko) * 2017-09-18 2019-05-15 주식회사 이에스티 대상체 들뜸 방지용 정전척
FR3098869B1 (fr) * 2019-07-17 2021-07-16 Pfeiffer Vacuum Groupe de pompage
KR20210096577A (ko) 2020-01-28 2021-08-05 (주)엘오티베큠 진공 시스템
CN111120261A (zh) * 2020-02-18 2020-05-08 福建华佳彩有限公司 一种真空泵节能装置
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CN112045837B (zh) * 2020-09-01 2022-06-17 中国建筑土木建设有限公司 防浆液流入装置及利用该装置进行真空压浆的施工方法
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KR20170062513A (ko) * 2014-10-02 2017-06-07 아뜰리에 부쉬 에스.아. 진공을 발생시키기 위한 펌핑 시스템 및 이 펌핑 시스템에 의한 펌핑 방법
KR102330815B1 (ko) * 2014-10-02 2021-11-24 아뜰리에 부쉬 에스.아. 진공을 발생시키기 위한 펌핑 시스템 및 이 펌핑 시스템에 의한 펌핑 방법

Also Published As

Publication number Publication date
US20080145238A1 (en) 2008-06-19
CN100348865C (zh) 2007-11-14
US20040173312A1 (en) 2004-09-09
TWI267581B (en) 2006-12-01
CN1541307A (zh) 2004-10-27
WO2003023229A1 (fr) 2003-03-20
KR20040030968A (ko) 2004-04-09

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