WO2003023229A1 - Systeme de pompe a vide et procede de fonctionnement d'un systeme de pompe a vide - Google Patents

Systeme de pompe a vide et procede de fonctionnement d'un systeme de pompe a vide Download PDF

Info

Publication number
WO2003023229A1
WO2003023229A1 PCT/JP2002/009048 JP0209048W WO03023229A1 WO 2003023229 A1 WO2003023229 A1 WO 2003023229A1 JP 0209048 W JP0209048 W JP 0209048W WO 03023229 A1 WO03023229 A1 WO 03023229A1
Authority
WO
WIPO (PCT)
Prior art keywords
rotor
delivery section
coupled
motor
exhausted
Prior art date
Application number
PCT/JP2002/009048
Other languages
English (en)
French (fr)
Inventor
Kouji Shibayama
Yuuichi Yamashita
Mitsuru Yahagi
Takahiko Tashima
Junichi Aikawa
Tomonari Tanaka
Yukio Kanke
Yuuji Fukaura
Original Assignee
Ulvac, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2001327229A external-priority patent/JP4045362B2/ja
Priority claimed from JP2001328674A external-priority patent/JP3992176B2/ja
Priority claimed from JP2001332632A external-priority patent/JP3906973B2/ja
Priority claimed from JP2001333772A external-priority patent/JP3982673B2/ja
Application filed by Ulvac, Inc. filed Critical Ulvac, Inc.
Priority to KR1020047002269A priority Critical patent/KR100876318B1/ko
Priority to US10/486,189 priority patent/US20040173312A1/en
Publication of WO2003023229A1 publication Critical patent/WO2003023229A1/ja
Priority to US12/070,265 priority patent/US20080145238A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K15/00—Check valves
    • F16K15/02—Check valves with guided rigid valve members
    • F16K15/04—Check valves with guided rigid valve members shaped as balls
    • F16K15/042—Check valves with guided rigid valve members shaped as balls with a plurality of balls
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/10—Vacuum
    • F04C2220/12—Dry running
PCT/JP2002/009048 2001-09-06 2002-09-05 Systeme de pompe a vide et procede de fonctionnement d'un systeme de pompe a vide WO2003023229A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020047002269A KR100876318B1 (ko) 2001-09-06 2002-09-05 진공배기장치 및 진공배기장치의 운전방법
US10/486,189 US20040173312A1 (en) 2001-09-06 2002-09-05 Vacuum exhaust apparatus and drive method of vacuum apparatus
US12/070,265 US20080145238A1 (en) 2001-09-06 2008-02-15 Vacuum exhaust apparatus and drive method of vacuum exhaust apparatus

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
JP2001269742 2001-09-06
JP2001-269742 2001-09-06
JP2001327229A JP4045362B2 (ja) 2001-09-06 2001-10-25 多段式容積移送型ドライ真空ポンプ
JP2001-327229 2001-10-25
JP2001-328674 2001-10-26
JP2001328674A JP3992176B2 (ja) 2001-10-26 2001-10-26 真空排気方法および真空排気装置
JP2001-332632 2001-10-30
JP2001332632A JP3906973B2 (ja) 2001-10-30 2001-10-30 真空排気装置
JP2001-333772 2001-10-31
JP2001333772A JP3982673B2 (ja) 2001-10-31 2001-10-31 真空排気装置の運転方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/070,265 Division US20080145238A1 (en) 2001-09-06 2008-02-15 Vacuum exhaust apparatus and drive method of vacuum exhaust apparatus

Publications (1)

Publication Number Publication Date
WO2003023229A1 true WO2003023229A1 (fr) 2003-03-20

Family

ID=27531990

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/009048 WO2003023229A1 (fr) 2001-09-06 2002-09-05 Systeme de pompe a vide et procede de fonctionnement d'un systeme de pompe a vide

Country Status (5)

Country Link
US (2) US20040173312A1 (ja)
KR (1) KR100876318B1 (ja)
CN (1) CN100348865C (ja)
TW (1) TWI267581B (ja)
WO (1) WO2003023229A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005038255A2 (en) * 2003-10-17 2005-04-28 Ebara Corporation Evacuation apparatus
EP1596066A1 (en) * 2004-05-14 2005-11-16 Varian, Inc. Light gas vacuum pumping system
DE102012220442A1 (de) 2012-11-09 2014-05-15 Oerlikon Leybold Vacuum Gmbh Vakuumpumpensystem zur Evakuierung einer Kammer sowie Verfahren zur Steuerung eines Vakuumpumpensystems

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101375063B (zh) * 2006-01-31 2011-04-27 株式会社荏原制作所 真空泵单元
JP2008088880A (ja) * 2006-09-29 2008-04-17 Anest Iwata Corp 真空排気装置
JP2008088879A (ja) * 2006-09-29 2008-04-17 Anest Iwata Corp 真空排気装置
TWI467092B (zh) * 2008-09-10 2015-01-01 Ulvac Inc 真空排氣裝置
WO2010055665A1 (ja) * 2008-11-14 2010-05-20 アルバック・クライオ株式会社 真空排気装置、真空処理装置及び真空処理方法
FR2952683B1 (fr) * 2009-11-18 2011-11-04 Alcatel Lucent Procede et dispositif de pompage a consommation d'energie reduite
CN102713287B (zh) * 2009-12-28 2015-04-15 株式会社爱发科 真空排气装置、真空排气方法及基板处理装置
DE102010033091A1 (de) * 2010-08-02 2012-02-02 Schaeffler Technologies Gmbh & Co. Kg Hydraulisches Spannausgleichselement
WO2012086767A1 (ja) * 2010-12-22 2012-06-28 株式会社アルバック 真空排気装置及び真空処理装置及び真空排気方法
KR101039875B1 (ko) * 2011-01-21 2011-06-09 솔로몬산업 주식회사 유지보수가 용이한 조립식 방음벽
JP6138144B2 (ja) 2011-12-14 2017-05-31 ステアリング・インダストリー・コンサルト・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＳｔｅｒｌｉｎｇ Ｉｎｄｕｓｔｒｙ Ｃｏｎｓｕｌｔ ＧｍｂＨ チャンバを空にして該チャンバから取り出されたガスを浄化するための装置及び方法
KR101293653B1 (ko) * 2012-04-09 2013-08-13 조영만 다단식 썩션노즐을 구비한 감압장치
GB2502134B (en) * 2012-05-18 2015-09-09 Edwards Ltd Method and apparatus for adjusting operating parameters of a vacuum pump arrangement
KR101385954B1 (ko) * 2012-11-14 2014-04-16 데이비드 김 다단형 건식 진공펌프
FR3001263B1 (fr) * 2013-01-18 2015-02-20 Adixen Vacuum Products Pompe a vide multi-etagee de type seche
DE102013108090A1 (de) * 2013-07-29 2015-01-29 Hella Kgaa Hueck & Co. Pumpenanordnung
EP3505801B1 (en) 2013-10-08 2020-06-17 Dayco IP Holdings, LLC Noise attenuation in a check valve unit or apparatus for producing vacuum
BR112016021852B1 (pt) 2014-04-04 2022-09-27 Dayco Ip Holdings, Llc Válvula de retenção de derivação e dispositivo de venturi apresentando a mesma
US10107240B2 (en) 2014-04-04 2018-10-23 Dayco Ip Holdings, Llc Check valves and Venturi devices having the same
CA2944825C (fr) * 2014-05-01 2021-04-27 Ateliers Busch Sa Methode de pompage dans un systeme de pompage et systeme de pompes a vide
JP6609626B2 (ja) 2014-05-30 2019-11-20 デイコ アイピー ホールディングス，エルエルシー エジェクタ、空圧式制御バルブ及び選択的なアスピレータを有する真空発生システム
JP6665116B2 (ja) 2014-06-06 2020-03-13 デイコ アイピー ホールディングス, エルエルシーDayco Ip Holdings, Llc ベンチュリーデバイスおよび／またはチェックバルブにおけるノイズ減衰
CN105201871A (zh) * 2014-06-16 2015-12-30 上海协微精密机械有限公司 用于大半导体行业的抽真空装置
DE202014005279U1 (de) * 2014-06-26 2015-10-05 Oerlikon Leybold Vacuum Gmbh Vakuumpumpen-System
KR102223057B1 (ko) * 2014-06-27 2021-03-05 아뜰리에 부쉬 에스.아. 진공 펌프들의 시스템에서의 펌핑 방법 및 진공 펌프들의 시스템
EP3166826A4 (en) 2014-07-10 2018-03-28 Dayco IP Holdings, LLC Dual venturi device
US10273978B2 (en) 2014-08-27 2019-04-30 Dayco IP, Holdings LLC Low-cost evacuator for an engine having tuned Venturi gaps
WO2016045753A1 (fr) 2014-09-26 2016-03-31 Ateliers Busch Sa Système de pompage pour générer un vide et procédé de pompage au moyen de ce système de pompage
DE202014007963U1 (de) * 2014-10-01 2016-01-05 Oerlikon Leybold Vacuum Gmbh Vakuumpumpsystem
PT3201469T (pt) * 2014-10-02 2020-04-23 Ateliers Busch S A Sistema de bombagem para gerar um vácuo e processo de bombagem por meio deste sistema de bombagem
EP3242997B1 (en) 2015-01-09 2019-09-25 Dayco IP Holdings, LLC Crankcase ventilating evacuator
US9382826B1 (en) 2015-01-09 2016-07-05 Dayco Ip Holdings, Llc Noise attenuating member for noise attenuating units in engines
US10151283B2 (en) 2015-02-25 2018-12-11 Dayco Ip Holdings, Llc Evacuator with motive fin
US10316864B2 (en) 2015-04-13 2019-06-11 Dayco Ip Holdings, Llc Devices for producing vacuum using the venturi effect
US9982666B2 (en) 2015-05-29 2018-05-29 Agilient Technologies, Inc. Vacuum pump system including scroll pump and secondary pumping mechanism
US10094381B2 (en) * 2015-06-05 2018-10-09 Agilent Technologies, Inc. Vacuum pump system with light gas pumping and leak detection apparatus comprising the same
KR102306207B1 (ko) 2015-07-17 2021-09-28 데이코 아이피 홀딩스 엘엘시 원동부 내의 원동 출구 및 복수의 하위 통로를 갖고 벤튜리 효과를 이용하는 진공 생성 장치
WO2017075390A1 (en) 2015-10-28 2017-05-04 Dayco IP Holding, LLC Venturi devices resistant to ice formation for producing vacuum from crankcase gases
CN106762650A (zh) * 2015-11-25 2017-05-31 中国科学院沈阳科学仪器股份有限公司 一种用于真空获得设备的节能控制系统及方法
WO2017196295A1 (en) * 2016-05-09 2017-11-16 Cummins Inc. Pressure regulator plunger with an integrated check valve
CN106321435A (zh) * 2016-09-09 2017-01-11 武汉华星光电技术有限公司 降低干泵功耗的系统及方法
FR3065040B1 (fr) * 2017-04-07 2019-06-21 Pfeiffer Vacuum Groupe de pompage et utilisation
KR101978736B1 (ko) * 2017-09-18 2019-05-15 주식회사 이에스티 대상체 들뜸 방지용 정전척
FR3098869B1 (fr) * 2019-07-17 2021-07-16 Pfeiffer Vacuum Groupe de pompage
KR20210096577A (ko) 2020-01-28 2021-08-05 (주)엘오티베큠 진공 시스템
CN111120261A (zh) * 2020-02-18 2020-05-08 福建华佳彩有限公司 一种真空泵节能装置
GB2597972A (en) * 2020-08-13 2022-02-16 Edwards Ltd Non-return check valve and check valve apparatus for vacuum system
CN112045837B (zh) * 2020-09-01 2022-06-17 中国建筑土木建设有限公司 防浆液流入装置及利用该装置进行真空压浆的施工方法
GB2599160A (en) * 2020-09-29 2022-03-30 Leybold Gmbh Method for operating a pump system
CN114962269A (zh) * 2021-02-26 2022-08-30 中国科学院微电子研究所 真空泵及真空泵系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62233492A (ja) * 1986-03-31 1987-10-13 Shimadzu Corp 油回転真空ポンプ
US5564907A (en) * 1992-09-03 1996-10-15 Matsushita Electric Industrial Co., Ltd. Evacuating apparatus

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2672266A (en) * 1950-12-19 1954-03-16 Sylvania Electric Prod Vacuum leak check valve
US3190284A (en) * 1961-10-23 1965-06-22 Kaiser Aluminium Chem Corp Container with mixing device
BE817066R (fr) * 1973-11-29 1974-10-16 Enceinte de reaction pour le depot de matiere semi-concuctrice sur des corps de support chauffes
KR950007378B1 (ko) * 1990-04-06 1995-07-10 가부시끼 가이샤 히다찌 세이사꾸쇼 진공펌프
JP3331749B2 (ja) * 1994-06-27 2002-10-07 松下電器産業株式会社 真空ポンプ
JP3501524B2 (ja) * 1994-07-01 2004-03-02 東京エレクトロン株式会社 処理装置の真空排気システム
JPH0897147A (ja) * 1994-09-29 1996-04-12 Mitsubishi Electric Corp エピタキシャル結晶成長装置
JP3467960B2 (ja) * 1996-02-29 2003-11-17 信越半導体株式会社 半導体単結晶薄膜の製造方法および装置
US6863019B2 (en) * 2000-06-13 2005-03-08 Applied Materials, Inc. Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
FR2822200B1 (fr) * 2001-03-19 2003-09-26 Cit Alcatel Systeme de pompage pour gaz a faible conductivite thermique

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62233492A (ja) * 1986-03-31 1987-10-13 Shimadzu Corp 油回転真空ポンプ
US5564907A (en) * 1992-09-03 1996-10-15 Matsushita Electric Industrial Co., Ltd. Evacuating apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005038255A2 (en) * 2003-10-17 2005-04-28 Ebara Corporation Evacuation apparatus
WO2005038255A3 (en) * 2003-10-17 2005-11-03 Ebara Corp Evacuation apparatus
US9541088B2 (en) 2003-10-17 2017-01-10 Ebara Corporation Evacuation apparatus
EP1596066A1 (en) * 2004-05-14 2005-11-16 Varian, Inc. Light gas vacuum pumping system
US7189066B2 (en) 2004-05-14 2007-03-13 Varian, Inc. Light gas vacuum pumping system
DE102012220442A1 (de) 2012-11-09 2014-05-15 Oerlikon Leybold Vacuum Gmbh Vakuumpumpensystem zur Evakuierung einer Kammer sowie Verfahren zur Steuerung eines Vakuumpumpensystems
WO2014072276A1 (de) 2012-11-09 2014-05-15 Oerlikon Leybold Vacuum Gmbh Vakuumpumpensystem zur evakuierung einer kammer sowie verfahren zur steuerung eines vakuumpumpensystems

Also Published As

Publication number Publication date
US20080145238A1 (en) 2008-06-19
CN1541307A (zh) 2004-10-27
TWI267581B (en) 2006-12-01
US20040173312A1 (en) 2004-09-09
CN100348865C (zh) 2007-11-14
KR100876318B1 (ko) 2008-12-31
KR20040030968A (ko) 2004-04-09

Similar Documents

Publication Publication Date Title
WO2003023229A1 (fr) Systeme de pompe a vide et procede de fonctionnement d'un systeme de pompe a vide
US8702407B2 (en) Multistage roots vacuum pump having different tip radius and meshing clearance from inlet stage to exhaust stage
EP1126176A3 (en) Motor driven double suction pump
JP2005155540A (ja) 多段ドライ真空ポンプ
EP1101942A3 (en) Evacuating apparatus
EP1122441A3 (en) Inline pump
CN100590317C (zh) 一种单级透平真空机及应用其抽取真空的方法
JP2008088879A (ja) 真空排気装置
IT1241431B (it) Pompa turbomolecolare perfezionata.
JP4180265B2 (ja) 真空排気装置の運転方法
EP1347176A3 (en) Vacuum pump
US6129534A (en) Vacuum pumps
EP1234982B1 (en) Vacuum pump
EP0965758B1 (en) Vacuum pump
WO2011039812A1 (ja) 容積移送型ドライ真空ポンプ
JP3961605B2 (ja) 真空ポンプの改良
JP2008088880A (ja) 真空排気装置
JP2005171766A (ja) ドライポンプ及びドライポンプの運転方法
JP4045362B2 (ja) 多段式容積移送型ドライ真空ポンプ
US6672828B2 (en) Vacuum pump
JPS60142092A (ja) 多段排気形回転真空ポンプ
JP2001090690A (ja) 真空ポンプ
CN219993887U (zh) 一种v型正负压一体式压缩机
CN101303019B (zh) 扇式气泵
CA2293618A1 (en) Screw spindle vacuum pump and operating method

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): CN KR SG

WWE Wipo information: entry into national phase

Ref document number: 10486189

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 20028157117

Country of ref document: CN

WWE Wipo information: entry into national phase

Ref document number: 1020047002269

Country of ref document: KR