KR100826488B1 - 균일 처리속도 생성방법 및 장치 - Google Patents

균일 처리속도 생성방법 및 장치 Download PDF

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Publication number
KR100826488B1
KR100826488B1 KR1020027006166A KR20027006166A KR100826488B1 KR 100826488 B1 KR100826488 B1 KR 100826488B1 KR 1020027006166 A KR1020027006166 A KR 1020027006166A KR 20027006166 A KR20027006166 A KR 20027006166A KR 100826488 B1 KR100826488 B1 KR 100826488B1
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turn
antenna
layer
plasma
processing chamber
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KR20020068346A (ko
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앤드류 디. Ⅲ 베일리
앨렌 엠. 쇼에프
앤드래스 쿠티
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램 리써치 코포레이션
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32467—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020027006166A 1999-11-15 2000-11-14 균일 처리속도 생성방법 및 장치 Expired - Lifetime KR100826488B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/440,418 1999-11-15
US09/440,418 US6320320B1 (en) 1999-11-15 1999-11-15 Method and apparatus for producing uniform process rates

Publications (2)

Publication Number Publication Date
KR20020068346A KR20020068346A (ko) 2002-08-27
KR100826488B1 true KR100826488B1 (ko) 2008-05-02

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KR1020027006166A Expired - Lifetime KR100826488B1 (ko) 1999-11-15 2000-11-14 균일 처리속도 생성방법 및 장치

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US (2) US6320320B1 (https=)
EP (1) EP1230668B1 (https=)
JP (2) JP4758046B2 (https=)
KR (1) KR100826488B1 (https=)
CN (1) CN1227710C (https=)
AU (1) AU4902801A (https=)
TW (1) TW507253B (https=)
WO (1) WO2001045134A2 (https=)

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