KR100789684B1 - 플라즈마 반응 챔버의 세정 및 조절 방법 - Google Patents

플라즈마 반응 챔버의 세정 및 조절 방법 Download PDF

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Publication number
KR100789684B1
KR100789684B1 KR1020027008036A KR20027008036A KR100789684B1 KR 100789684 B1 KR100789684 B1 KR 100789684B1 KR 1020027008036 A KR1020027008036 A KR 1020027008036A KR 20027008036 A KR20027008036 A KR 20027008036A KR 100789684 B1 KR100789684 B1 KR 100789684B1
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South Korea
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chamber
cleaning
gas
plasma
substrate
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Korean (ko)
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KR20020062367A (ko
Inventor
리차드슨브렛씨.
오웃카두언
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램 리써치 코포레이션
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32862—In situ cleaning of vessels and/or internal parts

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020027008036A 1999-12-22 2000-12-08 플라즈마 반응 챔버의 세정 및 조절 방법 Expired - Lifetime KR100789684B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/469,286 US6350697B1 (en) 1999-12-22 1999-12-22 Method of cleaning and conditioning plasma reaction chamber
US09/469,286 1999-12-22

Publications (2)

Publication Number Publication Date
KR20020062367A KR20020062367A (ko) 2002-07-25
KR100789684B1 true KR100789684B1 (ko) 2008-01-02

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KR1020027008036A Expired - Lifetime KR100789684B1 (ko) 1999-12-22 2000-12-08 플라즈마 반응 챔버의 세정 및 조절 방법

Country Status (9)

Country Link
US (1) US6350697B1 (enExample)
EP (1) EP1252361B1 (enExample)
JP (1) JP4995390B2 (enExample)
KR (1) KR100789684B1 (enExample)
CN (1) CN1252313C (enExample)
AU (1) AU2049901A (enExample)
DE (1) DE60042892D1 (enExample)
TW (1) TW487988B (enExample)
WO (1) WO2001046490A1 (enExample)

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