KR100696737B1 - 기계부품을 유지보수하기 위한 장치 및 방법 - Google Patents

기계부품을 유지보수하기 위한 장치 및 방법 Download PDF

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Publication number
KR100696737B1
KR100696737B1 KR1020040016071A KR20040016071A KR100696737B1 KR 100696737 B1 KR100696737 B1 KR 100696737B1 KR 1020040016071 A KR1020040016071 A KR 1020040016071A KR 20040016071 A KR20040016071 A KR 20040016071A KR 100696737 B1 KR100696737 B1 KR 100696737B1
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South Korea
Prior art keywords
substrate table
substrate
load lock
machine
pin
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Expired - Fee Related
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KR1020040016071A
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English (en)
Korean (ko)
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KR20040080347A (ko
Inventor
그루스 피에터 요한네스 마리우스 판
얀 프레데릭 후그캄프
알베르트 얀 헨드리크 클롬프
에릭 로엘로프 루프스트라
요한네스 페트루스 마르티누스 베르 나르두스 페르모일렌
요제푸스 코르넬리우스 요한네스 안토 니우스 푸그트스
로버트 고든 리브세이
요한네스 헨드리쿠스 게르트루디스 프란센
Original Assignee
에이에스엠엘 네델란즈 비.브이.
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Publication of KR20040080347A publication Critical patent/KR20040080347A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41C—CORSETS; BRASSIERES
    • A41C3/00—Brassieres
    • A41C3/10—Brassieres with stiffening or bust-forming inserts
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41B—SHIRTS; UNDERWEAR; BABY LINEN; HANDKERCHIEFS
    • A41B17/00—Selection of special materials for underwear
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41C—CORSETS; BRASSIERES
    • A41C3/00—Brassieres
    • A41C3/0007—Brassieres with stay means
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41C—CORSETS; BRASSIERES
    • A41C3/00—Brassieres
    • A41C3/12—Component parts
    • A41C3/122—Stay means
    • A41C3/128—Stay means using specific materials
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41C—CORSETS; BRASSIERES
    • A41C3/00—Brassieres
    • A41C3/12—Component parts
    • A41C3/14—Stiffening or bust-forming inserts
    • A41C3/142—Stiffening inserts
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41C—CORSETS; BRASSIERES
    • A41C3/00—Brassieres
    • A41C3/12—Component parts
    • A41C3/14—Stiffening or bust-forming inserts
    • A41C3/144—Pads
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

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  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Textile Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020040016071A 2003-03-11 2004-03-10 기계부품을 유지보수하기 위한 장치 및 방법 Expired - Fee Related KR100696737B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP03075703.3 2003-03-11
EP03075703 2003-03-11
EP03076702.4 2003-06-02
EP03076702 2003-06-02

Publications (2)

Publication Number Publication Date
KR20040080347A KR20040080347A (ko) 2004-09-18
KR100696737B1 true KR100696737B1 (ko) 2007-03-20

Family

ID=33542553

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040016071A Expired - Fee Related KR100696737B1 (ko) 2003-03-11 2004-03-10 기계부품을 유지보수하기 위한 장치 및 방법

Country Status (6)

Country Link
US (1) US7576831B2 (enExample)
JP (1) JP4152335B2 (enExample)
KR (1) KR100696737B1 (enExample)
CN (1) CN1530754A (enExample)
SG (1) SG115629A1 (enExample)
TW (1) TWI259333B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG115631A1 (en) * 2003-03-11 2005-10-28 Asml Netherlands Bv Lithographic projection assembly, load lock and method for transferring objects
US9939728B2 (en) 2011-09-12 2018-04-10 Mapper Lithography Ip B.V. Vacuum chamber with a thick aluminum base plate

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Also Published As

Publication number Publication date
CN1530754A (zh) 2004-09-22
JP2004343069A (ja) 2004-12-02
US20050019709A1 (en) 2005-01-27
TWI259333B (en) 2006-08-01
KR20040080347A (ko) 2004-09-18
JP4152335B2 (ja) 2008-09-17
TW200508809A (en) 2005-03-01
US7576831B2 (en) 2009-08-18
SG115629A1 (en) 2005-10-28

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