JP4152335B2 - 機械部品を整備する方法および装置 - Google Patents

機械部品を整備する方法および装置 Download PDF

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Publication number
JP4152335B2
JP4152335B2 JP2004067549A JP2004067549A JP4152335B2 JP 4152335 B2 JP4152335 B2 JP 4152335B2 JP 2004067549 A JP2004067549 A JP 2004067549A JP 2004067549 A JP2004067549 A JP 2004067549A JP 4152335 B2 JP4152335 B2 JP 4152335B2
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JP
Japan
Prior art keywords
gripper
internal space
substrate
load lock
machine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2004067549A
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English (en)
Japanese (ja)
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JP2004343069A (ja
JP2004343069A5 (enExample
Inventor
ヨハンネス マリウス ファン グロース ピエテル
フレデリック ホーグカンプ ヤン
ヤン ヘンドリック クロムプ アルバート
ローロフ ロープストラ エリック
ペトラス マルティナス ベルナルドス フェルモレン ヨハネス
コーネリアス ヨハネス アントニウス フッツ ヨセフ
ゴードン リブジー ロバート
ヘンドリクス ゲルトラディス フランセン ヨハネス
Original Assignee
エーエスエムエル ネザーランズ ビー．ブイ．
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Publication of JP2004343069A publication Critical patent/JP2004343069A/ja
Publication of JP2004343069A5 publication Critical patent/JP2004343069A5/ja
Application granted granted Critical
Publication of JP4152335B2 publication Critical patent/JP4152335B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41C—CORSETS; BRASSIERES
    • A41C3/00—Brassieres
    • A41C3/10—Brassieres with stiffening or bust-forming inserts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41B—SHIRTS; UNDERWEAR; BABY LINEN; HANDKERCHIEFS
    • A41B17/00—Selection of special materials for underwear
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41C—CORSETS; BRASSIERES
    • A41C3/00—Brassieres
    • A41C3/0007—Brassieres with stay means
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41C—CORSETS; BRASSIERES
    • A41C3/00—Brassieres
    • A41C3/12—Component parts
    • A41C3/122—Stay means
    • A41C3/128—Stay means using specific materials
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41C—CORSETS; BRASSIERES
    • A41C3/00—Brassieres
    • A41C3/12—Component parts
    • A41C3/14—Stiffening or bust-forming inserts
    • A41C3/142—Stiffening inserts
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41C—CORSETS; BRASSIERES
    • A41C3/00—Brassieres
    • A41C3/12—Component parts
    • A41C3/14—Stiffening or bust-forming inserts
    • A41C3/144—Pads
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Textile Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004067549A 2003-03-11 2004-03-10 機械部品を整備する方法および装置 Expired - Fee Related JP4152335B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03075703 2003-03-11
EP03076702 2003-06-02

Publications (3)

Publication Number Publication Date
JP2004343069A JP2004343069A (ja) 2004-12-02
JP2004343069A5 JP2004343069A5 (enExample) 2006-07-20
JP4152335B2 true JP4152335B2 (ja) 2008-09-17

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004067549A Expired - Fee Related JP4152335B2 (ja) 2003-03-11 2004-03-10 機械部品を整備する方法および装置

Country Status (6)

Country Link
US (1) US7576831B2 (enExample)
JP (1) JP4152335B2 (enExample)
KR (1) KR100696737B1 (enExample)
CN (1) CN1530754A (enExample)
SG (1) SG115629A1 (enExample)
TW (1) TWI259333B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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US9939728B2 (en) 2011-09-12 2018-04-10 Mapper Lithography Ip B.V. Vacuum chamber with a thick aluminum base plate

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Also Published As

Publication number Publication date
CN1530754A (zh) 2004-09-22
JP2004343069A (ja) 2004-12-02
US20050019709A1 (en) 2005-01-27
TWI259333B (en) 2006-08-01
KR20040080347A (ko) 2004-09-18
KR100696737B1 (ko) 2007-03-20
TW200508809A (en) 2005-03-01
US7576831B2 (en) 2009-08-18
SG115629A1 (en) 2005-10-28

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