KR100597970B1 - 할로겐화 아크릴레이트 및 이로부터 유도된 중합체 - Google Patents

할로겐화 아크릴레이트 및 이로부터 유도된 중합체 Download PDF

Info

Publication number
KR100597970B1
KR100597970B1 KR1019997011592A KR19997011592A KR100597970B1 KR 100597970 B1 KR100597970 B1 KR 100597970B1 KR 1019997011592 A KR1019997011592 A KR 1019997011592A KR 19997011592 A KR19997011592 A KR 19997011592A KR 100597970 B1 KR100597970 B1 KR 100597970B1
Authority
KR
South Korea
Prior art keywords
group
groups
halogenated
acrylate
aliphatic
Prior art date
Application number
KR1019997011592A
Other languages
English (en)
Korean (ko)
Other versions
KR20010013585A (ko
Inventor
무어조지쥐아이
맥코믹프레드비
채토라지미타
크로스엘리사엠
리우전강야콥
로버츠랄프알
슐츠제이에프
Original Assignee
미네소타 마이닝 앤드 매뉴팩춰링 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미네소타 마이닝 앤드 매뉴팩춰링 캄파니 filed Critical 미네소타 마이닝 앤드 매뉴팩춰링 캄파니
Publication of KR20010013585A publication Critical patent/KR20010013585A/ko
Application granted granted Critical
Publication of KR100597970B1 publication Critical patent/KR100597970B1/ko

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62—Oxygen or sulfur atoms
    • C07D213/63—One oxygen atom
    • C07D213/64—One oxygen atom attached in position 2 or 6
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/455—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation with carboxylic acids or their derivatives
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62—Halogen-containing esters
    • C07C69/65—Halogen-containing esters of unsaturated acids
    • C07C69/653—Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/22—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/38—Esters containing sulfur
KR1019997011592A 1997-06-10 1997-09-29 할로겐화 아크릴레이트 및 이로부터 유도된 중합체 KR100597970B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/872,235 US6005137A (en) 1997-06-10 1997-06-10 Halogenated acrylates and polymers derived therefrom
US08/872,235 1997-06-10
PCT/US1997/017437 WO1998056749A1 (en) 1997-06-10 1997-09-29 Halogenated acrylates and polymers derived therefrom

Publications (2)

Publication Number Publication Date
KR20010013585A KR20010013585A (ko) 2001-02-26
KR100597970B1 true KR100597970B1 (ko) 2006-07-13

Family

ID=25359127

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019997011592A KR100597970B1 (ko) 1997-06-10 1997-09-29 할로겐화 아크릴레이트 및 이로부터 유도된 중합체

Country Status (8)

Country Link
US (4) US6005137A (US06362379-20020326-C00018.png)
EP (1) EP1009729B1 (US06362379-20020326-C00018.png)
JP (1) JP4065932B2 (US06362379-20020326-C00018.png)
KR (1) KR100597970B1 (US06362379-20020326-C00018.png)
CN (1) CN1125030C (US06362379-20020326-C00018.png)
AU (1) AU4739297A (US06362379-20020326-C00018.png)
DE (1) DE69732310T2 (US06362379-20020326-C00018.png)
WO (1) WO1998056749A1 (US06362379-20020326-C00018.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101004984B1 (ko) * 2007-08-03 2011-01-04 도오꾜오까고오교 가부시끼가이샤 불소 함유 화합물, 액침 노광용 레지스트 조성물 및레지스트 패턴 형성 방법

Families Citing this family (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6005137A (en) * 1997-06-10 1999-12-21 3M Innovative Properties Company Halogenated acrylates and polymers derived therefrom
US6306563B1 (en) 1999-06-21 2001-10-23 Corning Inc. Optical devices made from radiation curable fluorinated compositions
US6555288B1 (en) 1999-06-21 2003-04-29 Corning Incorporated Optical devices made from radiation curable fluorinated compositions
DE60139624D1 (de) * 2000-06-15 2009-10-01 3M Innovative Properties Co Erzeugung eines mehrfarbenbildes mittels eines multiphoton photochemischen verfahren
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
AU2001266905A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Microfabrication of organic optical elements
EP1295179B1 (en) 2000-06-15 2013-05-22 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
JP2004503392A (ja) * 2000-06-15 2004-02-05 スリーエム　イノベイティブ　プロパティズ　カンパニー マイクロ流体製品を製造するためのプロセス
KR100754813B1 (ko) 2000-06-15 2007-09-04 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다중통과 다광자 흡수 방법 및 장치
KR100811017B1 (ko) 2000-06-15 2008-03-11 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다중방향성 광반응성 흡수 방법
US6444830B1 (en) 2000-06-16 2002-09-03 Corning Incorporated Electron acceptors for polymeric thin film waveguide media
US6584266B1 (en) 2000-06-16 2003-06-24 Corning Incorporated Chromophores for polymeric thin films and optical waveguides and devices comprising the same
US6514434B1 (en) 2000-06-16 2003-02-04 Corning Incorporated Electro-optic chromophore bridge compounds and donor-bridge compounds for polymeric thin film waveguides
JP5220978B2 (ja) 2000-08-18 2013-06-26 スリーエム イノベイティブ プロパティズ カンパニー フルオロアルキル（メタ）アクリレートコポリマーコーティング組成物
CN1237395C (zh) * 2000-12-27 2006-01-18 三井化学株式会社 薄膜和薄膜的制造方法以及薄膜用粘合剂
US6929899B2 (en) 2001-01-25 2005-08-16 E. I. Du Pont De Nemours And Company Fluorinated photopolymer composition and waveguide device
US7078445B2 (en) * 2001-02-01 2006-07-18 E. I. Du Pont De Nemours And Company Photosensitive acrylate composition and waveguide device
US6689844B2 (en) * 2001-05-29 2004-02-10 Rohmax Additives Gmbh Process for synthesis of polymer compositions with reduced halogen content, polymer composition with reduced halogen content as well as use of this composition
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
DE10257711B4 (de) * 2001-12-27 2019-09-26 Merck Patent Gmbh Polymerisierbare monocyclische Verbindungen enthaltende Flüssigkristallmischungen
CA2471810A1 (en) * 2002-02-04 2003-08-14 Ciba Speciality Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
JP4222120B2 (ja) * 2002-10-07 2009-02-12 Ｊｓｒ株式会社 光導波路形成用感光性樹脂組成物および光導波路
JP2006504788A (ja) * 2002-11-01 2006-02-09 カーギル，インコーポレイティド １，３−プロパンジオールの製造方法
JP2004240122A (ja) * 2003-02-05 2004-08-26 Fuji Photo Film Co Ltd プラスチック光ファイバケーブルおよび製造方法
US20060056031A1 (en) * 2004-09-10 2006-03-16 Capaldo Kevin P Brightness enhancement film, and methods of making and using the same
US6833391B1 (en) 2003-05-27 2004-12-21 General Electric Company Curable (meth)acrylate compositions
TWI254717B (en) * 2003-08-06 2006-05-11 Chung Shan Inst Of Science Method for the preparation of pentafluorophenylacrylate polymer
US7271283B2 (en) * 2003-08-29 2007-09-18 General Electric Company High refractive index, UV-curable monomers and coating compositions prepared therefrom
JP2005140909A (ja) * 2003-11-05 2005-06-02 Omron Corp 光学部品
EP1757990B1 (en) * 2004-05-26 2013-10-09 JSR Corporation Resin compositions for miniaturizing the resin pattern spaces or holes and method for miniaturizing the resin pattern spaces or holes using the same
US7341784B2 (en) * 2004-09-10 2008-03-11 General Electric Company Light management film and its preparation and use
WO2006032020A1 (en) * 2004-09-14 2006-03-23 E.I. Dupont De Nemours And Company Optical organic polymer
WO2006034011A1 (en) * 2004-09-14 2006-03-30 E.I. Dupont De Nemours And Company Process for preparing an optical organic polymer
US20080286580A1 (en) * 2004-09-14 2008-11-20 Maria Petrucci-Samija Polymeric Optical Waveguide
US7491441B2 (en) * 2004-12-30 2009-02-17 3M Innovative Properties Company High refractive index, durable hard coats
US7264872B2 (en) * 2004-12-30 2007-09-04 3M Innovative Properties Company Durable high index nanocomposites for AR coatings
US7297810B2 (en) * 2004-12-30 2007-11-20 3M Innovative Properties Company High refractive index monomers for optical applications
US7231127B2 (en) * 2005-01-21 2007-06-12 Lumera Corporation Waveguide devices with low loss clads and tunable refractive indices
US7262230B2 (en) * 2005-01-21 2007-08-28 Lumera Corporation Process of preparing crosslinked, low loss polymers with tunable refractive indices
KR20090007757A (ko) * 2006-05-05 2009-01-20 도꾸리쯔교세이호징 가가꾸 기쥬쯔 신꼬 기꼬 신규한 (메타)크릴산 에스테르 공중합체, 조성물, 광학 부재 및 전기 부재
US8791254B2 (en) * 2006-05-19 2014-07-29 3M Innovative Properties Company Cyclic hydrofluoroether compounds and processes for their preparation and use
US8193397B2 (en) * 2006-12-06 2012-06-05 3M Innovative Properties Company Hydrofluoroether compounds and processes for their preparation and use
US20080145545A1 (en) * 2006-12-15 2008-06-19 Bret Ja Chisholm Metal oxide and sulfur-containing coating compositions, methods of use, and articles prepared therefrom
US8179034B2 (en) 2007-07-13 2012-05-15 3M Innovative Properties Company Light extraction film for organic light emitting diode display and lighting devices
US20090015142A1 (en) 2007-07-13 2009-01-15 3M Innovative Properties Company Light extraction film for organic light emitting diode display devices
JP5150327B2 (ja) * 2007-08-03 2013-02-20 東京応化工業株式会社 液浸露光用レジスト組成物およびレジストパターン形成方法
JP2009098658A (ja) * 2007-09-25 2009-05-07 Fujifilm Corp 光学フィルム、偏光板、及び画像表示装置
JP5303142B2 (ja) * 2007-11-30 2013-10-02 東京応化工業株式会社 含フッ素化合物、含フッ素高分子化合物、液浸露光用レジスト組成物およびレジストパターン形成方法
US7981986B2 (en) * 2008-04-29 2011-07-19 3M Innovative Properties Company Optical films comprising fluorenol (meth)acrylate monomer
US20090275720A1 (en) * 2008-04-30 2009-11-05 3M Innovative Properties Company Ortho-benzylphenol mono(meth)acrylate monomers suitable for microstructured optical films
US7957621B2 (en) 2008-12-17 2011-06-07 3M Innovative Properties Company Light extraction film with nanoparticle coatings
TWI503334B (zh) * 2009-02-19 2015-10-11 Jsr Corp 聚合物及敏輻射線性組成物、及單體
US9217109B2 (en) * 2010-07-22 2015-12-22 Merck Patent Gmbh Polymer-stabilised liquid-crystal media and displays
US9182662B2 (en) * 2012-02-15 2015-11-10 Rohm And Haas Electronic Materials Llc Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom
TW201625996A (zh) * 2014-10-21 2016-07-16 聖高拜塑膠製品公司 用可撓性ｏｌｅｄ的支撐件
WO2016132805A1 (ja) * 2015-02-16 2016-08-25 セントラル硝子株式会社 含フッ素α－ケトカルボン酸エステル類の実用的な製造方法
JP6929304B2 (ja) 2016-05-27 2021-09-01 スリーエム イノベイティブ プロパティズ カンパニー 色均一性が改善されたｏｌｅｄディスプレイ
WO2018080830A1 (en) 2016-10-28 2018-05-03 3M Innovative Properties Company Nanostructured article
KR101965194B1 (ko) * 2017-07-12 2019-04-03 이화여자대학교 산학협력단 불소계 모노머 및 올리고머 화합물, 광중합형 조성물, 및 이들을 이용한 소수성 필름
CN109534968B (zh) * 2018-11-15 2022-07-08 广东广山新材料股份有限公司 一种不饱和氟碳化合物及其制备方法和应用
US20220123267A1 (en) 2019-04-18 2022-04-21 3M Innovative Properties Company Organic light emitting diode display with color-correction component
KR20220062291A (ko) 2019-09-18 2022-05-16 쓰리엠 이노베이티브 프로퍼티즈 캄파니 나노구조화된 표면 및 폐쇄된 공극을 포함하는 물품, 및 그의 제조 방법
EP4205192A1 (en) 2020-08-28 2023-07-05 3M Innovative Properties Company Articles including nanostructured surfaces and enclosed voids, methods of making same, and optical elements
JP2023109483A (ja) * 2022-01-27 2023-08-08 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、及び、化合物

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL283387A (US06362379-20020326-C00018.png) * 1961-09-20
US3981928A (en) * 1962-10-30 1976-09-21 Minnesota Mining And Manufacturing Company Perfluorotertiaryalkyl ethers
US3321515A (en) * 1963-04-24 1967-05-23 Du Pont Method of making fluorinated carbonyl compounds
US3520863A (en) * 1965-06-24 1970-07-21 Allied Chem Novel acrylic monomers,polymers and intermediates
US3723507A (en) * 1965-06-24 1973-03-27 Allied Chem Perfluoro cycloalkyl acrylates
US3544535A (en) * 1965-07-26 1970-12-01 Allied Chem Novel carbinol and derivatives thereof
US3513203A (en) * 1966-07-11 1970-05-19 Montedison Spa Fluorinated ketones and process for their preparation
FR1547223A (fr) * 1966-12-17 1968-11-22 Dynamit Nobel Ag Procédé de préparation d'esters phényliques
US4010212A (en) * 1970-04-13 1977-03-01 Minnesota Mining And Manufacturing Company Perfluorotertiaryalkyl ethers
US3668223A (en) * 1970-08-19 1972-06-06 Merck & Co Inc 2-oxo-3-benzoxepins
JPS5023019B1 (US06362379-20020326-C00018.png) * 1970-12-14 1975-08-05
US5132455A (en) * 1982-03-31 1992-07-21 Exfluor Research Corporation Method for synthesizing perfluorinated ether compounds via polyesters
DE3678146D1 (de) * 1985-12-25 1991-04-18 Tosoh Corp Halogen enthaltende polyacrylat-derivate.
DE3620050A1 (de) * 1986-06-14 1987-12-17 Hoechst Ag Substituierte (alpha)-fluoracrylsaeurephenylester
US5045397A (en) * 1987-02-13 1991-09-03 Hughes Aircraft Company Optical adhesive system having low refractive index
DE3707923A1 (de) * 1987-03-12 1988-09-22 Hoechst Ag Transparente thermoplastische formmasse
FR2623510B1 (fr) * 1987-11-20 1992-10-23 Ecole Nale Superieure Chimie Polymeres a base d'halo et de methacrylates de pentafluorophenyle et leur application a la realisation de fibres optiques, de photoresists positifs, de verres organiques et de resines pour disques optiques
US5236919A (en) 1989-02-28 1993-08-17 Imperial Chemical Industries Plc Quinoxalinyl derivatives suitable for use in leukotriene mediated disease
JP2854669B2 (ja) * 1990-04-27 1999-02-03 株式会社 日立製作所 光伝送体とそれを用いた光伝送システムおよびエンジンの制御システム
US5136117A (en) 1990-08-23 1992-08-04 Battelle Memorial Institute Monomeric recovery from polymeric materials
US5384374A (en) * 1991-01-11 1995-01-24 Minnesota Mining And Manufacturing Company Curing fluorocarbon elastomers
US5223593A (en) * 1991-08-08 1993-06-29 Minnesota Mining And Manufacturing Company Fluorine containing plastic optical fiber cores
EP0560043B1 (de) * 1992-03-07 1997-06-18 Minnesota Mining And Manufacturing Company Verfahren zum Herstellen von Bauelementen für Lichtwellenleiternetze und nach diesem Verfahren hergestellte Bauelemente
US5420359A (en) * 1992-12-11 1995-05-30 Minnesota Mining And Manufacturing Company Chlorofluoroether compositions and preparation thereof
US5350497A (en) * 1993-05-21 1994-09-27 E. I. Du Pont De Nemours And Company Production of perfluoro(alkyl vinyl ethers)
US5343544A (en) * 1993-07-02 1994-08-30 Minnesota Mining And Manufacturing Company Integrated optical fiber coupler and method of making same
US5466877A (en) * 1994-03-15 1995-11-14 Minnesota Mining And Manufacturing Company Process for converting perfluorinated esters to perfluorinated acyl fluorides and/or ketones
US6005137A (en) * 1997-06-10 1999-12-21 3M Innovative Properties Company Halogenated acrylates and polymers derived therefrom

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101004984B1 (ko) * 2007-08-03 2011-01-04 도오꾜오까고오교 가부시끼가이샤 불소 함유 화합물, 액침 노광용 레지스트 조성물 및레지스트 패턴 형성 방법

Also Published As

Publication number Publication date
US6362379B2 (en) 2002-03-26
EP1009729B1 (en) 2005-01-19
US20010037028A1 (en) 2001-11-01
CN1259932A (zh) 2000-07-12
CN1125030C (zh) 2003-10-22
JP2002514259A (ja) 2002-05-14
EP1009729A1 (en) 2000-06-21
US6288266B1 (en) 2001-09-11
KR20010013585A (ko) 2001-02-26
WO1998056749A1 (en) 1998-12-17
US6313245B1 (en) 2001-11-06
AU4739297A (en) 1998-12-30
US6005137A (en) 1999-12-21
JP4065932B2 (ja) 2008-03-26
DE69732310D1 (de) 2005-02-24
DE69732310T2 (de) 2005-12-22

Similar Documents

Publication Publication Date Title
KR100597970B1 (ko) 할로겐화 아크릴레이트 및 이로부터 유도된 중합체
EP0428706B1 (en) Perfluorovinyl compounds
EP0975577A1 (en) Photocurable halofluorinated acrylates
US6533959B2 (en) Brominated materials
CN103415542A (zh) 自由基聚合性组合物、其固化物及塑料透镜
US6133472A (en) Fluorinated oxyvinyl compounds and methods of preparing and using same
FI70701B (fi) Acetylacetoxyalkyl-allyl-etrar foer anvaendning vid polymerisation eller kopolymerisation foerfarande foer framstaellning av dessa och anvaendning av dessa
US20030059714A1 (en) Radiation curable fluorinated vinyl ethers derived from hexafluoropropene
EP1440961B1 (en) Fluorine-containing diene compounds, fluoropolymers and processes for production of both
WO2006082845A1 (ja) 硬化性組成物およびそれを硬化してなる光学部材
KR100590637B1 (ko) 브롬화 재료
EP0994844B1 (en) High index of refraction monomers
US20080293903A1 (en) Optical Organic Polymer
US20080286580A1 (en) Polymeric Optical Waveguide
JP2002529438A (ja) α−メチレン−β−ヒドロキシ酸エステル誘導体の製造方法と使用
KR100665760B1 (ko) 불소함유 노르보넨에스테르의 제조방법 및 상기제조방법에 의해 제조된 불소함유 노르보넨에스테르
US6258909B1 (en) Polyester resins
KR100644237B1 (ko) 신규 불소치환 폴리(아릴렌에테르포스핀옥사이드) 중합체 및 그 제조방법
JPH04226933A (ja) 高フッ素化モノマー可溶性光開始剤
KR19980018494A (ko) (메트)아크릴산 에스테르로부터 얻어진 폴리(메트)아크릴레이트 및 할로겐화 (메트)아크릴산 에스테르의 제조방법
US6891071B2 (en) Halogenated styrene compounds and very low-loss polymers made therefrom
JPH07179384A (ja) 新規含フッ素フェノール誘導体及びその製造法
JPH0251415B2 (US06362379-20020326-C00018.png)
JPH0125727B2 (US06362379-20020326-C00018.png)
JP2001233815A (ja) 含フッ素ビニルエーテル化合物、含フッ素ビニルエーテル化合物重合体、および含フッ素ビニルエーテル化合物の製造方法

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
LAPS Lapse due to unpaid annual fee