JPWO2023032854A5 - - Google Patents
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- Publication number
- JPWO2023032854A5 JPWO2023032854A5 JP2023545531A JP2023545531A JPWO2023032854A5 JP WO2023032854 A5 JPWO2023032854 A5 JP WO2023032854A5 JP 2023545531 A JP2023545531 A JP 2023545531A JP 2023545531 A JP2023545531 A JP 2023545531A JP WO2023032854 A5 JPWO2023032854 A5 JP WO2023032854A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- silica
- dispersion
- silane
- oxide particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 23
- 229910000077 silane Inorganic materials 0.000 claims 15
- 239000002245 particle Substances 0.000 claims 14
- 239000006185 dispersion Substances 0.000 claims 13
- 239000000377 silicon dioxide Substances 0.000 claims 10
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 9
- 229910052809 inorganic oxide Inorganic materials 0.000 claims 9
- 239000002612 dispersion medium Substances 0.000 claims 6
- -1 silane compound Chemical class 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 125000004429 atom Chemical group 0.000 claims 4
- 229910052710 silicon Inorganic materials 0.000 claims 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 229910044991 metal oxide Inorganic materials 0.000 claims 3
- 150000004706 metal oxides Chemical class 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 229910018540 Si C Inorganic materials 0.000 claims 2
- 125000004423 acyloxy group Chemical group 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 239000002131 composite material Substances 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 229910001873 dinitrogen Inorganic materials 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims 2
- 238000003756 stirring Methods 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 125000003277 amino group Chemical group 0.000 claims 1
- 229910000410 antimony oxide Inorganic materials 0.000 claims 1
- 239000012736 aqueous medium Substances 0.000 claims 1
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 claims 1
- 239000011258 core-shell material Substances 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 125000003700 epoxy group Chemical group 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 239000002609 medium Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 230000004048 modification Effects 0.000 claims 1
- 238000012986 modification Methods 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims 1
- 125000003396 thiol group Chemical group [H]S* 0.000 claims 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims 1
- 229910001887 tin oxide Inorganic materials 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024134471A JP2024149753A (ja) | 2021-08-31 | 2024-08-09 | 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021141201 | 2021-08-31 | ||
| JP2021141201 | 2021-08-31 | ||
| PCT/JP2022/032245 WO2023032854A1 (ja) | 2021-08-31 | 2022-08-26 | 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024134471A Division JP2024149753A (ja) | 2021-08-31 | 2024-08-09 | 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023032854A1 JPWO2023032854A1 (https=) | 2023-03-09 |
| JPWO2023032854A5 true JPWO2023032854A5 (https=) | 2023-10-20 |
| JP7538968B2 JP7538968B2 (ja) | 2024-08-22 |
Family
ID=85412703
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023545531A Active JP7538968B2 (ja) | 2021-08-31 | 2022-08-26 | 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法 |
| JP2024134471A Pending JP2024149753A (ja) | 2021-08-31 | 2024-08-09 | 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024134471A Pending JP2024149753A (ja) | 2021-08-31 | 2024-08-09 | 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US12203026B2 (https=) |
| EP (1) | EP4393877A4 (https=) |
| JP (2) | JP7538968B2 (https=) |
| KR (2) | KR20240157768A (https=) |
| CN (1) | CN117881629A (https=) |
| MY (1) | MY207235A (https=) |
| TW (1) | TW202323189A (https=) |
| WO (1) | WO2023032854A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7668924B1 (ja) | 2023-10-25 | 2025-04-25 | 多摩化学工業株式会社 | コロイダルシリカ及びコロイダルシリカの製造方法 |
| WO2025110245A1 (ja) * | 2023-11-24 | 2025-05-30 | 日産化学株式会社 | シリカ粒子とポリオルガノシロキサンと溶媒とを含む組成物及びその製造方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69804373T2 (de) | 1997-05-26 | 2002-10-24 | Nissan Chemical Industries, Ltd. | Verfahren zur Herstellung eines hydrophoben Kieselsäure Organosols |
| JP4032503B2 (ja) * | 1997-05-26 | 2008-01-16 | 日産化学工業株式会社 | 疎水性オルガノシリカゾルの製造方法 |
| JP4803630B2 (ja) * | 2003-05-21 | 2011-10-26 | 扶桑化学工業株式会社 | 高純度疎水性有機溶媒分散シリカゾルの製造方法 |
| JP4816861B2 (ja) | 2003-12-19 | 2011-11-16 | 日産化学工業株式会社 | 有機溶媒分散無機酸化物ゾルの製造方法 |
| JP4888633B2 (ja) * | 2004-11-16 | 2012-02-29 | 日産化学工業株式会社 | 疎水性シリカ粉末の製造法 |
| US20060112860A1 (en) * | 2004-11-16 | 2006-06-01 | Nissan Chemical Industries, Ltd. | Process for producing hydrophobic silica powder |
| US7186440B2 (en) | 2005-07-04 | 2007-03-06 | Nissan Chemical Industries, Ltd. | Process for producing hydrophobic silica powder |
| DE102006061057A1 (de) * | 2006-12-22 | 2008-06-26 | Wacker Chemie Ag | Organofunktionelle Silikonharzschichten auf Metalloxiden |
| JP2009013033A (ja) * | 2007-07-09 | 2009-01-22 | Arakawa Chem Ind Co Ltd | 表面被覆シリカオルガノゾルの製造方法および表面被覆シリカ粒子含有エポキシ樹脂組成物の製造方法 |
| DE102007044302A1 (de) * | 2007-09-17 | 2009-03-19 | Bühler PARTEC GmbH | Verfahren zur Dispergierung von feinteiligen anorganischen Pulvern in flüssigen Medien unter Verwendung von reaktiven Siloxanen |
| US20110244382A1 (en) * | 2010-04-06 | 2011-10-06 | Christopher Alyson M | Hydrophobic silica particles and method of producing same |
| JP5035651B2 (ja) * | 2010-07-12 | 2012-09-26 | Ｄｉｃ株式会社 | 無機微粒子用分散剤、それを使用した無機微粒子分散体 |
| EP3009480B1 (en) * | 2013-06-10 | 2019-05-01 | Nissan Chemical Corporation | Silica-containing resin composition and method for producing same, and molded article produced from silica-containing resin composition |
| JP6443197B2 (ja) | 2015-04-15 | 2018-12-26 | 信越化学工業株式会社 | 無機酸化物微粒子分散液の製造方法 |
| JP6481599B2 (ja) * | 2015-12-08 | 2019-03-13 | 信越化学工業株式会社 | 無機粒子−ポリシロキサン複合体、それを含む分散液、固体材料、及び該無機粒子−ポリシロキサン複合体の製造方法 |
| JP2021006595A (ja) * | 2017-09-13 | 2021-01-21 | 日産化学株式会社 | 原油回収用薬液 |
| CN113165424B (zh) * | 2018-11-28 | 2023-06-16 | 倍耐力轮胎股份公司 | 轮胎用胶料的制备方法和包含它们的轮胎 |
| US20220033268A1 (en) * | 2019-02-25 | 2022-02-03 | Nissan Chemical Corporation | Inorganic oxide particle, inorganic oxide particle dispersion and preparation method thereof, and method for producing surface modifier |
| JP7430985B2 (ja) | 2019-03-29 | 2024-02-14 | 日揮触媒化成株式会社 | 表面処理粒子の分散液および該分散液を含む硬化性の組成物 |
| KR102284512B1 (ko) * | 2019-11-25 | 2021-08-02 | 주식회사 케이씨텍 | 수분량이 제어된 무기 산화물 분산액 및 이의 제조방법 |
| KR102853213B1 (ko) * | 2019-12-20 | 2025-09-01 | 주식회사 케이씨텍 | 무기 산화물 입자-모노머 분산액 및 이의 제조 방법 |
| KR102671382B1 (ko) * | 2021-06-17 | 2024-06-04 | 주식회사 케이씨텍 | 중공실리카 입자 분산 조성물, 그의 제조방법, 그를 포함하는 광학용 필름 및 디스플레이용 광학 부재 |
-
2022
- 2022-08-26 US US18/688,274 patent/US12203026B2/en active Active
- 2022-08-26 WO PCT/JP2022/032245 patent/WO2023032854A1/ja not_active Ceased
- 2022-08-26 CN CN202280058941.3A patent/CN117881629A/zh active Pending
- 2022-08-26 EP EP22864438.1A patent/EP4393877A4/en active Pending
- 2022-08-26 TW TW111132364A patent/TW202323189A/zh unknown
- 2022-08-26 MY MYPI2024001270A patent/MY207235A/en unknown
- 2022-08-26 KR KR1020247034765A patent/KR20240157768A/ko active Pending
- 2022-08-26 KR KR1020247009109A patent/KR102722973B1/ko active Active
- 2022-08-26 JP JP2023545531A patent/JP7538968B2/ja active Active
-
2024
- 2024-08-09 JP JP2024134471A patent/JP2024149753A/ja active Pending
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