WO2023032854A1 - 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法 - Google Patents
表面処理シリカ含有無機酸化物粒子分散液及びその製造方法 Download PDFInfo
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- WO2023032854A1 WO2023032854A1 PCT/JP2022/032245 JP2022032245W WO2023032854A1 WO 2023032854 A1 WO2023032854 A1 WO 2023032854A1 JP 2022032245 W JP2022032245 W JP 2022032245W WO 2023032854 A1 WO2023032854 A1 WO 2023032854A1
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- Prior art keywords
- group
- silica
- silane
- dispersion
- inorganic oxide
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 249
- 239000002245 particle Substances 0.000 title claims abstract description 159
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 91
- 239000006185 dispersion Substances 0.000 title claims abstract description 60
- 229910052809 inorganic oxide Inorganic materials 0.000 title claims abstract description 51
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 229910000077 silane Inorganic materials 0.000 claims abstract description 164
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 76
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 46
- 239000002612 dispersion medium Substances 0.000 claims abstract description 37
- 239000007788 liquid Substances 0.000 claims abstract description 19
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 18
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 17
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 17
- 239000002131 composite material Substances 0.000 claims abstract description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000011258 core-shell material Substances 0.000 claims abstract description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 5
- 229910000410 antimony oxide Inorganic materials 0.000 claims abstract description 4
- 239000002609 medium Substances 0.000 claims abstract description 4
- 238000012986 modification Methods 0.000 claims abstract description 4
- 230000004048 modification Effects 0.000 claims abstract description 4
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 claims abstract description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 4
- -1 silane compound Chemical class 0.000 claims description 152
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 40
- 238000001179 sorption measurement Methods 0.000 claims description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 25
- 150000004756 silanes Chemical class 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims description 16
- 239000003960 organic solvent Substances 0.000 claims description 16
- 238000003756 stirring Methods 0.000 claims description 16
- 125000003545 alkoxy group Chemical group 0.000 claims description 9
- 125000004423 acyloxy group Chemical group 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 125000005843 halogen group Chemical group 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 5
- 125000003342 alkenyl group Chemical group 0.000 claims description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 239000012736 aqueous medium Substances 0.000 claims description 5
- 125000003277 amino group Chemical group 0.000 claims description 4
- 125000003700 epoxy group Chemical group 0.000 claims description 4
- 125000000962 organic group Chemical group 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 229910018540 Si C Inorganic materials 0.000 claims description 3
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 claims description 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 3
- 125000004429 atom Chemical group 0.000 claims 4
- 150000003839 salts Chemical class 0.000 abstract description 43
- 230000007062 hydrolysis Effects 0.000 abstract description 10
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 10
- 230000001747 exhibiting effect Effects 0.000 abstract description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 125
- 230000015784 hyperosmotic salinity response Effects 0.000 description 66
- 238000012360 testing method Methods 0.000 description 64
- 238000011156 evaluation Methods 0.000 description 51
- 238000000034 method Methods 0.000 description 47
- 230000000052 comparative effect Effects 0.000 description 31
- 238000002360 preparation method Methods 0.000 description 24
- 238000004438 BET method Methods 0.000 description 22
- 125000000524 functional group Chemical group 0.000 description 19
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 19
- 229910052783 alkali metal Inorganic materials 0.000 description 16
- 238000005259 measurement Methods 0.000 description 15
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 15
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 12
- 229910052757 nitrogen Inorganic materials 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 239000004310 lactic acid Substances 0.000 description 6
- 235000014655 lactic acid Nutrition 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 125000005372 silanol group Chemical group 0.000 description 6
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 5
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 4
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 4
- 150000003961 organosilicon compounds Chemical group 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 235000002597 Solanum melongena Nutrition 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 150000004703 alkoxides Chemical group 0.000 description 3
- 125000000129 anionic group Chemical group 0.000 description 3
- 125000002091 cationic group Chemical group 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229940093915 gynecological organic acid Drugs 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 239000004570 mortar (masonry) Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 3
- 238000000108 ultra-filtration Methods 0.000 description 3
- MZWXWSVCNSPBLH-UHFFFAOYSA-N 3-(3-aminopropyl-methoxy-methylsilyl)oxypropan-1-amine Chemical compound NCCC[Si](C)(OC)OCCCN MZWXWSVCNSPBLH-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000003125 aqueous solvent Substances 0.000 description 2
- 239000012267 brine Substances 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000002296 dynamic light scattering Methods 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 150000007529 inorganic bases Chemical class 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropyl acetate Chemical compound CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 235000010755 mineral Nutrition 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 235000019353 potassium silicate Nutrition 0.000 description 2
- 150000003141 primary amines Chemical class 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 125000001453 quaternary ammonium group Chemical group 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 150000003335 secondary amines Chemical class 0.000 description 2
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 239000011573 trace mineral Substances 0.000 description 2
- 235000013619 trace mineral Nutrition 0.000 description 2
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- 125000006033 1,1-dimethyl-2-propenyl group Chemical group 0.000 description 1
- 125000006034 1,2-dimethyl-1-propenyl group Chemical group 0.000 description 1
- 125000006035 1,2-dimethyl-2-propenyl group Chemical group 0.000 description 1
- ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- 125000006433 1-ethyl cyclopropyl group Chemical group [H]C([H])([H])C([H])([H])C1(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000006039 1-hexenyl group Chemical group 0.000 description 1
- 125000006438 1-i-propyl cyclopropyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C1(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000006432 1-methyl cyclopropyl group Chemical group [H]C([H])([H])C1(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000006025 1-methyl-1-butenyl group Chemical group 0.000 description 1
- 125000006044 1-methyl-1-pentenyl group Chemical group 0.000 description 1
- 125000006019 1-methyl-1-propenyl group Chemical group 0.000 description 1
- 125000006028 1-methyl-2-butenyl group Chemical group 0.000 description 1
- 125000006048 1-methyl-2-pentenyl group Chemical group 0.000 description 1
- 125000006021 1-methyl-2-propenyl group Chemical group 0.000 description 1
- 125000006030 1-methyl-3-butenyl group Chemical group 0.000 description 1
- 125000006052 1-methyl-3-pentenyl group Chemical group 0.000 description 1
- 125000006055 1-methyl-4-pentenyl group Chemical group 0.000 description 1
- 125000006439 1-n-propyl cyclopropyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C1(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000006023 1-pentenyl group Chemical group 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- MTEZSDOQASFMDI-UHFFFAOYSA-N 1-trimethoxysilylpropan-1-ol Chemical compound CCC(O)[Si](OC)(OC)OC MTEZSDOQASFMDI-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000006040 2-hexenyl group Chemical group 0.000 description 1
- 125000006026 2-methyl-1-butenyl group Chemical group 0.000 description 1
- 125000006045 2-methyl-1-pentenyl group Chemical group 0.000 description 1
- 125000006020 2-methyl-1-propenyl group Chemical group 0.000 description 1
- 125000006029 2-methyl-2-butenyl group Chemical group 0.000 description 1
- 125000006049 2-methyl-2-pentenyl group Chemical group 0.000 description 1
- 125000006022 2-methyl-2-propenyl group Chemical group 0.000 description 1
- 125000006031 2-methyl-3-butenyl group Chemical group 0.000 description 1
- 125000006024 2-pentenyl group Chemical group 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- 125000006041 3-hexenyl group Chemical group 0.000 description 1
- 125000006027 3-methyl-1-butenyl group Chemical group 0.000 description 1
- 125000006032 3-methyl-3-butenyl group Chemical group 0.000 description 1
- VOXXWSYKYCBWHO-UHFFFAOYSA-M 3-phenyllactate Chemical compound [O-]C(=O)C(O)CC1=CC=CC=C1 VOXXWSYKYCBWHO-UHFFFAOYSA-M 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 125000006042 4-hexenyl group Chemical group 0.000 description 1
- 125000006043 5-hexenyl group Chemical group 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Natural products OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- YJLYANLCNIKXMG-UHFFFAOYSA-N N-Methyldioctylamine Chemical compound CCCCCCCCN(C)CCCCCCCC YJLYANLCNIKXMG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- NJSVDVPGINTNGX-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethanamine Chemical compound CCC[Si](OC)(OC)OCN NJSVDVPGINTNGX-UHFFFAOYSA-N 0.000 description 1
- HITZGLBEZMKWBW-UHFFFAOYSA-N ac1n8rtr Chemical group C1CC2OC2CC1CC[Si](O1)(O2)O[Si](O3)(C4CCCC4)O[Si](O4)(C5CCCC5)O[Si]1(C1CCCC1)O[Si](O1)(C5CCCC5)O[Si]2(C2CCCC2)O[Si]3(C2CCCC2)O[Si]41C1CCCC1 HITZGLBEZMKWBW-UHFFFAOYSA-N 0.000 description 1
- IPBVNPXQWQGGJP-UHFFFAOYSA-N acetic acid phenyl ester Natural products CC(=O)OC1=CC=CC=C1 IPBVNPXQWQGGJP-UHFFFAOYSA-N 0.000 description 1
- IPTNXMGXEGQYSY-UHFFFAOYSA-N acetic acid;1-methoxybutan-1-ol Chemical compound CC(O)=O.CCCC(O)OC IPTNXMGXEGQYSY-UHFFFAOYSA-N 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000008431 aliphatic amides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- METIGIXCFPEQNM-UHFFFAOYSA-M amino-(2-bromoethyl)-dimethylazanium;bromide Chemical compound [Br-].C[N+](C)(N)CCBr METIGIXCFPEQNM-UHFFFAOYSA-M 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 238000005349 anion exchange Methods 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 description 1
- 238000005341 cation exchange Methods 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- PQZTVWVYCLIIJY-UHFFFAOYSA-N diethyl(propyl)amine Chemical compound CCCN(CC)CC PQZTVWVYCLIIJY-UHFFFAOYSA-N 0.000 description 1
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 1
- LAWOZCWGWDVVSG-UHFFFAOYSA-N dioctylamine Chemical compound CCCCCCCCNCCCCCCCC LAWOZCWGWDVVSG-UHFFFAOYSA-N 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- KVFVBPYVNUCWJX-UHFFFAOYSA-M ethyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(C)C KVFVBPYVNUCWJX-UHFFFAOYSA-M 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000011087 fumaric acid Nutrition 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- YWXYYJSYQOXTPL-SLPGGIOYSA-N isosorbide mononitrate Chemical compound [O-][N+](=O)O[C@@H]1CO[C@@H]2[C@@H](O)CO[C@@H]21 YWXYYJSYQOXTPL-SLPGGIOYSA-N 0.000 description 1
- TYQCGQRIZGCHNB-JLAZNSOCSA-N l-ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(O)=C(O)C1=O TYQCGQRIZGCHNB-JLAZNSOCSA-N 0.000 description 1
- 229960000448 lactic acid Drugs 0.000 description 1
- 229940070765 laurate Drugs 0.000 description 1
- 229940049918 linoleate Drugs 0.000 description 1
- 229940040452 linolenate Drugs 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005555 metalworking Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 229940105132 myristate Drugs 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- ORSUTASIQKBEFU-UHFFFAOYSA-N n,n-diethylbutan-1-amine Chemical compound CCCCN(CC)CC ORSUTASIQKBEFU-UHFFFAOYSA-N 0.000 description 1
- BVUGARXRRGZONH-UHFFFAOYSA-N n,n-diethyloctan-1-amine Chemical compound CCCCCCCCN(CC)CC BVUGARXRRGZONH-UHFFFAOYSA-N 0.000 description 1
- YZULHOOBWDXEOT-UHFFFAOYSA-N n,n-diethylpentan-1-amine Chemical compound CCCCCN(CC)CC YZULHOOBWDXEOT-UHFFFAOYSA-N 0.000 description 1
- UQKAOOAFEFCDGT-UHFFFAOYSA-N n,n-dimethyloctan-1-amine Chemical compound CCCCCCCCN(C)C UQKAOOAFEFCDGT-UHFFFAOYSA-N 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- OOHAUGDGCWURIT-UHFFFAOYSA-N n,n-dipentylpentan-1-amine Chemical compound CCCCCN(CCCCC)CCCCC OOHAUGDGCWURIT-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- BBDGYADAMYMJNO-UHFFFAOYSA-N n-butyl-n-ethylbutan-1-amine Chemical compound CCCCN(CC)CCCC BBDGYADAMYMJNO-UHFFFAOYSA-N 0.000 description 1
- DBIJGSRXWPQTLH-UHFFFAOYSA-N n-butyloctan-1-amine Chemical compound CCCCCCCCNCCCC DBIJGSRXWPQTLH-UHFFFAOYSA-N 0.000 description 1
- KYSDFVPIAZIJAW-UHFFFAOYSA-N n-ethyl-n-octyloctan-1-amine Chemical compound CCCCCCCCN(CC)CCCCCCCC KYSDFVPIAZIJAW-UHFFFAOYSA-N 0.000 description 1
- PXAVTVNEDPAYJP-UHFFFAOYSA-N n-ethyl-n-pentylpentan-1-amine Chemical compound CCCCCN(CC)CCCCC PXAVTVNEDPAYJP-UHFFFAOYSA-N 0.000 description 1
- XWCCTMBMQUCLSI-UHFFFAOYSA-N n-ethyl-n-propylpropan-1-amine Chemical compound CCCN(CC)CCC XWCCTMBMQUCLSI-UHFFFAOYSA-N 0.000 description 1
- QHCCDDQKNUYGNC-UHFFFAOYSA-N n-ethylbutan-1-amine Chemical compound CCCCNCC QHCCDDQKNUYGNC-UHFFFAOYSA-N 0.000 description 1
- SDQCOADWEMMSGK-UHFFFAOYSA-N n-ethyloctan-1-amine Chemical compound CCCCCCCCNCC SDQCOADWEMMSGK-UHFFFAOYSA-N 0.000 description 1
- ICVFPLUSMYSIFO-UHFFFAOYSA-N n-ethylpentan-1-amine Chemical compound CCCCCNCC ICVFPLUSMYSIFO-UHFFFAOYSA-N 0.000 description 1
- XCVNDBIXFPGMIW-UHFFFAOYSA-N n-ethylpropan-1-amine Chemical compound CCCNCC XCVNDBIXFPGMIW-UHFFFAOYSA-N 0.000 description 1
- RIVIDPPYRINTTH-UHFFFAOYSA-N n-ethylpropan-2-amine Chemical compound CCNC(C)C RIVIDPPYRINTTH-UHFFFAOYSA-N 0.000 description 1
- 125000001298 n-hexoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000003935 n-pentoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- JACMPVXHEARCBO-UHFFFAOYSA-N n-pentylpentan-1-amine Chemical compound CCCCCNCCCCC JACMPVXHEARCBO-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- CWYZDPHNAGSFQB-UHFFFAOYSA-N n-propylbutan-1-amine Chemical compound CCCCNCCC CWYZDPHNAGSFQB-UHFFFAOYSA-N 0.000 description 1
- GFAQQAUTKWCQHA-UHFFFAOYSA-N n-propylpentan-1-amine Chemical compound CCCCCNCCC GFAQQAUTKWCQHA-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229940049964 oleate Drugs 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- DYUMLJSJISTVPV-UHFFFAOYSA-N phenyl propanoate Chemical compound CCC(=O)OC1=CC=CC=C1 DYUMLJSJISTVPV-UHFFFAOYSA-N 0.000 description 1
- 229940049953 phenylacetate Drugs 0.000 description 1
- WLJVXDMOQOGPHL-UHFFFAOYSA-N phenylacetic acid Chemical compound OC(=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- RPDAUEIUDPHABB-UHFFFAOYSA-N potassium ethoxide Chemical compound [K+].CC[O-] RPDAUEIUDPHABB-UHFFFAOYSA-N 0.000 description 1
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 description 1
- 125000001844 prenyl group Chemical group [H]C([*])([H])C([H])=C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 150000003138 primary alcohols Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/146—After-treatment of sols
- C01B33/149—Coating
Definitions
- the present invention relates to a dispersion of silica-containing inorganic oxide particles whose surface is silane-treated and a method for producing the same.
- a dispersion of silica-containing inorganic oxide particles, particularly a silica sol, is a liquid in which silica particles are dispersed in a dispersion medium.
- One of the methods is to modify the surface of silica particles with a silane coupling agent having a cationic or anionic functional group when the dispersion medium is an aqueous solution, or to modify the surface of the silica particles when the dispersion medium is an organic solvent.
- There is a method of modifying the surface of silica particles with a silane coupling agent having an organic group There is a method of modifying the surface of silica particles with a silane coupling agent having an organic group.
- a method for producing an organic solvent-dispersed silica sol comprises the steps of adding an alkoxide for surface treatment and replacing the dispersion medium with a non-alcoholic organic solvent in the presence of a primary alcohol having 3 to 12 carbon atoms. (See Patent Document 1).
- the present invention provides a dispersion of silica-containing inorganic oxide particles, particularly a dispersion of silica particles, which has high dispersion stability even at high temperature and high salinity.
- the dispersion containing the silica-containing inorganic oxide particles are silica particles having an average particle diameter of 5 nm to 100 nm, or at least one selected from the group consisting of silica and alumina, tin oxide, zirconium oxide, titanium oxide, and antimony oxide.
- the hydrolyzable silane has formulas (1) to (3):
- R 3 is an alkyl group, a halogenated alkyl group, an alkenyl group, or an organic group having an epoxy group, (meth)acryloyl group, mercapto group, amino group, ureido group, or cyano group, and Si is bonded to a silicon atom by a —C bond
- R 4 represents an alkoxy group, an acyloxy group, or a halogen group
- a represents an integer of 1 to 3
- R 5 and R 7 are alkyl groups having 1 to 3 carbon atoms and are bonded to silicon atoms via Si—C bonds
- the dispersion according to the first or second aspect which is at least one silane compound selected from the group consisting of
- a hydrolyzate of the hydrolyzable silane in the dispersion medium a hydrolyzate of a silane compound in which a in formula (1) is an integer of 1 is observed by Si-NMR to form a bridge between silicon atoms.
- (T2+T3)/(T0+T1 ) has a specific value (2 to 15), or the (T1+T2+T3)/(T0) ratio contains a silane compound having a specific value (5 to 100),
- a hydrolyzate of a silane compound in which a in formula (1) is an integer of 2 is observed by Si-NMR to form a bridge between silicon atoms.
- the dispersion according to the third aspect comprising a silane compound having a (D2)/(D0+D1) ratio of 0.01 to 10;
- the value obtained by dividing the water vapor adsorption amount to the silica-containing inorganic oxide particles by the nitrogen gas adsorption amount (specific surface area calculated from the water vapor adsorption amount) / (specific surface area calculated from the nitrogen gas adsorption amount) is 0.15 to 0.95 compared to the silica particles before the addition of the silane compound, the dispersion according to any one of the first to fifth aspects,
- Silica-containing inorganic oxide particles especially inorganic particle dispersion liquids such as silica, ensure dispersion stability due to the repulsive force between particles.
- silica particles silanol groups are present on the surface of the silica particles, and repulsion between the particles occurs due to the negative charge possessed by the silanol groups.
- the magnitude of the absolute value of electric charge varies depending on the pH and salts in the dispersion. There are surface-treated particles that are less affected by pH and salts.
- the surface of the silica particles is treated with a hydrolyzable silane compound having a cationic functional group with a positive charge, or the surface is treated with a hydrolyzable silane compound having an anionic functional group with a negative charge.
- a hydrolyzable silane compound having a cationic functional group with a positive charge or the surface is treated with a hydrolyzable silane compound having an anionic functional group with a negative charge.
- There are methods of processing. Each of these has a repulsive force between particles due to the electrical repulsive force between cationic or anionic functional groups.
- silane compound having a functional group added to the silica particle dispersion liquid is dissolved in the dispersion medium without bonding to the silane (bonded silane) having a functional group bonded to the silica particle surface.
- silanes with functional groups hereinafter referred to as free silanes.
- the silane having a functional group in the dispersion medium exists between the silica particles, and since it has the same functional group, a repulsive force is generated between the bound silane and the free silane. A repulsive force is generated between the particles, resulting in a dispersion with high dispersion stability.
- the ratio of (the number of moles of silicon atoms in the hydrolyzate of the hydrolyzable silane in the dispersion medium)/(the number of moles of silicon atoms of the silane bonded to the surface of the inorganic oxide particles) is a specific value (0.2 ⁇ 30) gives a dispersion of silica particles with high dispersion stability.
- the dispersion medium is an organic solvent
- the silica particles have hydrophilicity based on silanol, which is different from the liquid properties of organic solvents. and have high compatibility with the organic solvent.
- Silane with a hydrophobic functional group is difficult to modify with the above functional group over the entire particle, and compatibility is ensured with a silane monomer with a hydrophobic functional group in the part of the silica particle that is not modified with a hydrophobic functional group. By doing so, it is possible to obtain a highly dispersible liquid dispersion even in an organic solvent.
- the hydrolyzate of the hydrolyzable silane in the dispersion medium preferably exists in such a manner that the repulsive force between the silica particles and the silane monomer is delocalized throughout the dispersion medium. It is preferable not to proceed to For example, when using a silane having three hydrolyzable groups in the hydrolyzable silane, the hydrolyzed compound of the silane compound is observed by Si-NMR and the ratio of bridging oxygen between silicon atoms is For T0, T1, T2, and T3 structures representing 0/2, 1/2, 2/2, and 3/2, (T2+T3)/(T0+T1) has a specific value (2-15, preferably is 2 to 10), or the (T1+T2+T3)/(T0) ratio is a specific value (5 to 100, preferably 5 to 50).
- the hydrolyzed compound of the silane compound is observed by Si-NMR so that the ratio of bridging oxygen between silicon atoms is For D0, D1 and D2 structures showing 0/2, 1/2, and 2/2, the (D1+D2)/(D0) ratio is a specific value (0.1-10), or (D2)/( It is preferable that the D0+D1) ratio is a specific value (0.01 to 10). Either one of these may be satisfied, but it is more preferable to satisfy both.
- the value obtained by dividing the amount of water vapor adsorption to the silica particles by the amount of nitrogen gas adsorption is in the range of 0.15 to 0.95 compared to the silica particles before the addition of the silane compound, so that the inorganic oxide particles can be highly compatible particles over a wide range from aqueous media to organic solvents. .
- Silica particles filled with these bound silanes and free silanes are surface-modified by Q4, in which the number of bridging oxygens between the silicon atoms of the silica particles is 4/2 per silicon atom by Si-NMR observation. This is an increase from before. For example, their increasing ratio can be in the range of 1.01 to 1.5, or 1.01 to 1.15.
- the present invention is a dispersion containing silane-bonded silica-containing inorganic oxide particles surface-modified with a hydrolyzable silane as a dispersoid and using a liquid medium as a dispersion medium, wherein the dispersion medium is a hydrolyzate of the hydrolyzable silane.
- the ratio of (the number of moles of silicon atoms in the hydrolyzate of the hydrolyzable silane in the dispersion medium)/(the number of moles of silicon atoms of the silane bonded to the surface of the inorganic oxide particles) is 0.2 to 30, preferably is 0.2 to 15, and in Si-NMR observation, the number of bridging oxygens between silicon atoms of silica particles is 4/2 per silicon atom. It is the above dispersion containing the silica-containing inorganic oxide particles.
- the average particle size of inorganic substances such as aqueous silica sol refers to the specific surface area measured by the nitrogen adsorption method (BET method), unless otherwise specified.
- the silica-containing inorganic oxide particles are silica particles having an average particle size of 5 nm to 100 nm, preferably 5 to 60 nm, as measured by the BET method, or from the group consisting of silica and alumina, tin oxide, zirconium oxide, titanium oxide, and antimony oxide. At least one selected inorganic oxide particle, the silica-containing inorganic oxide particle being a silica particle, a composite metal oxide of silica and other metal oxides, or a core-shell of silica and other metal oxides Composite oxide particles having a structure may be mentioned.
- silica particles are preferably used as single metal oxides, and composite metal oxide particles of silica and alumina and composite metal oxide particles of tin oxide and silica are mentioned as composite metal oxides.
- composite oxide particles having a core-shell structure include composite oxide particles having a core-shell structure in which a core is titanium oxide or titanium oxide and zirconium oxide and a shell is tin oxide and silica.
- the silica-containing inorganic oxide particles are obtained as a dispersion having a concentration of, for example, 1 to 50 mass % in a dispersion medium.
- the dispersion of the present invention is prepared by the following steps (A) to (B): (A) step: obtaining an aqueous dispersion of the silica-containing inorganic oxide particles; Step (B): Add hydrolyzable silane at a pH of 2.0 to 6.5 to the aqueous dispersion of silica-containing inorganic oxide particles as a ratio of the number of silanes to the surface area of the particles, 0.3 to 100/ nm 2 range, the temperature is raised to within 50 to 99° C.
- the aqueous dispersion of silica-containing inorganic oxide particles obtained in step (A) is obtained as a dispersion having a concentration of, for example, 1 to 50% by mass of silica-containing inorganic oxide particles in an aqueous medium.
- the aqueous silica sol is prepared by using water glass as a starting material, a) cation-exchanging the water glass to obtain active silicic acid, and b) heating the active silicic acid to obtain silica particles. .
- a mineral acid for example, hydrochloric acid, nitric acid, or sulfuric acid
- metal impurities other than silica are eluted by cation exchange and anion exchange.
- Activated silicic acid from which unnecessary anions are removed can be used.
- an alkali component eg, NaOH, KOH
- a seed liquid and a feed liquid are prepared by adding an alkali to the active silicic acid obtained in step a), and the feed liquid is supplied while heating the seed liquid to increase the silica particle diameter.
- step (B) An aqueous silica sol having an arbitrary particle size can be obtained by increasing the .
- step (B) the pH of the aqueous dispersion of silica-containing inorganic oxide particles obtained in step (A) can be adjusted to 2.0 to 6.5, and hydrolyzable silane can be added. Acid or alkali can be used for pH adjustment.
- Acids include mineral acids such as hydrochloric acid, sulfuric acid and nitric acid, and organic acids such as formic acid, oxalic acid, citric acid, acetic acid, lactic acid, malic acid, succinic acid, tartaric acid, butyric acid, fumaric acid, propionic acid and ascorbic acid.
- alkalis include ammonia, amines, quaternary ammonium hydroxides, alkali metal hydroxides, alkali metal alkoxides, and alkali metal salts of aliphatic carboxylic acids.
- Amines include primary amines, secondary amines, and tertiary amines.
- Examples of primary amines include methylamine, ethylamine, n-propylamine and i-propylamine.
- Examples of secondary amines include ethyl n-propylamine, ethyl i-propylamine, dipropylamine, di-i-propylamine, ethylbutylamine, n-propylbutylamine, dibutylamine, ethylpentylamine, n-propylpentylamine, i-propylpentylamine. , dipentylamine, ethyloctylamine, i-propyloctylamine, butyloctylamine, dioctylamine and the like.
- tertiary amine examples include triethylamine, ethyldi-n-propylamine, diethyl-n-propylamine, tri-n-propylamine, tri-i-propylamine, ethyldibutylamine, diethylbutylamine, i-propyldibutylamine, di-i-propylbutylamine, tributylamine, Ethyldipentylamine, diethylpentylamine, tripentylamine, methyldioctylamine, dimethyloctylamine, ethyldioctylamine, diethyloctylamine, trioctylamine and the like.
- the quaternary ammonium hydroxide is preferably a tetraalkylammonium hydroxide having 4 to 40 carbon atoms in total. Examples thereof include tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetra-n-propylammonium hydroxide, tetra-i-propylammonium hydroxide, tetrabutylammonium hydroxide, and ethyltrimethylammonium hydroxide.
- Alkali metal hydroxides include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate and the like.
- Alkali metal alkoxides include sodium methoxide, sodium ethoxide, potassium methoxide, potassium ethoxide and the like.
- Alkali metal salts of aliphatic carboxylic acids include alkali metal salts of saturated aliphatic carboxylic acids having 10 to 30 carbon atoms and alkali metal salts of unsaturated aliphatic carboxylic acids.
- Alkali metals include sodium and potassium.
- Examples of the saturated aliphatic carboxylic acid alkali metal salt include alkali metal laurate, alkali metal myristate, alkali metal palmitate, alkali metal stearate and the like.
- Examples of the unsaturated aliphatic carboxylic acid alkali metal salt include alkali metal oleate, alkali metal linoleate, alkali metal linolenate and the like.
- At least one silane compound selected from the group consisting of the above formulas (1) to (3) can be used as the hydrolyzable silane used in the step (B).
- R 3 is an alkyl group, a halogenated alkyl group, an alkenyl group, or an organic group having an epoxy group, (meth)acryloyl group, mercapto group, amino group, ureido group, or cyano group, and Si— C-bonded to a silicon atom
- R 4 represents an alkoxy group, an acyloxy group, or a halogen group
- a represents an integer of 1 to 3
- R 5 and R 7 are alkyl groups having 1 to 3 carbon atoms and are bonded to silicon atoms via Si—C bonds
- R 6 and R 7 are represents an alkoxy group, an acyloxy group, or a halogen group
- Y represents an alkylene group, an NH group, or an oxygen atom; and at least one of R 5 and R 7
- the above alkyl group is an alkyl group having 1 to 18 carbon atoms, such as methyl group, ethyl group, n-propyl group, i-propyl group, cyclopropyl group, n-butyl group, i-butyl group, s-butyl group.
- the alkenyl group is an alkenyl group having 2 to 10 carbon atoms, such as ethenyl, 1-propenyl, 2-propenyl, 1-methyl-1-ethenyl, 1-butenyl, 2-butenyl and 3-butenyl.
- alkoxy group examples include alkoxy groups having 1 to 10 carbon atoms, such as methoxy, ethoxy, n-propoxy, i-propoxy, n-butoxy, i-butoxy, s-butoxy, t -butoxy group, n-pentyloxy group, 1-methyl-n-butoxy group, 2-methyl-n-butoxy group, 3-methyl-n-butoxy group, 1,1-dimethyl-n-propoxy group, 1,2 -dimethyl-n-propoxy group, 2,2-dimethyl-n-propoxy group, 1-ethyl-n-propoxy group, n-hexyloxy group and the like, but are not limited thereto.
- the acyloxy group having 2 to 10 carbon atoms is, for example, methylcarbonyloxy group, ethylcarbonyloxy group, n-propylcarbonyloxy group, i-propylcarbonyloxy group, n-butylcarbonyloxy group, i-butyl carbonyloxy group, s-butylcarbonyloxy group, t-butylcarbonyloxy group, n-pentylcarbonyloxy group, 1-methyl-n-butylcarbonyloxy group, 2-methyl-n-butylcarbonyloxy group, 3-methyl -n-butylcarbonyloxy group, 1,1-dimethyl-n-propylcarbonyloxy group, 1,2-dimethyl-n-propylcarbonyloxy group, 2,2-dimethyl-n-propylcarbonyloxy group, 1-ethyl -n-propylcarbonyloxy group, n-hexylcarbonyloxy group, 1-methyl-n-
- halogen group examples include fluorine, chlorine, bromine and iodine.
- the (meth)acryloyl group means both an acryloyl group and a methacryloyl group.
- Formulas (2) and (3) above are preferably compounds capable of forming trimethylsilyl groups on the surfaces of silica particles. Examples of these compounds are given below.
- R12 is an alkoxy group such as a methoxy group and an ethoxy group.
- hydroxyl groups on the surfaces of silica particles for example, silanol groups in the case of silica particles, react with the silane compound to coat the surfaces of the silica particles with the silane compound through siloxane bonds.
- the reaction temperature can be in the range of 20°C to the boiling point of the dispersion medium, for example, in the range of 20°C to 100°C.
- the reaction time can be about 0.1 to 6 hours.
- Preferred functional groups include amino group, epoxy group, alkyl group, phenyl group and the like, such as aminopropyl group, aminoethylaminopropyl group, methyl group, phenyl group, glycidoxypropyl group, epoxycyclohexylethyl group, trifluoropropyl group. and the like.
- Silane compounds corresponding to them include aminopropyltrimethoxysilane, aminopropyltriethoxysilane, aminoethylaminopropyltrimethoxysilane, aminoethylaminopropyltriethoxysilane, aminoethylaminopropylmethyldimethoxysilane, aminoethylaminopropylmethyldiethoxysilane.
- Silane Methyltrimethoxysilane, Methyltriethoxysilane, Phenyltrimethoxysilane, Phenyltriethoxysilane, Glycidoxypropyltrimethoxysilane, Glycidoxypropyltriethoxysilane, Epoxycyclohexylethyltrimethoxysilane, Epoxycyclohexylethyltriethoxysilane silane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, and the like.
- the silane compound is added to the silica sol in such a manner that the silica particle surface is covered with a silane compound corresponding to a coating amount in which the number of silicon atoms in the silane compound is 0.1/nm 2 to 4.0/nm 2 .
- the surface of silica particles can be coated. Water is necessary for the hydrolysis of the silane compound, and if it is a sol of an aqueous solvent, such an aqueous solvent is used. Also, the hydrolysis can be carried out with or without a catalyst. When the reaction is carried out without a catalyst, the surface of the silica particles serves as a catalyst, and a silica sol having a pH of 2.0 to 6.5 can be used.
- hydrolysis catalysts include metal chelate compounds, organic acids, inorganic acids, organic bases, and inorganic bases.
- Metal chelate compounds as hydrolysis catalysts include, for example, triethoxy-mono(acetylacetonato)titanium and triethoxy-mono(acetylacetonato)zirconium.
- Organic acids as hydrolysis catalysts include, for example, acetic acid and oxalic acid.
- Inorganic acids as hydrolysis catalysts include, for example, hydrochloric acid, nitric acid, sulfuric acid, hydrofluoric acid, and phosphoric acid.
- Examples of organic bases as hydrolysis catalysts include pyridine, pyrrole, piperazine and quaternary ammonium salts.
- Inorganic bases as hydrolysis catalysts include, for example, ammonia, sodium hydroxide, and potassium hydroxide.
- a hydrolyzable silane is added to the aqueous dispersion of inorganic oxide particles obtained in the step (A), and the mixture is stirred at room temperature (for example, about 15 to 25° C.) for 0.01 to 2 hours. After that, the temperature is raised to a temperature within 50 to 99° C. and stirred for 0.01 to 14 hours, and the stirring time after raising the temperature to 50 to 99° C. is 1 to 100 times the stirring time at room temperature, or It is preferable to carry out within the range of 1 to 7 times.
- the hydrolyzate of the hydrolyzable silane is not sufficiently coated on the inorganic oxide particles (for example, silica particles), and the silane compound present in the dispersion medium is later locally coated. , uniform coverage cannot be achieved.
- the ratio of the T1, T2, T3, D1, and D2 structures decreases, which is not preferable in terms of the repulsive force of the particles.
- the state in which the hydrolyzate of the hydrolyzable silane is bonded to the silica particles and the state in which the hydrolyzate of the hydrolyzable silane exists in the dispersion medium coexist. Both of them have a ratio of (number of moles of silicon atoms in the hydrolyzate of the hydrolyzable silane in the dispersion medium) / (number of moles of silicon atoms of the silane bonded to the surface of the inorganic oxide particles) of 0.2 to 30. Occasionally contributes to the stability of inorganic oxide sol (silica sol).
- the silica particles When the hydrolyzate of the hydrolyzable silane of the present invention is bonded to the silica particles, the silica particles have a reduced amount of silanol. It is characteristic that Q4, which is 4/2 of the silane, is increased from before the surface modification of the silane.
- the silica particles are obtained by dividing the specific surface area calculated from the amount of water vapor adsorbed on the silica particles by the specific surface area calculated from the amount of nitrogen gas adsorbed.
- a certain (specific surface area calculated from water vapor adsorption amount)/(specific surface area calculated from nitrogen gas adsorption amount) is 0.15 to 0.95 compared to the silica particles before addition of the silane compound.
- the hydrolyzate of the hydrolyzable silane in the dispersion medium the hydrolyzate of the silane compound in which a in formula (1) is an integer of 1 is observed by Si-NMR, and the ratio of bridging oxygen between silicon atoms for T0, T1, T2, and T3 structures exhibiting 0/2, 1/2, 2/2, and 3/2 per silicon atom, the (T2+T3)/(T0+T1) ratio is It is characterized by containing a silane compound having a ratio of 2 to 10 or (T1+T2+T3)/(T0) of 5 to 100.
- the hydrolyzate of the hydrolyzable silane in the dispersion medium the hydrolyzate of the silane compound in which a in formula (1) is an integer of 2 is observed by Si-NMR, and the ratio of bridging oxygen between silicon atoms is 0/2, 1/2, 2/2 per silicon atom, the (D1+D2)/(D0) ratio is 0.1 to 10, or (D2 )/(D0+D1) ratio is 0.01-10. Either one of these may be satisfied, but it is more preferable to satisfy both.
- Organic solvents include organic solvents such as alcohols, ketones, ethers, esters, amides, and hydrocarbons.
- the alcohol is an alcohol having 1 to 10 carbon atoms, such as methanol, ethanol, i-propanol, n-propanol and butanol.
- Ketones are linear or cyclic aliphatic ketones having 3 to 30 carbon atoms, such as methyl ethyl ketone, diethyl ketone, methyl propyl ketone, methyl isobutyl ketone, diisobutyl ketone, methyl amyl ketone and cyclohexanone.
- Ethers are linear or cyclic aliphatic ethers having 3 to 30 carbon atoms, such as diethyl ether and tetrahydrofuran.
- Esters are linear or cyclic esters having 2 to 30 carbon atoms, such as ethyl acetate, butyl acetate, sec-butyl acetate, methoxybutyl acetate, amyl acetate, n-propyl acetate, i-propyl acetate, ethyl lactate, lactic acid.
- Amide is an aliphatic amide having 3 to 30 carbon atoms, such as dimethylacetamide, dimethylformamide, N-methylpyrrolidone, N-ethylpyrrolidone and the like.
- Hydrocarbons are linear or cyclic aliphatic or aromatic hydrocarbons having 6 to 30 carbon atoms, such as hexane, heptane, octane, nonane, decane, benzene, toluene and xylene.
- the silica-containing inorganic oxide sol (for example, silica sol) of the present invention can be used as a high-salt dispersion medium sol, an adhesive, a release agent, a semiconductor encapsulant, an LED encapsulant, a paint, a film internal additive, a hard coating agent, a photo Used in resist materials, printing inks, detergents, cleaners, additives for various resins, insulating compositions, rust preventives, lubricating oils, metal working oils, coating agents for films, stripping agents, well treatment agents, etc. can be done.
- aqueous silica sol pH value, electrical conductivity, viscosity, DLS average particle size, amount of silane bonds
- sample analysis after room temperature salt resistance test or high temperature salt resistance test of sample prepared using the aqueous silica sol was carried out using the following equipment.
- DLS average particle size average particle size by dynamic light scattering method: A dynamic light scattering particle size measuring device, Zetasizer Nano (manufactured by Spectris Co., Ltd., Malvern Division) was used.
- - pH A pH meter (manufactured by Toa DKK Co., Ltd.) was used.
- the aqueous silica sol from which the free silane was removed was dried by heating at 100° C. and pulverized in a mortar to obtain a silica sol powder.
- the carbon content of the obtained silica sol powder was measured with an organic trace element metal analyzer, and the silane bond content was calculated by the following formula from the obtained carbon content.
- Amount of surface treatment (Cm/Cn/Sc x A)/(Ct x Cs)
- Cm is the carbon content
- Cn is the carbon molecular weight
- Sc is the number of carbon atoms in the silane
- A is Avogadro's number
- Ct is the silica particle mass
- Cs is the silica specific surface area.
- the unit of the amount of silane bonds obtained by measuring the amount of carbon is (number/nm 2 ).
- the amount of nitrogen in the aqueous silica sol from which free silane was removed was measured with a TN measurement device, and the amount of silane bond was calculated from the obtained nitrogen amount by the following equation.
- Amount of surface treatment (Nm/Nn/Sn x A)/(Ct x Cs) where Nm is the nitrogen content, Nn is the nitrogen molecular weight, Sn is the number of nitrogen atoms in the silane, A is Avogadro's number, Ct is the silica particle mass, and Cs is the silica specific surface area.
- the unit of the amount of silane bonds obtained by measuring the amount of nitrogen is (number/nm 2 ).
- the aqueous silica sol obtained by removing the free silane was dried on a hot plate at 80° C., and the resulting silica gel was pulverized in a mortar and then dried at 150° C. for 3 hours to obtain dry silica powder. Based on the BET theory, the specific surface area (m 2 /g) of this powder was measured by the nitrogen adsorption method (BET method, ie nitrogen gas BET method).
- A The ratio of the DLS average particle size after the salt tolerance test/the DLS average particle size before the test is 1.1 or less.
- B The ratio of the DLS average particle size after the salt tolerance test/the DLS average particle size before the test is 1.2 to 1.5.
- C The ratio of the DLS average particle size after the salt resistance test/the DLS average particle size before the test is 1.6 to 2.4.
- D The ratio of the DLS average particle size after the salt tolerance test/the DLS average particle size before the test is 2.5 to 20.0.
- E The ratio of the DLS average particle size after the salt resistance test/the DLS average particle size before the test was 20.1 or more, or clouded and solid-liquid separation occurred. Salt tolerance test results show that A is the most preferred, with B, C, D and E being the preferred results in that order.
- High temperature salt resistance evaluation -1 Put 65 g of the salt tolerance test sample in a 120 ml Teflon (registered trademark) container that can be sealed, and after sealing, place the Teflon (registered trademark) container in a dryer at 100 ° C. and hold at 100 ° C. for a predetermined time (10 hours ), the appearance, pH, electrical conductivity, and DLS average particle size of the aqueous silica sol (silica particles) in the sample were evaluated.
- the high-temperature salt tolerance was determined according to the same criteria as the determination of the salt tolerance in the room-temperature salt tolerance evaluation.
- High temperature salt resistance evaluation -2 High-temperature salt resistance was determined in the same manner as described above (high-temperature salt resistance evaluation-1), except that the temperature of the dryer was 120° C. and the holding time was 10 hours.
- Example 1 Aqueous silica sol (Snowtex (trade name) ST-O manufactured by Nissan Chemical Industries, Ltd., silica concentration: 20.5% by mass, average particle size by BET method: 11.7 nm, average particle size by DLS method) in a 2000 ml glass eggplant flask After adding 1000 g of a magnetic stirrer (diameter 18.6 nm) and stirring with a magnetic stirrer, 3-glycidide was added so that the silane compound was 0.5/nm 2 with respect to the surface area of silica in the aqueous silica sol.
- a magnetic stirrer diameter 18.6 nm
- the aqueous silica sol of Example 1 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Example 1 was evaluated.
- a salt tolerance test sample was prepared according to ⁇ Preparation of salt tolerance test sample>, and after holding at 20°C for 10 hours according to ⁇ Room temperature salt tolerance evaluation>, the sample was taken out and room temperature salt tolerance was evaluated.
- Example 2 For silica in the aqueous silica sol (Nissan Chemical Co., Ltd. Snowtex (trade name) ST-O, average particle size 11.7 nm by BET method, average particle size 18.6 nm by DLS method), Same as Example 1 except that 149.7 g of 3-glycidoxypropyltrimethoxysilane (Dynasylan GLYMO manufactured by Evonik) was added so that the number of silane compounds was 8.0/nm 2 with respect to the surface area of silica. The operation yielded 1149.7 g of aqueous sol.
- the aqueous silica sol of Example 2 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Example 2 was evaluated.
- a salt resistance test sample was prepared according to (Preparation of salt resistance test sample), and after holding at 100° C. for 10 hours according to (Evaluation of high temperature salt resistance-1), the sample was taken out and evaluated for high temperature salt resistance.
- Example 3 For silica in the aqueous silica sol (Nissan Chemical Co., Ltd. Snowtex (trade name) ST-O, average particle size 11.7 nm by BET method, average particle size 18.6 nm by DLS method), Same as Example 1 except that 576.2 g of 3-glycidoxypropyltrimethoxysilane (Dynasylan GLYMO manufactured by Evonik) was added so that the number of silane compounds was 30.8/nm 2 with respect to the surface area of silica. The operation yielded 1576.2 g of aqueous sol. The aqueous silica sol of Example 3 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method.
- silane bond content The silane bond content of the aqueous silica sol of Example 3 was evaluated.
- a salt resistance test sample was prepared according to (Preparation of salt resistance test sample), and after holding at 100° C. for 10 hours according to (Evaluation of high temperature salt resistance-1), the sample was taken out and evaluated for high temperature salt resistance.
- Example 4 For silica in the aqueous silica sol (Snowtex (trade name) ST-O manufactured by Nissan Chemical Industries, average particle size 11.7 nm by BET method, average particle size 18.6 nm by DLS method), Same as Example 1 except that 864.3 g of 3-glycidoxypropyltrimethoxysilane (Dynasylan GLYMO manufactured by Evonik) was added so that the number of silane compounds was 46.2/nm 2 with respect to the surface area of silica. The operation yielded 1864.3 g of aqueous sol. The aqueous silica sol of Example 4 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method.
- silane bond content The silane bond content of the aqueous silica sol of Example 4 was evaluated.
- a salt resistance test sample was prepared according to (Preparation of salt resistance test sample), and after holding at 100° C. for 10 hours according to (Evaluation of high temperature salt resistance-1), the sample was taken out and evaluated for high temperature salt resistance.
- Example 5 For silica in the aqueous silica sol (Nissan Chemical Co., Ltd. Snowtex (trade name) ST-O, average particle size 11.7 nm by BET method, average particle size 18.6 nm by DLS method), The same operation as in Example 1 was performed except that 5.4 g of methyltrimethoxysilane (KBM-13 manufactured by Shin-Etsu Chemical Co., Ltd.) was added so that the number of silane compounds was 0.5/nm 2 with respect to the surface area of silica. 1005.4 g of aqueous sol were obtained. The aqueous silica sol of Example 5 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method.
- KBM-13 methyltrimethoxysilane
- silane bond content The silane bond content of the aqueous silica sol of Example 5 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20°C for 10 hours according to (Evaluation of room temperature salt tolerance).
- Example 6 For silica in the aqueous silica sol (Nissan Chemical Co., Ltd. Snowtex (trade name) ST-O, average particle size 11.7 nm by BET method, average particle size 18.6 nm by DLS method), Aqueous solution was prepared in the same manner as in Example 1, except that 4.8 g of dimethyldimethoxysilane (KBM-22 manufactured by Shin-Etsu Chemical Co., Ltd.) was added so that the number of silane compounds was 0.5/nm 2 with respect to the surface area of silica. 1004.8 g of sol were obtained. The aqueous silica sol of Example 6 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method.
- KBM-22 dimethyldimethoxysilane
- silane bond content The silane bond content of the aqueous silica sol of Example 6 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20°C for 10 hours according to (Evaluation of room temperature salt tolerance).
- Example 7 For silica in the aqueous silica sol (Nissan Chemical Co., Ltd. Snowtex (trade name) ST-O, average particle size 11.7 nm by BET method, average particle size 18.6 nm by DLS method), 9.8 g of 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane (KBM-303 manufactured by Shin-Etsu Chemical Co., Ltd.) was added so that the number of silane compounds was 0.5/nm 2 with respect to the surface area of silica. 1009.8 g of aqueous sol was obtained by the same operation as in Example 1 except for the above.
- KBM-303 manufactured by Shin-Etsu Chemical Co., Ltd.
- the aqueous silica sol of Example 7 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Example 7 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20°C for 10 hours according to (Evaluation of room temperature salt tolerance).
- Example 8 For silica in the aqueous silica sol (Nissan Chemical Co., Ltd. Snowtex (trade name) ST-O, average particle size 11.7 nm by BET method, average particle size 18.6 nm by DLS method), Same as Example 1 except that 8.6 g of trifluoropropyltrimethoxysilane (KBM-7103 manufactured by Shin-Etsu Chemical Co., Ltd.) was added so that the number of silane compounds was 0.5/nm 2 with respect to the surface area of silica. The operation yielded 1008.6 g of aqueous sol.
- KBM-7103 manufactured by Shin-Etsu Chemical Co., Ltd.
- the aqueous silica sol of Example 8 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Example 8 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20°C for 10 hours according to (Evaluation of room temperature salt tolerance).
- Example 9 For silica in the aqueous silica sol (Nissan Chemical Co., Ltd. Snowtex (trade name) ST-O, average particle size 11.7 nm by BET method, average particle size 18.6 nm by DLS method), 114.1 g of lactic acid and 140.2 g of aminopropyltriethoxysilane (KBE-903 manufactured by Shin-Etsu Chemical Co., Ltd.) were mixed in advance such that the number of silane compounds per surface area of silica was 8.0/nm 2 . 1254.3 g of aqueous sol was obtained in the same manner as in Example 1 except that the liquid stirred for 30 minutes was added.
- the aqueous silica sol of Example 9 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Example 9 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20°C for 10 hours according to (Evaluation of room temperature salt tolerance).
- Example 10 Aqueous silica sol (Nissan Chemical Co., Ltd. Snowtex (trade name) ST-O, average particle size 11.7 nm by BET method, average particle size 18.6 nm by DLS method), 114.1 g of lactic acid and stirred with a magnetic stirrer, aminopropyltrimethoxysilane (KBM-903 manufactured by Shin-Etsu Chemical Co., Ltd.) so that the silane compound is 8.0/nm 2 with respect to the surface area of silica in the aqueous silica sol. 1227.7 g of aqueous sol was obtained by the same operation as in Example 1, except that 113.6 g of water sol was added.
- KBM-903 aminopropyltrimethoxysilane
- the aqueous silica sol of Example 10 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Example 10 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20°C for 10 hours according to (Evaluation of room temperature salt tolerance).
- Example 11 Aqueous silica sol (Nissan Chemical Co., Ltd. Snowtex (trade name) ST-O, average particle size 11.7 nm by BET method, average particle size 18.6 nm by DLS method), lactic acid 228.2 g was added and stirred with a magnetic stirrer, and aminoethylaminopropyltrimethoxysilane ( KBM- 1369.1 g of aqueous sol was obtained by the same procedure as in Example 1, except that 140.9 g of 603) was added.
- the aqueous silica sol of Example 11 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method.
- silane bond content The silane bond content of the aqueous silica sol of Example 11 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample), and after holding at 120°C for 10 hours according to (Evaluation of high temperature salt tolerance-2), the sample was taken out and the room temperature salt tolerance was evaluated.
- Example 12 Aqueous silica sol (Nissan Chemical Co., Ltd. Snowtex (trade name) ST-O, average particle size 11.7 nm by BET method, average particle size 18.6 nm by DLS method), lactic acid 228.2 g was added and stirred with a magnetic stirrer, and aminoethylaminopropylmethyldimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd. KBM- 1358.9 g of aqueous sol was obtained by the same procedure as in Example 1, except that 130.7 g of 602) was added.
- the aqueous silica sol of Example 12 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Example 12 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample), and after holding at 120°C for 10 hours according to (Evaluation of high temperature salt tolerance-2), the sample was taken out and the room temperature salt tolerance was evaluated.
- Example 13 Aqueous silica sol (Nissan Chemical Co., Ltd. Snowtex (trade name) ST-OXS, silica concentration 10.5% by mass, average particle size 5.0 nm by BET method, average particle size 8.1 nm by DLS method) in 179.4 g of 3-glycidoxypropyltrimethoxysilane (Dynasylan GLYMO manufactured by Evonik) was added to silica so that the number of silane compounds per surface area of silica in the aqueous silica sol was 8.0/nm 2 .
- Dynasylan GLYMO manufactured by Evonik 3-glycidoxypropyltrimethoxysilane
- aqueous sol 1179.4 g was obtained by the same operation as in Example 1 except that The aqueous silica sol of Example 13 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Example 13 was evaluated.
- a salt resistance test sample was prepared according to (Preparation of salt resistance test sample), and after holding at 100° C. for 10 hours according to (Evaluation of high temperature salt resistance-1), the sample was taken out and evaluated for high temperature salt resistance.
- Example 14 Aqueous silica sol (Snowtex (trade name) ST-OL manufactured by Nissan Chemical Industries, Ltd., silica concentration 20.5% by mass, average particle size 45.0 nm by BET method, average particle size 78.0 nm by DLS method) in 159.0 g of 3-glycidoxypropyltrimethoxysilane (Dynasylan GLYMO manufactured by Evonik) was added to silica so that the number of silane compounds per surface area of silica in the aqueous silica sol was 32.7/nm 2 .
- aqueous sol 1159.0 g was obtained by the same operation as in Example 1 except that The aqueous silica sol of Example 14 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Example 14 was evaluated.
- a salt resistance test sample was prepared according to (Preparation of salt resistance test sample), and after holding at 100° C. for 10 hours according to (Evaluation of high temperature salt resistance-1), the sample was taken out and evaluated for high temperature salt resistance.
- aqueous silica sol (Snowtex (trade name) ST-O manufactured by Nissan Chemical Industries, Ltd.) was used as an aqueous silica sol of Comparative Example 1.
- the pH, electrical conductivity, viscosity, and DLS average particle size of the aqueous silica sol (silica particles) of the aqueous silica sol of Comparative Example 1 were evaluated.
- the silane bond content of the aqueous silica sol of Comparative Example 1 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20°C for 10 hours according to (Evaluation of room temperature salt tolerance).
- Example 2 By the same operation as in Example 2, 1149.7 g of aqueous silica sol was obtained. 800 g of pure water was added to 200 g of the aqueous silica sol of Example 2, followed by ultrafiltration until 200 g was discharged. 200 g of silica sol were obtained. The aqueous silica sol of Comparative Example 2 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Comparative Example 2 was evaluated. A salt resistance test sample was prepared according to (Preparation of salt resistance test sample), and after holding at 100° C. for 10 hours according to (Evaluation of high temperature salt resistance-1), the sample was taken out and evaluated for high temperature salt resistance.
- Example 3 For silica in the aqueous silica sol (Nissan Chemical Co., Ltd. Snowtex (trade name) ST-O, average particle size 11.7 nm by BET method, average particle size 18.6 nm by DLS method), The same operation as in Example 1 was performed except that 35.1 g of methyltrimethoxysilane (KBM-13 manufactured by Shin-Etsu Chemical Co., Ltd.) was added so that the number of silane compounds was 2.0/nm 2 with respect to the surface area of silica. 1035.1 g of aqueous sol were obtained. The aqueous silica sol of Comparative Example 3 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method.
- KBM-13 methyltrimethoxysilane
- silane bond content The silane bond content of the aqueous silica sol of Comparative Example 3 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20°C for 10 hours according to (Evaluation of room temperature salt tolerance).
- aqueous silica sol of Comparative Example 4 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Comparative Example 4 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20°C for 10 hours according to (Evaluation of room temperature salt tolerance).
- Example 5 By the same operation as in Example 9, 1254.3 g of aqueous silica sol was obtained. 800 g of pure water was added to 200 g of the aqueous silica sol of Example 9, followed by ultrafiltration until 200 g was discharged. 200 g of silica sol were obtained. The aqueous silica sol of Comparative Example 5 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Comparative Example 5 was evaluated. A salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20°C for 10 hours according to (Evaluation of room temperature salt tolerance).
- Example 6 By the same operation as in Example 10, 1227.7 g of aqueous silica sol was obtained. 800 g of pure water was added to 200 g of the aqueous silica sol of Example 10, followed by ultrafiltration until 200 g was discharged. 200 g of silica sol were obtained. The aqueous silica sol of Comparative Example 6 was evaluated for pH, electrical conductivity, viscosity, and average particle size by the DLS method. (Evaluation of silane bond content) The silane bond content of the aqueous silica sol of Comparative Example 6 was evaluated.
- aqueous silica sol (Snowtex (trade name) ST-OXS manufactured by Nissan Chemical Industries, Ltd.) was used as an aqueous silica sol of Comparative Example 7.
- the pH, electrical conductivity, viscosity, and DLS average particle size of the aqueous silica sol (silica particles) of the aqueous silica sol of Comparative Example 7 were evaluated.
- evaluation of silane bond content The silane bond content of the aqueous silica sol of Comparative Example 7 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20°C for 10 hours according to (Evaluation of room temperature salt tolerance).
- aqueous silica sol (Snowtex (trade name) ST-OL manufactured by Nissan Chemical Industries, Ltd.) was used as an aqueous silica sol of Comparative Example 8.
- the pH, electrical conductivity, viscosity, and DLS average particle size of the aqueous silica sol (silica particles) of the aqueous silica sol of Comparative Example 8 were evaluated.
- evaluation of silane bond content The silane bond content of the aqueous silica sol of Comparative Example 8 was evaluated.
- a salt tolerance test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20°C for 10 hours according to (Evaluation of room temperature salt tolerance).
- a brine test sample was prepared according to (Preparation of salt tolerance test sample) and kept at 20° C. for 10 hours according to (Evaluation of room temperature salt tolerance), then the sample was taken out and evaluated for room temperature salt tolerance.
- Tables 1 to 6 show the compositions (component concentrations) and salt tolerance test results of the aqueous silica sols of Examples, and Tables 7 and 8 show the compositions (component concentrations) and salt tolerance test results of the aqueous silica sols of Comparative Examples.
- the types (codes) of the silane compounds in the table are as follows.
- ⁇ LTAC Lauryltrimethylammonium chloride “trade name Cathiogen TML”, active ingredient 30.0%, manufactured by Daiichi Kogyo Seiyaku Co., Ltd.
- ⁇ GPS 3-glycidoxypropyltrimethoxysilane “trade name Dynasylan GLYMO”, Evonik ( Co., Ltd. MTMS: Methyltrimethoxysilane "trade name KBM-13", Shin-Etsu Chemical Co., Ltd.
- DMS Dimethyldimethoxysilane "trade name KBM-22", Shin-Etsu Chemical Co., Ltd.
- EPCHS ( 3,4-epoxycyclohexyl)ethyltrimethoxysilane "trade name KBM-303", manufactured by Shin-Etsu Chemical Co., Ltd.
- TFPS Trifluoropropyltrimethoxysilane "trade name KBM-7103", manufactured by Shin-Etsu Chemical Co., Ltd.
- APTES 3-aminopropyltriethoxysilane “trade name KBE-903”, manufactured by Shin-Etsu Chemical Co., Ltd.
- APTMS 3-aminopropyltrimethoxysilane “trade name KBM-903”, Shin-Etsu Chemical ( Co., Ltd.
- AEAPTMS N-2-(aminoethyl)-3-aminopropyltrimethoxysilane “trade name KBM-603”, Shin-Etsu Chemical Co., Ltd.
- AEAPMDMS N-2-(aminoethyl)-3 -Aminopropylmethyldimethoxysilane "trade name KBM-602", manufactured by Shin-Etsu Chemical Co., Ltd.
- the aqueous silica sol of the present invention can be expected to have an effect of improving the stability of silica particles depending on the form of the free silane contained.
- the form of free silane was obtained by putting 6 g of aqueous silica sol into a 15 ml centrifugal filter unit (trade name: Amicon Ultra 15 (Merck Co., Ltd.)), centrifuging at a centrifugal force of 2770 G for 20 minutes, and discharging free silane at the bottom of the unit.
- a liquid containing is analyzed by Si-NMR, and analyzed by calculating the content ratio of the T structure or D structure.
- the T structure was measured for Examples 2, 9, 10, 13 and 15, and Table 9 shows the measurement results.
- the D structure was measured for Example 12, and the measurement results are shown in Table 10.
- a part of the silane compound is bound to the surface of the silica particles, so that an effect of improving the stability of the silica particles can be expected.
- the form of bound silane was analyzed by analyzing the liquid obtained in (removal of free silane) by Si-NMR and calculating the ratio of the Q structure.
- the Q structure was measured for Examples 2, 5, 6, 7, 8, 9, 10, 11, 12, 13 and 14 and Comparative Examples 1, 7 and 8, and Table 11 shows the measurement results.
- the silanol group on the surface of the silica particles is replaced with a silane compound having a functional group, so an effect of improving the stability of the silica particles can be expected.
- the value obtained by dividing the specific surface area calculated from the amount of water vapor adsorption to the silica particles by the specific surface area calculated from the amount of nitrogen gas adsorption, (specific surface area calculated from the amount of water vapor adsorption) / (specific surface area calculated from the amount of nitrogen gas adsorption) is It shows that the silanol groups on the silica particle surface are replaced with a silane compound having a functional group.
- the amount of water vapor adsorption and the amount of nitrogen gas adsorption were analyzed according to the procedures of (measurement of water vapor adsorption amount) and (measurement of nitrogen gas adsorption amount).
- the water vapor adsorption amount and nitrogen gas adsorption amount were measured for Examples 1, 2, 5, 7, 8, 13, 14 and Comparative Examples 1, 3, 7, and 8, and (specific surface area calculated from the water vapor adsorption amount) / ( Table 12 shows the measurement results of the value obtained by dividing the value after the silane compound treatment by the value before the silane compound treatment (specific surface area calculated from the nitrogen gas adsorption amount).
- the present invention can provide a dispersion of inorganic oxide particles, particularly a dispersion of silica particles, which has high dispersion stability even under high temperature and high salinity.
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Abstract
Description
例えば親水性無機酸化物ゾルにケイ素原子に結合したアルコキシド基を2個以上有するケイ素アルコキシド、又は1個以上のケイ素原子に結合したヒドロキシル基と1個以上のケイ素原子に結合したアルコキシド基を有するケイ素アルコキシドを添加して表面処理する工程、炭素数3~12の1級アルコールの共存下に、分散媒を非アルコール系有機溶媒に置換する工程を含む有機溶媒分散シリカゾルの製造方法が開示されている(特許文献1参照)。
屈折率が1.65以上の金属酸化物粒子の表面に第一有機珪素化合物が結合した表面処理粒子と、前記金属酸化物粒子には結合していない第二有機珪素化合物と、有機溶媒とを含み、(第一有機珪素化合物)/(第二有機珪素化合物)が0.1~9.0である表面処理粒子の分散液が開示されている(特許文献2参照)。
第2観点として、シリカ含有無機酸化物粒子が、平均粒子径5nm~100nmのシリカ粒子、又はシリカとアルミナ、酸化スズ、酸化ジルコニウム、酸化チタン、及び酸化アンチモンからなる群から選ばれる少なくとも1種の無機酸化物粒子であって、該シリカ含有無機酸化物粒子はシリカ粒子、シリカとその他の金属酸化物との複合金属酸化物、又はシリカとその他の金属酸化物とのコアシェル構造を有する複合酸化物粒子である第1観点に記載の分散体、
第3観点として、加水分解性シランが式(1)乃至式(3):
式(2)及び式(3)中、R5及びR7は炭素原子数1~3のアルキル基で且つSi-C結合によりケイ素原子と結合しているものであり、R6及びR7はアルコキシ基、アシルオキシ基、又はハロゲン基を示し、Yはアルキレン基、NH基、又は酸素原子を示し、該R5及びR7は少なくとも一つが炭素原子数1~3のアルキル基であってSi-C結合によりケイ素原子と結合しているものであり、bは1~3の整数であり、cは0又は1の整数であり、dは1~3の整数であり、eは1~3の整数である。)
からなる群より選ばれる少なくとも1種のシラン化合物である第1観点又は第2観点に記載の分散体、
第4観点として、分散媒中の加水分解性シランの加水分解物中には、式(1)のaが1の整数であるシラン化合物の加水分解化合物がSi-NMR観測でケイ素原子間の架橋酸素の割合がケイ素原子1個に対して0/2個、1/2個、2/2個、及び3/2個を示すT0、T1、T2、及びT3構造について、(T2+T3)/(T0+T1)が特定の値(2~15)、又は(T1+T2+T3)/(T0)比が特定の値(5~100)であるシラン化合物を含んでいる第3観点に記載の分散体、
第5観点として、分散媒中の加水分解性シランの加水分解物中には、式(1)のaが2の整数であるシラン化合物の加水分解化合物がSi-NMR観測でケイ素原子間の架橋酸素の割合がケイ素原子1個に対して0/2個、1/2個、2/2個を示すD0、D1及びD2構造について、(D1+D2)/(D0)比が0.1~10、又は(D2)/(D0+D1)比が0.01~10であるシラン化合物を含んでいる第3観点に記載の分散体、
第6観点として、上記シリカ含有無機酸化物粒子への水蒸気吸着量を窒素ガス吸着量で割った値である(水蒸気吸着量から算出した比表面積)/(窒素ガス吸着量から算出した比表面積)がシラン化合物添加前のシリカ粒子に比較して0.15~0.95である第1観点乃至第5観点の何れか一つに記載の分散体、
第7観点として、下記(A)工程乃至(B)工程:
(A)工程:上記シリカ含有無機酸化物粒子の水性分散体を得る工程、
(B)工程:上記シリカ含有無機酸化物粒子の水性分散体にpH2.0~6.5で加水分解性シランを該粒子表面積当たりの該シランの個数の割合として、0.3~100個/nm2の範囲で添加して、室温で攪拌後に50~99℃以内の温度に昇温し、室温の攪拌時間に対して昇温後の攪拌時間が1~7倍以内の時間で行われる工程、を含む第1観点乃至第6観点のいずれか一つに記載の分散体の製造方法、及び
第8観点として、(B)工程の後に更に(C)工程:
(C)工程:(B)工程で得られた分散体の水性媒体を有機溶媒に置換する工程、を含む第7観点に記載の有機溶媒を分散媒とする分散体の製造方法である。
ところで、シリカ粒子の分散液に添加した官能基を有するシラン化合物は、シリカ粒子表面に結合した官能基を有するシラン(結合シラン)と、シリカ粒子に結合せずに分散媒中に溶解している官能基を有するシランとが存在する(以下フリーシランと呼ぶ。)。分散媒中の官能基を有するシランは、シリカ粒子間に存在し、同一官能基を有するために結合シランとフリーシラン間でも斥力を生じ、シリカ粒子は粒子間だけでなく、それらシランモノマーとの間でも反発力が生じ分散安定性の高い分散液となる。
また、分散媒が有機溶媒系ではシリカ粒子はシラノールに基づく親水性を有し、有機溶媒の液性とは異なるため、シリカ粒子のシラノール基を、疎水性官能基を有するシランで表面処理する事で有機溶媒に相溶性の高いものとする。疎水性官能基を有するシランは粒子全体に渡り、上記官能基で修飾する事は難しく、シリカ粒子の疎水性官能基で修飾されていない部分は疎水性官能基を有するシランモノマーで相溶性を確保する事で有機溶媒へも分散性の高い分散液とする事ができる。
また、加水分解性シランの加水分解基が2個であるシランを用いる場合には、シラン化合物の加水分解化合物がSi-NMR観測でケイ素原子間の架橋酸素の割合がケイ素原子1個に対して0/2個、1/2個、2/2個を示すD0、D1及びD2構造について、(D1+D2)/(D0)比が特定の値(0.1~10)、又は(D2)/(D0+D1)比が特定の値(0.01~10)である事が好ましい。これらはどちらか一方を満たすことでも良いが、両方満たすことがより好ましい。
これらの結合シランとフリーシランを満たしているシリカ粒子は、Si-NMR観測でシリカ粒子のケイ素原子間の架橋酸素がケイ素原子1個に対して4/2個であるQ4が該シランの表面修飾前より増加しているものである。例えばそれらの増加比が1.01~1.5、又は1.01~1.15の範囲とする事ができる。
本発明の分散体は下記(A)工程乃至(B)工程:
(A)工程:上記シリカ含有無機酸化物粒子の水性分散体を得る工程、
(B)工程:上記シリカ含有無機酸化物粒子の水性分散体にpH2.0~6.5で加水分解性シランを該粒子表面積当たりの該シランの個数の割合として、0.3~100個/nm2の範囲で添加して、室温で攪拌後に50~99℃以内の温度に昇温し、室温の攪拌時間に対して昇温後の攪拌時間が1~7倍以内の時間で行われる工程、を含むものである。
(A)工程で得られるシリカ含有無機酸化物粒子の水性分散体は、シリカ含有無機酸化物粒子が水性媒体中で例えば1~50質量%濃度の分散液として得られる。例えば水性シリカゾルを例とすれば、水性シリカゾルは水ガラスを出発原料として、a)水ガラスを陽イオン交換して活性珪酸を得る工程、b)活性珪酸を加熱してシリカ粒子を得る工程からなる。a)工程では活性珪酸を高純度化するために鉱酸(例えば、塩酸、硝酸、又は硫酸)を添加して、シリカ以外の金属不純物を溶出させた陽イオン交換及び陰イオン交換で金属不純物や不要なアニオンを除去した活性珪酸を用いる事ができる。b)工程では活性珪酸にアルカリ成分(例えばNaOH、KOH)を添加してシリカ粒子の粒子成長を行う。シリカ粒子の粒子成長を促進させるために、a)工程で得られた活性珪酸にアルカリを添加したシード液とフィード液を準備して、シード液を加熱しながらフィード液を供給してシリカ粒子径を増大させることによって任意の粒子径とする水性シリカゾルを得る事ができる。
(B)工程では(A)工程で得られた上記シリカ含有無機酸化物粒子の水性分散体のpHを2.0~6.5に調整して加水分解性シランを添加する事ができる。pH調整には酸又はアルカリを用いる事ができる。
アルカリとしてはアンモニア、アミン、水酸化第4級アンモニウム、水酸化アルカリ金属、アルカリ金属アルコキシド、及び脂肪族カルボン酸アルカリ金属塩等が挙げられる。
アミンとしては第1級アミン、第2級アミン、及び第3級アミンが挙げられる。
第1級アミンとしてはメチルアミン、エチルアミン、n-プロピルアミン、i-プロピルアミン等が挙げられる。
第2級アミンとしては例えばエチルnプロピルアミン、エチルiプロピルアミン、ジプロピルアミン、ジi-プロピルアミン、エチルブチルアミン、nプロピルブチルアミン、ジブチルアミン、エチルペンチルアミン、nプロピルペンチルアミン、iプロピルペンチルアミン、ジペンチルアミン、エチルオクチルアミン、iプロピルオクチルアミン、ブチルオクチルアミン、ジオクチルアミン等が挙げられる。
上記第3級アミンとしては例えばトリエチルアミン、エチルジnプロピルアミン、ジエチルnプロピルアミン、トリnプロピルアミン、トリiプロピルアミン、エチルジブチルアミン、ジエチルブチルアミン、iプロピルジブチルアミン、ジiプロピルブチルアミン、トリブチルアミン、エチルジペンチルアミン、ジエチルペンチルアミン、トリペンチルアミン、メチルジオクチルアミン、ジメチルオクチルアミン、エチルジオクチルアミン、ジエチルオクチルアミン、トリオクチルアミン等が挙げられる。
水酸化第4級アンモニウムとしては、総炭素原子数が4~40の水酸化テトラアルキルアンモニウムが好ましい。例えば水酸化テトラメチルアンモニウム、水酸化テトラエチルアンモニウム、水酸化テトラnプロピルアンモニウム、水酸化テトラiプロピルアンモニウム、水酸化テトラブチルアンモニウム、水酸化エチルトリメチルアンモニウム等が挙げられる。
水酸化アルカリ金属としては、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリム等が挙げられる。
アルカリ金属アルコキシドとしては、ナトリウムメトキシド、ナトリウムエトキシド、カリウムメトキシド、カリウムエトキシド等が挙げられる。
脂肪族カルボン酸アルカリ金属塩としては、炭素原子数10~30の飽和脂肪族カルボン酸アルカリ金属塩、不飽和脂肪族カルボン酸アルカリ金属塩が挙げられる。アルカリ金属はナトリウム、カリウムが挙げられる。飽和脂肪族カルボン酸アルカリ金属塩としてはラウリン酸アルカリ金属塩、ミリスチン酸アルカリ金属塩、パルミチン酸アルカリ金属塩、ステアリン酸アルカリ金属塩等が挙げられる。
不飽和脂肪族カルボン酸アルカリ金属塩としてはオレイン酸アルカリ金属塩、リノール酸アルカリ金属塩、リノレン酸アルカリ金属塩等が挙げられる。
式(1)中、R3はアルキル基、ハロゲン化アルキル基、アルケニル基、又はエポキシ基、(メタ)アクリロイル基、メルカプト基、アミノ基、ウレイド基、もしくはシアノ基を有する有機基で且つSi-C結合によりケイ素原子と結合しているものであって、R4はアルコキシ基、アシルオキシ基、又はハロゲン基を示し、aは1~3の整数を示し、
式(2)及び式(3)中、R5及びR7は炭素原子数1~3のアルキル基で且つSi-C結合によりケイ素原子と結合しているものであり、R6及びR7はアルコキシ基、アシルオキシ基、又はハロゲン基を示し、Yはアルキレン基、NH基、又は酸素原子を示し、該R5及びR7は少なくとも一つが炭素原子数1~3のアルキル基であってSi-C結合によりケイ素原子と結合しているものであり、bは1~3の整数であり、cは0又は1の整数であり、dは1~3の整数であり、eは1~3の整数である。
また、アルキレン基は上述のアルキル基から誘導されるアルキレン基を上げる事ができる。
上記ハロゲン基としてはフッ素、塩素、臭素、ヨウ素等が挙げられる。
上記(メタ)アクリロイル基とは、アクリロイル基とメタクリロイル基の双方をあらわす。
上記式(2)及び式(3)はトリメチルシリル基をシリカ粒子の表面に形成できる化合物が好ましい。
それら化合物としては以下に例示することができる。
シリカ粒子の表面にヒドロキシル基、例えばシリカ粒子であればシラノール基と上記シラン化合物が反応してシロキサン結合によりシリカ粒子の表面に上記シラン化合物を被覆する工程である。
それらに対応するシラン化合物としてアミノプロピルトリメトキシシラン、アミノプロピルトリエトキシシラン、アミノエチルアミノプロピルトリメトキシシラン、アミノエチルアミノプロピルトリエトキシシラン、アミノエチルアミノプロピルメチルジメトキシシラン、アミノエチルアミノプロピルメチルジエトキシシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、グリシドキシプロピルトリメトキシシラン、グリシドキシプロピルトリエトキシシラン、エポキシシクロヘキシルエチルトリメトキシシラン、エポキシシクロヘキシルエチルトリエトキシシラン、トリフルオロプロピルトリメトキシシラン、トリフルオロプロピルトリエトキシシラン等が挙げられる。
上記シラン化合物の加水分解には水が必要であるが、水性溶媒のゾルであればそれら水性溶媒が用いられる。
また、加水分解は触媒を用いて行うことも、触媒なしで行う事もできる。
触媒なしで行う場合はシリカ粒子表面が触媒となり、pH2.0~6.5のシリカゾルを用いる事ができる。
また、分散媒中の加水分解性シランの加水分解物中には、式(1)のaが1の整数であるシラン化合物の加水分解化合物がSi-NMR観測でケイ素原子間の架橋酸素の割合がケイ素原子1個に対して0/2個、1/2個、2/2個、及び3/2個を示すT0、T1、T2、及びT3構造について、(T2+T3)/(T0+T1)比が2~10、又は(T1+T2+T3)/(T0)比が5~100であるシラン化合物を含んでいる事が特徴である。これらはどちらか一方を満たすことでも良いが、両方満たすことがより好ましい。
また、分散媒中の加水分解性シランの加水分解物中には、式(1)のaが2の整数であるシラン化合物の加水分解化合物がSi-NMR観測でケイ素原子間の架橋酸素の割合がケイ素原子1個に対して0/2個、1/2個、2/2個を示すD0、D1及びD2構造について、(D1+D2)/(D0)比が0.1~10、又は(D2)/(D0+D1)比が0.01~10であるシラン化合物を含んでいる事が特徴である。これらはどちらか一方を満たすことでも良いが、両方満たすことがより好ましい。
(C)工程:(B)工程で得られた分散体の水性媒体を有機溶媒に置換する工程、を含み有機溶媒を分散媒とする分散体が得られる。
水性シリカゾルの分析(pH値、電気伝導率、粘度、DLS平均粒子径、シラン結合量)、該水性シリカゾルを用いて調製したサンプルの室温耐塩性試験後又は高温耐塩性試験後のサンプルの分析は、以下の装置を用いて行なった。
・DLS平均粒子径(動的光散乱法による平均粒子径):動的光散乱法粒子径測定装置 ゼーターサイザー ナノ(スペクトリス(株)マルバーン事業部製)を用いた。
・pH:pHメーター(東亞ディーケーケー(株)製)を用いた。
・電気伝導率:電気伝導率計(東亞ディーケーケー(株)製)を用いた。
・粘度:BMII型粘度計((株)東京計器製)を用いた。
・シラン結合量:有機微量元素分析装置 CHNS/Oアナライザ((株)パーキンエルマージャパン)または、TN測定装置 TN―2100V Total Nitrogen Analyzer((株)三菱化学アナリテック)を用いた。
・Si-NMR:ADVANCED NEO(Bruker(株)製)を用いた。
・窒素ガス吸着量:MONOSORB(Quantachrome INSTRUMENTS製)を用いた。
・水蒸気吸着量:Q5000SA 吸着分析器(ティー・エイ・インスツルメント・ジャパン(株)製)を用いた。
(シリカ粒子に結合していないシラン(フリーシラン)の除去)
15mlの遠心式フィルターユニットである商品名アミコンウルトラー15(メルク(株))に水性シリカゾル2gと純水4gを投入し、2770Gの遠心力で20分遠心処理した。遠心後、ユニット下部に排出された液体を廃棄し、廃棄した液体と同質量の純水をフィルター上に濃縮された水性シリカゾルに投入して再分散させた後、再び2770Gの遠心力で20分遠心処理した。上記の作業を合計4回繰り返して、フリーシランを除去した水性シリカゾルを得た。
フリーシランを除去した水性シリカゾルを100℃で加熱乾燥させ、乳鉢で粉砕することでシリカゾル粉末を得た。得られたシリカゾル粉末の炭素量は有機微量元素金属分析装置にて測定し、得られた炭素量から次式にてシラン結合量を算出した。
表面処理量=(Cm÷Cn÷Sc×A)/(Ct×Cs)
ただしCmは炭素含有量、Cnは炭素分子量、Scはシラン中の炭素原子数、Aはアボガドロ数、Ctはシリカ粒子質量、Csはシリカ比表面積である。
炭素量の測定で得られたシラン結合量の単位は(個/nm2)である。
フリーシランを除去した水性シリカゾルの窒素量はTN測定装置にて測定し、得られた窒素量から次式にてシラン結合量を算出した。
表面処理量=(Nm÷Nn÷Sn×A)/(Ct×Cs)
ただしNmは窒素含有量、Nnは窒素分子量、Snはシラン中の窒素原子数、Aはアボガドロ数、Ctはシリカ粒子質量、Csはシリカ比表面積である。
窒素量の測定で得られたシラン結合量の単位は(個/nm2)である。
上記フリーシランの除去で得られた水性シリカゾルを、80℃ホットプレートで乾燥して得られたシリカゲルを乳鉢で粉砕した後、さらに150℃で3時間乾燥してシリカ乾燥粉末を得た。BET理論に基づいてこの粉末の水蒸気吸着法による比表面積(m2/g)を測定した(水蒸気BET法)。
上記フリーシランの除去で得られた水性シリカゾルを、80℃ホットプレートで乾燥して得られたシリカゲルを乳鉢で粉砕した後、さらに150℃で3時間乾燥してシリカ乾燥粉末を得た。BET理論に基づいてこの粉末の窒素吸着法による比表面積(m2/g)を測定した(BET法、即ち、窒素ガスBET法)。
(耐塩性テストサンプルの調製)
200mlのスチロール瓶に撹拌子を投入後、実施例又は比較例で製造した各シリカゾル3.6gを投入しマグネットスターラーで撹拌した。マグネットスターラーで撹拌しながら、純水46.4gと塩濃度6質量%のブライン溶液100gを投入し、1時間撹拌した。これを、4質量%の塩濃度下で、前記シリカゾルをシリカ濃度0.5質量%となる濃度とした際の、耐熱性及び耐塩性を評価する耐塩性テストサンプルとした。得られた耐塩性テストサンプルのpH、電気伝導率、サンプル中の水性シリカゾル(シリカ粒子)のDLS平均粒子径を評価した。
200mlのスチロール製の密閉できる容器に、前記耐塩性テストサンプル150gを入れ、密閉後、スチロール容器を20℃で静置し、所定時間保持した後、耐塩性テストサンプルの外観、pH、電気伝導率、サンプル中の水性シリカゾル(シリカ粒子)のDLS平均粒子径を評価した。
なお耐塩性の評価は、20℃で所定時間保持後(10時間後)、サンプル中の水性シリカゾル(シリカ粒子)のDLS平均粒子径の測定結果に基づく耐塩性の判定(下記耐塩性の判定参照)並びに外観の評価により行った。
A:耐塩性試験後のDLS平均粒子径/試験前のDLS平均粒子径の比が1.1以下。
B:耐塩性試験後のDLS平均粒子径/試験前のDLS平均粒子径の比が1.2~1.5。
C:耐塩性試験後のDLS平均粒子径/試験前のDLS平均粒子径の比が1.6~2.4。
D:耐塩性試験後のDLS平均粒子径/試験前のDLS平均粒子径の比が2.5~20.0。
E:耐塩性試験後のDLS平均粒子径/試験前のDLS平均粒子径の比が20.1以上または白濁し固液分離。
耐塩性試験結果はAが最も好ましく、B、C、D、Eの順で好ましい結果であることを示す。
120mlのテフロン(登録商標)製の密閉できる容器に、前記耐塩性テストサンプル65gを入れ、密閉後、テフロン(登録商標)容器を100℃の乾燥機内に置き、100℃で所定時間保持(10時間)した後、耐塩性テストサンプルの外観、pH、電気伝導率、サンプル中の水性シリカゾル(シリカ粒子)のDLS平均粒子径を評価した。上記室温耐塩性評価の耐塩性の判定と同じ判定基準により、高温耐塩性の判定を行った。
乾燥機の温度を120℃とし、保持時間を10時間とした以外は、上記(高温耐塩性評価-1)と同じ操作により、高温耐塩性の判定を行った。
(実施例1)
2000mlのガラス製ナスフラスコに水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、シリカ濃度は20.5質量%、BET法による平均粒子径11.7nm、DLS法による平均粒子径18.6nm)1000gとマグネット撹拌子を投入した後、マグネットスターラーで撹拌しながら、水性シリカゾル中のシリカの表面積に対してシラン化合物が0.5個/nm2になるように3-グリシドキシプロピルトリメトキシシラン(エボニック社製Dynasylan GLYMO)を9.4g投入した。続いて、水道水を流した冷却管をナスフラスコの上部に設置し、還流しながら水性ゾルを60℃に昇温し、60℃で昇温時間を含めて4時間保持した後、冷却した。室温での攪拌時間に対して60℃昇温後の攪拌時間は1~7倍以内で行われた。室温まで冷却後、水性ゾルを取り出し、シラン化合物で表面処理された水性シリカゾルを含む水性ゾル1009.4gを得た。
実施例1の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例1の水性シリカゾルのシラン結合量を評価した。
〈耐塩性テストサンプルの調製〉に従い耐塩性テストサンプルを調製し、〈室温耐塩性評価〉に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、BET法による平均粒子径11.7nm、DLS法による平均粒子径18.6nm)中のシリカに対して、水性シリカゾル中のシリカの表面積に対してシラン化合物が8.0個/nm2になるように3-グリシドキシプロピルトリメトキシシラン(エボニック社製Dynasylan GLYMO)を149.7g投入した以外は、実施例1と同じ操作により水性ゾル1149.7gを得た。
実施例2の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例2の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(高温耐塩性評価―1)に従って100℃で10時間保持した後、サンプルを取り出し高温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、BET法による平均粒子径11.7nm、DLS法による平均粒子径18.6nm)中のシリカに対して、水性シリカゾル中のシリカの表面積に対してシラン化合物が30.8個/nm2になるように3-グリシドキシプロピルトリメトキシシラン(エボニック社製Dynasylan GLYMO)を576.2g投入した以外は、実施例1と同じ操作により水性ゾル1576.2gを得た。
実施例3の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例3の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(高温耐塩性評価―1)に従って100℃で10時間保持した後、サンプルを取り出し高温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、BET法による平均粒子径11.7nm、DLS法による平均粒子径18.6nm)中のシリカに対して、水性シリカゾル中のシリカの表面積に対してシラン化合物が46.2個/nm2になるように3-グリシドキシプロピルトリメトキシシラン(エボニック社製Dynasylan GLYMO)を864.3g投入した以外は、実施例1と同じ操作により水性ゾル1864.3gを得た。
実施例4の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例4の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(高温耐塩性評価―1)に従って100℃で10時間保持した後、サンプルを取り出し高温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、BET法による平均粒子径11.7nm、DLS法による平均粒子径18.6nm)中のシリカに対して、水性シリカゾル中のシリカの表面積に対してシラン化合物が0.5個/nm2になるようにメチルトリメトキシシラン(信越化学工業社製KBM-13)を5.4g投入した以外は、実施例1と同じ操作により水性ゾル1005.4gを得た。
実施例5の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例5の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、BET法による
平均粒子径11.7nm、DLS法による平均粒子径18.6nm)中のシリカに対して、水性シリカゾル中のシリカの表面積に対してシラン化合物が0.5個/nm2になるようにジメチルジメトキシシラン(信越化学工業社製KBM-22)を4.8g投入した以外は、実施例1と同じ操作により水性ゾル1004.8gを得た。
実施例6の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例6の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、BET法による平均粒子径11.7nm、DLS法による平均粒子径18.6nm)中のシリカに対して、水性シリカゾル中のシリカの表面積に対してシラン化合物が0.5個/nm2になるように2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン(信越化学工業社製KBM-303)を9.8g投入した以外は、実施例1と同じ操作により水性ゾル1009.8gを得た。
実施例7の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例7の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、BET法による平均粒子径11.7nm、DLS法による平均粒子径18.6nm)中のシリカに対して、水性シリカゾル中のシリカの表面積に対してシラン化合物が0.5個/nm2になるようにトリフルオロプロピルトリメトキシシラン(信越化学工業社製KBM-7103)を8.6g投入した以外は、実施例1と同じ操作により水性ゾル1008.6gを得た。
実施例8の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例8の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、BET法による平均粒子径11.7nm、DLS法による平均粒子径18.6nm)中のシリカに対して、水性シリカゾル中のシリカの表面積に対してシラン化合物が8.0個/nm2になるように、乳酸114.1gとアミノプロピルトリエトキシシラン(信越化学工業社製KBE-903)140.2gとを事前に混合して30分撹拌した液を投入した以外は、実施例1と同じ操作により水性ゾル1254.3gを得た。
実施例9の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例9の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、BET法による平均粒子径11.7nm、DLS法による平均粒子径18.6nm)中のシリカに対して、乳酸114.1gを投入してマグネットスターラーで撹拌し、水性シリカゾル中のシリカの表面積に対してシラン化合物が8.0個/nm2になるように、アミノプロピルトリメトキシシラン(信越化学工業社製KBM-903)113.6gを投入した以外は、実施例1と同じ操作により水性ゾル1227.7gを得た。
実施例10の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例10の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、BET法による平均粒子径11.7nm、DLS法による平均粒子径18.6nm)中のシリカに対して、乳酸228.2gを投入してマグネットスターラーで撹拌し、水性シリカゾル中のシリカの表面積に対してシラン化合物が8.0個/nm2になるように、アミノエチルアミノプロピルトリメトキシシラン(信越化学工業社製KBM-603)140.9gを投入した以外は、実施例1と同じ操作により水性ゾル1369.1gを得た。
実施例11の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例11の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(高温耐塩性評価―2)に従って120℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、BET法による平均粒子径11.7nm、DLS法による平均粒子径18.6nm)中のシリカに対して、乳酸228.2gを投入してマグネットスターラーで攪拌し、水性シリカゾル中のシリカの表面積に対してシラン化合物が8.0個/nm2になるように、アミノエチルアミノプロピルメチルジメトキシシラン(信越化学工業社製KBM-602)130.7gを投入した以外は、実施例1と同じ操作により水性ゾル1358.9gを得た。
実施例12の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例12の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(高温耐塩性評価―2)に従って120℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-OXS、シリカ濃度は10.5質量%、BET法による平均粒子径5.0nm、DLS法による平均粒子径8.1nm)中のシリカに対して、水性シリカゾル中のシリカの表面積に対してシラン化合物が8.0個/nm2になるように3-グリシドキシプロピルトリメトキシシラン(エボニック社製Dynasylan GLYMO)を179.4g投入した以外は、実施例1と同じ操作により水性ゾル1179.4gを得た。
実施例13の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例13の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(高温耐塩性評価―1)に従って100℃で10時間保持した後、サンプルを取り出し高温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-OL、シリカ濃度は20.5質量%、BET法による平均粒子径45.0nm、DLS法による平均粒子径78.0nm)中のシリカに対して、水性シリカゾル中のシリカの表面積に対してシラン化合物が32.7個/nm2になるように3-グリシドキシプロピルトリメトキシシラン(エボニック社製Dynasylan GLYMO)を159.0g投入した以外は、実施例1と同じ操作により水性ゾル1159.0gを得た。
実施例14の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って実施例14の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(高温耐塩性評価―1)に従って100℃で10時間保持した後、サンプルを取り出し高温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O)を、比較例1の水性シリカゾルとした。
比較例1の水性シリカゾルのpH、電気伝導率、粘度、水性シリカゾル(シリカ粒子)のDLS平均粒子径を評価した。
(シラン結合量の評価)に従って比較例1の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
実施例2と同じ操作により水性シリカゾル1149.7gを得た。
実施例2の水性シリカゾル200gに純水800gを投入し、限外濾過にて200g排出されるまで濾過し、再び純水800gを投入して同様の操作を4回繰り返し、フリーシランを除去した水性シリカゾル200gを得た。
比較例2の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って比較例2の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(高温耐塩性評価―1)に従って100℃で10時間保持した後、サンプルを取り出し高温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、BET法による平均粒子径11.7nm、DLS法による平均粒子径18.6nm)中のシリカに対して、水性シリカゾル中のシリカの表面積に対してシラン化合物が2.0個/nm2になるようにメチルトリメトキシシラン(信越化学工業社製KBM-13)を35.1g投入した以外は、実施例1と同じ操作により水性ゾル1035.1gを得た。
比較例3の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って比較例3の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
2000mlのガラス製ナスフラスコに水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-O、シリカ濃度=20.5質量%、BET法平均粒子径11.7nm、DLS平均粒子径18.6nm)1000gとマグネット撹拌子を投入した後、マグネットスターラーで撹拌しながら、水性シリカゾル中のシリカの表面積に対してシラン化合物が8.0個/nm2になるように3-グリシドキシプロピルトリメトキシシラン(エボニック社製Dynasylan GLYMO)を149.7g投入して水性ゾル1149.7gを得た。
比較例4の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って比較例4の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
実施例9と同じ操作により水性シリカゾル1254.3gを得た。
実施例9の水性シリカゾル200gに純水800gを投入し、限外濾過にて200g排出されるまで濾過し、再び純水800gを投入して同様の操作を4回繰り返し、フリーシランを除去した水性シリカゾル200gを得た。
比較例5の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って比較例5の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
実施例10と同じ操作により水性シリカゾル1227.7gを得た。
実施例10の水性シリカゾル200gに純水800gを投入し、限外濾過にて200g排出されるまで濾過し、再び純水800gを投入して同様の操作を4回繰り返し、フリーシランを除去した水性シリカゾル200gを得た。
比較例6の水性シリカゾルのpH、電気伝導率、粘度、DLS法による平均粒子径を評価した。
(シラン結合量の評価)に従って比較例6の水性シリカゾルのシラン結合量を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-OXS)を、比較例7の水性シリカゾルとした。
比較例7の水性シリカゾルのpH、電気伝導率、粘度、水性シリカゾル(シリカ粒子)のDLS平均粒子径を評価した。
(シラン結合量の評価)に従って比較例7の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
水性シリカゾル(日産化学(株)製スノーテックス(商品名)ST-OL)を、比較例8の水性シリカゾルとした。
比較例8の水性シリカゾルのpH、電気伝導率、粘度、水性シリカゾル(シリカ粒子)のDLS平均粒子径を評価した。
(シラン結合量の評価)に従って比較例8の水性シリカゾルのシラン結合量を評価した。
(耐塩性テストサンプルの調製)に従い耐塩性テストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
(耐塩性テストサンプルの調製)に従いブラインテストサンプルを調製し、(室温耐塩性評価)に従って20℃で10時間保持した後、サンプルを取り出し室温耐塩性を評価した。
表1~6に実施例の水性シリカゾルの組成(成分濃度)及び耐塩性試験結果を、表7及び表8に比較例の水性シリカゾルの組成(成分濃度)及び耐塩性試験結果を示す。
・LTAC:ラウリルトリメチルアンモニウムクロライド「商品名カチオーゲンTML」、有効成分30.0%、第一工業製薬(株)製
・GPS:3-グリシドキシプロピルトリメトキシシラン「商品名Dynasylan GLYMO」、Evonik(株)製
・MTMS:メチルトリメトキシシラン「商品名KBM-13」、信越化学工業(株)製
・DMS:ジメチルジメトキシシラン「商品名KBM-22」、信越化学工業(株)製
・EPCHS:(3,4―エポキシシクロヘキシル)エチルトリメトキシシラン「商品名KBM-303」、信越化学工業(株)製
・TFPS:トリフルオロプロピルトリメトキシシラン「商品名KBM-7103」、信越化学工業(株)製
・APTES:3-アミノプロピルトリエトキシシラン「商品名KBE-903」、信越化学工業(株)(株)製
・APTMS:3-アミノプロピルトリメトキシシラン「商品名KBM-903」、信越化学工業(株)製
・AEAPTMS:N-2-(アミノエチル)―3-アミノプロピルトリメトキシシラン「商品名KBM-603」、信越化学工業(株)製
・AEAPMDMS:N-2-(アミノエチル)―3-アミノプロピルメチルジメトキシシラン「商品名KBM-602」、信越化学工業(株)製
本発明の水性シリカゾルは、含有するフリーシランの形態によりシリカ粒子の安定性向上効果がより期待できる。フリーシランの形態は15mlの遠心式フィルターユニット 商品名アミコンウルトラー15(メルク(株))に水性シリカゾル6gを投入し、2770Gの遠心力で20分遠心処理し、ユニット下部に排出されたフリーシランを含む液体をSi-NMRにより分析し、T構造またはD構造の含有割合を算出することで解析した。
実施例2、9、10、13、15、についてT構造を測定し表9に測定結果を示した。実施例12についてD構造を測定し表10に測定結果を示した。
本発明の水性シリカゾルは、シラン化合物の一部がシリカ粒子の表面に結合することでシリカ粒子の安定性向上効果がより期待できる。結合シランの形態は(フリーシランの除去)で得られた液体をSi-NMRにより分析し、Q構造の割合を算出することで解析した。
実施例2、5、6、7、8、9、10、11、12、13、14および比較例1、7、8についてQ構造を測定し表11に測定結果を示した。
本発明の水性シリカゾルは、シリカ粒子表面がシラノール基から官能基を有するシラン化合物に置き換わっている事でシリカ粒子の安定性向上効果がより期待できる。シリカ粒子への水蒸気吸着量から算出した比表面積を窒素ガス吸着量から算出した比表面積で割った値、(水蒸気吸着量から算出した比表面積)/(窒素ガス吸着量から算出した比表面積)はシリカ粒子表面がシラノール基から官能基を有するシラン化合物に置き換わっていることを示す。(水蒸気吸着量の測定)および(窒素ガス吸着量の測定)の手順に沿って、水蒸気吸着量および窒素ガス吸着量を分析した。
実施例1、2、5、7、8、13、14および比較例1、3、7、8について水蒸気吸着量、窒素ガス吸着量を測定し、(水蒸気吸着量から算出した比表面積)/(窒素ガス吸着量から算出した比表面積)にてシラン化合物処理後の値をシラン化合物処理前の値で割った値について、表12に測定結果を示した。
Claims (8)
- 加水分解性シランで表面修飾したシラン結合シリカ含有無機酸化物粒子を分散質として含み液状媒体を分散媒とする分散体であって、該分散媒は上記加水分解性シランの加水分解物を含み、(分散媒中の加水分解性シランの加水分解物中のケイ素原子モル数)/(無機酸化物粒子表面に結合したシランのケイ素原子モル数)の割合が0.2~30であり、Si-NMR観測でシリカ粒子のケイ素原子間の架橋酸素がケイ素原子1個に対して4/2個であるQ4が該シランの表面修飾前より増加しているものである該シリカ含有無機酸化物粒子を含む上記分散体。
- シリカ含有無機酸化物粒子が、平均粒子径5nm~100nmのシリカ粒子、又はシリカとアルミナ、酸化スズ、酸化ジルコニウム、酸化チタン、及び酸化アンチモンからなる群から選ばれる少なくとも1種の無機酸化物粒子であって、該シリカ含有無機酸化物粒子はシリカ粒子、シリカとその他の金属酸化物との複合金属酸化物、又はシリカとその他の金属酸化物とのコアシェル構造を有する複合酸化物粒子である請求項1に記載の分散体。
- 加水分解性シランが式(1)乃至式(3):
式(2)及び式(3)中、R5及びR7は炭素原子数1~3のアルキル基で且つSi-C結合によりケイ素原子と結合しているものであり、R6及びR7はアルコキシ基、アシルオキシ基、又はハロゲン基を示し、Yはアルキレン基、NH基、又は酸素原子を示し、該R5及びR7は少なくとも一つが炭素原子数1~3のアルキル基であってSi-C結合によりケイ素原子と結合しているものであり、bは1~3の整数であり、cは0又は1の整数であり、dは1~3の整数であり、eは1~3の整数である。)
からなる群より選ばれる少なくとも1種のシラン化合物である請求項1又は請求項2に記載の分散体。 - 分散媒中の加水分解性シランの加水分解物中には、式(1)のaが1の整数であるシラン化合物の加水分解化合物がSi-NMR観測でケイ素原子間の架橋酸素の割合がケイ素原子1個に対して0/2個、1/2個、2/2個、及び3/2個を示すT0、T1、T2、及びT3構造について、(T2+T3)/(T0+T1)が特定の値(2~15)、又は(T1+T2+T3)/(T0)比が特定の値(5~100)であるシラン化合物を含んでいる請求項3に記載の分散体。
- 分散媒中の加水分解性シランの加水分解物中には、式(1)のaが2の整数であるシラン化合物の加水分解化合物がSi-NMR観測でケイ素原子間の架橋酸素の割合がケイ素原子1個に対して0/2個、1/2個、2/2個を示すD0、D1及びD2構造について、(D1+D2)/(D0)比が0.1~10、又は(D2)/(D0+D1)比が0.01~10であるシラン化合物を含んでいる請求項3に記載の分散体。
- 上記シリカ含有無機酸化物粒子への水蒸気吸着量を窒素ガス吸着量で割った値である(水蒸気吸着量から算出した比表面積)/(窒素ガス吸着量から算出した比表面積)がシラン化合物添加前のシリカ粒子に比較して0.15~0.95である請求項1乃至請求項5の何れか1項に記載の分散体。
- 下記(A)工程乃至(B)工程:
(A)工程:上記シリカ含有無機酸化物粒子の水性分散体を得る工程、
(B)工程:上記シリカ含有無機酸化物粒子の水性分散体にpH2.0~6.5で加水分解性シランを該粒子表面積当たりの該シランの個数の割合として、0.3~100個/nm2の範囲で添加して、室温で攪拌後に50~99℃以内の温度に昇温し、室温の攪拌時間に対して昇温後の攪拌時間が1~100倍以内の時間で行われる工程、を含む請求項1乃至請求項6のいずれか1項に記載の分散体の製造方法。 - (B)工程の後に更に(C)工程:
(C)工程:(B)工程で得られた分散体の水性媒体を有機溶媒に置換する工程、を含む請求項7に記載の有機溶媒を分散媒とする分散体の製造方法。
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JPH1143319A (ja) * | 1997-05-26 | 1999-02-16 | Nissan Chem Ind Ltd | 疎水性オルガノシリカゾルの製造方法 |
JP2005200294A (ja) | 2003-12-19 | 2005-07-28 | Nissan Chem Ind Ltd | 有機溶媒分散無機酸化物ゾルの製造方法 |
JP2005314197A (ja) * | 2003-05-21 | 2005-11-10 | Fuso Chemical Co Ltd | 高純度疎水性有機溶媒分散シリカゾル及びその製造方法 |
JP2016204168A (ja) * | 2015-04-15 | 2016-12-08 | 信越化学工業株式会社 | 無機酸化物微粒子分散液の製造方法 |
JP2020164374A (ja) | 2019-03-29 | 2020-10-08 | 日揮触媒化成株式会社 | 表面処理粒子の分散液および該分散液を含む硬化性の組成物 |
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JPH1143319A (ja) * | 1997-05-26 | 1999-02-16 | Nissan Chem Ind Ltd | 疎水性オルガノシリカゾルの製造方法 |
JP2005314197A (ja) * | 2003-05-21 | 2005-11-10 | Fuso Chemical Co Ltd | 高純度疎水性有機溶媒分散シリカゾル及びその製造方法 |
JP2005200294A (ja) | 2003-12-19 | 2005-07-28 | Nissan Chem Ind Ltd | 有機溶媒分散無機酸化物ゾルの製造方法 |
JP2016204168A (ja) * | 2015-04-15 | 2016-12-08 | 信越化学工業株式会社 | 無機酸化物微粒子分散液の製造方法 |
JP2020164374A (ja) | 2019-03-29 | 2020-10-08 | 日揮触媒化成株式会社 | 表面処理粒子の分散液および該分散液を含む硬化性の組成物 |
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