JP7538968B2 - 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法 - Google Patents

表面処理シリカ含有無機酸化物粒子分散液及びその製造方法 Download PDF

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Publication number
JP7538968B2
JP7538968B2 JP2023545531A JP2023545531A JP7538968B2 JP 7538968 B2 JP7538968 B2 JP 7538968B2 JP 2023545531 A JP2023545531 A JP 2023545531A JP 2023545531 A JP2023545531 A JP 2023545531A JP 7538968 B2 JP7538968 B2 JP 7538968B2
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Japan
Prior art keywords
group
silane
silica
particles
dispersion
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Japanese (ja)
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JPWO2023032854A5 (https=
JPWO2023032854A1 (https=
Inventor
智 村上
誠志 安部
裕丈 北川
貴広 大堀
雅也 柏原
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Nissan Chemical Corp
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Nissan Chemical Corp
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Priority to JP2024134471A priority Critical patent/JP2024149753A/ja
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K23/00—Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
    • C09K23/54—Silicon compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14—Methods for preparing oxides or hydroxides in general
    • C01B13/145—After-treatment of oxides or hydroxides, e.g. pulverising, drying, decreasing the acidity
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3081—Treatment with organo-silicon compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/12—Treatment with organosilicon compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/86—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by NMR- or ESR-data
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Silicon Compounds (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Dispersion Chemistry (AREA)
JP2023545531A 2021-08-31 2022-08-26 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法 Active JP7538968B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024134471A JP2024149753A (ja) 2021-08-31 2024-08-09 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021141201 2021-08-31
JP2021141201 2021-08-31
PCT/JP2022/032245 WO2023032854A1 (ja) 2021-08-31 2022-08-26 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法

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JP2024134471A Division JP2024149753A (ja) 2021-08-31 2024-08-09 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法

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JPWO2023032854A1 JPWO2023032854A1 (https=) 2023-03-09
JPWO2023032854A5 JPWO2023032854A5 (https=) 2023-10-20
JP7538968B2 true JP7538968B2 (ja) 2024-08-22

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JP2023545531A Active JP7538968B2 (ja) 2021-08-31 2022-08-26 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法
JP2024134471A Pending JP2024149753A (ja) 2021-08-31 2024-08-09 表面処理シリカ含有無機酸化物粒子分散液及びその製造方法

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Country Link
US (1) US12203026B2 (https=)
EP (1) EP4393877A4 (https=)
JP (2) JP7538968B2 (https=)
KR (2) KR20240157768A (https=)
CN (1) CN117881629A (https=)
MY (1) MY207235A (https=)
TW (1) TW202323189A (https=)
WO (1) WO2023032854A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7668924B1 (ja) 2023-10-25 2025-04-25 多摩化学工業株式会社 コロイダルシリカ及びコロイダルシリカの製造方法
WO2025110245A1 (ja) * 2023-11-24 2025-05-30 日産化学株式会社 シリカ粒子とポリオルガノシロキサンと溶媒とを含む組成物及びその製造方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
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DE69804373T2 (de) 1997-05-26 2002-10-24 Nissan Chemical Industries, Ltd. Verfahren zur Herstellung eines hydrophoben Kieselsäure Organosols
JP4032503B2 (ja) * 1997-05-26 2008-01-16 日産化学工業株式会社 疎水性オルガノシリカゾルの製造方法
JP4803630B2 (ja) * 2003-05-21 2011-10-26 扶桑化学工業株式会社 高純度疎水性有機溶媒分散シリカゾルの製造方法
JP4816861B2 (ja) 2003-12-19 2011-11-16 日産化学工業株式会社 有機溶媒分散無機酸化物ゾルの製造方法
JP4888633B2 (ja) * 2004-11-16 2012-02-29 日産化学工業株式会社 疎水性シリカ粉末の製造法
US20060112860A1 (en) * 2004-11-16 2006-06-01 Nissan Chemical Industries, Ltd. Process for producing hydrophobic silica powder
US7186440B2 (en) 2005-07-04 2007-03-06 Nissan Chemical Industries, Ltd. Process for producing hydrophobic silica powder
DE102006061057A1 (de) * 2006-12-22 2008-06-26 Wacker Chemie Ag Organofunktionelle Silikonharzschichten auf Metalloxiden
JP2009013033A (ja) * 2007-07-09 2009-01-22 Arakawa Chem Ind Co Ltd 表面被覆シリカオルガノゾルの製造方法および表面被覆シリカ粒子含有エポキシ樹脂組成物の製造方法
DE102007044302A1 (de) * 2007-09-17 2009-03-19 Bühler PARTEC GmbH Verfahren zur Dispergierung von feinteiligen anorganischen Pulvern in flüssigen Medien unter Verwendung von reaktiven Siloxanen
US20110244382A1 (en) * 2010-04-06 2011-10-06 Christopher Alyson M Hydrophobic silica particles and method of producing same
JP5035651B2 (ja) * 2010-07-12 2012-09-26 Ｄｉｃ株式会社 無機微粒子用分散剤、それを使用した無機微粒子分散体
EP3009480B1 (en) * 2013-06-10 2019-05-01 Nissan Chemical Corporation Silica-containing resin composition and method for producing same, and molded article produced from silica-containing resin composition
JP6443197B2 (ja) 2015-04-15 2018-12-26 信越化学工業株式会社 無機酸化物微粒子分散液の製造方法
JP6481599B2 (ja) * 2015-12-08 2019-03-13 信越化学工業株式会社 無機粒子−ポリシロキサン複合体、それを含む分散液、固体材料、及び該無機粒子−ポリシロキサン複合体の製造方法
JP2021006595A (ja) * 2017-09-13 2021-01-21 日産化学株式会社 原油回収用薬液
CN113165424B (zh) * 2018-11-28 2023-06-16 倍耐力轮胎股份公司 轮胎用胶料的制备方法和包含它们的轮胎
US20220033268A1 (en) * 2019-02-25 2022-02-03 Nissan Chemical Corporation Inorganic oxide particle, inorganic oxide particle dispersion and preparation method thereof, and method for producing surface modifier
JP7430985B2 (ja) 2019-03-29 2024-02-14 日揮触媒化成株式会社 表面処理粒子の分散液および該分散液を含む硬化性の組成物
KR102284512B1 (ko) * 2019-11-25 2021-08-02 주식회사 케이씨텍 수분량이 제어된 무기 산화물 분산액 및 이의 제조방법
KR102853213B1 (ko) * 2019-12-20 2025-09-01 주식회사 케이씨텍 무기 산화물 입자-모노머 분산액 및 이의 제조 방법
KR102671382B1 (ko) * 2021-06-17 2024-06-04 주식회사 케이씨텍 중공실리카 입자 분산 조성물, 그의 제조방법, 그를 포함하는 광학용 필름 및 디스플레이용 광학 부재

Also Published As

Publication number Publication date
WO2023032854A1 (ja) 2023-03-09
MY207235A (en) 2025-02-07
TW202323189A (zh) 2023-06-16
JP2024149753A (ja) 2024-10-18
US12203026B2 (en) 2025-01-21
KR20240157768A (ko) 2024-11-01
EP4393877A4 (en) 2024-11-13
EP4393877A1 (en) 2024-07-03
CN117881629A (zh) 2024-04-12
JPWO2023032854A1 (https=) 2023-03-09
CA3230465A1 (en) 2023-03-09
KR20240042168A (ko) 2024-04-01
US20240271043A1 (en) 2024-08-15
KR102722973B1 (ko) 2024-10-28

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