JPWO2013146642A1 - 光学素子用透明基材及びこれを用いた液晶表示装置用偏光板、有機エレクトロルミネッセンス素子 - Google Patents
光学素子用透明基材及びこれを用いた液晶表示装置用偏光板、有機エレクトロルミネッセンス素子 Download PDFInfo
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Abstract
Description
2、2a、2b、2c 無機層
3 親水層(樹脂層)
4 疎水層(樹脂層)
B 光学素子用透明基材
20 有機層
30 偏光膜
31 保護フィルム(樹脂製フィルム)
[実施例1]
光学素子用透明基材を以下のように調製した。可撓性フィルム1に、厚さ100μmのポリエチレンナフタレート(テオネックスQ65FA;帝人デュポンフィルム社製)を用い、その上に、窒化ケイ素膜層2、親水層3と、疎水層4を順次積層した。窒化ケイ素膜は、プラズマCVD装置を用いて、基板温度100℃、圧力120Paに保ち、SiH4、NH3、H2、N2ガスをフローレート10、20、200、200sccmで導入し、電源周波数13.56MHz、投入電力500Wで、厚さ100nmの透明無機膜を形成した。次に、親水層を形成した。モノマーとしてメタクリル酸メチル、溶剤としてプロピレングリコールモノメチルエーテルアセテート、架橋剤としてメタアクリル酸エステルモノマー、分散レベリング剤として変性ポリアクリレート、開始剤としてベンゾフェノン系開始剤を用いてスピンコート法にて塗布を行った。2000rpmで20秒間回転させた後、0.6kPaで90秒間減圧乾燥を行い、さらに90℃で5分間加熱乾燥を行った。高圧水銀灯によりUVを、積算光量2000mJ/cm2となるよう照射し、さらに110℃で40分間焼成を行い、塗布膜厚500nmを得た。その後、疎水層を形成した。モノマーとして5−メチル−2−ノルボルネン、溶剤としてエチルベンゼン、架橋剤としてケトンパーオキシド、分散レベリング剤として変性ポリアクリレート、光反応性モノマーとして2−ヒドロキシエチルメタクリレート、開始剤としてベンゾフェノン系開始剤を用いてスピンコート法にて塗布を行った。2000rpmで20秒間回転させた後、1.3kPaで120秒間減圧乾燥を行い、さらに60℃で5分間加熱乾燥を行った。高圧水銀灯によりUVを、積算光量2000mJ/cm2となるよう照射し、さらに110℃で30分間焼成を行い、塗布膜厚500nmを得た。
無機層、親水層、疎水層を作製せず樹脂製フィルムをそのまま用いた他は、実施例1と同様に、有機EL照明パネルを作製し、高温高湿試験を行った。ダークスポットの発生について、結果を図4に示す。発光部のシュリンク、光学素子用透明基材のクラックが発生・成長し、ダークスポットに起因するショートにより200時間後には非点灯となった。
偏光膜30の両面に、それぞれ厚さ10μmのアクリル系粘着層を介して、樹脂製フィルムを厚さ70μmのトリアセチルセルロースフィルムに変えた他は、実施例1と同様に作製した光学素子用透明基材と、厚さ70μmのトリアセチルセルロースフィルムの保護フィルム31とを接着して、図3に示す偏光板を作製した。厚さ70μmのトリアセチルセルロースフィルムは、以下の方法により得た。トリアセチルセルロースの塩化メチレン溶液を、ステンレス等の平板基板上に均一に塗布し、47kPaで120秒間減圧乾燥を行い、さらに、50℃にて5分間加熱乾燥を行った。次にステンレス板より剥離し、フィルムに応力がかからない状態で、150℃で10分間乾燥させて、厚さ70μmの保護フィルムを得た。
無機層、親水層、疎水層を作製せず透明可撓性基材をそのまま用いた他は、実施例2と同様に偏光板を作製し、高温高湿試験を行い、液晶パネルの光漏れ、色ズレ・色付き、光学素子用透明基材のクラックの有無を観察した。色度変化を図5(b)に示し、1000時間経過後の液晶パネルの黒表示時の斜め視野からの画像状態を図6(b)に示す。光学素子用透明基材のクラックは1200時間後に認められた。
図7に示すように、無機層として、樹脂製フィルム1上に、順次、窒化酸化ケイ素膜(第一層)2a、窒化ケイ素膜(第二層)2b、酸化ケイ素膜(第三層)2cを以下の方法により作製した。窒化酸化ケイ素膜は、プラズマCVD装置を用いて、基板温度100℃、圧力120Paに保ち、SiH4、O2、N2ガスを流量10、20、200sccmで導入し、電源周波数13.56MHz、投入電力500Wで、厚さ70nmの透明無機膜を形成した。次に、窒化ケイ素膜を、上記と同じ条件で、SiH4、NH3、H2、N2ガスを流量10、20、200、200sccmで成膜し、厚さ100nmの透明無機膜を形成した。さらに、酸化ケイ素膜を、上記と同じ条件で、SiH4、O2、H2ガスを流量10、50、200sccmで成膜し、厚さ100nmの透明無機膜を形成した。
実施例3に用いた光学素子用透明基材上に、実施例2と同様にして、図8に示す偏光板を作製し、液晶パネルを作製し、高温高湿試験を行い、光学素子用透明基材のクラック、液晶パネルの光漏れ、色ズレ・色付きについて観察した。
実施例2で得られた図3に示す偏光板のトリアセチルセルロースフィルム31上に、厚さ10μmのアクリル系接着層を介して、光学補償フィルム32を接着することにより積層膜とした。光学補償フィルム上に、実施例1と同様に、無機層、親水層、疎水層を作製し、光学素子用透明基材を作製した。得られた光学素子用透明基材のトリアセチルセルロースフィルムの裏面に、実施例1と同様にして、光学素子用透明基材を作製し、図9に示す偏光板を作製し、実施例2と同様にして、液晶パネルを作製し、高温高湿試験を行い、光学素子用透明基材のクラック、液晶パネルの光漏れ、色ズレ・色付きについて観察した。
Claims (10)
- 透明の樹脂製フィルム上に順次積層された無機層及び親水層を有することを特徴とする光学素子用透明基材。
- 前記親水層上に疎水層を有することを特徴とする請求項1に記載の光学素子用透明基材。
- 前記親水層が、アクリル系樹脂、ポリアミド系樹脂及びポリエステル系樹脂から選ばれる何れか1種又は2種以上を含むことを特徴とする請求項1又は2に記載の光学素子用透明基材。
- 前記疎水層が、オレフィン樹脂、脂環式オレフィン樹脂、アクリル系樹脂、ポリエステル系樹脂及びフッ素系樹脂から選ばれる何れか1種又は2種以上を含むことを特徴とする請求項1から3の何れかに記載の光学素子用透明基材。
- 前記無機層が、前記樹脂製フィルム側から、下層、中間層及び上層を有し、該上層、該下層、該中間層の順に屈折率を上昇させることを特徴とする請求項1から4の何れかに記載の光学素子用透明基材。
- 前記無機層の厚さが5〜500nm、前記親水層の厚さが90〜1000nm、前記疎水層の厚さが10〜1000nmであることを特徴とする請求項1から5の何れかに記載の光学素子用透明基材。
- 請求項1から6の何れかに記載の光学素子用透明基材を用いたことを特徴とする液晶表示装置用偏光板。
- 請求項7に記載の液晶表示装置用偏光板を用いたことを特徴とする液晶表示装置。
- 請求項1から6の何れかに記載の光学素子用透明基材を用いたことを特徴とする有機エレクトロルミネッセンス素子。
- 請求項9に記載の有機エレクトロルミネッセンス素子を用いたことを特徴とする有機エレクトロルミネッセンス照明装置。
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