JPWO2011027772A1 - 半導体表面用処理剤組成物及びそれを用いた半導体表面の処理方法 - Google Patents
半導体表面用処理剤組成物及びそれを用いた半導体表面の処理方法 Download PDFInfo
- Publication number
- JPWO2011027772A1 JPWO2011027772A1 JP2011529911A JP2011529911A JPWO2011027772A1 JP WO2011027772 A1 JPWO2011027772 A1 JP WO2011027772A1 JP 2011529911 A JP2011529911 A JP 2011529911A JP 2011529911 A JP2011529911 A JP 2011529911A JP WO2011027772 A1 JPWO2011027772 A1 JP WO2011027772A1
- Authority
- JP
- Japan
- Prior art keywords
- acid
- ammonium
- hydroxylamine
- semiconductor surface
- potassium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 187
- 239000004065 semiconductor Substances 0.000 title claims abstract description 151
- 238000000034 method Methods 0.000 title claims abstract description 61
- -1 fluorine ions Chemical class 0.000 claims abstract description 316
- 150000001723 carbon free-radicals Chemical class 0.000 claims abstract description 125
- 150000001875 compounds Chemical class 0.000 claims abstract description 74
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 58
- 239000003960 organic solvent Substances 0.000 claims abstract description 39
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 claims abstract description 33
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 24
- 239000011737 fluorine Substances 0.000 claims abstract description 24
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 16
- 150000002443 hydroxylamines Chemical class 0.000 claims abstract description 16
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 8
- 125000006165 cyclic alkyl group Chemical group 0.000 claims abstract description 7
- 125000000547 substituted alkyl group Chemical group 0.000 claims abstract description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 3
- 239000000758 substrate Substances 0.000 claims description 72
- 239000003795 chemical substances by application Substances 0.000 claims description 70
- 239000002253 acid Substances 0.000 claims description 67
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 45
- 229960003975 potassium Drugs 0.000 claims description 44
- 229910052700 potassium Inorganic materials 0.000 claims description 44
- 239000011591 potassium Substances 0.000 claims description 44
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 40
- 239000011734 sodium Substances 0.000 claims description 38
- 229910052708 sodium Inorganic materials 0.000 claims description 38
- 150000003839 salts Chemical group 0.000 claims description 35
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 34
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 28
- 229910052802 copper Inorganic materials 0.000 claims description 28
- 239000010949 copper Substances 0.000 claims description 28
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 24
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 18
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 17
- 239000012756 surface treatment agent Substances 0.000 claims description 17
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 16
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 14
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 12
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 11
- 239000004094 surface-active agent Substances 0.000 claims description 11
- 235000015165 citric acid Nutrition 0.000 claims description 8
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 7
- 229920001174 Diethylhydroxylamine Polymers 0.000 claims description 7
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 7
- FVCOIAYSJZGECG-UHFFFAOYSA-N diethylhydroxylamine Chemical compound CCN(O)CC FVCOIAYSJZGECG-UHFFFAOYSA-N 0.000 claims description 7
- 239000001630 malic acid Substances 0.000 claims description 7
- 235000011090 malic acid Nutrition 0.000 claims description 7
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical group S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims description 6
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 6
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 claims description 6
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 6
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 claims description 6
- 235000006408 oxalic acid Nutrition 0.000 claims description 6
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000011975 tartaric acid Substances 0.000 claims description 6
- 235000002906 tartaric acid Nutrition 0.000 claims description 6
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 6
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 claims description 6
- WYTQVQPFRZZAIE-UHFFFAOYSA-N 2-[2,2-dihydroxyethyl(hydroxy)amino]ethane-1,1-diol Chemical compound OC(O)CN(O)CC(O)O WYTQVQPFRZZAIE-UHFFFAOYSA-N 0.000 claims description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 5
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 5
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 5
- 230000005484 gravity Effects 0.000 claims description 5
- 239000001508 potassium citrate Substances 0.000 claims description 5
- 229960002635 potassium citrate Drugs 0.000 claims description 5
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 claims description 5
- 235000011082 potassium citrates Nutrition 0.000 claims description 5
- 239000001509 sodium citrate Substances 0.000 claims description 4
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 claims description 4
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 claims description 3
- GHQFLMULNSGOAR-UHFFFAOYSA-N 2,3-dihydroxybutanedioic acid;sodium Chemical compound [Na].OC(=O)C(O)C(O)C(O)=O GHQFLMULNSGOAR-UHFFFAOYSA-N 0.000 claims description 3
- 239000001715 Ammonium malate Substances 0.000 claims description 3
- 239000001361 adipic acid Substances 0.000 claims description 3
- 235000011037 adipic acid Nutrition 0.000 claims description 3
- 150000001408 amides Chemical class 0.000 claims description 3
- KGECWXXIGSTYSQ-UHFFFAOYSA-N ammonium malate Chemical compound [NH4+].[NH4+].[O-]C(=O)C(O)CC([O-])=O KGECWXXIGSTYSQ-UHFFFAOYSA-N 0.000 claims description 3
- 235000019292 ammonium malate Nutrition 0.000 claims description 3
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 claims description 3
- WPUMTJGUQUYPIV-JIZZDEOASA-L disodium (S)-malate Chemical compound [Na+].[Na+].[O-]C(=O)[C@@H](O)CC([O-])=O WPUMTJGUQUYPIV-JIZZDEOASA-L 0.000 claims description 3
- 239000001530 fumaric acid Substances 0.000 claims description 3
- VRVKOZSIJXBAJG-TYYBGVCCSA-M monosodium fumarate Chemical compound [Na+].OC(=O)\C=C\C([O-])=O VRVKOZSIJXBAJG-TYYBGVCCSA-M 0.000 claims description 3
- 239000001415 potassium malate Substances 0.000 claims description 3
- 235000011033 potassium malate Nutrition 0.000 claims description 3
- SVICABYXKQIXBM-UHFFFAOYSA-L potassium malate Chemical compound [K+].[K+].[O-]C(=O)C(O)CC([O-])=O SVICABYXKQIXBM-UHFFFAOYSA-L 0.000 claims description 3
- 235000019265 sodium DL-malate Nutrition 0.000 claims description 3
- 239000001394 sodium malate Substances 0.000 claims description 3
- KZQSXALQTHVPDQ-UHFFFAOYSA-M sodium;butanedioate;hydron Chemical compound [Na+].OC(=O)CCC([O-])=O KZQSXALQTHVPDQ-UHFFFAOYSA-M 0.000 claims description 3
- 150000003462 sulfoxides Chemical class 0.000 claims description 3
- BPHVHMBNGQRCNN-UHFFFAOYSA-N 2,3-dihydroxybutanedioic acid;potassium Chemical compound [K].OC(=O)C(O)C(O)C(O)=O BPHVHMBNGQRCNN-UHFFFAOYSA-N 0.000 claims description 2
- VBIXEXWLHSRNKB-UHFFFAOYSA-N ammonium oxalate Chemical compound [NH4+].[NH4+].[O-]C(=O)C([O-])=O VBIXEXWLHSRNKB-UHFFFAOYSA-N 0.000 claims description 2
- CHCFOMQHQIQBLZ-UHFFFAOYSA-N azane;phthalic acid Chemical compound N.N.OC(=O)C1=CC=CC=C1C(O)=O CHCFOMQHQIQBLZ-UHFFFAOYSA-N 0.000 claims description 2
- IRXRGVFLQOSHOH-UHFFFAOYSA-L dipotassium;oxalate Chemical compound [K+].[K+].[O-]C(=O)C([O-])=O IRXRGVFLQOSHOH-UHFFFAOYSA-L 0.000 claims description 2
- GOMCKELMLXHYHH-UHFFFAOYSA-L dipotassium;phthalate Chemical compound [K+].[K+].[O-]C(=O)C1=CC=CC=C1C([O-])=O GOMCKELMLXHYHH-UHFFFAOYSA-L 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- NLVWBYNKMPGKRG-ODZAUARKSA-N azane;(z)-but-2-enedioic acid Chemical compound N.OC(=O)\C=C/C(O)=O NLVWBYNKMPGKRG-ODZAUARKSA-N 0.000 claims 1
- HQWKKEIVHQXCPI-UHFFFAOYSA-L disodium;phthalate Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C([O-])=O HQWKKEIVHQXCPI-UHFFFAOYSA-L 0.000 claims 1
- IPGOVDXOBDFUBM-UHFFFAOYSA-N oxalic acid;sodium Chemical compound [Na].OC(=O)C(O)=O IPGOVDXOBDFUBM-UHFFFAOYSA-N 0.000 claims 1
- 238000004381 surface treatment Methods 0.000 abstract description 10
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 125000000217 alkyl group Chemical group 0.000 abstract description 4
- 125000001424 substituent group Chemical group 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 271
- 238000010438 heat treatment Methods 0.000 description 31
- 238000007654 immersion Methods 0.000 description 27
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 21
- 238000011156 evaluation Methods 0.000 description 21
- 150000003863 ammonium salts Chemical class 0.000 description 19
- 239000003638 chemical reducing agent Substances 0.000 description 19
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 18
- 230000002411 adverse Effects 0.000 description 17
- 238000007598 dipping method Methods 0.000 description 16
- 239000000243 solution Substances 0.000 description 14
- 229910052783 alkali metal Inorganic materials 0.000 description 13
- 230000003667 anti-reflective effect Effects 0.000 description 13
- 159000000000 sodium salts Chemical class 0.000 description 13
- 238000003756 stirring Methods 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 11
- 150000005215 alkyl ethers Chemical class 0.000 description 11
- 235000010323 ascorbic acid Nutrition 0.000 description 11
- 239000011668 ascorbic acid Substances 0.000 description 11
- SFLRURCEBYIKSS-UHFFFAOYSA-N n-butyl-2-[[1-(butylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound CCCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCCC SFLRURCEBYIKSS-UHFFFAOYSA-N 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 10
- 239000003945 anionic surfactant Substances 0.000 description 10
- 238000005530 etching Methods 0.000 description 10
- 238000004380 ashing Methods 0.000 description 9
- 230000001678 irradiating effect Effects 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 229960005070 ascorbic acid Drugs 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 150000003254 radicals Chemical class 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 150000003973 alkyl amines Chemical group 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 6
- 108010077895 Sarcosine Proteins 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 150000001340 alkali metals Chemical class 0.000 description 6
- 150000004996 alkyl benzenes Chemical class 0.000 description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 235000010350 erythorbic acid Nutrition 0.000 description 6
- 229940026239 isoascorbic acid Drugs 0.000 description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 6
- SYWIXHZXHQDFOO-UHFFFAOYSA-N methyl n-phenyliminocarbamate Chemical compound COC(=O)N=NC1=CC=CC=C1 SYWIXHZXHQDFOO-UHFFFAOYSA-N 0.000 description 6
- 150000007522 mineralic acids Chemical class 0.000 description 6
- 230000001603 reducing effect Effects 0.000 description 6
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 5
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N Lactic Acid Natural products CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 5
- FSYKKLYZXJSNPZ-UHFFFAOYSA-N N-methylaminoacetic acid Natural products C[NH2+]CC([O-])=O FSYKKLYZXJSNPZ-UHFFFAOYSA-N 0.000 description 5
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 5
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 5
- 239000012965 benzophenone Substances 0.000 description 5
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 229940043230 sarcosine Drugs 0.000 description 5
- PPASLZSBLFJQEF-RKJRWTFHSA-M sodium ascorbate Substances [Na+].OC[C@@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RKJRWTFHSA-M 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- 150000000996 L-ascorbic acids Chemical class 0.000 description 4
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 235000010233 benzoic acid Nutrition 0.000 description 4
- 229960004365 benzoic acid Drugs 0.000 description 4
- 229960003237 betaine Drugs 0.000 description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 4
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 4
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 3
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 3
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 3
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 3
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 3
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 3
- LYPGJGCIPQYQBW-UHFFFAOYSA-N 2-methyl-2-[[2-methyl-1-oxo-1-(prop-2-enylamino)propan-2-yl]diazenyl]-n-prop-2-enylpropanamide Chemical compound C=CCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCC=C LYPGJGCIPQYQBW-UHFFFAOYSA-N 0.000 description 3
- IDLCGKHZBNSVKN-UHFFFAOYSA-N 3-[2,3-dihydroxypropyl(hydroxy)amino]propane-1,2-diol Chemical compound OCC(O)CN(O)CC(O)CO IDLCGKHZBNSVKN-UHFFFAOYSA-N 0.000 description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- CIWBSHSKHKDKBQ-DUZGATOHSA-N D-isoascorbic acid Chemical compound OC[C@@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-DUZGATOHSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 229940072107 ascorbate Drugs 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 3
- LWMFAFLIWMPZSX-UHFFFAOYSA-N bis[2-(4,5-dihydro-1h-imidazol-2-yl)propan-2-yl]diazene Chemical compound N=1CCNC=1C(C)(C)N=NC(C)(C)C1=NCCN1 LWMFAFLIWMPZSX-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 235000019253 formic acid Nutrition 0.000 description 3
- 229930195712 glutamate Natural products 0.000 description 3
- 229940093915 gynecological organic acid Drugs 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 235000014655 lactic acid Nutrition 0.000 description 3
- 239000004310 lactic acid Substances 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- ZQMHJBXHRFJKOT-UHFFFAOYSA-N methyl 2-[(1-methoxy-2-methyl-1-oxopropan-2-yl)diazenyl]-2-methylpropanoate Chemical compound COC(=O)C(C)(C)N=NC(C)(C)C(=O)OC ZQMHJBXHRFJKOT-UHFFFAOYSA-N 0.000 description 3
- WVFLGSMUPMVNTQ-UHFFFAOYSA-N n-(2-hydroxyethyl)-2-[[1-(2-hydroxyethylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCO WVFLGSMUPMVNTQ-UHFFFAOYSA-N 0.000 description 3
- 239000002736 nonionic surfactant Substances 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical compound CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 description 3
- 229940080818 propionamide Drugs 0.000 description 3
- 229940107700 pyruvic acid Drugs 0.000 description 3
- 235000010378 sodium ascorbate Nutrition 0.000 description 3
- 229960005055 sodium ascorbate Drugs 0.000 description 3
- 125000000542 sulfonic acid group Chemical group 0.000 description 3
- 229910021642 ultra pure water Inorganic materials 0.000 description 3
- 239000012498 ultrapure water Substances 0.000 description 3
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 3
- NPENBPVOAXERED-UHFFFAOYSA-N (4-benzoylphenyl)-phenylmethanone Chemical compound C=1C=C(C(=O)C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 NPENBPVOAXERED-UHFFFAOYSA-N 0.000 description 2
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 2
- GJZFGDYLJLCGHT-UHFFFAOYSA-N 1,2-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(CC)C(CC)=CC=C3SC2=C1 GJZFGDYLJLCGHT-UHFFFAOYSA-N 0.000 description 2
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 2
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 2
- YNSNJGRCQCDRDM-UHFFFAOYSA-N 1-chlorothioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl YNSNJGRCQCDRDM-UHFFFAOYSA-N 0.000 description 2
- HSKPJQYAHCKJQC-UHFFFAOYSA-N 1-ethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2CC HSKPJQYAHCKJQC-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 2
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 2
- MHDULSOPQSUKBQ-UHFFFAOYSA-N 2-(2-chlorophenyl)-1-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C(N1C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 MHDULSOPQSUKBQ-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- CKSAKVMRQYOFBC-UHFFFAOYSA-N 2-cyanopropan-2-yliminourea Chemical compound N#CC(C)(C)N=NC(N)=O CKSAKVMRQYOFBC-UHFFFAOYSA-N 0.000 description 2
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 2
- 125000005809 3,4,5-trimethoxyphenyl group Chemical group [H]C1=C(OC([H])([H])[H])C(OC([H])([H])[H])=C(OC([H])([H])[H])C([H])=C1* 0.000 description 2
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- SRBFZHDQGSBBOR-IOVATXLUSA-N D-xylopyranose Chemical compound O[C@@H]1COC(O)[C@H](O)[C@H]1O SRBFZHDQGSBBOR-IOVATXLUSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- ZMDDERVSCYEKPQ-UHFFFAOYSA-N Ethyl (mesitylcarbonyl)phenylphosphinate Chemical compound C=1C=CC=CC=1P(=O)(OCC)C(=O)C1=C(C)C=C(C)C=C1C ZMDDERVSCYEKPQ-UHFFFAOYSA-N 0.000 description 2
- ZGFPUTOTEJOSAY-UHFFFAOYSA-N FC1=C([Ti])C(F)=CC=C1N1C=CC=C1 Chemical compound FC1=C([Ti])C(F)=CC=C1N1C=CC=C1 ZGFPUTOTEJOSAY-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- 239000011786 L-ascorbyl-6-palmitate Substances 0.000 description 2
- QAQJMLQRFWZOBN-LAUBAEHRSA-N L-ascorbyl-6-palmitate Chemical compound CCCCCCCCCCCCCCCC(=O)OC[C@H](O)[C@H]1OC(=O)C(O)=C1O QAQJMLQRFWZOBN-LAUBAEHRSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- NQSMEZJWJJVYOI-UHFFFAOYSA-N Methyl 2-benzoylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 NQSMEZJWJJVYOI-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 2
- 235000021314 Palmitic acid Nutrition 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- XOAAWQZATWQOTB-UHFFFAOYSA-N Taurine Natural products NCCS(O)(=O)=O XOAAWQZATWQOTB-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- LXEKPEMOWBOYRF-UHFFFAOYSA-N [2-[(1-azaniumyl-1-imino-2-methylpropan-2-yl)diazenyl]-2-methylpropanimidoyl]azanium;dichloride Chemical compound Cl.Cl.NC(=N)C(C)(C)N=NC(C)(C)C(N)=N LXEKPEMOWBOYRF-UHFFFAOYSA-N 0.000 description 2
- VUGIQPRQXKWKGX-UHFFFAOYSA-K [K+].[K+].[K+].[O-]C(=O)CC(C([O-])=O)S([O-])(=O)=O Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(C([O-])=O)S([O-])(=O)=O VUGIQPRQXKWKGX-UHFFFAOYSA-K 0.000 description 2
- 125000005037 alkyl phenyl group Chemical group 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 229940064734 aminobenzoate Drugs 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- PYMYPHUHKUWMLA-UHFFFAOYSA-N arabinose Natural products OCC(O)C(O)C(O)C=O PYMYPHUHKUWMLA-UHFFFAOYSA-N 0.000 description 2
- 235000010385 ascorbyl palmitate Nutrition 0.000 description 2
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 150000001565 benzotriazoles Chemical class 0.000 description 2
- SRBFZHDQGSBBOR-UHFFFAOYSA-N beta-D-Pyranose-Lyxose Natural products OC1COC(O)C(O)C1O SRBFZHDQGSBBOR-UHFFFAOYSA-N 0.000 description 2
- LBSPZZSGTIBOFG-UHFFFAOYSA-N bis[2-(4,5-dihydro-1h-imidazol-2-yl)propan-2-yl]diazene;dihydrochloride Chemical compound Cl.Cl.N=1CCNC=1C(C)(C)N=NC(C)(C)C1=NCCN1 LBSPZZSGTIBOFG-UHFFFAOYSA-N 0.000 description 2
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 2
- OZYJVQJGKRFVHQ-UHFFFAOYSA-L dipotassium trioxidophosphanium Chemical compound [K+].[K+].[O-]P([O-])=O OZYJVQJGKRFVHQ-UHFFFAOYSA-L 0.000 description 2
- LRUDDHYVRFQYCN-UHFFFAOYSA-L dipotassium;terephthalate Chemical compound [K+].[K+].[O-]C(=O)C1=CC=C(C([O-])=O)C=C1 LRUDDHYVRFQYCN-UHFFFAOYSA-L 0.000 description 2
- VFNGKCDDZUSWLR-UHFFFAOYSA-L disulfate(2-) Chemical compound [O-]S(=O)(=O)OS([O-])(=O)=O VFNGKCDDZUSWLR-UHFFFAOYSA-L 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- 229930182478 glucoside Natural products 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- PAZXUKOJTOTKBK-UHFFFAOYSA-N n,n-dibutylhydroxylamine Chemical compound CCCCN(O)CCCC PAZXUKOJTOTKBK-UHFFFAOYSA-N 0.000 description 2
- ZKXYINRKIDSREX-UHFFFAOYSA-N n,n-dipropylhydroxylamine Chemical compound CCCN(O)CCC ZKXYINRKIDSREX-UHFFFAOYSA-N 0.000 description 2
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 2
- BUGISVZCMXHOHO-UHFFFAOYSA-N n-[1,3-dihydroxy-2-(hydroxymethyl)propan-2-yl]-2-[[1-[[1,3-dihydroxy-2-(hydroxymethyl)propan-2-yl]amino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCC(CO)(CO)NC(=O)C(C)(C)N=NC(C)(C)C(=O)NC(CO)(CO)CO BUGISVZCMXHOHO-UHFFFAOYSA-N 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- WMRNGPYHLQSTDL-UHFFFAOYSA-N n-cyclohexyl-2-[[1-(cyclohexylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound C1CCCCC1NC(=O)C(C)(C)N=NC(C)(C)C(=O)NC1CCCCC1 WMRNGPYHLQSTDL-UHFFFAOYSA-N 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- SJNXJRVDSTZUFB-UHFFFAOYSA-N naphthalen-2-yl(phenyl)methanone Chemical compound C=1C=C2C=CC=CC2=CC=1C(=O)C1=CC=CC=C1 SJNXJRVDSTZUFB-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 2
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical group C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 2
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 125000001453 quaternary ammonium group Chemical group 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 235000010352 sodium erythorbate Nutrition 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- PPASLZSBLFJQEF-RXSVEWSESA-M sodium-L-ascorbate Chemical compound [Na+].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RXSVEWSESA-M 0.000 description 2
- WQQPDTLGLVLNOH-UHFFFAOYSA-M sodium;4-hydroxy-4-oxo-3-sulfobutanoate Chemical compound [Na+].OC(=O)CC(C([O-])=O)S(O)(=O)=O WQQPDTLGLVLNOH-UHFFFAOYSA-M 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229960003080 taurine Drugs 0.000 description 2
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 2
- 150000004685 tetrahydrates Chemical class 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- NCPXQVVMIXIKTN-UHFFFAOYSA-N trisodium;phosphite Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])[O-] NCPXQVVMIXIKTN-UHFFFAOYSA-N 0.000 description 2
- 239000001124 (E)-prop-1-ene-1,2,3-tricarboxylic acid Substances 0.000 description 1
- 125000005918 1,2-dimethylbutyl group Chemical group 0.000 description 1
- OTKCEEWUXHVZQI-UHFFFAOYSA-N 1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(=O)CC1=CC=CC=C1 OTKCEEWUXHVZQI-UHFFFAOYSA-N 0.000 description 1
- JKVSAZTYCZKNDX-UHFFFAOYSA-N 1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C1=CC(C(=O)CCC)=CC=C1N1CCOCC1 JKVSAZTYCZKNDX-UHFFFAOYSA-N 0.000 description 1
- NEFUPBYOHNIISE-UHFFFAOYSA-N 1-[1,2-dihydroxyethyl(hydroxy)amino]ethane-1,2-diol Chemical compound OCC(O)N(O)C(O)CO NEFUPBYOHNIISE-UHFFFAOYSA-N 0.000 description 1
- RXWOOWGNFRSHOL-UHFFFAOYSA-N 1-[hydroxy(1-hydroxyethyl)amino]ethanol Chemical compound CC(O)N(O)C(C)O RXWOOWGNFRSHOL-UHFFFAOYSA-N 0.000 description 1
- WQQZMYRVHZZOEW-UHFFFAOYSA-N 1-benzyl-4-(2-methylphenyl)sulfanylbenzene Chemical compound CC1=CC=CC=C1SC(C=C1)=CC=C1CC1=CC=CC=C1 WQQZMYRVHZZOEW-UHFFFAOYSA-N 0.000 description 1
- 125000006218 1-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004066 1-hydroxyethyl group Chemical group [H]OC([H])([*])C([H])([H])[H] 0.000 description 1
- WJDJWDHXZBNQNE-UHFFFAOYSA-M 1-octadecylpyridin-1-ium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+]1=CC=CC=C1 WJDJWDHXZBNQNE-UHFFFAOYSA-M 0.000 description 1
- YUBXLROQJAIVDR-UHFFFAOYSA-N 10-butyl-1-chloroacridin-9-one Chemical compound C1=CC=C2N(CCCC)C3=CC=CC=C3C(=O)C2=C1Cl YUBXLROQJAIVDR-UHFFFAOYSA-N 0.000 description 1
- BVYZDBLMCKSKAT-UHFFFAOYSA-N 2,2,3,3-tetrahexyldecanoic acid Chemical compound CCCCCCCC(CCCCCC)(CCCCCC)C(CCCCCC)(CCCCCC)C(O)=O BVYZDBLMCKSKAT-UHFFFAOYSA-N 0.000 description 1
- VGNVQGDEZCFGFJ-UHFFFAOYSA-N 2,3-dihydro-1h-pyrrol-1-ium;fluoride Chemical compound [F-].C1CC=C[NH2+]1 VGNVQGDEZCFGFJ-UHFFFAOYSA-N 0.000 description 1
- TYFSYONDMQEGJK-UHFFFAOYSA-N 2-(2,2-dihydroxyethylamino)acetic acid Chemical compound OC(O)CNCC(O)=O TYFSYONDMQEGJK-UHFFFAOYSA-N 0.000 description 1
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 1
- ZVJFKIWWIBIXSB-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile;2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N.CCC(C)(C#N)N=NC(C)(CC)C#N ZVJFKIWWIBIXSB-UHFFFAOYSA-N 0.000 description 1
- YRWXWZQPYMBKEI-UHFFFAOYSA-N 2-(hydroxyamino)ethane-1,1-diol Chemical compound ONCC(O)O YRWXWZQPYMBKEI-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- PEZYWNIDYUJMOV-UHFFFAOYSA-N 2-[(1-imino-2-methyl-1-pyrrolidin-1-ylpropan-2-yl)diazenyl]-2-methyl-1-pyrrolidin-1-ylpropan-1-imine Chemical compound C1CCCN1C(=N)C(C)(C)N=NC(C)(C)C(=N)N1CCCC1 PEZYWNIDYUJMOV-UHFFFAOYSA-N 0.000 description 1
- ZIAGYKQVFTXUQH-UHFFFAOYSA-N 2-[(4-methylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)CC1=CC=C(C)C=C1 ZIAGYKQVFTXUQH-UHFFFAOYSA-N 0.000 description 1
- FLKBKUFGKQPPRY-UHFFFAOYSA-N 2-[2-[2-[2-[1-(2-hydroxyethyl)-4,5-dihydroimidazol-2-yl]propan-2-yldiazenyl]propan-2-yl]-4,5-dihydroimidazol-1-yl]ethanol;dihydrochloride Chemical compound Cl.Cl.N=1CCN(CCO)C=1C(C)(C)N=NC(C)(C)C1=NCCN1CCO FLKBKUFGKQPPRY-UHFFFAOYSA-N 0.000 description 1
- UNBYXRSBNHGVLA-UHFFFAOYSA-N 2-[ethyl(hydroxy)amino]ethanol Chemical compound CCN(O)CCO UNBYXRSBNHGVLA-UHFFFAOYSA-N 0.000 description 1
- ADIJLGOTHNVIMK-UHFFFAOYSA-N 2-[hydroxy(2-hydroxyethyl)amino]ethanol Chemical compound OCCN(O)CCO ADIJLGOTHNVIMK-UHFFFAOYSA-N 0.000 description 1
- 125000000143 2-carboxyethyl group Chemical group [H]OC(=O)C([H])([H])C([H])([H])* 0.000 description 1
- ROIHTLRHYRFOHA-UHFFFAOYSA-N 2-methyl-1-pyrrolidin-1-ylpropan-1-imine dihydrochloride Chemical compound Cl.Cl.N=C(C(C)C)N1CCCC1 ROIHTLRHYRFOHA-UHFFFAOYSA-N 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- RCEJCSULJQNRQQ-UHFFFAOYSA-N 2-methylbutanenitrile Chemical compound CCC(C)C#N RCEJCSULJQNRQQ-UHFFFAOYSA-N 0.000 description 1
- 125000005916 2-methylpentyl group Chemical group 0.000 description 1
- SMBRHGJEDJVDOB-UHFFFAOYSA-N 2-methylpropanimidamide;dihydrochloride Chemical compound Cl.Cl.CC(C)C(N)=N SMBRHGJEDJVDOB-UHFFFAOYSA-N 0.000 description 1
- ZDWPBMJZDNXTPG-UHFFFAOYSA-N 2h-benzotriazol-4-amine Chemical compound NC1=CC=CC2=C1NN=N2 ZDWPBMJZDNXTPG-UHFFFAOYSA-N 0.000 description 1
- KFJDQPJLANOOOB-UHFFFAOYSA-N 2h-benzotriazole-4-carboxylic acid Chemical compound OC(=O)C1=CC=CC2=NNN=C12 KFJDQPJLANOOOB-UHFFFAOYSA-N 0.000 description 1
- MNULHGQAROOBFB-UHFFFAOYSA-N 3-[(1-amino-2-methylpropylidene)amino]propanoic acid Chemical compound CC(C)C(N)=NCCC(O)=O MNULHGQAROOBFB-UHFFFAOYSA-N 0.000 description 1
- QPAWZHGOOREAHE-UHFFFAOYSA-N 3-[3,3-dihydroxypropyl(hydroxy)amino]propane-1,1-diol Chemical compound OC(O)CCN(O)CCC(O)O QPAWZHGOOREAHE-UHFFFAOYSA-N 0.000 description 1
- BSXGCUHREZFSRY-UHFFFAOYSA-N 3-[[1-amino-2-[[1-amino-1-(2-carboxyethylimino)-2-methylpropan-2-yl]diazenyl]-2-methylpropylidene]amino]propanoic acid;tetrahydrate Chemical compound O.O.O.O.OC(=O)CCNC(=N)C(C)(C)N=NC(C)(C)C(=N)NCCC(O)=O BSXGCUHREZFSRY-UHFFFAOYSA-N 0.000 description 1
- 125000003542 3-methylbutan-2-yl group Chemical group [H]C([H])([H])C([H])(*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical compound SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 description 1
- VFXXTYGQYWRHJP-UHFFFAOYSA-N 4,4'-azobis(4-cyanopentanoic acid) Chemical compound OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N VFXXTYGQYWRHJP-UHFFFAOYSA-N 0.000 description 1
- NZBKIOJQXNGENQ-UHFFFAOYSA-N 4-(4,6-dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholin-4-ium Chemical compound COC1=NC(OC)=NC([N+]2(C)CCOCC2)=N1 NZBKIOJQXNGENQ-UHFFFAOYSA-N 0.000 description 1
- FUSNOPLQVRUIIM-UHFFFAOYSA-N 4-amino-2-(4,4-dimethyl-2-oxoimidazolidin-1-yl)-n-[3-(trifluoromethyl)phenyl]pyrimidine-5-carboxamide Chemical compound O=C1NC(C)(C)CN1C(N=C1N)=NC=C1C(=O)NC1=CC=CC(C(F)(F)F)=C1 FUSNOPLQVRUIIM-UHFFFAOYSA-N 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000001729 Ammonium fumarate Substances 0.000 description 1
- 239000004261 Ascorbyl stearate Substances 0.000 description 1
- LITUBCVUXPBCGA-WMZHIEFXSA-N Ascorbyl stearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC[C@H](O)[C@H]1OC(=O)C(O)=C1O LITUBCVUXPBCGA-WMZHIEFXSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- VXFMJGCHSNZZPE-UHFFFAOYSA-N CC1=C(C(=O)P(C2=CC=CC=C2)(C(C2=C(C=C(C=C2C)C)C)=O)=O)C(=CC(=C1)C)C.[PH3]=O Chemical compound CC1=C(C(=O)P(C2=CC=CC=C2)(C(C2=C(C=C(C=C2C)C)C)=O)=O)C(=CC(=C1)C)C.[PH3]=O VXFMJGCHSNZZPE-UHFFFAOYSA-N 0.000 description 1
- 239000005632 Capric acid (CAS 334-48-5) Substances 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- WQZGKKKJIJFFOK-QTVWNMPRSA-N D-mannopyranose Chemical compound OC[C@H]1OC(O)[C@@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-QTVWNMPRSA-N 0.000 description 1
- HMFHBZSHGGEWLO-SOOFDHNKSA-N D-ribofuranose Chemical compound OC[C@H]1OC(O)[C@H](O)[C@@H]1O HMFHBZSHGGEWLO-SOOFDHNKSA-N 0.000 description 1
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical compound C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 1
- 229930091371 Fructose Natural products 0.000 description 1
- 239000005715 Fructose Substances 0.000 description 1
- RFSUNEUAIZKAJO-ARQDHWQXSA-N Fructose Chemical compound OC[C@H]1O[C@](O)(CO)[C@@H](O)[C@@H]1O RFSUNEUAIZKAJO-ARQDHWQXSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- YXHXDEBLSQQHQE-UHFFFAOYSA-N N.N.OP(O)=O Chemical compound N.N.OP(O)=O YXHXDEBLSQQHQE-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000005643 Pelargonic acid Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- PYMYPHUHKUWMLA-LMVFSUKVSA-N Ribose Natural products OC[C@@H](O)[C@@H](O)[C@@H](O)C=O PYMYPHUHKUWMLA-LMVFSUKVSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- VBIIFPGSPJYLRR-UHFFFAOYSA-M Stearyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C VBIIFPGSPJYLRR-UHFFFAOYSA-M 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- HDNMGUIJYKQCHV-UHFFFAOYSA-N [ethyl(hydroxy)amino]methanol Chemical compound CCN(O)CO HDNMGUIJYKQCHV-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229940091181 aconitic acid Drugs 0.000 description 1
- FZEYVTFCMJSGMP-UHFFFAOYSA-N acridone Chemical class C1=CC=C2C(=O)C3=CC=CC=C3NC2=C1 FZEYVTFCMJSGMP-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000005210 alkyl ammonium group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- HMFHBZSHGGEWLO-UHFFFAOYSA-N alpha-D-Furanose-Ribose Natural products OCC1OC(O)C(O)C1O HMFHBZSHGGEWLO-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-PHYPRBDBSA-N alpha-D-galactose Chemical compound OC[C@H]1O[C@H](O)[C@H](O)[C@@H](O)[C@H]1O WQZGKKKJIJFFOK-PHYPRBDBSA-N 0.000 description 1
- 150000001409 amidines Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- BIVUUOPIAYRCAP-UHFFFAOYSA-N aminoazanium;chloride Chemical compound Cl.NN BIVUUOPIAYRCAP-UHFFFAOYSA-N 0.000 description 1
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 1
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 1
- 235000019297 ammonium fumarate Nutrition 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- PYMYPHUHKUWMLA-WDCZJNDASA-N arabinose Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)C=O PYMYPHUHKUWMLA-WDCZJNDASA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 125000003289 ascorbyl group Chemical group [H]O[C@@]([H])(C([H])([H])O*)[C@@]1([H])OC(=O)C(O*)=C1O* 0.000 description 1
- 235000019276 ascorbyl stearate Nutrition 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- RISDCUGHDORGEL-UHFFFAOYSA-N azane 2,3-dihydroxybutanedioic acid 2-hydroxypropane-1,2,3-tricarboxylic acid Chemical compound N.OC(=O)C(O)C(O)C(O)=O.OC(=O)CC(O)(C(O)=O)CC(O)=O RISDCUGHDORGEL-UHFFFAOYSA-N 0.000 description 1
- CKKXWJDFFQPBQL-SEPHDYHBSA-N azane;(e)-but-2-enedioic acid Chemical compound N.N.OC(=O)\C=C\C(O)=O CKKXWJDFFQPBQL-SEPHDYHBSA-N 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- WPKWPKDNOPEODE-UHFFFAOYSA-N bis(2,4,4-trimethylpentan-2-yl)diazene Chemical compound CC(C)(C)CC(C)(C)N=NC(C)(C)CC(C)(C)C WPKWPKDNOPEODE-UHFFFAOYSA-N 0.000 description 1
- MRKIVPRKIOXZTM-UHFFFAOYSA-N bis[2-(4,5-dihydro-1h-imidazol-2-yl)propan-2-yl]diazene;dihydrate Chemical compound O.O.N=1CCNC=1C(C)(C)N=NC(C)(C)C1=NCCN1 MRKIVPRKIOXZTM-UHFFFAOYSA-N 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- GCSVCUMDOQKEMT-UHFFFAOYSA-N butan-1-amine;hydrofluoride Chemical compound [H+].[F-].CCCCN GCSVCUMDOQKEMT-UHFFFAOYSA-N 0.000 description 1
- YMKDRGPMQRFJGP-UHFFFAOYSA-M cetylpyridinium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+]1=CC=CC=C1 YMKDRGPMQRFJGP-UHFFFAOYSA-M 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- GTZCVFVGUGFEME-IWQZZHSRSA-N cis-aconitic acid Chemical compound OC(=O)C\C(C(O)=O)=C\C(O)=O GTZCVFVGUGFEME-IWQZZHSRSA-N 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- FVPCNTIZTYPTAZ-UHFFFAOYSA-N cyclohexylazanium;fluoride Chemical compound F.NC1CCCCC1 FVPCNTIZTYPTAZ-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 1
- YSAVZVORKRDODB-WDSKDSINSA-N diethyl tartrate Chemical compound CCOC(=O)[C@@H](O)[C@H](O)C(=O)OCC YSAVZVORKRDODB-WDSKDSINSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- KGOGNDXXUVELIQ-UHFFFAOYSA-N dioctadecylazanium;chloride Chemical compound Cl.CCCCCCCCCCCCCCCCCCNCCCCCCCCCCCCCCCCCC KGOGNDXXUVELIQ-UHFFFAOYSA-N 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- GIGWNNOCCCHECH-UHFFFAOYSA-L dipotassium;benzene-1,3-dicarboxylate Chemical compound [K+].[K+].[O-]C(=O)C1=CC=CC(C([O-])=O)=C1 GIGWNNOCCCHECH-UHFFFAOYSA-L 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- GZCKIUIIYCBICZ-UHFFFAOYSA-L disodium;benzene-1,3-dicarboxylate Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC(C([O-])=O)=C1 GZCKIUIIYCBICZ-UHFFFAOYSA-L 0.000 description 1
- LNGNZSMIUVQZOX-UHFFFAOYSA-L disodium;dioxido(sulfanylidene)-$l^{4}-sulfane Chemical compound [Na+].[Na+].[O-]S([O-])=S LNGNZSMIUVQZOX-UHFFFAOYSA-L 0.000 description 1
- VIQSRHWJEKERKR-UHFFFAOYSA-L disodium;terephthalate Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=C(C([O-])=O)C=C1 VIQSRHWJEKERKR-UHFFFAOYSA-L 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethyl mercaptane Natural products CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 229930182830 galactose Natural products 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- 150000002395 hexacarboxylic acids Chemical class 0.000 description 1
- IPCSVZSSVZVIGE-UHFFFAOYSA-M hexadecanoate Chemical compound CCCCCCCCCCCCCCCC([O-])=O IPCSVZSSVZVIGE-UHFFFAOYSA-M 0.000 description 1
- 150000002402 hexoses Chemical class 0.000 description 1
- 239000012493 hydrazine sulfate Substances 0.000 description 1
- 229910000377 hydrazine sulfate Inorganic materials 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- RNYJXPUAFDFIQJ-UHFFFAOYSA-N hydron;octadecan-1-amine;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[NH3+] RNYJXPUAFDFIQJ-UHFFFAOYSA-N 0.000 description 1
- IKGLACJFEHSFNN-UHFFFAOYSA-N hydron;triethylazanium;trifluoride Chemical compound F.F.F.CCN(CC)CC IKGLACJFEHSFNN-UHFFFAOYSA-N 0.000 description 1
- UNFDKMXBKPSFIJ-UHFFFAOYSA-N hydroxylamine;hydrofluoride Chemical class F.ON UNFDKMXBKPSFIJ-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- WFKAJVHLWXSISD-UHFFFAOYSA-N isobutyramide Chemical compound CC(C)C(N)=O WFKAJVHLWXSISD-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- QQVIHTHCMHWDBS-UHFFFAOYSA-L isophthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC(C([O-])=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-L 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229940074358 magnesium ascorbate Drugs 0.000 description 1
- AIOKQVJVNPDJKA-ZZMNMWMASA-L magnesium;(2r)-2-[(1s)-1,2-dihydroxyethyl]-4-hydroxy-5-oxo-2h-furan-3-olate Chemical compound [Mg+2].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] AIOKQVJVNPDJKA-ZZMNMWMASA-L 0.000 description 1
- RRSMHQNLDRCPQG-UHFFFAOYSA-N methanamine;hydrofluoride Chemical compound [F-].[NH3+]C RRSMHQNLDRCPQG-UHFFFAOYSA-N 0.000 description 1
- MOVBJUGHBJJKOW-UHFFFAOYSA-N methyl 2-amino-5-methoxybenzoate Chemical compound COC(=O)C1=CC(OC)=CC=C1N MOVBJUGHBJJKOW-UHFFFAOYSA-N 0.000 description 1
- NQMRYBIKMRVZLB-UHFFFAOYSA-N methylamine hydrochloride Chemical compound [Cl-].[NH3+]C NQMRYBIKMRVZLB-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 235000019837 monoammonium phosphate Nutrition 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- PJUIMOJAAPLTRJ-UHFFFAOYSA-N monothioglycerol Chemical compound OCC(O)CS PJUIMOJAAPLTRJ-UHFFFAOYSA-N 0.000 description 1
- GHTYHZNTZWCGKI-UHFFFAOYSA-N morpholin-4-ium;fluoride Chemical compound [F-].C1COCC[NH2+]1 GHTYHZNTZWCGKI-UHFFFAOYSA-N 0.000 description 1
- UNBLNSMDMBMQQF-UHFFFAOYSA-N n,n-bis(2,2-dimethylpropyl)hydroxylamine Chemical compound CC(C)(C)CN(O)CC(C)(C)C UNBLNSMDMBMQQF-UHFFFAOYSA-N 0.000 description 1
- QYTNRAKVMLCHEM-UHFFFAOYSA-N n,n-bis(2,3-dimethylbutyl)hydroxylamine Chemical compound CC(C)C(C)CN(O)CC(C)C(C)C QYTNRAKVMLCHEM-UHFFFAOYSA-N 0.000 description 1
- GOGCTRSPVDNIKE-UHFFFAOYSA-N n,n-bis(2-methylbutan-2-yl)hydroxylamine Chemical compound CCC(C)(C)N(O)C(C)(C)CC GOGCTRSPVDNIKE-UHFFFAOYSA-N 0.000 description 1
- BJMHYUHEXQOMRC-UHFFFAOYSA-N n,n-bis(2-methylpentan-2-yl)hydroxylamine Chemical compound CCCC(C)(C)N(O)C(C)(C)CCC BJMHYUHEXQOMRC-UHFFFAOYSA-N 0.000 description 1
- XFHUEIZEGRAREY-UHFFFAOYSA-N n,n-bis(2-methylpropyl)hydroxylamine Chemical compound CC(C)CN(O)CC(C)C XFHUEIZEGRAREY-UHFFFAOYSA-N 0.000 description 1
- DNTWWSAXZIQLDD-UHFFFAOYSA-N n,n-bis(3-methylbutan-2-yl)hydroxylamine Chemical compound CC(C)C(C)N(O)C(C)C(C)C DNTWWSAXZIQLDD-UHFFFAOYSA-N 0.000 description 1
- QSKCGBWBFNNGHW-UHFFFAOYSA-N n,n-bis(3-methylbutyl)hydroxylamine Chemical compound CC(C)CCN(O)CCC(C)C QSKCGBWBFNNGHW-UHFFFAOYSA-N 0.000 description 1
- WYPIJDDVHHUKBE-UHFFFAOYSA-N n,n-bis(3-methylpentan-2-yl)hydroxylamine Chemical compound CCC(C)C(C)N(O)C(C)C(C)CC WYPIJDDVHHUKBE-UHFFFAOYSA-N 0.000 description 1
- IRQNCKMTWLHMGM-UHFFFAOYSA-N n,n-bis(4-methylpentyl)hydroxylamine Chemical compound CC(C)CCCN(O)CCCC(C)C IRQNCKMTWLHMGM-UHFFFAOYSA-N 0.000 description 1
- PRRGLBHZMSZRRW-UHFFFAOYSA-N n,n-di(butan-2-yl)hydroxylamine Chemical compound CCC(C)N(O)C(C)CC PRRGLBHZMSZRRW-UHFFFAOYSA-N 0.000 description 1
- BXCUMRWEJGRSCJ-UHFFFAOYSA-N n,n-di(cyclobutyl)hydroxylamine Chemical compound C1CCC1N(O)C1CCC1 BXCUMRWEJGRSCJ-UHFFFAOYSA-N 0.000 description 1
- QRGWVXYKHMMQJK-UHFFFAOYSA-N n,n-di(hexan-2-yl)hydroxylamine Chemical compound CCCCC(C)N(O)C(C)CCCC QRGWVXYKHMMQJK-UHFFFAOYSA-N 0.000 description 1
- YHULWDKLWCOKMX-UHFFFAOYSA-N n,n-di(pentan-2-yl)hydroxylamine Chemical compound CCCC(C)N(O)C(C)CCC YHULWDKLWCOKMX-UHFFFAOYSA-N 0.000 description 1
- OQAIUHLITJGRMM-UHFFFAOYSA-N n,n-di(propan-2-yl)hydroxylamine Chemical compound CC(C)N(O)C(C)C OQAIUHLITJGRMM-UHFFFAOYSA-N 0.000 description 1
- ZQRBSCXRHDJZBS-UHFFFAOYSA-N n,n-dibutylbutan-1-amine;hydrofluoride Chemical compound F.CCCCN(CCCC)CCCC ZQRBSCXRHDJZBS-UHFFFAOYSA-N 0.000 description 1
- FRQONEWDWWHIPM-UHFFFAOYSA-N n,n-dicyclohexylcyclohexanamine Chemical compound C1CCCCC1N(C1CCCCC1)C1CCCCC1 FRQONEWDWWHIPM-UHFFFAOYSA-N 0.000 description 1
- QTZCGGNOVCUAQK-UHFFFAOYSA-N n,n-dicyclohexylhydroxylamine Chemical compound C1CCCCC1N(O)C1CCCCC1 QTZCGGNOVCUAQK-UHFFFAOYSA-N 0.000 description 1
- HETSPTVTJMBTMQ-UHFFFAOYSA-N n,n-dicyclopentylhydroxylamine Chemical compound C1CCCC1N(O)C1CCCC1 HETSPTVTJMBTMQ-UHFFFAOYSA-N 0.000 description 1
- ZNAZZYNEJKNPME-UHFFFAOYSA-N n,n-dihexylhydroxylamine Chemical compound CCCCCCN(O)CCCCCC ZNAZZYNEJKNPME-UHFFFAOYSA-N 0.000 description 1
- VMESOKCXSYNAKD-UHFFFAOYSA-N n,n-dimethylhydroxylamine Chemical compound CN(C)O VMESOKCXSYNAKD-UHFFFAOYSA-N 0.000 description 1
- IXYXXQNFKSEXJM-UHFFFAOYSA-N n,n-dimethylmethanamine;hydron;fluoride Chemical compound F.CN(C)C IXYXXQNFKSEXJM-UHFFFAOYSA-N 0.000 description 1
- HSZZYODJBHTPQI-UHFFFAOYSA-N n,n-dipentylhydroxylamine Chemical compound CCCCCN(O)CCCCC HSZZYODJBHTPQI-UHFFFAOYSA-N 0.000 description 1
- JQDZCJWPDXZTEW-UHFFFAOYSA-N n,n-ditert-butylhydroxylamine Chemical compound CC(C)(C)N(O)C(C)(C)C JQDZCJWPDXZTEW-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- ZMBUORMORUHTIQ-UHFFFAOYSA-N n-butylbutan-1-amine;hydrofluoride Chemical compound [F-].CCCC[NH2+]CCCC ZMBUORMORUHTIQ-UHFFFAOYSA-N 0.000 description 1
- SOQDHKXOLGMZRB-UHFFFAOYSA-N n-cyclohexylcyclohexanamine;hydrofluoride Chemical compound [F-].C1CCCCC1[NH2+]C1CCCCC1 SOQDHKXOLGMZRB-UHFFFAOYSA-N 0.000 description 1
- IUVRYNCZPOFHIT-UHFFFAOYSA-N n-ethylethanamine;hydrofluoride Chemical compound [F-].CC[NH2+]CC IUVRYNCZPOFHIT-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- LVKUAMRYYGCOLC-UHFFFAOYSA-N n-methylmethanamine;hydrofluoride Chemical compound [F-].C[NH2+]C LVKUAMRYYGCOLC-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- GCLZYIAWFUPTLN-UHFFFAOYSA-N n-propylpropan-1-amine;hydrofluoride Chemical compound F.CCCNCCC GCLZYIAWFUPTLN-UHFFFAOYSA-N 0.000 description 1
- 125000005244 neohexyl group Chemical group [H]C([H])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 150000002924 oxiranes Chemical class 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002972 pentoses Chemical class 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- JBQNHQIURDYDFL-UHFFFAOYSA-N piperidin-1-ium;fluoride Chemical compound F.C1CCNCC1 JBQNHQIURDYDFL-UHFFFAOYSA-N 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- SHPKCSFVQGSAJU-SEPHDYHBSA-L potassium fumarate Chemical compound [K+].[K+].[O-]C(=O)\C=C\C([O-])=O SHPKCSFVQGSAJU-SEPHDYHBSA-L 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- DSISTIFLMZXDDI-UHFFFAOYSA-N propan-1-amine;hydrofluoride Chemical compound F.CCCN DSISTIFLMZXDDI-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- GRJJQCWNZGRKAU-UHFFFAOYSA-N pyridin-1-ium;fluoride Chemical compound F.C1=CC=NC=C1 GRJJQCWNZGRKAU-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- WGZXOMPLJAOTAY-UHFFFAOYSA-N pyrrolidin-1-ium;fluoride Chemical compound F.C1CCNC1 WGZXOMPLJAOTAY-UHFFFAOYSA-N 0.000 description 1
- LOAUVZALPPNFOQ-UHFFFAOYSA-N quinaldic acid Chemical compound C1=CC=CC2=NC(C(=O)O)=CC=C21 LOAUVZALPPNFOQ-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- ZNCPFRVNHGOPAG-UHFFFAOYSA-L sodium oxalate Chemical compound [Na+].[Na+].[O-]C(=O)C([O-])=O ZNCPFRVNHGOPAG-UHFFFAOYSA-L 0.000 description 1
- 229940039790 sodium oxalate Drugs 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 230000003381 solubilizing effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- SFVFIFLLYFPGHH-UHFFFAOYSA-M stearalkonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 SFVFIFLLYFPGHH-UHFFFAOYSA-M 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- QSUJAUYJBJRLKV-UHFFFAOYSA-M tetraethylazanium;fluoride Chemical compound [F-].CC[N+](CC)(CC)CC QSUJAUYJBJRLKV-UHFFFAOYSA-M 0.000 description 1
- POSYVRHKTFDJTR-UHFFFAOYSA-M tetrapropylazanium;fluoride Chemical compound [F-].CCC[N+](CCC)(CCC)CCC POSYVRHKTFDJTR-UHFFFAOYSA-M 0.000 description 1
- 229940035024 thioglycerol Drugs 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- GTZCVFVGUGFEME-UHFFFAOYSA-N trans-aconitic acid Natural products OC(=O)CC(C(O)=O)=CC(O)=O GTZCVFVGUGFEME-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- PIFYSWIJWKZPAT-UHFFFAOYSA-N tricyclohexylazanium;fluoride Chemical compound [F-].C1CCCCC1[NH+](C1CCCCC1)C1CCCCC1 PIFYSWIJWKZPAT-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-O triethanolammonium Chemical compound OCC[NH+](CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-O 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- GRSOSRPRKCYTMG-UHFFFAOYSA-N tripropylazanium;fluoride Chemical compound [F-].CCC[NH+](CCC)CCC GRSOSRPRKCYTMG-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
-
- C11D2111/22—
Abstract
Description
(式中、R1は炭素数1〜6の直鎖状、分枝状若しくは環状のアルキル基又は1〜3のヒドロキシル基を有する炭素数1〜4の直鎖状若しくは分枝状の置換アルキル基を表し、R2は水素原子、炭素数1〜6の直鎖状、分枝状若しくは環状のアルキル基又は1〜3のヒドロキシル基を有する炭素数1〜4の直鎖状若しくは分枝状の置換アルキル基を表す。)で示されるヒドロキシルアミン誘導体からなる群より選ばれる少なくとも1種の化合物を含有することを特徴とする半導体表面用処理剤組成物の発明である。
水4.74g及びアルキルスルホコハク酸ナトリウム(ネオコールP;第一工業製薬株式会社製)1.29gの溶液に、イエローランプ(直管イエロー蛍光ランプ,FLR40SY-IC/M;三菱電機オスラム株式会社製)の照射下、フッ化アンモニウム0.06g及び2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン-1(イルガキュア369;チバ・スペシャルティ・ケミカルズ社製)0.5gを加え、室温で攪拌した。フッ化アンモニウム及びイルガキュア369の溶解を確認した後、攪拌を続けながら、その溶液にγ-ブチロラクトン93gを加え、更に、ジエチルヒドロキシルアミン0.01gを加えた後、クエン酸0.4gを加えて、pH2の本発明の組成物(1)を調製した。
実施例2〜18では、表1及び表2に示す各成分を用いて、表1及び表2に示す量を仕込んだ以外は、実施例1と同様にして、本発明の組成物(2)〜(18)を調製した。これらの組成を実施例1の組成と併せて表1及び表2に示す。なお、表1及び表2に示す数値は、組成物の総重量を100%とした場合における各成分の重量%濃度である。
実施例1で調製した本発明の組成物(1)50mLに、室温中、紫外線照射装置(UV照射装置,MUV-35U MUV-PF001フィルター付き;株式会社モリテックス製)を用い、中心波長320nmの光を照射しながら、ゆるやかな攪拌下、上記評価用基板サンプルを3分間浸漬した。その後、純水で30秒間リンスし、基板表面を圧縮空気で乾燥した。乾燥後の基板サンプルを目視及び電解放出型走査電子顕微鏡(S-4800;株式会社日立ハイテクノロジーズ製)で観察したところ、レジスト層及びレジスト硬化層については残渣もなく良好に剥離できており、反射防止膜層については、その90%以上が剥離できていることを確認した。その結果、評価用基板サンプルを、光照射しながら本発明の組成物中に攪拌下3分間浸漬すれば、反射防止膜層(BARC層)のみならず、レジスト層やレジスト硬化層をも同時に剥離できることが判った。
実施例20〜36では、本発明の組成物(2)〜(18)について実施例19と同様の方法により、所定の時間浸漬を行って、レジスト層、レジスト硬化層及び反射防止膜層の剥離性能を目視及び電解放出型走査電子顕微鏡(S-4800;株式会社日立ハイテクノロジーズ製)で観察した。これらの結果を実施例19の結果と併せて表3に示す。
実施例15で調製した本発明の組成物(15)50mLを予め40℃に加温し、10分間加熱した。この加熱した溶液に、上記評価用基板サンプルを、ゆるやかな攪拌下、3分間浸漬した。なお、浸漬の間は加熱を行わなかった。その後、純水で30秒間リンスし、基板表面を圧縮空気で乾燥した。乾燥後の基板サンプルを目視及び電解放出型走査電子顕微鏡(S-4800;株式会社日立ハイテクノロジーズ製)で観察したところ、レジスト層、レジスト硬化層及び反射防止膜層のすべてが良好に剥離できていることが確認できた。その結果、評価用基板サンプルを、予め加熱した本発明の組成物中に攪拌下3分間浸漬すれば、反射防止膜層(BARC層)のみならず、レジスト層やレジスト硬化層をも同時に剥離できることが判った。
0.1Nの硫酸水溶液に5分間浸漬して、酸化被膜を除去した20mm×20mmの銅板を、実施例6で調製した本発明の組成物(6)の溶液50mLに、室温で10分間浸漬した。次いで、銅板を浸漬液から取り出した後、浸漬液中に含まれる銅をフレームレス原子吸光法により定量し、定量値からエッチングレートを確認したところ、その値は4.0×10-6nm/minであったことから、浸漬液中に殆ど銅は溶出していないことが確認された。この結果から、本発明の半導体表面用処理剤組成物を、銅配線が施された半導体基板に用いても、銅配線表面には悪影響を及ぼさないことが判った。
水99.44gに、イエローランプ(直管イエロー蛍光ランプ,FLR40SY-IC/M;三菱電機オスラム株式会社製)の照射下、フッ化アンモニウム0.06g及び2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン-1(イルガキュア369;チバ・スペシャルティ・ケミカルズ社製)0.5gを加え、室温で攪拌して、pH6の反射防止膜層剥離用組成物(1)を調製した。
参考例2〜3では、表4に示す各成分を用いて、表4に示す量を仕込んだ以外は、参考例1と同様にして、反射防止膜層剥離用組成物(2)〜(3)を調製した。これらの組成を参考例1の組成と併せて表4に示す。なお、表4に示す数値は、組成物の総重量を100%とした場合における各成分の重量%濃度である。
水99.94gに、フッ化アンモニウム0.06gを加え、室温で攪拌して、pH6の比較参考用組成物(1)を調製した。
参考例1で調製した反射防止膜層剥離用組成物(1)50mLに、室温中、紫外線照射装置(UV照射装置,MUV-35U MUV-PF001フィルター付き;株式会社モリテックス製)を用い、中心波長320nmの光を照射しながら、ゆるやかな攪拌下、反射防止膜層のみが塗布されたシリコン基板を浸漬し、浸漬中での反射防止膜層の剥離を目視で観察した。その結果、浸漬3分後には、反射防止膜層の剥離が確認でき、浸漬15分後では、反射防止膜層が完全に剥離されていることが確認された。
参考例6では、参考例2で調製した反射防止膜層剥離用組成物(2)を用いた以外は、参考例5と同様の方法により浸漬を行って、反射防止膜層の剥離を目視観察した。その結果、反射防止膜層剥離用組成物(2)を用いた場合は、浸漬3分後には、反射防止膜層が完全に剥離されていることが確認された。
参考例3で調製した反射防止膜層剥離用組成物(3)50mLを40℃に加温し、10分間加熱した。この加熱した溶液に、反射防止膜層のみが塗布されたシリコン基板を、ゆるやかな攪拌下浸漬を行い、浸漬中での反射防止膜層の剥離を目視で観察した。その結果、浸漬3分後には、反射防止膜層が完全に剥離されていることが確認された。
参考例4で調製した比較参考用組成物(1)50mLに、室温中、紫外線照射装置(UV照射装置,MUV-35U MUV-PF001フィルター付き;株式会社モリテックス製)を用い、中心波長320nmの光を照射しながら、ゆるやかな攪拌下、反射防止膜層のみが塗布されたシリコン基板を浸漬し、浸漬中での反射防止膜層の剥離を目視で観察した。しかしながら、30分間も浸漬し続けたのにもかかわらず、反射防止膜層がまったく剥離できなかった。
参考例1及び2で調製した反射防止膜層剥離用組成物(1)〜(2)の各々50mLに、室温中、紫外線を照射せずに、ゆるやかな攪拌下、反射防止膜層のみが塗布されたシリコン基板を浸漬し、浸漬中での反射防止膜層の剥離を目視で観察した。しかしながら、30分間も浸漬し続けたのにもかかわらず、反射防止膜層がまったく剥離できなかった。
参考例3で調製した反射防止膜層剥離用組成物(3)50mLに、加熱をせずに室温中で、ゆるやかな攪拌下、反射防止膜層のみが塗布されたシリコン基板を浸漬し、浸漬中での反射防止膜層の剥離を目視で観察した。しかしながら、30分間も浸漬し続けたのにもかかわらず、反射防止膜層がまったく剥離できなかった。
実施例39〜40では、本発明の組成物における有機溶剤であるγ-ブチロラクトンの代わりに、アセトン又はジメチルホルムアミド(DMF)を用いて、表5に示す量を仕込んだ以外は、実施例1と同様にして、本発明の半導体表面用処理剤組成物(19)〜(20)を調製した。これらの組成を表5に示す。なお、表5に示す数値は、組成物の総重量を100%とした場合における各成分の重量%濃度である。
実施例39で調製した本発明の半導体表面用処理剤組成物(19)及び実施例40で調製した本発明の半導体表面用処理剤組成物(20)の各々50mLに、室温中、紫外線照射装置(UV照射装置,MUV-35U MUV-PF001フィルター付き;株式会社モリテックス製)を用い、中心波長320nmの光を照射しながら、ゆるやかな攪拌下、上記評価用基板サンプルを30分間浸漬した。しかしながら、30分間も浸漬し続けたのにもかかわらず、レジスト層及びレジスト硬化層が剥離できず、その下部にある反射防止膜層(BARC層)もほとんど剥離できなかった。なお、反射防止膜層のみが塗布されたシリコン基板を、同条件下、上記本発明の半導体表面用処理剤組成物(19)〜(20)に浸漬した場合には、反射防止膜層が完全に剥離されていることが確認された。
比較例1では、還元剤であるヒドロキシルアミン又は/及びその誘導体を用いず、比較例2〜3では、ヒドロキシルアミン又は/及びその誘導体の代わりにアスコルビン酸パルミチルを還元剤として用いて、表6に示す量を仕込んだ以外は、実施例1と同様にして、比較用組成物(1)〜(3)を調製した。これらの組成を実施例1の組成と併せて表6に示す。なお、表6に示す数値は、組成物の総重量を100%とした場合における各成分の重量%濃度である。
比較例4〜6では、比較用組成物(1)〜(2)について実施例19と同様の方法により、所定の時間浸漬を行って、レジスト層、レジスト硬化層及び反射防止膜層の剥離性能を目視及び電解放出型走査電子顕微鏡(S-4800;株式会社日立ハイテクノロジーズ製)で観察した。これらの結果を本発明の組成物(1)を用いた実施例19の結果と併せて表7に示す。なお、比較例3で調製した比較用組成物(3)は、調製後の溶液からアスコルビン酸パルミチルが固体として析出してしまったため、評価対象の組成物から除外した。
Claims (24)
- 〔I〕水中でフッ素イオンを発生する化合物、〔II〕炭素ラジカル発生剤、〔III〕水、〔IV〕有機溶剤、並びに〔V〕ヒドロキシルアミン及び一般式[1]
(式中、R1は炭素数1〜6の直鎖状、分枝状若しくは環状のアルキル基又は1〜3のヒドロキシル基を有する炭素数1〜4の直鎖状若しくは分枝状の置換アルキル基を表し、R2は水素原子、炭素数1〜6の直鎖状、分枝状若しくは環状のアルキル基又は1〜3のヒドロキシル基を有する炭素数1〜4の直鎖状若しくは分枝状の置換アルキル基を表す。)で示されるヒドロキシルアミン誘導体からなる群より選ばれる少なくとも1種の化合物を含有することを特徴とする半導体表面用処理剤組成物。 - 更に〔VI〕酸を含有することを特徴とする請求項1に記載の組成物。
- 更に〔VII〕界面活性剤を含有することを特徴とする請求項1に記載の組成物。
- 前記半導体表面用処理剤が、反射防止膜層剥離用である請求項1に記載の組成物。
- 前記半導体表面用処理剤が、BARC層剥離用である請求項1に記載の組成物。
- 前記半導体表面用処理剤が、反射防止膜層及びレジスト層剥離用である請求項1に記載の組成物。
- 前記半導体表面用処理剤が、BARC層及びレジスト層剥離用である請求項1に記載の組成物。
- 前記〔I〕水中でフッ素イオンを発生する化合物が、フッ化水素と無機非金属の塩基との塩である請求項1に記載の組成物。
- 前記フッ化水素と無機非金属の塩基との塩が、フッ化アンモニウムである請求項8に記載の組成物。
- 前記〔II〕炭素ラジカル発生剤が、波長200〜750nmの光照射によって炭素ラジカルを発生する化合物である請求項1に記載の組成物。
- 前記〔IV〕有機溶剤が、アルコール系、エステル系、アミド系及びスルホキシド系の有機溶剤からなる群より選ばれる少なくとも1種のものであって、選ばれた各々の有機溶剤自体の双極子モーメントが1.5〜7.5debyeであり、かつ選ばれた各々の有機溶剤自体の比重が0.7〜1.2の範囲のものである請求項1に記載の組成物。
- 前記〔IV〕有機溶剤が、イソプロパノール、γ-ブチロラクトン及びN-メチルピロリドンからなる群より選ばれる少なくとも1種のものである請求項1に記載の組成物。
- 前記〔V〕ヒドロキシルアミン及び一般式[1]で示されるヒドロキシルアミン誘導体からなる群より選ばれる少なくとも1種の化合物が、モノ又はジエチルヒドロキシルアミン、モノ又はビス(2,2-ジヒドロキシエチル)ヒドロキシルアミン及びモノ又はビス(2,3-ジヒドロキシ-n-プロピル)-1-ヒドロキシルアミンからなる群より選ばれる少なくとも1種のものである請求項1に記載の組成物。
- 前記〔V〕ヒドロキシルアミン及び一般式[1]で示されるヒドロキシルアミン誘導体からなる群より選ばれる少なくとも1種の化合物が、ジエチルヒドロキシルアミン、ビス(2,2-ジヒドロキシエチル)ヒドロキシルアミン及びビス(2,3-ジヒドロキシ-n-プロピル)-1-ヒドロキシルアミンからなる群より選ばれる少なくとも1種のものである請求項1に記載の組成物。
- 前記〔VI〕酸が、脂肪族ジカルボン酸又はその塩、脂肪族ヒドロキシカルボン酸又はその塩、芳香族ジカルボン酸又はその塩及び芳香族ヒドロキシカルボン酸からなる群より選ばれる少なくとも1種のものである請求項2に記載の組成物。
- 前記脂肪族ジカルボン酸又はその塩、脂肪族ヒドロキシカルボン酸又はその塩、芳香族ジカルボン酸又はその塩及び芳香族ヒドロキシカルボン酸からなる群より選ばれる少なくとも1種のものが、シュウ酸、シュウ酸-1ナトリウム、シュウ酸-1カリウム、シュウ酸-1アンモニウム、マロン酸、マロン酸-1ナトリウム、マロン酸-1カリウム、マロン酸-1アンモニウム、コハク酸、コハク酸-1ナトリウム、コハク酸-1カリウム、コハク酸-1アンモニウム、グルタル酸、グルタル酸-1ナトリウム、グルタル酸-1カリウム、グルタル酸-1アンモニウム、アジピン酸、アジピン酸-1ナトリウム、アジピン酸-1カリウム、アジピン酸-1アンモニウム、ピメリン酸、ピメリン酸-1ナトリウム、ピメリン酸-1カリウム、ピメリン酸-1アンモニウム、マレイン酸、マレイン酸-1ナトリウム、マレイン酸-1カリウム、マレイン酸-1アンモニウム、フマル酸、フマル酸-1ナトリウム、フマル酸-1カリウム、フマル酸-1アンモニウム、リンゴ酸、リンゴ酸-1ナトリウム、リンゴ酸-1カリウム、リンゴ酸-1アンモニウム、酒石酸、酒石酸-1ナトリウム、酒石酸-1カリウム、酒石酸-1アンモニウム、クエン酸、クエン酸-1ナトリウム、クエン酸-2ナトリウム、クエン酸-1カリウム、クエン酸-2カリウム、クエン酸-1アンモニウム、クエン酸-2アンモニウム、フタル酸、フタル酸-1ナトリウム、フタル酸-1カリウム及びフタル酸-1アンモニウムからなる群より選ばれる少なくとも1種のものである請求項15に記載の組成物。
- 前記脂肪族ジカルボン酸又はその塩、脂肪族ヒドロキシカルボン酸又はその塩、芳香族ジカルボン酸又はその塩及び芳香族ヒドロキシカルボン酸からなる群より選ばれる少なくとも1種のものが、シュウ酸、シュウ酸-1ナトリウム、シュウ酸-1カリウム、シュウ酸-1アンモニウム、リンゴ酸、リンゴ酸-1ナトリウム、リンゴ酸-1カリウム、リンゴ酸-1アンモニウム、酒石酸、酒石酸-1ナトリウム、酒石酸-1カリウム、酒石酸-1アンモニウム、クエン酸、クエン酸-1ナトリウム、クエン酸-2ナトリウム、クエン酸-1カリウム、クエン酸-2カリウム、クエン酸-1アンモニウム及びクエン酸-2アンモニウムからなる群より選ばれる少なくとも1種のものである請求項15に記載の組成物。
- 前記半導体表面用処理剤が反射防止膜層剥離用であって、当該反射防止膜層の下層がLow-k膜であり、前記半導体表面用処理剤のpHが7以下である請求項1に記載の組成物。
- 前記半導体表面用処理剤が反射防止膜層及びレジスト層剥離用であって、当該反射防止膜層の下層がLow-k膜であり、前記半導体表面用処理剤のpHが7以下である請求項1に記載の組成物。
- 前記半導体表面用処理剤が反射防止膜層剥離用であって、当該反射防止膜層の下層がLow-k膜であり、前記半導体表面用処理剤のpHが1〜4の範囲である請求項2に記載の組成物。
- 前記半導体表面用処理剤が反射防止膜層及びレジスト層剥離用であって、当該反射防止膜層の下層がLow-k膜であり、前記半導体表面用処理剤のpHが1〜4の範囲である請求項2に記載の組成物。
- 前記〔I〕水中でフッ素イオンを発生する化合物の重量%が0.01〜5重量%、前記〔II〕炭素ラジカル発生剤の重量%が0.05〜10重量%、前記〔III〕水の重量%が0.02〜10重量%、前記〔IV〕有機溶剤の重量%が80〜99重量%、前記〔V〕ヒドロキシルアミン及び一般式[1]で示されるヒドロキシルアミン誘導体からなる群より選ばれる少なくとも1種の化合物の重量%が0.001〜5重量%、前記〔VI〕酸の重量%が0.1〜5重量%、並びに前記〔VII〕界面活性剤の重量%が0.05〜5重量%である請求項3に記載の組成物。
- 多層銅配線構造の半導体基板に使用するものである請求項1に記載の組成物。
- 請求項1に記載の組成物を用いることを特徴とする半導体表面の処理方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011529911A JP5652399B2 (ja) | 2009-09-02 | 2010-09-01 | 半導体表面用処理剤組成物及びそれを用いた半導体表面の処理方法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009202260 | 2009-09-02 | ||
JP2009202260 | 2009-09-02 | ||
JP2011529911A JP5652399B2 (ja) | 2009-09-02 | 2010-09-01 | 半導体表面用処理剤組成物及びそれを用いた半導体表面の処理方法 |
PCT/JP2010/064904 WO2011027772A1 (ja) | 2009-09-02 | 2010-09-01 | 半導体表面用処理剤組成物及びそれを用いた半導体表面の処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2011027772A1 true JPWO2011027772A1 (ja) | 2013-02-04 |
JP5652399B2 JP5652399B2 (ja) | 2015-01-14 |
Family
ID=43649307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011529911A Expired - Fee Related JP5652399B2 (ja) | 2009-09-02 | 2010-09-01 | 半導体表面用処理剤組成物及びそれを用いた半導体表面の処理方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US9034810B2 (ja) |
EP (1) | EP2475000B1 (ja) |
JP (1) | JP5652399B2 (ja) |
KR (1) | KR20120073228A (ja) |
CN (1) | CN102484057B (ja) |
IL (1) | IL218408A0 (ja) |
SG (2) | SG10201405260YA (ja) |
TW (1) | TW201128328A (ja) |
WO (1) | WO2011027772A1 (ja) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5077594B2 (ja) * | 2010-01-26 | 2012-11-21 | 信越化学工業株式会社 | ポジ型レジスト材料及びパターン形成方法 |
CN102998915A (zh) * | 2012-07-17 | 2013-03-27 | 张峰 | 正型光致抗蚀剂剥离剂组合物 |
CN103383529B (zh) * | 2012-07-18 | 2015-12-02 | 张峰 | 正型光刻胶清除液组合物 |
CN103383530B (zh) * | 2012-07-18 | 2015-12-02 | 张峰 | 正型光阻清洗剂组合物 |
CN103543620B (zh) * | 2013-11-11 | 2016-07-06 | 深圳市星扬化工有限公司 | 一种印制电路板显影膜去除液 |
KR20200034830A (ko) | 2013-12-06 | 2020-03-31 | 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. | 표면 잔류물 제거용 세정 제형 |
WO2015152212A1 (ja) * | 2014-03-31 | 2015-10-08 | 富士フイルム株式会社 | 除去液及び除去方法 |
KR102153745B1 (ko) | 2014-04-16 | 2020-09-09 | 삼성전자주식회사 | 세정액 조성물 및 이를 이용한 반도체 소자의 세정 방법 |
EP3208659A1 (en) * | 2014-10-14 | 2017-08-23 | AZ Electronic Materials (Luxembourg) S.à.r.l. | Composition for resist patterning and method for forming pattern using same |
CN106298442B (zh) * | 2015-05-25 | 2020-11-27 | 中芯国际集成电路制造(上海)有限公司 | 残留物的清除方法 |
CN106919011B (zh) * | 2015-12-25 | 2021-12-17 | 安集微电子科技(上海)股份有限公司 | 一种富含水的羟胺剥离清洗液 |
JP6689991B2 (ja) * | 2016-08-31 | 2020-04-28 | 富士フイルム株式会社 | 処理液、基板の洗浄方法、半導体デバイスの製造方法 |
US10597609B2 (en) | 2016-12-29 | 2020-03-24 | Tokyo Ohka Kogyo Co., Ltd. | Cleaning liquid, anticorrosion agent, and method for manufacturing the same |
US10597616B2 (en) | 2016-12-29 | 2020-03-24 | Toyota Ohka Kogyo Co., Ltd. | Cleaning liquid and method for manufacturing the same |
JP6965143B2 (ja) | 2016-12-29 | 2021-11-10 | 東京応化工業株式会社 | 洗浄液、防食剤、及びこれらを製造する方法 |
JP6965144B2 (ja) | 2016-12-29 | 2021-11-10 | 東京応化工業株式会社 | 洗浄液及びこれを製造する方法 |
IL277275B2 (en) | 2018-03-28 | 2023-11-01 | Fujifilm Electronic Mat Usa Inc | cleaning products |
WO2021100353A1 (ja) * | 2019-11-22 | 2021-05-27 | 富士フイルムエレクトロニクスマテリアルズ株式会社 | 洗浄液、洗浄方法 |
KR20220109425A (ko) * | 2020-01-28 | 2022-08-04 | 후지필름 가부시키가이샤 | 처리액, 피처리물의 처리 방법 |
JP2022041077A (ja) * | 2020-08-31 | 2022-03-11 | 株式会社Screenホールディングス | 基板処理方法および基板処理装置 |
CN114014776B (zh) * | 2021-12-09 | 2024-03-12 | 西安鸿钧睿泽新材料科技有限公司 | 一种具有低全球变暖潜值的化合物、制备方法及其应用 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001083712A (ja) * | 1999-09-10 | 2001-03-30 | Nec Corp | レジスト用剥離液組成物 |
WO2004019134A1 (ja) * | 2002-08-22 | 2004-03-04 | Daikin Industries, Ltd. | 剥離液 |
JP2006009006A (ja) * | 2004-06-15 | 2006-01-12 | Air Products & Chemicals Inc | 基材から残留物を除去するための組成物及びその組成物を用いた方法 |
JP2006011297A (ja) * | 2004-06-29 | 2006-01-12 | Kanto Chem Co Inc | フォトレジスト残渣及びポリマー残渣除去組成物 |
WO2007058286A1 (ja) * | 2005-11-18 | 2007-05-24 | Mitsubishi Gas Chemical Company, Inc. | 基板の洗浄方法及び洗浄装置 |
WO2009110582A1 (ja) * | 2008-03-07 | 2009-09-11 | 和光純薬工業株式会社 | 半導体表面用処理剤組成物及びそれを用いた半導体表面の処理方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3410403B2 (ja) * | 1999-09-10 | 2003-05-26 | 東京応化工業株式会社 | ホトレジスト用剥離液およびこれを用いたホトレジスト剥離方法 |
JP2001100436A (ja) * | 1999-09-28 | 2001-04-13 | Mitsubishi Gas Chem Co Inc | レジスト剥離液組成物 |
KR100540525B1 (ko) * | 2000-04-26 | 2006-01-11 | 다이킨 고교 가부시키가이샤 | 세정용 조성물 |
US20040038840A1 (en) * | 2002-04-24 | 2004-02-26 | Shihying Lee | Oxalic acid as a semiaqueous cleaning product for copper and dielectrics |
JP4443864B2 (ja) * | 2002-07-12 | 2010-03-31 | 株式会社ルネサステクノロジ | レジストまたはエッチング残さ物除去用洗浄液および半導体装置の製造方法 |
JP2004241414A (ja) | 2003-02-03 | 2004-08-26 | Sharp Corp | 剥離洗浄装置 |
SG147482A1 (en) * | 2003-10-29 | 2008-11-28 | Mallinckrodt Baker Inc | Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors |
JP2005209953A (ja) * | 2004-01-23 | 2005-08-04 | Tokyo Ohka Kogyo Co Ltd | 剥離洗浄液、該剥離洗浄液を用いた半導体基板洗浄方法および金属配線形成方法 |
JP4440689B2 (ja) * | 2004-03-31 | 2010-03-24 | 東友ファインケム株式会社 | レジスト剥離剤組成物 |
SG118380A1 (en) * | 2004-06-15 | 2006-01-27 | Air Prod & Chem | Composition and method comprising same for removing residue from a substrate |
JP2006106616A (ja) | 2004-10-08 | 2006-04-20 | Tokyo Ohka Kogyo Co Ltd | ホトレジスト除去用処理液および基板の処理方法 |
TW200710205A (en) * | 2005-06-16 | 2007-03-16 | Advanced Tech Materials | Dense fluid compositions for removal of hardened photoresist, post-etch residue and/or bottom anti-reflective coating layers |
US7700533B2 (en) * | 2005-06-23 | 2010-04-20 | Air Products And Chemicals, Inc. | Composition for removal of residue comprising cationic salts and methods using same |
US7947637B2 (en) * | 2006-06-30 | 2011-05-24 | Fujifilm Electronic Materials, U.S.A., Inc. | Cleaning formulation for removing residues on surfaces |
JP2009075285A (ja) * | 2007-09-20 | 2009-04-09 | Fujifilm Corp | 半導体デバイスの剥離液、及び、剥離方法 |
TW200940706A (en) * | 2007-10-29 | 2009-10-01 | Ekc Technology Inc | Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions |
-
2010
- 2010-09-01 SG SG10201405260YA patent/SG10201405260YA/en unknown
- 2010-09-01 EP EP10813721.7A patent/EP2475000B1/en not_active Not-in-force
- 2010-09-01 CN CN201080038221.8A patent/CN102484057B/zh not_active Expired - Fee Related
- 2010-09-01 US US13/393,981 patent/US9034810B2/en not_active Expired - Fee Related
- 2010-09-01 KR KR1020127006511A patent/KR20120073228A/ko not_active Application Discontinuation
- 2010-09-01 TW TW099129422A patent/TW201128328A/zh unknown
- 2010-09-01 JP JP2011529911A patent/JP5652399B2/ja not_active Expired - Fee Related
- 2010-09-01 SG SG2012014940A patent/SG178611A1/en unknown
- 2010-09-01 WO PCT/JP2010/064904 patent/WO2011027772A1/ja active Application Filing
-
2012
- 2012-02-29 IL IL218408A patent/IL218408A0/en unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001083712A (ja) * | 1999-09-10 | 2001-03-30 | Nec Corp | レジスト用剥離液組成物 |
WO2004019134A1 (ja) * | 2002-08-22 | 2004-03-04 | Daikin Industries, Ltd. | 剥離液 |
JP2006009006A (ja) * | 2004-06-15 | 2006-01-12 | Air Products & Chemicals Inc | 基材から残留物を除去するための組成物及びその組成物を用いた方法 |
JP2006011297A (ja) * | 2004-06-29 | 2006-01-12 | Kanto Chem Co Inc | フォトレジスト残渣及びポリマー残渣除去組成物 |
WO2007058286A1 (ja) * | 2005-11-18 | 2007-05-24 | Mitsubishi Gas Chemical Company, Inc. | 基板の洗浄方法及び洗浄装置 |
WO2009110582A1 (ja) * | 2008-03-07 | 2009-09-11 | 和光純薬工業株式会社 | 半導体表面用処理剤組成物及びそれを用いた半導体表面の処理方法 |
Also Published As
Publication number | Publication date |
---|---|
TW201128328A (en) | 2011-08-16 |
CN102484057B (zh) | 2015-10-14 |
WO2011027772A1 (ja) | 2011-03-10 |
EP2475000A1 (en) | 2012-07-11 |
KR20120073228A (ko) | 2012-07-04 |
CN102484057A (zh) | 2012-05-30 |
SG178611A1 (en) | 2012-03-29 |
EP2475000A4 (en) | 2013-03-27 |
US9034810B2 (en) | 2015-05-19 |
JP5652399B2 (ja) | 2015-01-14 |
SG10201405260YA (en) | 2014-10-30 |
IL218408A0 (en) | 2012-04-30 |
US20120157368A1 (en) | 2012-06-21 |
EP2475000B1 (en) | 2015-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5652399B2 (ja) | 半導体表面用処理剤組成物及びそれを用いた半導体表面の処理方法 | |
JP5375820B2 (ja) | 半導体表面用処理剤組成物及びそれを用いた半導体表面の処理方法 | |
JP5598477B2 (ja) | レジスト剥離剤組成物及び当該組成物を用いたレジストの剥離方法 | |
JP6430925B2 (ja) | シリコンパッシベーションの改善された半水性フォトレジスト又は半導体製造残留物剥離及び洗浄用組成物 | |
JP6470239B2 (ja) | 洗浄配合物 | |
JP2005522027A (ja) | 半導体基板洗浄のためのph緩衝組成物 | |
KR20110127244A (ko) | 표면 상의 잔류물을 제거하기 위한 세정 조성물 | |
EP2758507A1 (en) | Process and composition for removing substances from substrates | |
KR20130138681A (ko) | 리소그래피용 세정액 및 배선 형성 방법 | |
WO2017119350A1 (ja) | 処理液、基板の洗浄方法、及び、半導体デバイスの製造方法 | |
JP2007200944A (ja) | 基板洗浄液 | |
JP4415228B2 (ja) | レジスト剥離液用組成物 | |
KR20170114476A (ko) | 레지스트 박리제 조성물 제조방법 | |
KR20130021213A (ko) | 레지스트 박리액 조성물 및 이를 이용한 레지스트의 박리방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20130821 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140729 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140821 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20141021 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20141103 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5652399 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |