CN103543620B - 一种印制电路板显影膜去除液 - Google Patents
一种印制电路板显影膜去除液 Download PDFInfo
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CN201310555963.3A CN103543620B (zh) | 2013-11-11 | 2013-11-11 | 一种印制电路板显影膜去除液 |
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CN103543620A CN103543620A (zh) | 2014-01-29 |
CN103543620B true CN103543620B (zh) | 2016-07-06 |
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CN106519781B (zh) * | 2016-11-15 | 2020-01-03 | 广东石油化工学院 | 一种粉末涂料脱漆组合物及其制备方法和应用 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US6800142B1 (en) * | 2002-05-30 | 2004-10-05 | Novellus Systems, Inc. | Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment |
CN102484057A (zh) * | 2009-09-02 | 2012-05-30 | 和光纯药工业株式会社 | 半导体表面用处理剂组合物和使用该组合物的半导体表面的处理方法 |
WO2012161790A1 (en) * | 2011-02-24 | 2012-11-29 | John Moore | Concentrated chemical composition and method for removing photoresist during microelectric fabrication |
WO2012168485A1 (en) * | 2011-06-09 | 2012-12-13 | Technic France | Composition of solutions and conditions for use enabling the stripping and complete dissolution of photoresists |
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WO2002003143A2 (en) * | 2000-06-29 | 2002-01-10 | Huntsman Petrochemical Corporation | Alkylene carbonate-based photoresist stripping compositions |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US6800142B1 (en) * | 2002-05-30 | 2004-10-05 | Novellus Systems, Inc. | Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment |
CN102484057A (zh) * | 2009-09-02 | 2012-05-30 | 和光纯药工业株式会社 | 半导体表面用处理剂组合物和使用该组合物的半导体表面的处理方法 |
WO2012161790A1 (en) * | 2011-02-24 | 2012-11-29 | John Moore | Concentrated chemical composition and method for removing photoresist during microelectric fabrication |
WO2012168485A1 (en) * | 2011-06-09 | 2012-12-13 | Technic France | Composition of solutions and conditions for use enabling the stripping and complete dissolution of photoresists |
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Inventor after: Zhou Guoxin Inventor after: Li Yaquan Inventor after: Jiu Ying Inventor after: Tong Yongdeng Inventor before: Liu Guozheng Inventor before: Luo Hairong |
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Effective date of registration: 20160606 Address after: 518000, Guangdong, Shenzhen, Baoan District manhole Street Xinqiao bridge, No. four, No. 5, on the first floor, on the east side of the two floor and the third floor Applicant after: Shenzhen Xingyang Chemical Industry Co. LTD. Address before: 518104 Guangdong province Dongguan City Hengli Town, Zhongshan Road No. 398 Applicant before: Liu Guozheng |
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Address after: 518000, Guangdong, Shenzhen, Baoan District manhole Street Xinqiao bridge, No. four, No. 5, on the first floor, on the east side of the two floor and the third floor Patentee after: Shenzhen Xingyang hi-tech Co., Ltd. Address before: 518000, Guangdong, Shenzhen, Baoan District manhole Street Xinqiao bridge, No. four, No. 5, on the first floor, on the east side of the two floor and the third floor Patentee before: Shenzhen Xingyang Chemical Industry Co. LTD. |
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