JPS638613B2 - - Google Patents

Info

Publication number
JPS638613B2
JPS638613B2 JP53014202A JP1420278A JPS638613B2 JP S638613 B2 JPS638613 B2 JP S638613B2 JP 53014202 A JP53014202 A JP 53014202A JP 1420278 A JP1420278 A JP 1420278A JP S638613 B2 JPS638613 B2 JP S638613B2
Authority
JP
Japan
Prior art keywords
metal pattern
layer
substrate
metal
insulating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53014202A
Other languages
English (en)
Japanese (ja)
Other versions
JPS53100785A (en
Inventor
Yan Kooru Heritsuto
Hosutoma Ranberutosu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of JPS53100785A publication Critical patent/JPS53100785A/ja
Publication of JPS638613B2 publication Critical patent/JPS638613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
    • H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • H10P50/262—
    • H10P50/282—
    • H10W20/077—

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Magnetic Heads (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP1420278A 1977-02-15 1978-02-13 Device and method of producing same Granted JPS53100785A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7701559A NL7701559A (nl) 1977-02-15 1977-02-15 Het maken van schuine hellingen aan metaal- patronen, alsmede substraat voor een geinte- greerde schakeling voorzien van een dergelijk patroon.

Publications (2)

Publication Number Publication Date
JPS53100785A JPS53100785A (en) 1978-09-02
JPS638613B2 true JPS638613B2 (enExample) 1988-02-23

Family

ID=19827979

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1420278A Granted JPS53100785A (en) 1977-02-15 1978-02-13 Device and method of producing same

Country Status (8)

Country Link
US (1) US4176016A (enExample)
JP (1) JPS53100785A (enExample)
CA (1) CA1102922A (enExample)
DE (1) DE2804602C2 (enExample)
FR (1) FR2380636B1 (enExample)
GB (1) GB1553181A (enExample)
HK (1) HK8880A (enExample)
NL (1) NL7701559A (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3032708C2 (de) * 1980-08-30 1987-01-22 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur Herstellung eines Dünnschicht-Magnetfeld-Sensors
JPS5759355A (en) * 1980-09-26 1982-04-09 Fujitsu Ltd Manufacture of semiconductor device
JPH0697660B2 (ja) * 1985-03-23 1994-11-30 日本電信電話株式会社 薄膜形成方法
FR2619457B1 (fr) * 1987-08-14 1989-11-17 Commissariat Energie Atomique Procede d'obtention d'un motif notamment en materiau ferromagnetique ayant des flancs de pente differente et tete magnetique comportant un tel motif
US5756397A (en) * 1993-12-28 1998-05-26 Lg Semicon Co., Ltd. Method of fabricating a wiring in a semiconductor device
DE4400032C1 (de) * 1994-01-03 1995-08-31 Gold Star Electronics Halbleitereinrichtung und Verfahren zu deren Herstellung
JP2016219452A (ja) * 2015-05-14 2016-12-22 富士通株式会社 多層基板及び多層基板の製造方法
CN114080088B (zh) * 2020-08-10 2024-05-31 鹏鼎控股(深圳)股份有限公司 电路板及其制备方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE758160A (fr) * 1969-10-31 1971-04-01 Fairchild Camera Instr Co Structure metallique a couches multiples et procede de fabrication d'une telle structure
US3666548A (en) * 1970-01-06 1972-05-30 Ibm Monocrystalline semiconductor body having dielectrically isolated regions and method of forming
DE2123630A1 (en) * 1970-05-12 1971-12-02 Texas Instruments Inc Semiconductor with multilayer interconnections - using - successive masking and photo etching
US3700508A (en) * 1970-06-25 1972-10-24 Gen Instrument Corp Fabrication of integrated microcircuit devices
FR2119930B1 (enExample) * 1970-12-31 1974-08-19 Ibm
US3755123A (en) * 1971-03-30 1973-08-28 Method for sputtering a film on an irregular surface
JPS5217995B2 (enExample) * 1972-02-18 1977-05-19
US3804738A (en) * 1973-06-29 1974-04-16 Ibm Partial planarization of electrically insulative films by resputtering
US3868723A (en) * 1973-06-29 1975-02-25 Ibm Integrated circuit structure accommodating via holes
US3839111A (en) * 1973-08-20 1974-10-01 Rca Corp Method of etching silicon oxide to produce a tapered edge thereon
US4022930A (en) * 1975-05-30 1977-05-10 Bell Telephone Laboratories, Incorporated Multilevel metallization for integrated circuits

Also Published As

Publication number Publication date
JPS53100785A (en) 1978-09-02
GB1553181A (en) 1979-09-19
US4176016A (en) 1979-11-27
FR2380636A1 (fr) 1978-09-08
CA1102922A (en) 1981-06-09
DE2804602C2 (de) 1985-01-17
NL7701559A (nl) 1978-08-17
HK8880A (en) 1980-03-14
DE2804602A1 (de) 1978-08-17
FR2380636B1 (fr) 1985-06-14

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