JPS6235267B2 - - Google Patents

Info

Publication number
JPS6235267B2
JPS6235267B2 JP8682480A JP8682480A JPS6235267B2 JP S6235267 B2 JPS6235267 B2 JP S6235267B2 JP 8682480 A JP8682480 A JP 8682480A JP 8682480 A JP8682480 A JP 8682480A JP S6235267 B2 JPS6235267 B2 JP S6235267B2
Authority
JP
Japan
Prior art keywords
groove
film
etching
semiconductor device
silicon dioxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8682480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5712533A (en
Inventor
Junji Sakurai
Hajime Kamioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8682480A priority Critical patent/JPS5712533A/ja
Publication of JPS5712533A publication Critical patent/JPS5712533A/ja
Publication of JPS6235267B2 publication Critical patent/JPS6235267B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/762Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76224Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Element Separation (AREA)
  • Formation Of Insulating Films (AREA)
JP8682480A 1980-06-26 1980-06-26 Manufacture of semiconductor device Granted JPS5712533A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8682480A JPS5712533A (en) 1980-06-26 1980-06-26 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8682480A JPS5712533A (en) 1980-06-26 1980-06-26 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5712533A JPS5712533A (en) 1982-01-22
JPS6235267B2 true JPS6235267B2 (enrdf_load_stackoverflow) 1987-07-31

Family

ID=13897550

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8682480A Granted JPS5712533A (en) 1980-06-26 1980-06-26 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5712533A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021213701A1 (de) 2021-12-02 2023-06-07 Robert Bosch Gesellschaft mit beschränkter Haftung Kontrollsystem und Verfahren zur Kontrolle der Position eines mobilen Endgeräts mittels eines Kontrollsystems

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5743438A (en) * 1980-08-29 1982-03-11 Toshiba Corp Semiconductor device and manufacture thereof
JPS589333A (ja) * 1981-07-08 1983-01-19 Hitachi Ltd 半導体装置
US4506435A (en) * 1981-07-27 1985-03-26 International Business Machines Corporation Method for forming recessed isolated regions
JPS5955033A (ja) * 1982-09-22 1984-03-29 Fujitsu Ltd 素子間分離膜の形成方法
JPS59106133A (ja) * 1982-12-09 1984-06-19 Nec Corp 集積回路装置
JPS59119848A (ja) * 1982-12-27 1984-07-11 Fujitsu Ltd 半導体装置の製造方法
JPS6043843A (ja) * 1983-08-19 1985-03-08 Nec Corp 半導体装置の製造方法
JPS60111436A (ja) * 1983-11-22 1985-06-17 Toshiba Corp 半導体装置の製造方法
JPS60170951A (ja) * 1984-02-16 1985-09-04 Nec Corp 素子分離方法
US4729815A (en) * 1986-07-21 1988-03-08 Motorola, Inc. Multiple step trench etching process
JP2554635B2 (ja) * 1986-09-30 1996-11-13 株式会社東芝 半導体装置の製造方法
JPS6392045A (ja) * 1986-10-06 1988-04-22 Toshiba Corp 半導体装置の製造方法
JP2635607B2 (ja) * 1987-08-28 1997-07-30 株式会社東芝 半導体装置の製造方法
US4952524A (en) * 1989-05-05 1990-08-28 At&T Bell Laboratories Semiconductor device manufacture including trench formation
JP2667552B2 (ja) * 1990-05-28 1997-10-27 株式会社東芝 半導体装置の製造方法
KR960006714B1 (ko) * 1990-05-28 1996-05-22 가부시끼가이샤 도시바 반도체 장치의 제조 방법
US6077786A (en) * 1997-05-08 2000-06-20 International Business Machines Corporation Methods and apparatus for filling high aspect ratio structures with silicate glass
KR100392894B1 (ko) * 2000-12-27 2003-07-28 동부전자 주식회사 반도체 소자의 트렌치 형성 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021213701A1 (de) 2021-12-02 2023-06-07 Robert Bosch Gesellschaft mit beschränkter Haftung Kontrollsystem und Verfahren zur Kontrolle der Position eines mobilen Endgeräts mittels eines Kontrollsystems
WO2023099369A1 (de) 2021-12-02 2023-06-08 Robert Bosch Gmbh Kontrollsystem und verfahren zur kontrolle der position eines mobilen endgeräts mittels eines kontrollsystems

Also Published As

Publication number Publication date
JPS5712533A (en) 1982-01-22

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