JPS60186416A - 低抵抗ＳｎＯ↓２ド−プＩｎ↓２Ｏ↓３粉末の製造法 - Google Patents

低抵抗ＳｎＯ↓２ド−プＩｎ↓２Ｏ↓３粉末の製造法

Info

Publication number
JPS60186416A
JPS60186416A JP3849184A JP3849184A JPS60186416A JP S60186416 A JPS60186416 A JP S60186416A JP 3849184 A JP3849184 A JP 3849184A JP 3849184 A JP3849184 A JP 3849184A JP S60186416 A JPS60186416 A JP S60186416A
Authority
JP
Japan
Prior art keywords
powder
doped
added
oxalic acid
chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3849184A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0563412B2 (enrdf_load_stackoverflow
Inventor
Kiyoyoshi Watanabe
渡辺　精悦
Kenji Yajima
健児 矢島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP3849184A priority Critical patent/JPS60186416A/ja
Publication of JPS60186416A publication Critical patent/JPS60186416A/ja
Publication of JPH0563412B2 publication Critical patent/JPH0563412B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Conductive Materials (AREA)
JP3849184A 1984-03-02 1984-03-02 低抵抗ＳｎＯ↓２ド−プＩｎ↓２Ｏ↓３粉末の製造法 Granted JPS60186416A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3849184A JPS60186416A (ja) 1984-03-02 1984-03-02 低抵抗ＳｎＯ↓２ド−プＩｎ↓２Ｏ↓３粉末の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3849184A JPS60186416A (ja) 1984-03-02 1984-03-02 低抵抗ＳｎＯ↓２ド−プＩｎ↓２Ｏ↓３粉末の製造法

Publications (2)

Publication Number Publication Date
JPS60186416A true JPS60186416A (ja) 1985-09-21
JPH0563412B2 JPH0563412B2 (enrdf_load_stackoverflow) 1993-09-10

Family

ID=12526730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3849184A Granted JPS60186416A (ja) 1984-03-02 1984-03-02 低抵抗ＳｎＯ↓２ド−プＩｎ↓２Ｏ↓３粉末の製造法

Country Status (1)

Country Link
JP (1) JPS60186416A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2742140A1 (fr) * 1995-12-06 1997-06-13 Sumitomo Chemical Co Procedes de production d'une poudre et d'un corps fritte d'oxyde d'indium et d'oxyde d'etain et poudre ainsi obtenue
US5720904A (en) * 1993-10-18 1998-02-24 Alcan International Limited Electroconductive tin oxide
US5772924A (en) * 1994-06-14 1998-06-30 Mitsui Mining & Smelting Co., Ltd. Composite conductive powder and conductive film formed from the powder
KR100477717B1 (ko) * 1997-07-02 2005-07-12 삼성에스디아이 주식회사 산화인듐 입자의 제조방법
GB2459917A (en) * 2008-05-12 2009-11-18 Bizesp Ltd A process for manufacturing indium tin oxide (ITO) granules
US20120195822A1 (en) * 2011-01-27 2012-08-02 Honeywell International Inc. Method for the preparation of high purity stannous oxide

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5720904A (en) * 1993-10-18 1998-02-24 Alcan International Limited Electroconductive tin oxide
US5772924A (en) * 1994-06-14 1998-06-30 Mitsui Mining & Smelting Co., Ltd. Composite conductive powder and conductive film formed from the powder
FR2742140A1 (fr) * 1995-12-06 1997-06-13 Sumitomo Chemical Co Procedes de production d'une poudre et d'un corps fritte d'oxyde d'indium et d'oxyde d'etain et poudre ainsi obtenue
NL1004635C2 (nl) * 1995-12-06 1999-01-12 Sumitomo Chemical Co Indiumoxyde-tinoxydepoeders en werkwijze voor het voortbrengen daarvan.
US6051166A (en) * 1995-12-06 2000-04-18 Sumitomo Chemical Corporation, Limited Indium oxide-tin oxide powders and method for producing the same
KR100477717B1 (ko) * 1997-07-02 2005-07-12 삼성에스디아이 주식회사 산화인듐 입자의 제조방법
GB2459917A (en) * 2008-05-12 2009-11-18 Bizesp Ltd A process for manufacturing indium tin oxide (ITO) granules
GB2459917B (en) * 2008-05-12 2013-02-27 Sinito Shenzhen Optoelectrical Advanced Materials Company Ltd A process for the manufacture of a high density ITO sputtering target
US8778234B2 (en) 2008-05-12 2014-07-15 Bizesp Limited Process for the manufacture of a high density ITO sputtering target
US20120195822A1 (en) * 2011-01-27 2012-08-02 Honeywell International Inc. Method for the preparation of high purity stannous oxide
US8277774B2 (en) * 2011-01-27 2012-10-02 Honeywell International Method for the preparation of high purity stannous oxide

Also Published As

Publication number Publication date
JPH0563412B2 (enrdf_load_stackoverflow) 1993-09-10

Similar Documents

Publication Publication Date Title
JP3444655B2 (ja) 複合導電性粉末及び導電膜
JPH05201731A (ja) 超微粒低抵抗スズドープ酸化インジウム粉末とその製法
US5401441A (en) Preparation of metal oxide conductive powders
KR100444142B1 (ko) Ito 미분말 및 그의 제조방법
JP4765051B2 (ja) スズドープ酸化インジウム粉
JPS60186416A (ja) 低抵抗ＳｎＯ↓２ド−プＩｎ↓２Ｏ↓３粉末の製造法
JP5514570B2 (ja) スズドープ酸化インジウム粉末の製造方法およびスズドープ酸化インジウム粉末
JPH0323220A (ja) 白色導電性酸化亜鉛の製造方法
JP4171790B2 (ja) スズドープ酸化インジウム粉の製造方法
JP2001058822A (ja) スズドープ酸化インジウム粉末およびその製造方法
JP2844011B2 (ja) 導電性微粉末およびその製造方法
JPS6046925A (ja) 低電気抵抗酸化スズ微粉末の製造法
JPS60260424A (ja) 低電気抵抗酸化スズ微粉末の製造法
JPS6241175B2 (enrdf_load_stackoverflow)
JP2011102229A (ja) 結晶性の高い微細なｉｔｏ粉末とその用途および製造方法等
JP3838615B2 (ja) スズドープ酸化インジウム粉末およびその製造方法
JP4078660B2 (ja) 導電性酸化チタンとその製法およびこれを含有したプラスチック組成物
JPH06227815A (ja) 導電性微粉末の製造方法
JP2844012B2 (ja) 導電性微粉末およびその製造方法
JP2781798B2 (ja) 白色導電性物質及びその製法
JPS61286224A (ja) 導電性微粉末の製造方法
JPH06236710A (ja) 導電性材料およびその製造方法
JP3250338B2 (ja) 酸化アンチモン含有酸化錫白色微粉末の製造方法
JP3453783B2 (ja) インジウム−錫酸化物針状粉末の製造方法
JP2858271B2 (ja) 導電性微粉末の製造方法