JPS60186416A - Production of sn-doped in2o3 powder having low electrical resistance - Google Patents

Production of sn-doped in2o3 powder having low electrical resistance

Info

Publication number
JPS60186416A
JPS60186416A JP3849184A JP3849184A JPS60186416A JP S60186416 A JPS60186416 A JP S60186416A JP 3849184 A JP3849184 A JP 3849184A JP 3849184 A JP3849184 A JP 3849184A JP S60186416 A JPS60186416 A JP S60186416A
Authority
JP
Japan
Prior art keywords
electrical resistance
powder
added
oxalic acid
chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3849184A
Other languages
Japanese (ja)
Other versions
JPH0563412B2 (en
Inventor
Kiyoyoshi Watanabe
渡辺 精悦
Kenji Yajima
健児 矢島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP3849184A priority Critical patent/JPS60186416A/en
Publication of JPS60186416A publication Critical patent/JPS60186416A/en
Publication of JPH0563412B2 publication Critical patent/JPH0563412B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To prepare SnO2-doped In2O3 powder having low electrical resistance, by adjusting the pH of an aqueous solution containing an indium salt and stannous chloride at a specific ratio with oxalic acid and ammonia, and sintering the resultant precipitate under a specific condition. CONSTITUTION:Oxalic acid is added to an aqueous solution containing a water- soluble indium salt such as chloride, sulfate, etc. and stannous chloride at a ratio to obtain a product having an Sn-content of 0.1-20%. After the reaction, ammonia is added to the reaction mixture to adjust the pH to 0-2. The obtained precipitate is separated by filtration, washed thoroughly, dried, and sintered at 400-800 deg.C in an oxidizing atmosphere such as air. An electrically conductive SnO2-doped In2O3 fine powder having an electrical resistance of as low as about <=100OMEGA.cm can be prepared by this method.

Description

【発明の詳細な説明】 本発明は導電性を有する微粉末の製造法に関する。導電
性を有する微粉末は静電複写紙、通電感熱複写紙等の抵
抗層形成用に広く使用されている(特開昭56−416
03)。微粉末にすることによって透明性を賦与された
導電性粉末は透明導電膜の形成(特開昭56−1566
03)や帯電防止樹脂製造のための導電性フィラーとし
て、またフレクシプルエレクトロルミネッセンス表示材
料として使用されている。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing fine powder having electrical conductivity. Conductive fine powders are widely used for forming resistive layers in electrostatic copying paper, electrically conductive thermal copying paper, etc. (Japanese Patent Laid-Open No. 56-416
03). Conductive powder imparted with transparency by being made into fine powder is used to form a transparent conductive film (Japanese Unexamined Patent Publication No. 56-1566).
03), as a conductive filler for the production of antistatic resins, and as flexible electroluminescent display materials.

導電性粉末としては、Ag、Ni 、Cu等の金属の微
粉末、カーボンブラック、導電性ZnO1sbドープ5
n02.SbドープSn 02被覆Ti 02等が知ら
れているが、Agは高価であり、Ni 、Cuは酸化さ
れ易く、カーボンブラックは黒色であり、かつ分散性が
悪く、導電性ZnOは粒径が大で耐湿性に欠け、sbを
使用した粉末はsbの毒性の問題がある。透明ないし白
色に近い色を呈する満足な導電性粉末は未だ知られてい
ない。また、一般に導電性を目的とする粉末の製造法は
余り知られていない。
Examples of conductive powders include fine powders of metals such as Ag, Ni, and Cu, carbon black, and conductive ZnO1sb dope5.
n02. Sb-doped Sn 02 coated Ti 02, etc. are known, but Ag is expensive, Ni and Cu are easily oxidized, carbon black is black and has poor dispersibility, and conductive ZnO has a large particle size. Powders using sb lack moisture resistance, and powders using sb have the problem of sb toxicity. A satisfactory conductive powder exhibiting a transparent or nearly white color is not yet known. In addition, generally speaking, methods for producing powder for the purpose of electrical conductivity are not well known.

ITO膜として知られているように、Sn 02ド一プ
In203M膜は導電性を呈することが知られている。
It is known that the Sn 02 doped In203M film, also known as an ITO film, exhibits electrical conductivity.

従ってその粉末も導電性であることが予想される。本発
明者らの知見によると、Sn 02 ドープIn2O3
の製造法において、塩化スズと塩化インジウムの混合水
溶液にアルカリを加え、生成した水酸化物を焼成する方
法では、′焼成温度が800 ’O以下では微細な粉末
は得られるものの、恐ら<SnとInが均一に混合して
いないためと思われるが、500Ω・am(50kg/
Cm2の圧力で圧粉体としたものの抵抗、以下抵抗値は
すべてこの状態で測定したものである)以上の高抵抗と
なり、800℃を越える温度で焼成すると100Ω・c
m以下になるが、粒子の焼結が生じ微粉末が得られない
Therefore, it is expected that the powder is also electrically conductive. According to the findings of the present inventors, Sn 02 doped In2O3
In the manufacturing method, alkali is added to a mixed aqueous solution of tin chloride and indium chloride, and the resulting hydroxide is calcined. Although a fine powder can be obtained at a firing temperature of 800 O or less, it is possible that This seems to be because the and In are not mixed uniformly.
The resistance of the compacted powder at a pressure of Cm2 (all resistance values below were measured under this condition) is high, and when fired at a temperature exceeding 800℃, it becomes 100Ω・c.
m or less, but sintering of particles occurs and fine powder cannot be obtained.

塩化第二スズと塩化インジウムの混合水溶液にシュウ酸
を加え、得られるシュウ酸塩を熱分解する方法でも高抵
抗(iooΩ・81以上)の粉末しか得られない。
Even by adding oxalic acid to a mixed aqueous solution of stannic chloride and indium chloride and thermally decomposing the resulting oxalate, only a powder with high resistance (iooΩ·81 or higher) can be obtained.

本発明者らは、上記シュウ酸法において、スズ塩として
塩化第一スズを使用すると、低抵抗の粉末が得られるこ
とを見出した。
The present inventors have discovered that when stannous chloride is used as the tin salt in the oxalic acid method, a powder with low resistance can be obtained.

即ち、水に可溶なインジウム塩(塩化物、硫酸塩、等)
と水に可溶な第一スズ塩(塩化物、硫酸塩9等)を所定
量の水に溶解し、シュウ酸水溶液を加え、pHをO〜2
に調整して、シュウ酸スズ/インジウムを共沈させる。
i.e., water soluble indium salts (chlorides, sulfates, etc.)
and water-soluble stannous salts (chloride, sulfate, etc.) are dissolved in a predetermined amount of water, and an aqueous oxalic acid solution is added to adjust the pH to 0~2.
tin oxalate/indium co-precipitate.

得られた共沈澱を洗浄、乾燥後、400〜800℃の温
度で焼成することによって、低抵抗(100Ω”cm以
下)のSn 02 ドープIn2O3粉末を得ることが
できる。
The obtained coprecipitate is washed, dried, and then calcined at a temperature of 400 to 800° C. to obtain Sn 02 -doped In2O3 powder with low resistance (100 Ω”cm or less).

生成物におけるスズ含有量は0.1〜20%、好ましく
は、1〜15%である。0.1%未満であると、抵抗が
100Ω5eff1以上にあり、20%を超えても有意
の抵抗変化はない。
The tin content in the product is between 0.1 and 20%, preferably between 1 and 15%. If it is less than 0.1%, the resistance is 100Ω5eff1 or more, and even if it exceeds 20%, there is no significant change in resistance.

生成物におけるこのようなスズ含有量を達成するために
は出発溶液において、塩化第一スズとインジウム塩が化
学量論的に相当する関係になければならないことは勿論
である。
Of course, in order to achieve such a tin content in the product, the stannous chloride and indium salt must be in a stoichiometrically equivalent relationship in the starting solution.

沈ど生成時にPHがO以下では沈澱が得られず、2を超
えると沈澱の濾過性が非常に悪くなる。
If the pH is below 0 during precipitate formation, no precipitate will be obtained, and if it exceeds 2, the filterability of the precipitate will be very poor.

焼成温度は400℃未満であると、シュウ酸の分解が不
充分となり、800℃を越えると、焼結が始まる。
If the firing temperature is less than 400°C, decomposition of oxalic acid will be insufficient, and if it exceeds 800°C, sintering will begin.

次に実施例により本発明を具体的に説明する。Next, the present invention will be specifically explained with reference to Examples.

塩化インジウムの125 g/l濃度の溶液に、塩化第
−スズ44.2gを溶解し、常温でこの混合溶液にシュ
ウ酸の170 g/l濃度の溶液3文を加えて反応させ
、直後にアンモニアを加えてpHを1に調整した。なお
反応を継続させ、始めから20分経過した時点で生成沈
澱を炉別し、十分に洗浄した。
44.2 g of stannous chloride was dissolved in a solution of indium chloride with a concentration of 125 g/l, and three solutions of oxalic acid with a concentration of 170 g/l were added to this mixed solution at room temperature to react. was added to adjust the pH to 1. The reaction was continued, and after 20 minutes had elapsed from the beginning, the precipitate produced was separated in the furnace and thoroughly washed.

得られた結晶を空気気流中で焙焼した。The resulting crystals were roasted in a stream of air.

300℃まで1時間かけ、以後 450℃まで0.5時間かけて昇温し、550℃で5時
間加熱した。
The temperature was raised to 300°C over 1 hour, then to 450°C over 0.5 hour, and then heated at 550°C for 5 hours.

得られた粉末は酸に溶解し、吸光光度法で分析して、S
n含有量10.5%であり、 比表面積 20〜25m2/g 比抵抗 3〜10×lO0Ω11CI11であった。
The resulting powder was dissolved in acid and analyzed spectrophotometrically to determine S.
The n content was 10.5%, the specific surface area was 20 to 25 m2/g, and the specific resistance was 3 to 10×1O0Ω11CI11.

特許出願人 三菱金属株式会社 代理人 弁理士 松井政広Patent applicant Mitsubishi Metals Corporation Agent: Patent Attorney Masahiro Matsui

Claims (1)

【特許請求の範囲】[Claims] 1、低抵抗5n02 ドープIn2O3の製法であって
、インジウム塩と塩化第一スズを、生成物においてSn
含有量が0.1〜20%になるような割合で含む水溶液
に、シュウ酸を加え、さらにアンモニアを加えてpHを
0〜2に調整し、生成する沈澱を炉別し、洗浄し、乾燥
し、酸化性雰囲気中で400〜800℃で焼結すること
からなる方法。
1. A method for producing low resistance 5n02 doped In2O3, in which indium salt and stannous chloride are combined in the product with Sn
Oxalic acid is added to an aqueous solution with a content of 0.1 to 20%, and then ammonia is added to adjust the pH to 0 to 2.The resulting precipitate is filtered, washed, and dried. and sintering at 400-800°C in an oxidizing atmosphere.
JP3849184A 1984-03-02 1984-03-02 Production of sn-doped in2o3 powder having low electrical resistance Granted JPS60186416A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3849184A JPS60186416A (en) 1984-03-02 1984-03-02 Production of sn-doped in2o3 powder having low electrical resistance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3849184A JPS60186416A (en) 1984-03-02 1984-03-02 Production of sn-doped in2o3 powder having low electrical resistance

Publications (2)

Publication Number Publication Date
JPS60186416A true JPS60186416A (en) 1985-09-21
JPH0563412B2 JPH0563412B2 (en) 1993-09-10

Family

ID=12526730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3849184A Granted JPS60186416A (en) 1984-03-02 1984-03-02 Production of sn-doped in2o3 powder having low electrical resistance

Country Status (1)

Country Link
JP (1) JPS60186416A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2742140A1 (en) * 1995-12-06 1997-06-13 Sumitomo Chemical Co PROCESSES FOR PRODUCING POWDER AND SINTERED BODY OF INDIUM OXIDE AND TIN OXIDE AND POWDER THUS OBTAINED
US5720904A (en) * 1993-10-18 1998-02-24 Alcan International Limited Electroconductive tin oxide
US5772924A (en) * 1994-06-14 1998-06-30 Mitsui Mining & Smelting Co., Ltd. Composite conductive powder and conductive film formed from the powder
KR100477717B1 (en) * 1997-07-02 2005-07-12 삼성에스디아이 주식회사 Method for producing indium oxide particles
GB2459917A (en) * 2008-05-12 2009-11-18 Bizesp Ltd A process for manufacturing indium tin oxide (ITO) granules
US20120195822A1 (en) * 2011-01-27 2012-08-02 Honeywell International Inc. Method for the preparation of high purity stannous oxide

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5720904A (en) * 1993-10-18 1998-02-24 Alcan International Limited Electroconductive tin oxide
US5772924A (en) * 1994-06-14 1998-06-30 Mitsui Mining & Smelting Co., Ltd. Composite conductive powder and conductive film formed from the powder
FR2742140A1 (en) * 1995-12-06 1997-06-13 Sumitomo Chemical Co PROCESSES FOR PRODUCING POWDER AND SINTERED BODY OF INDIUM OXIDE AND TIN OXIDE AND POWDER THUS OBTAINED
NL1004635C2 (en) * 1995-12-06 1999-01-12 Sumitomo Chemical Co Indium oxide tin oxide powders and method of producing them.
US6051166A (en) * 1995-12-06 2000-04-18 Sumitomo Chemical Corporation, Limited Indium oxide-tin oxide powders and method for producing the same
KR100477717B1 (en) * 1997-07-02 2005-07-12 삼성에스디아이 주식회사 Method for producing indium oxide particles
GB2459917A (en) * 2008-05-12 2009-11-18 Bizesp Ltd A process for manufacturing indium tin oxide (ITO) granules
GB2459917B (en) * 2008-05-12 2013-02-27 Sinito Shenzhen Optoelectrical Advanced Materials Company Ltd A process for the manufacture of a high density ITO sputtering target
US8778234B2 (en) 2008-05-12 2014-07-15 Bizesp Limited Process for the manufacture of a high density ITO sputtering target
US20120195822A1 (en) * 2011-01-27 2012-08-02 Honeywell International Inc. Method for the preparation of high purity stannous oxide
US8277774B2 (en) * 2011-01-27 2012-10-02 Honeywell International Method for the preparation of high purity stannous oxide

Also Published As

Publication number Publication date
JPH0563412B2 (en) 1993-09-10

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