JPH0563412B2 - - Google Patents
Info
- Publication number
- JPH0563412B2 JPH0563412B2 JP3849184A JP3849184A JPH0563412B2 JP H0563412 B2 JPH0563412 B2 JP H0563412B2 JP 3849184 A JP3849184 A JP 3849184A JP 3849184 A JP3849184 A JP 3849184A JP H0563412 B2 JPH0563412 B2 JP H0563412B2
- Authority
- JP
- Japan
- Prior art keywords
- powder
- resistance
- chloride
- conductive
- doped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Conductive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3849184A JPS60186416A (ja) | 1984-03-02 | 1984-03-02 | 低抵抗SnO↓2ド−プIn↓2O↓3粉末の製造法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3849184A JPS60186416A (ja) | 1984-03-02 | 1984-03-02 | 低抵抗SnO↓2ド−プIn↓2O↓3粉末の製造法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60186416A JPS60186416A (ja) | 1985-09-21 |
JPH0563412B2 true JPH0563412B2 (enrdf_load_stackoverflow) | 1993-09-10 |
Family
ID=12526730
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3849184A Granted JPS60186416A (ja) | 1984-03-02 | 1984-03-02 | 低抵抗SnO↓2ド−プIn↓2O↓3粉末の製造法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60186416A (enrdf_load_stackoverflow) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9321481D0 (en) * | 1993-10-18 | 1993-12-08 | Alcan Int Ltd | Tin oxide |
JP3444655B2 (ja) * | 1994-06-14 | 2003-09-08 | 三井金属鉱業株式会社 | 複合導電性粉末及び導電膜 |
NL1004635C2 (nl) * | 1995-12-06 | 1999-01-12 | Sumitomo Chemical Co | Indiumoxyde-tinoxydepoeders en werkwijze voor het voortbrengen daarvan. |
KR100477717B1 (ko) * | 1997-07-02 | 2005-07-12 | 삼성에스디아이 주식회사 | 산화인듐 입자의 제조방법 |
GB2459917B (en) | 2008-05-12 | 2013-02-27 | Sinito Shenzhen Optoelectrical Advanced Materials Company Ltd | A process for the manufacture of a high density ITO sputtering target |
US8277774B2 (en) * | 2011-01-27 | 2012-10-02 | Honeywell International | Method for the preparation of high purity stannous oxide |
-
1984
- 1984-03-02 JP JP3849184A patent/JPS60186416A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60186416A (ja) | 1985-09-21 |
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