JPH1174333A5 - - Google Patents

Info

Publication number
JPH1174333A5
JPH1174333A5 JP1998194362A JP19436298A JPH1174333A5 JP H1174333 A5 JPH1174333 A5 JP H1174333A5 JP 1998194362 A JP1998194362 A JP 1998194362A JP 19436298 A JP19436298 A JP 19436298A JP H1174333 A5 JPH1174333 A5 JP H1174333A5
Authority
JP
Japan
Prior art keywords
substrate
support
support layer
plasma
processing chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998194362A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1174333A (ja
Filing date
Publication date
Priority claimed from US08/890,743 external-priority patent/US6177023B1/en
Application filed filed Critical
Publication of JPH1174333A publication Critical patent/JPH1174333A/ja
Publication of JPH1174333A5 publication Critical patent/JPH1174333A5/ja
Pending legal-status Critical Current

Links

JP10194362A 1997-07-11 1998-07-09 基板の平面度を静電的に維持する方法及び装置 Pending JPH1174333A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/890743 1997-07-11
US08/890,743 US6177023B1 (en) 1997-07-11 1997-07-11 Method and apparatus for electrostatically maintaining substrate flatness

Publications (2)

Publication Number Publication Date
JPH1174333A JPH1174333A (ja) 1999-03-16
JPH1174333A5 true JPH1174333A5 (enExample) 2005-10-27

Family

ID=25397090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10194362A Pending JPH1174333A (ja) 1997-07-11 1998-07-09 基板の平面度を静電的に維持する方法及び装置

Country Status (2)

Country Link
US (4) US6177023B1 (enExample)
JP (1) JPH1174333A (enExample)

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JP5770740B2 (ja) * 2009-12-11 2015-08-26 ノベラス・システムズ・インコーポレーテッドＮｏｖｅｌｌｕｓ Ｓｙｓｔｅｍｓ Ｉｎｃｏｒｐｏｒａｔｅｄ 高ドーズインプラントストリップの前に行われる、シリコンを保護するためのパッシベーションプロセスの改善方法およびそのための装置
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US9916998B2 (en) 2012-12-04 2018-03-13 Applied Materials, Inc. Substrate support assembly having a plasma resistant protective layer
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