JPH06505225A - 無圧焼結法または低圧気体焼結法により製造した高密度の自己強化性窒化ケイ素セラミック - Google Patents
無圧焼結法または低圧気体焼結法により製造した高密度の自己強化性窒化ケイ素セラミックInfo
- Publication number
- JPH06505225A JPH06505225A JP4505294A JP50529492A JPH06505225A JP H06505225 A JPH06505225 A JP H06505225A JP 4505294 A JP4505294 A JP 4505294A JP 50529492 A JP50529492 A JP 50529492A JP H06505225 A JPH06505225 A JP H06505225A
- Authority
- JP
- Japan
- Prior art keywords
- oxide
- silicon nitride
- zirconium
- percent
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052581 Si3N4 Inorganic materials 0.000 title claims description 133
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title claims description 107
- 239000000919 ceramic Substances 0.000 title claims description 67
- 238000005245 sintering Methods 0.000 title claims description 34
- 238000005728 strengthening Methods 0.000 title description 6
- 239000000843 powder Substances 0.000 claims description 98
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 88
- 239000000203 mixture Substances 0.000 claims description 87
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 54
- 238000000034 method Methods 0.000 claims description 50
- 239000000395 magnesium oxide Substances 0.000 claims description 43
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 41
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 32
- 239000013078 crystal Substances 0.000 claims description 29
- 238000001272 pressureless sintering Methods 0.000 claims description 26
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 25
- 238000000280 densification Methods 0.000 claims description 24
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 21
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 21
- 150000001875 compounds Chemical class 0.000 claims description 19
- 239000007789 gas Substances 0.000 claims description 19
- 239000000377 silicon dioxide Substances 0.000 claims description 19
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- 238000006243 chemical reaction Methods 0.000 claims description 15
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 13
- 239000000292 calcium oxide Substances 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 229910021332 silicide Inorganic materials 0.000 claims description 12
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 11
- 239000011575 calcium Substances 0.000 claims description 11
- 229910052715 tantalum Inorganic materials 0.000 claims description 11
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 10
- 229910052791 calcium Inorganic materials 0.000 claims description 10
- 229910052733 gallium Inorganic materials 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 10
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 9
- 229910001195 gallium oxide Inorganic materials 0.000 claims description 9
- -1 zirconium calcium nitride Chemical class 0.000 claims description 9
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 8
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 claims description 8
- 229910052735 hafnium Inorganic materials 0.000 claims description 8
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 8
- 238000005520 cutting process Methods 0.000 claims description 7
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 7
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 7
- 229910052738 indium Inorganic materials 0.000 claims description 7
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 7
- UVGLBOPDEUYYCS-UHFFFAOYSA-N silicon zirconium Chemical compound [Si].[Zr] UVGLBOPDEUYYCS-UHFFFAOYSA-N 0.000 claims description 6
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- QBXVTOWCLDDBIC-UHFFFAOYSA-N [Zr].[Ta] Chemical compound [Zr].[Ta] QBXVTOWCLDDBIC-UHFFFAOYSA-N 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 5
- 229910003437 indium oxide Inorganic materials 0.000 claims description 5
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052749 magnesium Inorganic materials 0.000 claims description 5
- 239000011777 magnesium Substances 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- OBOSXEWFRARQPU-UHFFFAOYSA-N 2-n,2-n-dimethylpyridine-2,5-diamine Chemical compound CN(C)C1=CC=C(N)C=N1 OBOSXEWFRARQPU-UHFFFAOYSA-N 0.000 claims description 3
- 230000003197 catalytic effect Effects 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- AMVVEDHCBDQBJL-UHFFFAOYSA-N [Ca][Zr] Chemical compound [Ca][Zr] AMVVEDHCBDQBJL-UHFFFAOYSA-N 0.000 claims description 2
- DRTJNMUFNLFUTQ-UHFFFAOYSA-N [Si].[Zr].[In] Chemical compound [Si].[Zr].[In] DRTJNMUFNLFUTQ-UHFFFAOYSA-N 0.000 claims description 2
- FWJPEOKFQUAQEQ-UHFFFAOYSA-N [Zr].[In] Chemical compound [Zr].[In] FWJPEOKFQUAQEQ-UHFFFAOYSA-N 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 238000005452 bending Methods 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 claims description 2
- INIGCWGJTZDVRY-UHFFFAOYSA-N hafnium zirconium Chemical compound [Zr].[Hf] INIGCWGJTZDVRY-UHFFFAOYSA-N 0.000 claims description 2
- 230000001737 promoting effect Effects 0.000 claims description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 2
- 241000255925 Diptera Species 0.000 claims 1
- CEPICIBPGDWCRU-UHFFFAOYSA-N [Si].[Hf] Chemical compound [Si].[Hf] CEPICIBPGDWCRU-UHFFFAOYSA-N 0.000 claims 1
- 150000007513 acids Chemical class 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 229910021346 calcium silicide Inorganic materials 0.000 claims 1
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 1
- 239000001569 carbon dioxide Substances 0.000 claims 1
- 239000012071 phase Substances 0.000 description 55
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 10
- 229910001936 tantalum oxide Inorganic materials 0.000 description 10
- 235000012255 calcium oxide Nutrition 0.000 description 9
- 238000000465 moulding Methods 0.000 description 9
- 238000012360 testing method Methods 0.000 description 9
- 239000012535 impurity Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 229910052717 sulfur Inorganic materials 0.000 description 7
- 239000000725 suspension Substances 0.000 description 7
- 229910052770 Uranium Inorganic materials 0.000 description 6
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 6
- 230000002708 enhancing effect Effects 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 229910021355 zirconium silicide Inorganic materials 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 239000002270 dispersing agent Substances 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 238000003801 milling Methods 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- WEAMLHXSIBDPGN-UHFFFAOYSA-N (4-hydroxy-3-methylphenyl) thiocyanate Chemical compound CC1=CC(SC#N)=CC=C1O WEAMLHXSIBDPGN-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 238000004626 scanning electron microscopy Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 241000723368 Conium Species 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 2
- 229910001947 lithium oxide Inorganic materials 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UZFMOKQJFYMBGY-UHFFFAOYSA-N 4-hydroxy-TEMPO Chemical group CC1(C)CC(O)CC(C)(C)N1[O] UZFMOKQJFYMBGY-UHFFFAOYSA-N 0.000 description 1
- 241000219198 Brassica Species 0.000 description 1
- 235000003351 Brassica cretica Nutrition 0.000 description 1
- 235000003343 Brassica rupestris Nutrition 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 241000287227 Fringillidae Species 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 206010037660 Pyrexia Diseases 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 238000007545 Vickers hardness test Methods 0.000 description 1
- 206010047700 Vomiting Diseases 0.000 description 1
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical compound [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 description 1
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- QKSKPIVNLNLAAV-UHFFFAOYSA-N bis(2-chloroethyl) sulfide Chemical compound ClCCSCCCl QKSKPIVNLNLAAV-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000373 effect on fracture Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001513 hot isostatic pressing Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 150000002472 indium compounds Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 235000010460 mustard Nutrition 0.000 description 1
- 238000003947 neutron activation analysis Methods 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000004482 other powder Substances 0.000 description 1
- 238000000643 oven drying Methods 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- HWEYZGSCHQNNEH-UHFFFAOYSA-N silicon tantalum Chemical compound [Si].[Ta] HWEYZGSCHQNNEH-UHFFFAOYSA-N 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 238000010245 stereological analysis Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000003828 vacuum filtration Methods 0.000 description 1
- 230000008673 vomiting Effects 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/584—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
- C04B35/593—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride obtained by pressure sintering
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/584—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/584—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
- C04B35/593—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride obtained by pressure sintering
- C04B35/5935—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride obtained by pressure sintering obtained by gas pressure sintering
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
- C04B35/645—Pressure sintering
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/71—Ceramic products containing macroscopic reinforcing agents
- C04B35/78—Ceramic products containing macroscopic reinforcing agents containing non-metallic materials
- C04B35/80—Fibres, filaments, whiskers, platelets, or the like
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Ceramic Products (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US657,715 | 1984-10-04 | ||
| US07/657,715 US5120328A (en) | 1988-01-27 | 1991-02-19 | Dense, self-reinforced silicon nitride ceramic prepared by pressureless or low pressure gas sintering |
| PCT/US1992/000082 WO1992014685A2 (en) | 1991-02-19 | 1992-01-06 | A dense, self-reinforced silicon nitride ceramic prepared by pressureless or low pressure gas sintering |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06505225A true JPH06505225A (ja) | 1994-06-16 |
Family
ID=24638377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4505294A Pending JPH06505225A (ja) | 1991-02-19 | 1992-01-06 | 無圧焼結法または低圧気体焼結法により製造した高密度の自己強化性窒化ケイ素セラミック |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US5120328A (enExample) |
| EP (1) | EP0572484B1 (enExample) |
| JP (1) | JPH06505225A (enExample) |
| KR (1) | KR930703218A (enExample) |
| CN (1) | CN1064260A (enExample) |
| AU (1) | AU1276792A (enExample) |
| CA (1) | CA2100958A1 (enExample) |
| DE (1) | DE69200764T2 (enExample) |
| IL (1) | IL100974A0 (enExample) |
| TW (1) | TW218001B (enExample) |
| WO (1) | WO1992014685A2 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0497355B1 (en) * | 1991-01-30 | 1995-12-06 | Ngk Spark Plug Co., Ltd | Method for preparing silicon nitride based ceramics |
| US5269989A (en) * | 1992-09-01 | 1993-12-14 | The Dow Chemical Company | Cermet or ceramic/glass composites including self-reinforced β-Silicon nitride, and method of making same |
| ATE164371T1 (de) * | 1992-12-23 | 1998-04-15 | Hoechst Ag | Hochtemperaturfeste siliziumnitridkeramik und verfahren zu ihrer herstellung |
| DE69433631T2 (de) * | 1993-01-22 | 2005-03-10 | Eaton Corp., Cleveland | Verfahren zur herstellung eines siliciumhaltigen nitridierbaren basismaterials und von siliciumnitridmaterialien |
| US5312785A (en) * | 1993-05-18 | 1994-05-17 | The Dow Chemical Company | Sintered self-reinforced silicon nitride |
| CN1043035C (zh) * | 1993-06-22 | 1999-04-21 | 武汉工业大学 | 一种自蔓延高温合成瞬间冲压快速制备金属陶瓷的方法 |
| US5413972A (en) * | 1993-12-23 | 1995-05-09 | The Dow Chemical Company | SiAlON composites and method of preparing the same |
| US5538675A (en) * | 1994-04-14 | 1996-07-23 | The Dow Chemical Company | Method for producing silicon nitride/silicon carbide composite |
| JPH0987036A (ja) * | 1995-09-22 | 1997-03-31 | Isuzu Ceramics Kenkyusho:Kk | 窒化ケイ素焼結体とその製造方法 |
| JPH107466A (ja) * | 1996-06-19 | 1998-01-13 | Isuzu Ceramics Kenkyusho:Kk | 低熱伝導率を有するセラミツクス |
| SE513938C2 (sv) * | 1996-07-19 | 2000-11-27 | Sandvik Ab | Skärverktygsmaterial av kiselnitrid |
| DE19702465A1 (de) * | 1997-01-24 | 1998-07-30 | Heraeus Gmbh W C | Tiegel zur Einkristall-Züchtung, Verfahren zu seiner Herstellung und seine Verwendung |
| KR20010006021A (ko) | 1997-04-04 | 2001-01-15 | 조셉 에스. 바이크 | 셀룰로오스 에테르 슬러리 |
| US20040009866A1 (en) * | 2002-06-13 | 2004-01-15 | Ngk Spark Plug Co. Ltd. | Sintered silicon nitride, cutting tip, wear-resistant member, cutting tool, and method for producing sintered silicon nitride |
| US7157394B2 (en) * | 2004-07-17 | 2007-01-02 | Adams Sr James Hugo | Stoichiometrically balanced silicon nitride ceramic for high performance cutting tools |
| CN100358834C (zh) * | 2004-08-04 | 2008-01-02 | 中国科学院上海硅酸盐研究所 | 一种高光输出快衰减闪烁陶瓷及其制备方法 |
| CN100391896C (zh) * | 2005-05-13 | 2008-06-04 | 中国科学院上海硅酸盐研究所 | 氧化铪-氧化钆固溶体透明陶瓷闪烁材料及其制备方法和用途 |
| US8133830B2 (en) * | 2007-03-15 | 2012-03-13 | Kabushiki Kaisha Toshiba | Silicon nitride sintered compact and sliding member using the same |
| GB0713876D0 (en) * | 2007-07-18 | 2007-08-29 | 3M Innovative Properties Co | Manufacture of components for medicinal dispensers |
| US7968484B2 (en) * | 2007-09-07 | 2011-06-28 | Ut-Battelle, Llc | Use of additives to improve microstructures and fracture resistance of silicon nitride ceramics |
| CN103025043A (zh) * | 2012-12-13 | 2013-04-03 | 江苏达胜加速器制造有限公司 | 一种瓷环的处理工艺 |
| CN107353014A (zh) * | 2017-05-26 | 2017-11-17 | 东莞市镒凯模具科技有限公司 | 一种陶瓷定位梢及其制备工艺以及陶瓷定位梢结构 |
| US11607733B2 (en) | 2019-12-16 | 2023-03-21 | Brown University | Bulk grain boundary materials |
| CN115677357B (zh) * | 2022-11-10 | 2023-07-11 | 中国科学院上海硅酸盐研究所 | 一种高耐磨氮化硅陶瓷及其制备方法 |
| CN116217235B (zh) * | 2023-02-10 | 2024-03-01 | 湖南星鑫航天新材料股份有限公司 | 一种氮化硅质大尺寸高温结构件及其制备方法 |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4097293A (en) * | 1969-04-30 | 1978-06-27 | Tokyo Shibaura Electric Co., Ltd. | Method for manufacturing heat-resistant reinforced composite materials |
| US4025351A (en) * | 1972-10-24 | 1977-05-24 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Sintered silicon nitride base ceramic and said ceramic |
| JPS523647B2 (enExample) * | 1972-10-24 | 1977-01-29 | ||
| US4004937A (en) * | 1972-10-24 | 1977-01-25 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Method for producing a sintered silicon nitride base ceramic and said ceramic |
| US4046580A (en) * | 1974-06-28 | 1977-09-06 | Tokyo Shibaura Electric Co., Ltd. | Silicon nitride-based sintered material and method for manufacturing the same |
| US4218257A (en) * | 1975-04-07 | 1980-08-19 | Ngk Insulators, Ltd. | Sintered silicon nitride body and a method of producing the same |
| JPS51132207A (en) * | 1975-05-14 | 1976-11-17 | Tokyo Shibaura Electric Co | Manufacture of high density and high strength sintering articles |
| US4119689A (en) * | 1977-01-03 | 1978-10-10 | General Electric Company | Sintering of silicon nitride using Be additive |
| US4179301A (en) * | 1979-01-08 | 1979-12-18 | Gte Sylvania Incorporated | Si3 N4 containing intergranular phase nucleating agent and method |
| US4323325A (en) * | 1979-12-20 | 1982-04-06 | Ford Motor Company | ethod of using Si3 N4.Y2 O3.SiO2 ceramic system for machine cast iron |
| US4227842A (en) * | 1979-12-20 | 1980-10-14 | Ford Motor Company | Method of using Si3 N4.Y2 O3.SiO2 ceramic system for machining cast iron |
| US4279657A (en) * | 1980-01-30 | 1981-07-21 | General Electric Company | Light-transmitting silicon nitride |
| EP0100380B1 (en) * | 1981-02-05 | 1987-06-16 | Sumitomo Electric Industries Limited | Method for plastic deformation of non-ferrous metals |
| JPS5826077A (ja) * | 1981-08-10 | 1983-02-16 | 株式会社東芝 | セラミツクス焼結体及びその製造方法 |
| JPS5860676A (ja) * | 1981-09-30 | 1983-04-11 | 日本特殊陶業株式会社 | 窒化珪素焼結体及びその製造方法 |
| JPS5864274A (ja) * | 1981-10-12 | 1983-04-16 | 住友電気工業株式会社 | 窒化けい素の焼結方法 |
| DE3266050D1 (en) * | 1981-10-12 | 1985-10-10 | Sumitomo Electric Industries | Method for sintering silicon nitride |
| US4511525A (en) * | 1981-11-26 | 1985-04-16 | Tokyo Shibaura Denki Kabushiki Kaisha | Process for producing sintered silicon nitride-base body |
| US4406668A (en) * | 1982-05-20 | 1983-09-27 | Gte Laboratories Incorporated | Nitride coated silicon nitride cutting tools |
| JPS5921413A (ja) * | 1982-07-26 | 1984-02-03 | Sumitomo Electric Ind Ltd | 圧延ロ−ル |
| US4753764A (en) * | 1982-09-24 | 1988-06-28 | Sumitomo Electric Industries, Ltd. | Manufacturing method for fiber reinforced silicon ceramics sintered body |
| CA1223013A (en) * | 1983-04-22 | 1987-06-16 | Mikio Fukuhara | Silicon nitride sintered body and method for preparing the same |
| US4543345A (en) * | 1984-02-09 | 1985-09-24 | The United States Of America As Represented By The Department Of Energy | Silicon carbide whisker reinforced ceramic composites and method for making same |
| JPS60186475A (ja) * | 1984-03-06 | 1985-09-21 | 京セラ株式会社 | 窒化珪素質焼結体及びその製造方法 |
| US4603116A (en) * | 1984-04-09 | 1986-07-29 | Gte Laboratories Incorporated | Silicon nitride based ceramics and method |
| JPS6168373A (ja) * | 1984-09-07 | 1986-04-08 | 日本碍子株式会社 | 窒化珪素焼結体およびその製造法 |
| JPS6178657A (ja) * | 1984-09-27 | 1986-04-22 | Toshiba Corp | プリンタ用ガイド部材 |
| JPS6197167A (ja) * | 1984-10-17 | 1986-05-15 | 住友電気工業株式会社 | 窒化珪素焼結体およびその製造法 |
| JPS61106430A (ja) * | 1984-10-31 | 1986-05-24 | Noritake Co Ltd | ガラス器ブロ−成形用セラミツク型 |
| DE3504145A1 (de) * | 1985-02-07 | 1986-08-07 | Basf Ag, 6700 Ludwigshafen | Neues verfahren zur herstellung hochfester und hochtemperaturbestaendiger keramischer formteile aus siliziumnitrid |
| US4891342A (en) * | 1985-11-20 | 1990-01-02 | Kyocera Corporation | Process for preparing a silicon nitride sintered body |
| JPS62158166A (ja) * | 1985-12-27 | 1987-07-14 | 三菱化学株式会社 | 窒化珪素混合粉末の製造法 |
| US4652276A (en) * | 1986-03-10 | 1987-03-24 | Gte Valeron Corporation | High toughness silicon nitride cutting tools |
| JPS62246865A (ja) * | 1986-04-16 | 1987-10-28 | 日本碍子株式会社 | 窒化珪素焼結体およびその製造法 |
| JPS63185864A (ja) * | 1986-09-05 | 1988-08-01 | 株式会社日立製作所 | 複合セラミツクスおよびその製法 |
| US4717693A (en) * | 1986-10-24 | 1988-01-05 | Gte Products Corporation | Process for producing beta silicon nitride fibers |
| US4820665A (en) * | 1986-12-16 | 1989-04-11 | Ngk Insulators, Ltd. | Ceramic sintered bodies and a process for manufacturing the same |
| JPH0774103B2 (ja) * | 1986-12-27 | 1995-08-09 | 日本碍子株式会社 | 高硬度窒化珪素焼結体 |
| US4920085A (en) * | 1987-04-02 | 1990-04-24 | Kyocera Corporation | Silicon nitride sintered body and process for preparation thereof |
| JP2512061B2 (ja) * | 1987-11-26 | 1996-07-03 | 日本碍子株式会社 | 均質窒化珪素焼結体およびその製造方法 |
| US5021372A (en) * | 1988-01-27 | 1991-06-04 | The Dow Chemical Company | Method of preparing a self-reinforced silicon nitride ceramic of high fracture toughness |
| US4870036A (en) * | 1988-03-08 | 1989-09-26 | Allied-Signal Inc. | High strength silicon nitride |
-
1991
- 1991-02-19 US US07/657,715 patent/US5120328A/en not_active Expired - Fee Related
-
1992
- 1992-01-06 EP EP92905364A patent/EP0572484B1/en not_active Expired - Lifetime
- 1992-01-06 DE DE69200764T patent/DE69200764T2/de not_active Expired - Fee Related
- 1992-01-06 KR KR1019930702460A patent/KR930703218A/ko not_active Withdrawn
- 1992-01-06 WO PCT/US1992/000082 patent/WO1992014685A2/en not_active Ceased
- 1992-01-06 CA CA002100958A patent/CA2100958A1/en not_active Abandoned
- 1992-01-06 AU AU12767/92A patent/AU1276792A/en not_active Abandoned
- 1992-01-06 JP JP4505294A patent/JPH06505225A/ja active Pending
- 1992-02-17 IL IL100974A patent/IL100974A0/xx unknown
- 1992-02-18 TW TW081101160A patent/TW218001B/zh active
- 1992-02-18 CN CN92101117A patent/CN1064260A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US5120328A (en) | 1992-06-09 |
| AU1276792A (en) | 1992-09-15 |
| IL100974A0 (en) | 1992-11-15 |
| CN1064260A (zh) | 1992-09-09 |
| TW218001B (enExample) | 1993-12-21 |
| DE69200764D1 (de) | 1995-01-12 |
| WO1992014685A2 (en) | 1992-09-03 |
| KR930703218A (ko) | 1993-11-29 |
| CA2100958A1 (en) | 1992-08-20 |
| EP0572484B1 (en) | 1994-11-30 |
| EP0572484A1 (en) | 1993-12-08 |
| WO1992014685A3 (en) | 1992-10-15 |
| DE69200764T2 (de) | 1995-04-06 |
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