CA2100958A1 - A dense, self-reinforced silicon nitride ceramic prepared by pressureless or low pressure gas sintering - Google Patents
A dense, self-reinforced silicon nitride ceramic prepared by pressureless or low pressure gas sinteringInfo
- Publication number
- CA2100958A1 CA2100958A1 CA002100958A CA2100958A CA2100958A1 CA 2100958 A1 CA2100958 A1 CA 2100958A1 CA 002100958 A CA002100958 A CA 002100958A CA 2100958 A CA2100958 A CA 2100958A CA 2100958 A1 CA2100958 A1 CA 2100958A1
- Authority
- CA
- Canada
- Prior art keywords
- oxide
- silicon nitride
- percent
- zirconium
- weight percent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 229910052581 Si3N4 Inorganic materials 0.000 title claims abstract description 159
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title claims abstract description 111
- 239000000919 ceramic Substances 0.000 title claims abstract description 73
- 238000005245 sintering Methods 0.000 title claims abstract description 30
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims abstract description 98
- 239000000203 mixture Substances 0.000 claims abstract description 84
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims abstract description 56
- 239000000395 magnesium oxide Substances 0.000 claims abstract description 45
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 41
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims abstract description 34
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims abstract description 30
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 25
- 229910052751 metal Inorganic materials 0.000 claims abstract description 21
- 239000002184 metal Substances 0.000 claims abstract description 21
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 20
- 229910021355 zirconium silicide Inorganic materials 0.000 claims abstract description 17
- 239000011575 calcium Substances 0.000 claims abstract description 14
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 13
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 11
- 229910052738 indium Inorganic materials 0.000 claims abstract description 11
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 10
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims abstract description 10
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical class [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims abstract description 10
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 6
- WEAMLHXSIBDPGN-UHFFFAOYSA-N (4-hydroxy-3-methylphenyl) thiocyanate Chemical compound CC1=CC(SC#N)=CC=C1O WEAMLHXSIBDPGN-UHFFFAOYSA-N 0.000 claims abstract description 5
- UVGLBOPDEUYYCS-UHFFFAOYSA-N silicon zirconium Chemical compound [Si].[Zr] UVGLBOPDEUYYCS-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000000843 powder Substances 0.000 claims description 103
- 238000000034 method Methods 0.000 claims description 39
- 238000000280 densification Methods 0.000 claims description 28
- 150000001875 compounds Chemical class 0.000 claims description 18
- 238000006243 chemical reaction Methods 0.000 claims description 17
- 230000008569 process Effects 0.000 claims description 17
- 230000002708 enhancing effect Effects 0.000 claims description 15
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 13
- 239000000292 calcium oxide Substances 0.000 claims description 13
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims description 12
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 10
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 10
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 claims description 9
- 229910001195 gallium oxide Inorganic materials 0.000 claims description 9
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 9
- 229910003437 indium oxide Inorganic materials 0.000 claims description 9
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 9
- 239000012298 atmosphere Substances 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 238000005520 cutting process Methods 0.000 claims description 7
- 238000004626 scanning electron microscopy Methods 0.000 claims description 6
- ORJYGLQDURYZPM-UHFFFAOYSA-N [Si].[Zr].[Ta] Chemical compound [Si].[Zr].[Ta] ORJYGLQDURYZPM-UHFFFAOYSA-N 0.000 claims description 4
- QBXVTOWCLDDBIC-UHFFFAOYSA-N [Zr].[Ta] Chemical compound [Zr].[Ta] QBXVTOWCLDDBIC-UHFFFAOYSA-N 0.000 claims description 4
- IWPSJDKRBIAWLY-UHFFFAOYSA-N gallium zirconium Chemical compound [Ga].[Zr] IWPSJDKRBIAWLY-UHFFFAOYSA-N 0.000 claims description 4
- 230000003197 catalytic effect Effects 0.000 claims description 3
- AMVVEDHCBDQBJL-UHFFFAOYSA-N [Ca][Zr] Chemical compound [Ca][Zr] AMVVEDHCBDQBJL-UHFFFAOYSA-N 0.000 claims description 2
- RFBRDHGMLHXGOB-UHFFFAOYSA-N [Si].[Zr].[Hf] Chemical compound [Si].[Zr].[Hf] RFBRDHGMLHXGOB-UHFFFAOYSA-N 0.000 claims description 2
- DRTJNMUFNLFUTQ-UHFFFAOYSA-N [Si].[Zr].[In] Chemical compound [Si].[Zr].[In] DRTJNMUFNLFUTQ-UHFFFAOYSA-N 0.000 claims description 2
- FWJPEOKFQUAQEQ-UHFFFAOYSA-N [Zr].[In] Chemical compound [Zr].[In] FWJPEOKFQUAQEQ-UHFFFAOYSA-N 0.000 claims description 2
- AXSCZBBSHYVKKU-UHFFFAOYSA-N [Zr].[Si].[Ca] Chemical compound [Zr].[Si].[Ca] AXSCZBBSHYVKKU-UHFFFAOYSA-N 0.000 claims description 2
- INIGCWGJTZDVRY-UHFFFAOYSA-N hafnium zirconium Chemical compound [Zr].[Hf] INIGCWGJTZDVRY-UHFFFAOYSA-N 0.000 claims description 2
- 238000010952 in-situ formation Methods 0.000 claims description 2
- 238000001272 pressureless sintering Methods 0.000 abstract description 10
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 2
- 150000004706 metal oxides Chemical class 0.000 abstract description 2
- 239000012071 phase Substances 0.000 description 49
- 239000007789 gas Substances 0.000 description 19
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 239000000306 component Substances 0.000 description 11
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 11
- 235000012255 calcium oxide Nutrition 0.000 description 10
- 239000012535 impurity Substances 0.000 description 8
- 239000000725 suspension Substances 0.000 description 8
- 238000001035 drying Methods 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 238000007731 hot pressing Methods 0.000 description 6
- 150000004767 nitrides Chemical class 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- -1 SiO2 Chemical compound 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000001513 hot isostatic pressing Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 230000037396 body weight Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 238000007545 Vickers hardness test Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000007429 general method Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004627 transmission electron microscopy Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 241001279686 Allium moly Species 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229940037003 alum Drugs 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- CUZMQPZYCDIHQL-VCTVXEGHSA-L calcium;(2s)-1-[(2s)-3-[(2r)-2-(cyclohexanecarbonylamino)propanoyl]sulfanyl-2-methylpropanoyl]pyrrolidine-2-carboxylate Chemical compound [Ca+2].N([C@H](C)C(=O)SC[C@@H](C)C(=O)N1[C@@H](CCC1)C([O-])=O)C(=O)C1CCCCC1.N([C@H](C)C(=O)SC[C@@H](C)C(=O)N1[C@@H](CCC1)C([O-])=O)C(=O)C1CCCCC1 CUZMQPZYCDIHQL-VCTVXEGHSA-L 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000007657 chevron notch test Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000003947 neutron activation analysis Methods 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000004482 other powder Substances 0.000 description 1
- 238000000643 oven drying Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000011226 reinforced ceramic Substances 0.000 description 1
- DECCZIUVGMLHKQ-UHFFFAOYSA-N rhenium tungsten Chemical compound [W].[Re] DECCZIUVGMLHKQ-UHFFFAOYSA-N 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HWEYZGSCHQNNEH-UHFFFAOYSA-N silicon tantalum Chemical compound [Si].[Ta] HWEYZGSCHQNNEH-UHFFFAOYSA-N 0.000 description 1
- 238000007569 slipcasting Methods 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- HLCHESOMJVGDSJ-UHFFFAOYSA-N thiq Chemical compound C1=CC(Cl)=CC=C1CC(C(=O)N1CCC(CN2N=CN=C2)(CC1)C1CCCCC1)NC(=O)C1NCC2=CC=CC=C2C1 HLCHESOMJVGDSJ-UHFFFAOYSA-N 0.000 description 1
- 238000003828 vacuum filtration Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/584—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
- C04B35/593—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride obtained by pressure sintering
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/584—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/584—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
- C04B35/593—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride obtained by pressure sintering
- C04B35/5935—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride obtained by pressure sintering obtained by gas pressure sintering
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
- C04B35/645—Pressure sintering
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/71—Ceramic products containing macroscopic reinforcing agents
- C04B35/78—Ceramic products containing macroscopic reinforcing agents containing non-metallic materials
- C04B35/80—Fibres, filaments, whiskers, platelets, or the like
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Ceramic Products (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/657,715 | 1991-02-19 | ||
| US07/657,715 US5120328A (en) | 1988-01-27 | 1991-02-19 | Dense, self-reinforced silicon nitride ceramic prepared by pressureless or low pressure gas sintering |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2100958A1 true CA2100958A1 (en) | 1992-08-20 |
Family
ID=24638377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002100958A Abandoned CA2100958A1 (en) | 1991-02-19 | 1992-01-06 | A dense, self-reinforced silicon nitride ceramic prepared by pressureless or low pressure gas sintering |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US5120328A (enExample) |
| EP (1) | EP0572484B1 (enExample) |
| JP (1) | JPH06505225A (enExample) |
| KR (1) | KR930703218A (enExample) |
| CN (1) | CN1064260A (enExample) |
| AU (1) | AU1276792A (enExample) |
| CA (1) | CA2100958A1 (enExample) |
| DE (1) | DE69200764T2 (enExample) |
| IL (1) | IL100974A0 (enExample) |
| TW (1) | TW218001B (enExample) |
| WO (1) | WO1992014685A2 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0497355B1 (en) * | 1991-01-30 | 1995-12-06 | Ngk Spark Plug Co., Ltd | Method for preparing silicon nitride based ceramics |
| US5269989A (en) * | 1992-09-01 | 1993-12-14 | The Dow Chemical Company | Cermet or ceramic/glass composites including self-reinforced β-Silicon nitride, and method of making same |
| ATE164371T1 (de) * | 1992-12-23 | 1998-04-15 | Hoechst Ag | Hochtemperaturfeste siliziumnitridkeramik und verfahren zu ihrer herstellung |
| DE69433631T2 (de) * | 1993-01-22 | 2005-03-10 | Eaton Corp., Cleveland | Verfahren zur herstellung eines siliciumhaltigen nitridierbaren basismaterials und von siliciumnitridmaterialien |
| US5312785A (en) * | 1993-05-18 | 1994-05-17 | The Dow Chemical Company | Sintered self-reinforced silicon nitride |
| CN1043035C (zh) * | 1993-06-22 | 1999-04-21 | 武汉工业大学 | 一种自蔓延高温合成瞬间冲压快速制备金属陶瓷的方法 |
| US5413972A (en) * | 1993-12-23 | 1995-05-09 | The Dow Chemical Company | SiAlON composites and method of preparing the same |
| US5538675A (en) * | 1994-04-14 | 1996-07-23 | The Dow Chemical Company | Method for producing silicon nitride/silicon carbide composite |
| JPH0987036A (ja) * | 1995-09-22 | 1997-03-31 | Isuzu Ceramics Kenkyusho:Kk | 窒化ケイ素焼結体とその製造方法 |
| JPH107466A (ja) * | 1996-06-19 | 1998-01-13 | Isuzu Ceramics Kenkyusho:Kk | 低熱伝導率を有するセラミツクス |
| SE513938C2 (sv) * | 1996-07-19 | 2000-11-27 | Sandvik Ab | Skärverktygsmaterial av kiselnitrid |
| DE19702465A1 (de) * | 1997-01-24 | 1998-07-30 | Heraeus Gmbh W C | Tiegel zur Einkristall-Züchtung, Verfahren zu seiner Herstellung und seine Verwendung |
| KR20010006021A (ko) | 1997-04-04 | 2001-01-15 | 조셉 에스. 바이크 | 셀룰로오스 에테르 슬러리 |
| US20040009866A1 (en) * | 2002-06-13 | 2004-01-15 | Ngk Spark Plug Co. Ltd. | Sintered silicon nitride, cutting tip, wear-resistant member, cutting tool, and method for producing sintered silicon nitride |
| US7157394B2 (en) * | 2004-07-17 | 2007-01-02 | Adams Sr James Hugo | Stoichiometrically balanced silicon nitride ceramic for high performance cutting tools |
| CN100358834C (zh) * | 2004-08-04 | 2008-01-02 | 中国科学院上海硅酸盐研究所 | 一种高光输出快衰减闪烁陶瓷及其制备方法 |
| CN100391896C (zh) * | 2005-05-13 | 2008-06-04 | 中国科学院上海硅酸盐研究所 | 氧化铪-氧化钆固溶体透明陶瓷闪烁材料及其制备方法和用途 |
| US8133830B2 (en) * | 2007-03-15 | 2012-03-13 | Kabushiki Kaisha Toshiba | Silicon nitride sintered compact and sliding member using the same |
| GB0713876D0 (en) * | 2007-07-18 | 2007-08-29 | 3M Innovative Properties Co | Manufacture of components for medicinal dispensers |
| US7968484B2 (en) * | 2007-09-07 | 2011-06-28 | Ut-Battelle, Llc | Use of additives to improve microstructures and fracture resistance of silicon nitride ceramics |
| CN103025043A (zh) * | 2012-12-13 | 2013-04-03 | 江苏达胜加速器制造有限公司 | 一种瓷环的处理工艺 |
| CN107353014A (zh) * | 2017-05-26 | 2017-11-17 | 东莞市镒凯模具科技有限公司 | 一种陶瓷定位梢及其制备工艺以及陶瓷定位梢结构 |
| US11607733B2 (en) | 2019-12-16 | 2023-03-21 | Brown University | Bulk grain boundary materials |
| CN115677357B (zh) * | 2022-11-10 | 2023-07-11 | 中国科学院上海硅酸盐研究所 | 一种高耐磨氮化硅陶瓷及其制备方法 |
| CN116217235B (zh) * | 2023-02-10 | 2024-03-01 | 湖南星鑫航天新材料股份有限公司 | 一种氮化硅质大尺寸高温结构件及其制备方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4097293A (en) * | 1969-04-30 | 1978-06-27 | Tokyo Shibaura Electric Co., Ltd. | Method for manufacturing heat-resistant reinforced composite materials |
| US4025351A (en) * | 1972-10-24 | 1977-05-24 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Sintered silicon nitride base ceramic and said ceramic |
| JPS523647B2 (enExample) * | 1972-10-24 | 1977-01-29 | ||
| US4004937A (en) * | 1972-10-24 | 1977-01-25 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Method for producing a sintered silicon nitride base ceramic and said ceramic |
| US4046580A (en) * | 1974-06-28 | 1977-09-06 | Tokyo Shibaura Electric Co., Ltd. | Silicon nitride-based sintered material and method for manufacturing the same |
| US4218257A (en) * | 1975-04-07 | 1980-08-19 | Ngk Insulators, Ltd. | Sintered silicon nitride body and a method of producing the same |
| JPS51132207A (en) * | 1975-05-14 | 1976-11-17 | Tokyo Shibaura Electric Co | Manufacture of high density and high strength sintering articles |
| US4119689A (en) * | 1977-01-03 | 1978-10-10 | General Electric Company | Sintering of silicon nitride using Be additive |
| US4179301A (en) * | 1979-01-08 | 1979-12-18 | Gte Sylvania Incorporated | Si3 N4 containing intergranular phase nucleating agent and method |
| US4323325A (en) * | 1979-12-20 | 1982-04-06 | Ford Motor Company | ethod of using Si3 N4.Y2 O3.SiO2 ceramic system for machine cast iron |
| US4227842A (en) * | 1979-12-20 | 1980-10-14 | Ford Motor Company | Method of using Si3 N4.Y2 O3.SiO2 ceramic system for machining cast iron |
| US4279657A (en) * | 1980-01-30 | 1981-07-21 | General Electric Company | Light-transmitting silicon nitride |
| EP0100380B1 (en) * | 1981-02-05 | 1987-06-16 | Sumitomo Electric Industries Limited | Method for plastic deformation of non-ferrous metals |
| JPS5826077A (ja) * | 1981-08-10 | 1983-02-16 | 株式会社東芝 | セラミツクス焼結体及びその製造方法 |
| JPS5860676A (ja) * | 1981-09-30 | 1983-04-11 | 日本特殊陶業株式会社 | 窒化珪素焼結体及びその製造方法 |
| JPS5864274A (ja) * | 1981-10-12 | 1983-04-16 | 住友電気工業株式会社 | 窒化けい素の焼結方法 |
| DE3266050D1 (en) * | 1981-10-12 | 1985-10-10 | Sumitomo Electric Industries | Method for sintering silicon nitride |
| US4511525A (en) * | 1981-11-26 | 1985-04-16 | Tokyo Shibaura Denki Kabushiki Kaisha | Process for producing sintered silicon nitride-base body |
| US4406668A (en) * | 1982-05-20 | 1983-09-27 | Gte Laboratories Incorporated | Nitride coated silicon nitride cutting tools |
| JPS5921413A (ja) * | 1982-07-26 | 1984-02-03 | Sumitomo Electric Ind Ltd | 圧延ロ−ル |
| US4753764A (en) * | 1982-09-24 | 1988-06-28 | Sumitomo Electric Industries, Ltd. | Manufacturing method for fiber reinforced silicon ceramics sintered body |
| CA1223013A (en) * | 1983-04-22 | 1987-06-16 | Mikio Fukuhara | Silicon nitride sintered body and method for preparing the same |
| US4543345A (en) * | 1984-02-09 | 1985-09-24 | The United States Of America As Represented By The Department Of Energy | Silicon carbide whisker reinforced ceramic composites and method for making same |
| JPS60186475A (ja) * | 1984-03-06 | 1985-09-21 | 京セラ株式会社 | 窒化珪素質焼結体及びその製造方法 |
| US4603116A (en) * | 1984-04-09 | 1986-07-29 | Gte Laboratories Incorporated | Silicon nitride based ceramics and method |
| JPS6168373A (ja) * | 1984-09-07 | 1986-04-08 | 日本碍子株式会社 | 窒化珪素焼結体およびその製造法 |
| JPS6178657A (ja) * | 1984-09-27 | 1986-04-22 | Toshiba Corp | プリンタ用ガイド部材 |
| JPS6197167A (ja) * | 1984-10-17 | 1986-05-15 | 住友電気工業株式会社 | 窒化珪素焼結体およびその製造法 |
| JPS61106430A (ja) * | 1984-10-31 | 1986-05-24 | Noritake Co Ltd | ガラス器ブロ−成形用セラミツク型 |
| DE3504145A1 (de) * | 1985-02-07 | 1986-08-07 | Basf Ag, 6700 Ludwigshafen | Neues verfahren zur herstellung hochfester und hochtemperaturbestaendiger keramischer formteile aus siliziumnitrid |
| US4891342A (en) * | 1985-11-20 | 1990-01-02 | Kyocera Corporation | Process for preparing a silicon nitride sintered body |
| JPS62158166A (ja) * | 1985-12-27 | 1987-07-14 | 三菱化学株式会社 | 窒化珪素混合粉末の製造法 |
| US4652276A (en) * | 1986-03-10 | 1987-03-24 | Gte Valeron Corporation | High toughness silicon nitride cutting tools |
| JPS62246865A (ja) * | 1986-04-16 | 1987-10-28 | 日本碍子株式会社 | 窒化珪素焼結体およびその製造法 |
| JPS63185864A (ja) * | 1986-09-05 | 1988-08-01 | 株式会社日立製作所 | 複合セラミツクスおよびその製法 |
| US4717693A (en) * | 1986-10-24 | 1988-01-05 | Gte Products Corporation | Process for producing beta silicon nitride fibers |
| US4820665A (en) * | 1986-12-16 | 1989-04-11 | Ngk Insulators, Ltd. | Ceramic sintered bodies and a process for manufacturing the same |
| JPH0774103B2 (ja) * | 1986-12-27 | 1995-08-09 | 日本碍子株式会社 | 高硬度窒化珪素焼結体 |
| US4920085A (en) * | 1987-04-02 | 1990-04-24 | Kyocera Corporation | Silicon nitride sintered body and process for preparation thereof |
| JP2512061B2 (ja) * | 1987-11-26 | 1996-07-03 | 日本碍子株式会社 | 均質窒化珪素焼結体およびその製造方法 |
| US5021372A (en) * | 1988-01-27 | 1991-06-04 | The Dow Chemical Company | Method of preparing a self-reinforced silicon nitride ceramic of high fracture toughness |
| US4870036A (en) * | 1988-03-08 | 1989-09-26 | Allied-Signal Inc. | High strength silicon nitride |
-
1991
- 1991-02-19 US US07/657,715 patent/US5120328A/en not_active Expired - Fee Related
-
1992
- 1992-01-06 EP EP92905364A patent/EP0572484B1/en not_active Expired - Lifetime
- 1992-01-06 DE DE69200764T patent/DE69200764T2/de not_active Expired - Fee Related
- 1992-01-06 KR KR1019930702460A patent/KR930703218A/ko not_active Withdrawn
- 1992-01-06 WO PCT/US1992/000082 patent/WO1992014685A2/en not_active Ceased
- 1992-01-06 CA CA002100958A patent/CA2100958A1/en not_active Abandoned
- 1992-01-06 AU AU12767/92A patent/AU1276792A/en not_active Abandoned
- 1992-01-06 JP JP4505294A patent/JPH06505225A/ja active Pending
- 1992-02-17 IL IL100974A patent/IL100974A0/xx unknown
- 1992-02-18 TW TW081101160A patent/TW218001B/zh active
- 1992-02-18 CN CN92101117A patent/CN1064260A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US5120328A (en) | 1992-06-09 |
| AU1276792A (en) | 1992-09-15 |
| IL100974A0 (en) | 1992-11-15 |
| CN1064260A (zh) | 1992-09-09 |
| TW218001B (enExample) | 1993-12-21 |
| DE69200764D1 (de) | 1995-01-12 |
| WO1992014685A2 (en) | 1992-09-03 |
| KR930703218A (ko) | 1993-11-29 |
| EP0572484B1 (en) | 1994-11-30 |
| JPH06505225A (ja) | 1994-06-16 |
| EP0572484A1 (en) | 1993-12-08 |
| WO1992014685A3 (en) | 1992-10-15 |
| DE69200764T2 (de) | 1995-04-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| FZDE | Discontinued |