JPH0525199B2 - - Google Patents
Info
- Publication number
- JPH0525199B2 JPH0525199B2 JP60076574A JP7657485A JPH0525199B2 JP H0525199 B2 JPH0525199 B2 JP H0525199B2 JP 60076574 A JP60076574 A JP 60076574A JP 7657485 A JP7657485 A JP 7657485A JP H0525199 B2 JPH0525199 B2 JP H0525199B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- conductor
- plating
- thick
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 51
- 239000004020 conductor Substances 0.000 claims description 40
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 36
- 229910052802 copper Inorganic materials 0.000 claims description 36
- 239000010949 copper Substances 0.000 claims description 36
- 238000007747 plating Methods 0.000 claims description 34
- 229910052759 nickel Inorganic materials 0.000 claims description 26
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 12
- 229910052721 tungsten Inorganic materials 0.000 claims description 12
- 239000010937 tungsten Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 11
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 7
- 239000000919 ceramic Substances 0.000 claims description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- 239000012212 insulator Substances 0.000 claims 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 239000012298 atmosphere Substances 0.000 description 12
- 238000010304 firing Methods 0.000 description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910052698 phosphorus Inorganic materials 0.000 description 5
- 239000011574 phosphorus Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 2
- PCEXQRKSUSSDFT-UHFFFAOYSA-N [Mn].[Mo] Chemical compound [Mn].[Mo] PCEXQRKSUSSDFT-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
- H05K3/4053—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
- H05K3/4061—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in inorganic insulating substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0347—Overplating, e.g. for reinforcing conductors or bumps; Plating over filled vias
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/035—Paste overlayer, i.e. conductive paste or solder paste over conductive layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/07—Electric details
- H05K2201/0753—Insulation
- H05K2201/0769—Anti metal-migration, e.g. avoiding tin whisker growth
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/09563—Metal filled via
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/245—Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques
- H05K3/246—Reinforcing conductive paste, ink or powder patterns by other methods, e.g. by plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/245—Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques
- H05K3/247—Finish coating of conductors by using conductive pastes, inks or powders
- H05K3/248—Finish coating of conductors by using conductive pastes, inks or powders fired compositions for inorganic substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4664—Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders
- H05K3/4667—Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders characterized by using an inorganic intermediate insulating layer
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60076574A JPS61236192A (ja) | 1985-04-12 | 1985-04-12 | セラミツク基板の電極形成方法 |
| DE19863612261 DE3612261A1 (de) | 1985-04-12 | 1986-04-11 | Vielschicht-keramikleiterplatte |
| CN198686103221A CN86103221A (zh) | 1985-04-12 | 1986-04-12 | 多层陶瓷电路板 |
| US06/851,729 US4713494A (en) | 1985-04-12 | 1986-04-14 | Multilayer ceramic circuit board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60076574A JPS61236192A (ja) | 1985-04-12 | 1985-04-12 | セラミツク基板の電極形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61236192A JPS61236192A (ja) | 1986-10-21 |
| JPH0525199B2 true JPH0525199B2 (en, 2012) | 1993-04-12 |
Family
ID=13609015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60076574A Granted JPS61236192A (ja) | 1985-04-12 | 1985-04-12 | セラミツク基板の電極形成方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4713494A (en, 2012) |
| JP (1) | JPS61236192A (en, 2012) |
| CN (1) | CN86103221A (en, 2012) |
| DE (1) | DE3612261A1 (en, 2012) |
Families Citing this family (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0714105B2 (ja) * | 1986-05-19 | 1995-02-15 | 日本電装株式会社 | 混成集積回路基板及びその製造方法 |
| US4931144A (en) * | 1987-07-31 | 1990-06-05 | Texas Instruments Incorporated | Self-aligned nonnested sloped via |
| DE3735959A1 (de) * | 1987-10-23 | 1989-05-03 | Bbc Brown Boveri & Cie | Mehrlagige duennschichtschaltung sowie verfahren zu deren herstellung |
| US4882454A (en) * | 1988-02-12 | 1989-11-21 | Texas Instruments Incorporated | Thermal interface for a printed wiring board |
| US4963697A (en) * | 1988-02-12 | 1990-10-16 | Texas Instruments Incorporated | Advanced polymers on metal printed wiring board |
| US5243320A (en) * | 1988-02-26 | 1993-09-07 | Gould Inc. | Resistive metal layers and method for making same |
| JPH01248593A (ja) * | 1988-03-30 | 1989-10-04 | Ngk Insulators Ltd | セラミック多層配線基板 |
| DE3814863A1 (de) * | 1988-05-02 | 1989-11-16 | Siemens Ag | Verfahren zum herstellen von vielschichtenkeramik auf silikatbasis |
| US5502889A (en) * | 1988-06-10 | 1996-04-02 | Sheldahl, Inc. | Method for electrically and mechanically connecting at least two conductive layers |
| US5164547A (en) * | 1988-07-07 | 1992-11-17 | Texas Instruments Incorporated | Articles having a dielectric layer on a metal substrate having improved adhesion |
| JPH0272695A (ja) * | 1988-09-07 | 1990-03-12 | Toshiba Lighting & Technol Corp | 混成集積回路 |
| US4927983A (en) * | 1988-12-16 | 1990-05-22 | International Business Machines Corporation | Circuit board |
| JP2840271B2 (ja) * | 1989-01-27 | 1998-12-24 | キヤノン株式会社 | 記録ヘッド |
| JPH04234147A (ja) * | 1990-12-28 | 1992-08-21 | Sony Corp | 多層配線構造体 |
| EP0504614B1 (en) | 1991-02-22 | 2003-10-15 | Canon Kabushiki Kaisha | Electrical connecting member and manufacturing method therefor |
| US5144228A (en) * | 1991-04-23 | 1992-09-01 | International Business Machines Corporation | Probe interface assembly |
| JP2738600B2 (ja) * | 1991-05-27 | 1998-04-08 | 京セラ株式会社 | 回路基板 |
| JPH04369288A (ja) * | 1991-06-17 | 1992-12-22 | Kyocera Corp | 回路基板 |
| US5386627A (en) * | 1992-09-29 | 1995-02-07 | International Business Machines Corporation | Method of fabricating a multi-layer integrated circuit chip interposer |
| US5389743A (en) * | 1992-12-21 | 1995-02-14 | Hughes Aircraft Company | Rivet design for enhanced copper thick-film I/O pad adhesion |
| JPH06223623A (ja) * | 1992-12-28 | 1994-08-12 | Internatl Business Mach Corp <Ibm> | 銅を素材とするペーストおよびセラミックパッケージ |
| US5727310A (en) * | 1993-01-08 | 1998-03-17 | Sheldahl, Inc. | Method of manufacturing a multilayer electronic circuit |
| US5416278A (en) | 1993-03-01 | 1995-05-16 | Motorola, Inc. | Feedthrough via connection |
| US5428190A (en) * | 1993-07-02 | 1995-06-27 | Sheldahl, Inc. | Rigid-flex board with anisotropic interconnect and method of manufacture |
| JP3471046B2 (ja) * | 1993-08-12 | 2003-11-25 | 富士通株式会社 | プリント基板の製造方法 |
| US5527998A (en) * | 1993-10-22 | 1996-06-18 | Sheldahl, Inc. | Flexible multilayer printed circuit boards and methods of manufacture |
| JPH07212045A (ja) * | 1994-01-21 | 1995-08-11 | Hitachi Ltd | 電子部品及びその製造方法 |
| US5834705A (en) * | 1994-03-04 | 1998-11-10 | Silicon Graphics, Inc. | Arrangement for modifying eletrical printed circuit boards |
| US6323435B1 (en) * | 1998-07-31 | 2001-11-27 | Kulicke & Soffa Holdings, Inc. | Low-impedance high-density deposited-on-laminate structures having reduced stress |
| JP2001210919A (ja) * | 1999-11-17 | 2001-08-03 | Sharp Corp | フレキシブル配線板およびそれを用いた電子機器 |
| US6586682B2 (en) * | 2000-02-23 | 2003-07-01 | Kulicke & Soffa Holdings, Inc. | Printed wiring board with controlled line impedance |
| JP3473601B2 (ja) * | 2000-12-26 | 2003-12-08 | 株式会社デンソー | プリント基板およびその製造方法 |
| US6486415B2 (en) * | 2001-01-16 | 2002-11-26 | International Business Machines Corporation | Compliant layer for encapsulated columns |
| DE60228030D1 (de) * | 2001-03-14 | 2008-09-18 | Ibiden Co Ltd | Mehrschichtige leiterplatte |
| JP2005022956A (ja) * | 2003-07-02 | 2005-01-27 | Rohm & Haas Electronic Materials Llc | セラミックの金属化 |
| JP2005340687A (ja) * | 2004-05-31 | 2005-12-08 | Fujitsu Ltd | 積層基板及びその製造方法、かかる積層基板を有する電子機器 |
| JP4634977B2 (ja) * | 2006-08-15 | 2011-02-16 | Ｏｋｉセミコンダクタ株式会社 | 半導体装置及び半導体装置の製造方法 |
| KR100896610B1 (ko) * | 2007-11-05 | 2009-05-08 | 삼성전기주식회사 | 다층 세라믹 기판 및 그 제조방법 |
| US9586382B2 (en) * | 2008-01-24 | 2017-03-07 | National Taiwan University | Ceramic/metal composite structure |
| KR100957787B1 (ko) * | 2008-03-24 | 2010-05-12 | 삼성전기주식회사 | 다층 기판 제조 방법 및 다층 기판 |
| DE102009029485A1 (de) | 2009-09-15 | 2011-03-24 | Robert Bosch Gmbh | Verfahren zur Herstellung eines Keramikbauteils, Keramikbauteil und Bauteilanordnung |
| JP5367914B2 (ja) * | 2011-08-11 | 2013-12-11 | 古河電気工業株式会社 | 配線基板およびその製造方法ならびに半導体装置 |
| CN104349586A (zh) * | 2013-07-31 | 2015-02-11 | 黄小蔓 | 一种陶瓷基锰覆线pcb及其制备方法 |
| CN103607837A (zh) * | 2013-10-21 | 2014-02-26 | 溧阳市东大技术转移中心有限公司 | 一种印刷电路板结构 |
| KR102720915B1 (ko) * | 2018-03-28 | 2024-10-24 | 다이니폰 인사츠 가부시키가이샤 | 배선 기판, 및 배선 기판을 제조하는 방법 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB874965A (en) * | 1958-07-09 | 1961-08-16 | G V Planer Ltd | Improvements in or relating to electrical circuits or circuit elements |
| BE631489A (en, 2012) * | 1962-04-27 | |||
| US3838204A (en) * | 1966-03-30 | 1974-09-24 | Ibm | Multilayer circuits |
| US3576668A (en) * | 1968-06-07 | 1971-04-27 | United Aircraft Corp | Multilayer thick film ceramic hybrid integrated circuit |
| US3778530A (en) * | 1971-04-01 | 1973-12-11 | W Reimann | Flatpack lead positioning device |
| DE2202077A1 (de) * | 1971-05-17 | 1972-11-30 | Hochvakuum Dresden Veb | Verfahren zur Herstellung von Mehrlagenleiterplatten |
| US3725743A (en) * | 1971-05-19 | 1973-04-03 | Hitachi Ltd | Multilayer wiring structure |
| DE2509912C3 (de) * | 1975-03-07 | 1979-11-29 | Robert Bosch Gmbh, 7000 Stuttgart | Elektronische Dünnfilmschaltung |
| US4311768A (en) * | 1977-12-22 | 1982-01-19 | Gould Inc. | Printed circuit board having mutually etchable copper and nickel layers |
| US4340618A (en) * | 1981-03-20 | 1982-07-20 | International Business Machines Corporation | Process for forming refractory metal layers on ceramic substrate |
| JPS5936948A (ja) * | 1982-08-25 | 1984-02-29 | Hitachi Ltd | セラミツクス基板 |
| JPS5975695A (ja) * | 1982-10-23 | 1984-04-28 | 日本碍子株式会社 | セラミツク厚膜回路基板 |
| GB2134136B (en) * | 1983-01-19 | 1986-03-26 | Shell Int Research | An electronic conduit and a method of manufacturing it |
| JPS59167096A (ja) * | 1983-03-11 | 1984-09-20 | 日本電気株式会社 | 回路基板 |
| US4541035A (en) * | 1984-07-30 | 1985-09-10 | General Electric Company | Low loss, multilevel silicon circuit board |
-
1985
- 1985-04-12 JP JP60076574A patent/JPS61236192A/ja active Granted
-
1986
- 1986-04-11 DE DE19863612261 patent/DE3612261A1/de not_active Withdrawn
- 1986-04-12 CN CN198686103221A patent/CN86103221A/zh active Pending
- 1986-04-14 US US06/851,729 patent/US4713494A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE3612261A1 (de) | 1986-10-16 |
| CN86103221A (zh) | 1987-04-01 |
| JPS61236192A (ja) | 1986-10-21 |
| US4713494A (en) | 1987-12-15 |
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