JP7670487B2 - 導電性組成物及びその製造方法と、導電体及びその製造方法 - Google Patents

導電性組成物及びその製造方法と、導電体及びその製造方法 Download PDF

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JP7670487B2
JP7670487B2 JP2020555673A JP2020555673A JP7670487B2 JP 7670487 B2 JP7670487 B2 JP 7670487B2 JP 2020555673 A JP2020555673 A JP 2020555673A JP 2020555673 A JP2020555673 A JP 2020555673A JP 7670487 B2 JP7670487 B2 JP 7670487B2
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conductive polymer
conductive composition
conductive
molecular weight
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JPWO2020100791A1 (ja
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早希 仲野
嘉子 入江
正志 鵜澤
明 山嵜
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Mitsubishi Chemical Corp
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    • G—PHYSICS
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    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/093—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antistatic means, e.g. for charge depletion
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    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/02—Polyamines
    • C08G73/026—Wholly aromatic polyamines
    • C08G73/0266—Polyanilines or derivatives thereof
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    • C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
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    • H01B1/124—Intrinsically conductive polymers
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JP2020555673A 2018-11-15 2019-11-11 導電性組成物及びその製造方法と、導電体及びその製造方法 Active JP7670487B2 (ja)

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JP2024083083A (ja) * 2022-12-09 2024-06-20 信越化学工業株式会社 導電性高分子組成物、被覆品、及びパターン形成方法

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