JP7137156B2 - 細長い粒子形状を有するシリカゾルの製造方法 - Google Patents

細長い粒子形状を有するシリカゾルの製造方法 Download PDF

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Publication number
JP7137156B2
JP7137156B2 JP2020501086A JP2020501086A JP7137156B2 JP 7137156 B2 JP7137156 B2 JP 7137156B2 JP 2020501086 A JP2020501086 A JP 2020501086A JP 2020501086 A JP2020501086 A JP 2020501086A JP 7137156 B2 JP7137156 B2 JP 7137156B2
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Prior art keywords
silica sol
acid
producing
exchange resin
raw material
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Japanese (ja)
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JPWO2019163992A5 (https=
JPWO2019163992A1 (ja
Inventor
智 村上
拓也 福岡
和也 黒岩
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Nissan Chemical Corp
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Nissan Chemical Corp
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C01B33/143—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
    • C01B33/1435—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates using ion exchangers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/02—Amorphous compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/10—Particle morphology extending in one dimension, e.g. needle-like
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Silicon Compounds (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
JP2020501086A 2018-02-26 2019-02-25 細長い粒子形状を有するシリカゾルの製造方法 Active JP7137156B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018032123 2018-02-26
JP2018032123 2018-02-26
PCT/JP2019/007109 WO2019163992A1 (ja) 2018-02-26 2019-02-25 細長い粒子形状を有するシリカゾルの製造方法

Publications (3)

Publication Number Publication Date
JPWO2019163992A1 JPWO2019163992A1 (ja) 2021-03-04
JPWO2019163992A5 JPWO2019163992A5 (https=) 2022-02-18
JP7137156B2 true JP7137156B2 (ja) 2022-09-14

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JP2020501086A Active JP7137156B2 (ja) 2018-02-26 2019-02-25 細長い粒子形状を有するシリカゾルの製造方法

Country Status (6)

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US (1) US11814295B2 (https=)
JP (1) JP7137156B2 (https=)
KR (1) KR102686976B1 (https=)
CN (1) CN111788153B (https=)
TW (1) TWI850216B (https=)
WO (1) WO2019163992A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7455623B2 (ja) * 2020-03-13 2024-03-26 日揮触媒化成株式会社 粒子連結型シリカ微粒子分散液およびその製造方法、並びに研磨用砥粒分散液
CN113845117B (zh) * 2020-06-28 2023-05-26 中国石油天然气股份有限公司 一种油水两亲性二氧化硅纳米粒子及其制备方法
JP7583597B2 (ja) * 2020-12-09 2024-11-14 日揮触媒化成株式会社 異形シリカ系微粒子分散液およびその製造方法
CN116143131A (zh) * 2023-03-02 2023-05-23 衢州博来纳润电子材料有限公司 一种低金属离子含量硼改性酸性硅溶胶的制备方法
WO2025173621A1 (ja) * 2024-02-14 2025-08-21 株式会社トクヤマ 非晶質シリカ粒子の製造方法、非晶質シリカ粒子、それを含む化粧品、及び非晶質シリカ粒子の製造システム

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007153672A (ja) 2005-12-05 2007-06-21 Catalysts & Chem Ind Co Ltd 異方形状シリカゾルの製造方法
WO2008093422A1 (ja) 2007-02-01 2008-08-07 Nissan Chemical Industries, Ltd. 細長い形状を有するシリカゾルの製造方法
JP2010143784A (ja) 2008-12-18 2010-07-01 Adeka Corp 分鎖状シリカ粒子よりなるシリカゾル及びその製造方法
US9783702B1 (en) 2016-10-19 2017-10-10 Rohm And Haas Electronic Materials Cmp Holdings Inc. Aqueous compositions of low abrasive silica particles

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2803134B2 (ja) 1988-03-16 1998-09-24 日産化学工業株式会社 細長い形状のシリカゾル及びその製造法
JPH085657B2 (ja) 1990-11-21 1996-01-24 触媒化成工業株式会社 シリカゾルとその製法
JP3517913B2 (ja) 1993-10-15 2004-04-12 日産化学工業株式会社 細長い形状のシリカゾルの製造法
JP4264701B2 (ja) * 2002-12-11 2009-05-20 日産化学工業株式会社 低アルカリ金属含有水性シリカゾルの製造方法
JP3691048B1 (ja) * 2004-08-09 2005-08-31 日本化学工業株式会社 高純度コロイダルシリカの製造方法
TW200833606A (en) 2007-02-02 2008-08-16 Nissan Chemical Ind Ltd Process for producing silica sol having elongated shape
JP5398963B2 (ja) * 2007-04-23 2014-01-29 日本化学工業株式会社 低ナトリウムで非球状のコロイダルシリカ
CN101397139B (zh) 2008-09-09 2012-01-04 苏州纳迪微电子有限公司 高纯度硅溶胶及其制备方法
JP5457070B2 (ja) * 2009-05-14 2014-04-02 日本化学工業株式会社 コロイダルシリカおよびその製造方法
JP5431120B2 (ja) 2009-11-06 2014-03-05 日本化学工業株式会社 コロイダルシリカの製造方法
TWI549911B (zh) 2011-12-28 2016-09-21 日揮觸媒化成股份有限公司 高純度氧化矽溶膠及其製造方法
JP6414547B2 (ja) * 2013-06-10 2018-10-31 日産化学株式会社 シリカゾル及びシリカゾルの製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007153672A (ja) 2005-12-05 2007-06-21 Catalysts & Chem Ind Co Ltd 異方形状シリカゾルの製造方法
WO2008093422A1 (ja) 2007-02-01 2008-08-07 Nissan Chemical Industries, Ltd. 細長い形状を有するシリカゾルの製造方法
JP2010143784A (ja) 2008-12-18 2010-07-01 Adeka Corp 分鎖状シリカ粒子よりなるシリカゾル及びその製造方法
US9783702B1 (en) 2016-10-19 2017-10-10 Rohm And Haas Electronic Materials Cmp Holdings Inc. Aqueous compositions of low abrasive silica particles

Also Published As

Publication number Publication date
TWI850216B (zh) 2024-08-01
WO2019163992A1 (ja) 2019-08-29
US11814295B2 (en) 2023-11-14
US20200392004A1 (en) 2020-12-17
KR102686976B1 (ko) 2024-07-19
JPWO2019163992A1 (ja) 2021-03-04
KR20200124249A (ko) 2020-11-02
TW201936500A (zh) 2019-09-16
CN111788153A (zh) 2020-10-16
CN111788153B (zh) 2023-12-19

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