CN111788153B - 具有细长的粒子形状的硅溶胶的制造方法 - Google Patents

具有细长的粒子形状的硅溶胶的制造方法 Download PDF

Info

Publication number
CN111788153B
CN111788153B CN201980015361.4A CN201980015361A CN111788153B CN 111788153 B CN111788153 B CN 111788153B CN 201980015361 A CN201980015361 A CN 201980015361A CN 111788153 B CN111788153 B CN 111788153B
Authority
CN
China
Prior art keywords
silica sol
acid
producing
raw material
exchange resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201980015361.4A
Other languages
English (en)
Chinese (zh)
Other versions
CN111788153A (zh
Inventor
村上智
福冈拓也
黑岩和也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of CN111788153A publication Critical patent/CN111788153A/zh
Application granted granted Critical
Publication of CN111788153B publication Critical patent/CN111788153B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C01B33/143—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
    • C01B33/1435—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates using ion exchangers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/02—Amorphous compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/10—Particle morphology extending in one dimension, e.g. needle-like
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Silicon Compounds (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
CN201980015361.4A 2018-02-26 2019-02-25 具有细长的粒子形状的硅溶胶的制造方法 Active CN111788153B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018-032123 2018-02-26
JP2018032123 2018-02-26
PCT/JP2019/007109 WO2019163992A1 (ja) 2018-02-26 2019-02-25 細長い粒子形状を有するシリカゾルの製造方法

Publications (2)

Publication Number Publication Date
CN111788153A CN111788153A (zh) 2020-10-16
CN111788153B true CN111788153B (zh) 2023-12-19

Family

ID=67688116

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980015361.4A Active CN111788153B (zh) 2018-02-26 2019-02-25 具有细长的粒子形状的硅溶胶的制造方法

Country Status (6)

Country Link
US (1) US11814295B2 (https=)
JP (1) JP7137156B2 (https=)
KR (1) KR102686976B1 (https=)
CN (1) CN111788153B (https=)
TW (1) TWI850216B (https=)
WO (1) WO2019163992A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7455623B2 (ja) * 2020-03-13 2024-03-26 日揮触媒化成株式会社 粒子連結型シリカ微粒子分散液およびその製造方法、並びに研磨用砥粒分散液
CN113845117B (zh) * 2020-06-28 2023-05-26 中国石油天然气股份有限公司 一种油水两亲性二氧化硅纳米粒子及其制备方法
JP7583597B2 (ja) * 2020-12-09 2024-11-14 日揮触媒化成株式会社 異形シリカ系微粒子分散液およびその製造方法
CN116143131A (zh) * 2023-03-02 2023-05-23 衢州博来纳润电子材料有限公司 一种低金属离子含量硼改性酸性硅溶胶的制备方法
WO2025173621A1 (ja) * 2024-02-14 2025-08-21 株式会社トクヤマ 非晶質シリカ粒子の製造方法、非晶質シリカ粒子、それを含む化粧品、及び非晶質シリカ粒子の製造システム

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004189534A (ja) * 2002-12-11 2004-07-08 Nissan Chem Ind Ltd 低アルカリ金属含有水性シリカゾルの製造方法
JP3691048B1 (ja) * 2004-08-09 2005-08-31 日本化学工業株式会社 高純度コロイダルシリカの製造方法
JP2008266080A (ja) * 2007-04-23 2008-11-06 Nippon Chem Ind Co Ltd 低ナトリウムで非球状のコロイダルシリカ
CN101626979A (zh) * 2007-02-01 2010-01-13 日产化学工业株式会社 具有细长形状的硅溶胶的制造方法
JP2010265139A (ja) * 2009-05-14 2010-11-25 Nippon Chem Ind Co Ltd コロイダルシリカおよびその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2803134B2 (ja) 1988-03-16 1998-09-24 日産化学工業株式会社 細長い形状のシリカゾル及びその製造法
JPH085657B2 (ja) 1990-11-21 1996-01-24 触媒化成工業株式会社 シリカゾルとその製法
JP3517913B2 (ja) 1993-10-15 2004-04-12 日産化学工業株式会社 細長い形状のシリカゾルの製造法
JP4979930B2 (ja) 2005-12-05 2012-07-18 日揮触媒化成株式会社 異方形状シリカゾルの製造方法
TW200833606A (en) 2007-02-02 2008-08-16 Nissan Chemical Ind Ltd Process for producing silica sol having elongated shape
CN101397139B (zh) 2008-09-09 2012-01-04 苏州纳迪微电子有限公司 高纯度硅溶胶及其制备方法
JP2010143784A (ja) * 2008-12-18 2010-07-01 Adeka Corp 分鎖状シリカ粒子よりなるシリカゾル及びその製造方法
JP5431120B2 (ja) 2009-11-06 2014-03-05 日本化学工業株式会社 コロイダルシリカの製造方法
TWI549911B (zh) 2011-12-28 2016-09-21 日揮觸媒化成股份有限公司 高純度氧化矽溶膠及其製造方法
JP6414547B2 (ja) * 2013-06-10 2018-10-31 日産化学株式会社 シリカゾル及びシリカゾルの製造方法
US9783702B1 (en) * 2016-10-19 2017-10-10 Rohm And Haas Electronic Materials Cmp Holdings Inc. Aqueous compositions of low abrasive silica particles

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004189534A (ja) * 2002-12-11 2004-07-08 Nissan Chem Ind Ltd 低アルカリ金属含有水性シリカゾルの製造方法
JP3691048B1 (ja) * 2004-08-09 2005-08-31 日本化学工業株式会社 高純度コロイダルシリカの製造方法
CN101626979A (zh) * 2007-02-01 2010-01-13 日产化学工业株式会社 具有细长形状的硅溶胶的制造方法
JP2008266080A (ja) * 2007-04-23 2008-11-06 Nippon Chem Ind Co Ltd 低ナトリウムで非球状のコロイダルシリカ
JP2010265139A (ja) * 2009-05-14 2010-11-25 Nippon Chem Ind Co Ltd コロイダルシリカおよびその製造方法

Also Published As

Publication number Publication date
TWI850216B (zh) 2024-08-01
WO2019163992A1 (ja) 2019-08-29
US11814295B2 (en) 2023-11-14
US20200392004A1 (en) 2020-12-17
KR102686976B1 (ko) 2024-07-19
JPWO2019163992A1 (ja) 2021-03-04
KR20200124249A (ko) 2020-11-02
JP7137156B2 (ja) 2022-09-14
TW201936500A (zh) 2019-09-16
CN111788153A (zh) 2020-10-16

Similar Documents

Publication Publication Date Title
CN111788153B (zh) 具有细长的粒子形状的硅溶胶的制造方法
TWI850215B (zh) 具有細長粒子形狀之二氧化矽溶膠的製造方法
CN102164853B (zh) 含有具有弯曲结构和/或分支结构的二氧化硅二次颗粒的胶体二氧化硅及其制造方法
TW311905B (https=)
JP5221517B2 (ja) アルミ改質コロイダルシリカ及びその製造方法
JP7575904B2 (ja) 鉄系酸化物磁性粉およびその製造方法
JP5019076B2 (ja) 細長い形状を有するシリカゾルの製造方法
WO2007018069A1 (ja) 異形シリカゾルおよびその製造方法
JP2002338232A (ja) 二次凝集コロイダルシリカとその製造方法及びそれを用いた研磨剤組成物
JP3837754B2 (ja) 結晶性酸化第二セリウムの製造方法
TWI701348B (zh) 鐵粉及其製造方法，以及電感器用成形體及電感器
JP2022100932A (ja) シリカ微粒子分散液およびその製造方法
JP7561557B2 (ja) 鉄系酸化物磁性粉およびその製造方法
CN111629846A (zh) Fe-Ni合金粉以及使用其的电感器用成型体和电感器
JP2021134098A (ja) シリカ微粒子分散液およびその製造方法
TWI900801B (zh) 鏈狀之膠體二氧化矽粒子分散溶膠及其製造方法
KR100894795B1 (ko) 금속 규소로부터 직접산화법에 의한 콜로이달 실리카의제조방법
JP7165538B2 (ja) リン回収材およびその製造方法
JP7101386B2 (ja) 金属酸化物ナノ粒子の製造方法
WO2021187329A1 (ja) 鉄系酸化物磁性粉の製造方法
CN120265574A (zh) 二氧化硅粒子、二氧化硅粒子的制造方法、硅溶胶、研磨组合物、研磨方法、半导体晶片的制造方法及半导体器件的制造方法
JP2021127279A (ja) 鉄系酸化物磁性粉とその製造方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant