JP7101615B2 - ポリシロキサンマクロモノマー単位を有するコポリマー、該コポリマーの製造方法、ならびに該コポリマーの、コーティング組成物およびポリマー成形コンパウンドにおける使用 - Google Patents

ポリシロキサンマクロモノマー単位を有するコポリマー、該コポリマーの製造方法、ならびに該コポリマーの、コーティング組成物およびポリマー成形コンパウンドにおける使用 Download PDF

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JP7101615B2
JP7101615B2 JP2018510942A JP2018510942A JP7101615B2 JP 7101615 B2 JP7101615 B2 JP 7101615B2 JP 2018510942 A JP2018510942 A JP 2018510942A JP 2018510942 A JP2018510942 A JP 2018510942A JP 7101615 B2 JP7101615 B2 JP 7101615B2
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carbon atoms
mass
copolymer
alkyl
meth
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JP2018532824A (ja
Inventor
ヤウンキー ヴォイチェフ
フランク アルベアト
ヴィンターマイアー フェレナ
ミヒェルブリンク ミヒャエラ
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BYK Chemie GmbH
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BYK Chemie GmbH
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/14Methyl esters, e.g. methyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/20Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42Block-or graft-polymers containing polysiloxane sequences
    • C08G77/442Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/10Block or graft copolymers containing polysiloxane sequences

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
JP2018510942A 2015-08-31 2016-08-31 ポリシロキサンマクロモノマー単位を有するコポリマー、該コポリマーの製造方法、ならびに該コポリマーの、コーティング組成物およびポリマー成形コンパウンドにおける使用 Active JP7101615B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15183207 2015-08-31
EP15183207.8 2015-08-31
PCT/EP2016/070528 WO2017037123A1 (en) 2015-08-31 2016-08-31 Copolymers containing polysiloxane macromonomer units, process of their preparation and their use in coating compositions and polymeric moulding compounds

Publications (2)

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JP2018532824A JP2018532824A (ja) 2018-11-08
JP7101615B2 true JP7101615B2 (ja) 2022-07-15

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JP2018510942A Active JP7101615B2 (ja) 2015-08-31 2016-08-31 ポリシロキサンマクロモノマー単位を有するコポリマー、該コポリマーの製造方法、ならびに該コポリマーの、コーティング組成物およびポリマー成形コンパウンドにおける使用

Country Status (6)

Country Link
US (1) US20180244855A1 (ko)
EP (1) EP3344705B1 (ko)
JP (1) JP7101615B2 (ko)
KR (1) KR20180048811A (ko)
CN (1) CN107922739A (ko)
WO (1) WO2017037123A1 (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6850268B2 (ja) * 2018-02-09 2021-03-31 信越化学工業株式会社 (メタ)アクリルシリコーン系グラフト共重合体及びその製造方法
WO2020142388A1 (en) * 2018-12-31 2020-07-09 Dow Silicones Corporation Composition, method of preparing copolymer, and methods and end uses thereof
WO2021007125A1 (en) * 2019-07-05 2021-01-14 Board Of Trustees Of Michigan State University Omniphobic compatibilizers for clear coatings, related articles, and related methods
JP7467794B2 (ja) 2020-11-16 2024-04-16 関西ペイント株式会社 塗料組成物及び塗膜形成方法
JP7467793B2 (ja) 2019-11-28 2024-04-16 関西ペイント株式会社 塗料組成物及び塗膜形成方法
EP4208491A1 (en) * 2020-09-02 2023-07-12 BYK-Chemie GmbH Ladder copolymer
KR102401234B1 (ko) 2020-11-25 2022-05-24 에이엠씨주식회사 에너지선 경화형 화합물을 함유하는 점착시트 및 반도체 칩의 제조방법
CN114716680B (zh) * 2021-06-23 2023-08-25 浙江赢科新材料股份有限公司 一种单端γ-甲基丙烯酰氧丙基官能团封端的聚二甲基硅氧烷的制备方法
CN113698839B (zh) * 2021-08-30 2023-02-28 浙江理工大学 一种无voc排放的环保型有机超疏水复合涂层及其制备方法
CN114854021A (zh) * 2022-04-24 2022-08-05 希立科高新材料科技(苏州)有限公司 一种单边反应型官能团封端硅油的制备方法
WO2024101164A1 (ja) * 2022-11-10 2024-05-16 Dic株式会社 レジスト組成物およびその硬化物

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011116037A (ja) 2009-12-03 2011-06-16 Dainichiseika Color & Chem Mfg Co Ltd 感熱記録材
JP2011132398A (ja) 2009-12-25 2011-07-07 Toyo Ink Sc Holdings Co Ltd フィルムもしくはシート

Family Cites Families (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3878263A (en) * 1972-07-10 1975-04-15 Stauffer Chemical Co Acrylate-functional polysiloxane polymers
US4804732A (en) * 1986-01-06 1989-02-14 E. I. Du Pont De Nemours And Company Polysiloxane graft copolymers, flexible coating compositions comprising same and branched polysiloxane macromers for preparing same
JP2658152B2 (ja) * 1988-04-05 1997-09-30 日本油脂株式会社 ポリシロキサン基含有重合体
JP2668083B2 (ja) * 1988-09-05 1997-10-27 関西ペイント株式会社 自動車用塗料組成物
JPH0651795B2 (ja) * 1988-09-16 1994-07-06 信越化学工業株式会社 メタクリル官能性ジメチルポリシロキサン
JPH02284926A (ja) * 1989-04-26 1990-11-22 Idemitsu Petrochem Co Ltd 硬化性ホスファゼン組成物および被覆部材
US5258458A (en) * 1991-02-28 1993-11-02 Minnesota Mining And Manufacturing Company Composition for providing oil and water repellency
US5319045A (en) * 1993-06-02 1994-06-07 Mitsubishi Kasei Corporation Copolymer and composition containing the copolymer
DE4439669A1 (de) * 1994-11-07 1996-05-09 Basf Lacke & Farben Wäßriges Zweikomponenten-Polyurethan-Beschichtungsmittel, Verfahren zu seiner Herstellung und seine Verwendung in Verfahren zur Herstellung einer Mehrschichtlackierung
US6291620B1 (en) 1994-11-09 2001-09-18 E. I. Du Pont De Nemours And Company Polymer synthesis
JP3053353B2 (ja) * 1995-04-18 2000-06-19 信越化学工業株式会社 ラジカル重合性樹脂組成物
DE19535603A1 (de) * 1995-09-25 1997-03-27 Basf Lacke & Farben 3-Komponenten-Beschichtungsmittel mit hoher Lösemittelbeständigkeit und hoher Abklebfestigkeit
US5714538A (en) * 1995-12-26 1998-02-03 Lexmark International, Inc. Polymeric dispersants for pigmented inks
US5656071A (en) * 1995-12-26 1997-08-12 Lexmark International, Inc. Ink compositions
US5719204A (en) * 1995-12-26 1998-02-17 Lexmark International, Inc. Pigmented inks with polymeric dispersants
CN1137144C (zh) 1996-07-10 2004-02-04 纳幕尔杜邦公司 具有活性特征的聚合作用
JPH10182987A (ja) * 1996-12-27 1998-07-07 Shin Etsu Chem Co Ltd 摺動性樹脂組成物
US5994427A (en) * 1997-03-12 1999-11-30 Lexmark International, Inc. High performance ink compositions with non-benzidine based colorants
FR2764892B1 (fr) 1997-06-23 2000-03-03 Rhodia Chimie Sa Procede de synthese de polymeres a blocs
US6063834A (en) * 1997-12-08 2000-05-16 Lexmark International, Inc. Wet-rub resistant ink compositions
CA2309279C (en) 1997-12-18 2009-07-14 E.I. Du Pont De Nemours And Company Polymerization process with living characteristics and polymers made therefrom
CA2337004C (en) * 1998-07-17 2008-12-23 Biocompatibles Limited Method for providing coated moulded polymeric articles
US7049373B2 (en) * 1999-08-06 2006-05-23 Carnegie Mellon University Process for preparation of graft polymers
DE10048259A1 (de) 2000-09-29 2002-04-18 Byk Chemie Gmbh Beschichtungsmittel und polymere Formmassen mit anti-adhäsiven, schmutzabweisenden Eigenschaften
US6692105B2 (en) * 2000-12-01 2004-02-17 Konica Corporation Ink jet recording head and ink jet recording apparatus employing the same
JP4936599B2 (ja) * 2001-02-16 2012-05-23 楠本化成株式会社 塗料・インキ用平滑剤
US7034085B2 (en) 2002-07-23 2006-04-25 Nuplex Resins, B.V. Method for polymerizing ethylenically unsaturated monomers by degenerative iodine transfer
US9237865B2 (en) * 2002-10-18 2016-01-19 Medtronic Minimed, Inc. Analyte sensors and methods for making and using them
US7297462B2 (en) * 2003-11-17 2007-11-20 Agfa Graphics Nv Heat-sensitive lithographic printing plate precursor
BRPI0510086B1 (pt) * 2004-04-21 2019-04-24 Novartis Ag Tinta para produção de lentes de contato coloridas
US7939576B2 (en) * 2005-11-25 2011-05-10 Fujifilm Corporation Antireflection film, process of producing the same, and polarizing plate and display device including the same
CN100560592C (zh) * 2006-12-13 2009-11-18 中国科学院广州化学研究所 一种含硅(甲基)丙烯酸酯单体及其共聚物和它们的制备方法
US7799888B2 (en) 2007-04-27 2010-09-21 Gelest, Inc. Low molecular weight siloxanes with one functional group
US7858672B1 (en) * 2007-10-02 2010-12-28 Alcon, Inc. Methacrylic materials suitable for ophthalmic and otorhinolaryngological devices
EP2207824A4 (en) * 2007-11-01 2011-02-16 Univ Akron THERMOPLASTIC AMPHIPHILIC CO-NETWORKS
US8044111B2 (en) * 2007-11-30 2011-10-25 Novartis Ag Actinically-crosslinkable silicone-containing block copolymers
KR101542638B1 (ko) 2007-12-28 2015-08-06 쓰리엠 이노베이티브 프로퍼티즈 캄파니 나노입자, 비닐단량체 및 실리콘의 공중합체
US20090207228A1 (en) * 2008-02-13 2009-08-20 Fujifilm Corporation Method of forming image by thermal transfer
US20110045444A1 (en) * 2008-04-18 2011-02-24 Rao Prabhakara S Dental filling composition comprising hyperbranched compound
JP5610722B2 (ja) * 2008-08-08 2014-10-22 キヤノン株式会社 インクジェット用インク、インクジェット記録方法、インクカートリッジ、記録ユニット、及びインクジェット記録装置
JP5333045B2 (ja) * 2009-08-21 2013-11-06 富士ゼロックス株式会社 電気泳動粒子、電気泳動粒子分散液、表示媒体、および表示装置
WO2012036036A1 (ja) * 2010-09-13 2012-03-22 ユニマテック株式会社 含フッ素共重合体
SG191268A1 (en) * 2010-12-21 2013-07-31 Agency Science Tech & Res Copolymer, composition and method for modifying rheology
CN103261356B (zh) * 2010-12-29 2016-01-13 3M创新有限公司 用于有机硅粘合剂制品的低粘合性背胶及方法
JP2012215835A (ja) * 2011-03-31 2012-11-08 Ricoh Co Ltd 書換え可能な記録媒体、書換え可能な記録媒体の製造方法、画像記録セット、及び画像記録方法
US8952118B2 (en) 2011-08-12 2015-02-10 Gelest Technologies, Inc. Dual functional linear siloxanes, step-growth polymers derived therefrom, and methods of preparation thereof
JP6021920B2 (ja) * 2011-08-31 2016-11-09 スリーエム イノベイティブ プロパティズ カンパニー 耐擦り傷性を有する臭気吸収フィルム
TWI477560B (zh) * 2013-02-07 2015-03-21 Benq Materials Corp 隱形眼鏡材料、隱形眼鏡的製造方法與由此方法所製造出之隱形眼鏡

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011116037A (ja) 2009-12-03 2011-06-16 Dainichiseika Color & Chem Mfg Co Ltd 感熱記録材
JP2011132398A (ja) 2009-12-25 2011-07-07 Toyo Ink Sc Holdings Co Ltd フィルムもしくはシート

Also Published As

Publication number Publication date
US20180244855A1 (en) 2018-08-30
WO2017037123A1 (en) 2017-03-09
JP2018532824A (ja) 2018-11-08
CN107922739A (zh) 2018-04-17
KR20180048811A (ko) 2018-05-10
EP3344705A1 (en) 2018-07-11
EP3344705B1 (en) 2019-06-26

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