JP6868982B2 - 隆起部が設けられている半導体を基板の基板位置に取り付けるための方法 - Google Patents

隆起部が設けられている半導体を基板の基板位置に取り付けるための方法 Download PDF

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JP6868982B2
JP6868982B2 JP2016156305A JP2016156305A JP6868982B2 JP 6868982 B2 JP6868982 B2 JP 6868982B2 JP 2016156305 A JP2016156305 A JP 2016156305A JP 2016156305 A JP2016156305 A JP 2016156305A JP 6868982 B2 JP6868982 B2 JP 6868982B2
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camera
substrate
positioning
bonding head
image
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JP2017050533A (ja
JP2017050533A5 (enrdf_load_stackoverflow
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フローリアン スピア
フローリアン スピア
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Besi Switzerland AG
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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Wire Bonding (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2016156305A 2015-08-31 2016-08-09 隆起部が設けられている半導体を基板の基板位置に取り付けるための方法 Active JP6868982B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CH12482015 2015-08-31
CH01248/15 2015-08-31
CH01404/15 2015-09-28
CH01404/15A CH711536B1 (de) 2015-08-31 2015-09-28 Verfahren für die Montage von mit Bumps versehenen Halbleiterchips auf Substratplätzen eines Substrats.

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JP2017050533A JP2017050533A (ja) 2017-03-09
JP2017050533A5 JP2017050533A5 (enrdf_load_stackoverflow) 2019-09-05
JP6868982B2 true JP6868982B2 (ja) 2021-05-12

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JP (1) JP6868982B2 (enrdf_load_stackoverflow)
KR (1) KR102597252B1 (enrdf_load_stackoverflow)
CN (1) CN106486400B (enrdf_load_stackoverflow)
CH (1) CH711536B1 (enrdf_load_stackoverflow)
MY (1) MY176667A (enrdf_load_stackoverflow)
SG (1) SG10201606167WA (enrdf_load_stackoverflow)
TW (1) TWI700767B (enrdf_load_stackoverflow)

Families Citing this family (3)

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Publication number Priority date Publication date Assignee Title
JP7164314B2 (ja) * 2017-04-28 2022-11-01 ベシ スウィッツァーランド エージー 部品を基板上に搭載する装置及び方法
CN109079367B (zh) * 2018-07-23 2020-07-24 中电科技(合肥)博微信息发展有限责任公司 一种芯片智能焊接方法
JP7582928B2 (ja) * 2021-11-25 2024-11-13 キヤノン株式会社 接合装置および接合方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5372294A (en) * 1994-01-27 1994-12-13 Motorola, Inc. Method of preparing a component for automated placement
JP2833996B2 (ja) * 1994-05-25 1998-12-09 日本電気株式会社 フレキシブルフィルム及びこれを有する半導体装置
JPH10209208A (ja) * 1997-01-23 1998-08-07 Hitachi Ltd 半導体製造方法および装置
US7842599B2 (en) * 1997-05-27 2010-11-30 Wstp, Llc Bumping electronic components using transfer substrates
JP2001060795A (ja) * 1999-08-20 2001-03-06 Matsushita Electric Ind Co Ltd 電子部品実装装置
US7033842B2 (en) * 2002-03-25 2006-04-25 Matsushita Electric Industrial Co., Ltd. Electronic component mounting apparatus and electronic component mounting method
JP4334892B2 (ja) * 2003-03-20 2009-09-30 パナソニック株式会社 部品実装方法
JP4516354B2 (ja) * 2004-05-17 2010-08-04 パナソニック株式会社 部品供給方法
JP2007173801A (ja) * 2005-12-22 2007-07-05 Unaxis Internatl Trading Ltd フリップチップを基板に取り付ける方法
JP2008168225A (ja) * 2007-01-12 2008-07-24 Fujifilm Corp スリット塗布方法及び装置、並びにカラーフィルタの製造方法
CH698718B1 (de) * 2007-01-31 2009-10-15 Oerlikon Assembly Equipment Ag Vorrichtung für die Montage eines Flipchips auf einem Substrat.
CH698720B1 (de) * 2007-02-14 2009-10-15 Oerlikon Assembly Equipment Ag Verfahren und Montageautomat für die Montage von Halbleiterchips als Flipchip auf einem Substrat.
CH698334B1 (de) * 2007-10-09 2011-07-29 Esec Ag Verfahren für die Entnahme und Montage von auf einem Wafertisch bereitgestellten Halbleiterchips auf einem Substrat.
JP5030843B2 (ja) * 2008-04-14 2012-09-19 芝浦メカトロニクス株式会社 電子部品の実装装置及び実装方法
JP4983737B2 (ja) * 2008-06-30 2012-07-25 株式会社日立プラントテクノロジー ハンダボール検査リペア装置およびハンダボール検査リペア方法
JP4766144B2 (ja) * 2009-04-08 2011-09-07 パナソニック株式会社 電子部品実装装置
KR101120129B1 (ko) * 2009-08-31 2012-03-23 (주) 에스에스피 기준값을 응용한 작업위치 자동 조정방법 및 이를 위한 자동화 장비
JP2011181675A (ja) * 2010-03-01 2011-09-15 Nec Corp 回路部品の実装装置
CH705802B1 (de) * 2011-11-25 2016-04-15 Esec Ag Einrichtung für die Montage von Halbleiterchips.
JP6000626B2 (ja) * 2012-05-01 2016-10-05 新光電気工業株式会社 電子装置の製造方法及び電子部品搭載装置
JP6391225B2 (ja) 2013-09-13 2018-09-19 ファスフォードテクノロジ株式会社 フリップチップボンダ及びフリップチップボンディング方法
JP6200737B2 (ja) * 2013-09-17 2017-09-20 ファスフォードテクノロジ株式会社 ダイボンダ用ディッピング機構及びフリップチップボンダ
JP2015076411A (ja) * 2013-10-04 2015-04-20 株式会社日立ハイテクインスツルメンツ ダイボンダ
JP6324772B2 (ja) * 2014-03-14 2018-05-16 ファスフォードテクノロジ株式会社 ダイボンダ用ディッピング機構及びフリップチップボンダ

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TW201735227A (zh) 2017-10-01
CH711536B1 (de) 2019-02-15
MY176667A (en) 2020-08-19
CN106486400A (zh) 2017-03-08
TWI700767B (zh) 2020-08-01
KR102597252B1 (ko) 2023-11-01
CN106486400B (zh) 2021-10-29
CH711536A1 (de) 2017-03-15
SG10201606167WA (en) 2017-03-30
KR20170026136A (ko) 2017-03-08

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