CH711536B1 - Verfahren für die Montage von mit Bumps versehenen Halbleiterchips auf Substratplätzen eines Substrats. - Google Patents

Verfahren für die Montage von mit Bumps versehenen Halbleiterchips auf Substratplätzen eines Substrats. Download PDF

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Publication number
CH711536B1
CH711536B1 CH01404/15A CH14042015A CH711536B1 CH 711536 B1 CH711536 B1 CH 711536B1 CH 01404/15 A CH01404/15 A CH 01404/15A CH 14042015 A CH14042015 A CH 14042015A CH 711536 B1 CH711536 B1 CH 711536B1
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CH
Switzerland
Prior art keywords
substrate
camera
flip chip
cavity
image
Prior art date
Application number
CH01404/15A
Other languages
German (de)
English (en)
Other versions
CH711536A1 (de
Inventor
speer Florian
Original Assignee
Besi Switzerland Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Besi Switzerland Ag filed Critical Besi Switzerland Ag
Priority to DE102016113328.0A priority Critical patent/DE102016113328B4/de
Priority to SG10201606167WA priority patent/SG10201606167WA/en
Priority to JP2016156305A priority patent/JP6868982B2/ja
Priority to MYPI2016702921A priority patent/MY176667A/en
Priority to KR1020160103073A priority patent/KR102597252B1/ko
Priority to CN201610754833.6A priority patent/CN106486400B/zh
Priority to US15/250,796 priority patent/US9721819B2/en
Priority to TW105127781A priority patent/TWI700767B/zh
Publication of CH711536A1 publication Critical patent/CH711536A1/de
Publication of CH711536B1 publication Critical patent/CH711536B1/de

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • HELECTRICITY
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67144Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
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    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/03Manufacturing methods
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    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/52Mounting semiconductor bodies in containers
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    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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    • H01L23/04Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
    • H01L23/053Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having an insulating or insulated base as a mounting for the semiconductor body
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    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/11Manufacturing methods
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    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/75Apparatus for connecting with bump connectors or layer connectors
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    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
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    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/82Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
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    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/757Means for aligning
    • H01L2224/75702Means for aligning in the upper part of the bonding apparatus, e.g. in the bonding head
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    • H01L2224/75753Means for optical alignment, e.g. sensors
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    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/758Means for moving parts
    • H01L2224/75821Upper part of the bonding apparatus, i.e. bonding head
    • H01L2224/75824Translational mechanism
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    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
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    • H01ELECTRIC ELEMENTS
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    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/8112Aligning
    • H01L2224/81121Active alignment, i.e. by apparatus steering, e.g. optical alignment using marks or sensors
    • H01L2224/81132Active alignment, i.e. by apparatus steering, e.g. optical alignment using marks or sensors using marks formed outside the semiconductor or solid-state body, i.e. "off-chip"
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    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L24/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Wire Bonding (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CH01404/15A 2015-08-31 2015-09-28 Verfahren für die Montage von mit Bumps versehenen Halbleiterchips auf Substratplätzen eines Substrats. CH711536B1 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
DE102016113328.0A DE102016113328B4 (de) 2015-08-31 2016-07-20 Verfahren für die Montage von mit Bumps versehenen Halbleiterchips auf Substratplätzen eines Substrats
SG10201606167WA SG10201606167WA (en) 2015-08-31 2016-07-26 Method for mounting semiconductors provided with bumps on substrate locations of a substrate
JP2016156305A JP6868982B2 (ja) 2015-08-31 2016-08-09 隆起部が設けられている半導体を基板の基板位置に取り付けるための方法
MYPI2016702921A MY176667A (en) 2015-08-31 2016-08-11 Method for mounting semiconductors provided with bumps on substrate locations of a substrate
KR1020160103073A KR102597252B1 (ko) 2015-08-31 2016-08-12 범프를 구비하는 반도체를 기판의 기판 위치상에 장착하기 위한 방법
CN201610754833.6A CN106486400B (zh) 2015-08-31 2016-08-18 用于在基板的基板定位上安装设有凸块的半导体的方法
US15/250,796 US9721819B2 (en) 2015-08-31 2016-08-29 Method for mounting semiconductors provided with bumps on substrate locations of a substrate
TW105127781A TWI700767B (zh) 2015-08-31 2016-08-30 用於將設有凸塊的半導體晶片安裝在基板的基板定位的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH12482015 2015-08-31

Publications (2)

Publication Number Publication Date
CH711536A1 CH711536A1 (de) 2017-03-15
CH711536B1 true CH711536B1 (de) 2019-02-15

Family

ID=58264157

Family Applications (1)

Application Number Title Priority Date Filing Date
CH01404/15A CH711536B1 (de) 2015-08-31 2015-09-28 Verfahren für die Montage von mit Bumps versehenen Halbleiterchips auf Substratplätzen eines Substrats.

Country Status (7)

Country Link
JP (1) JP6868982B2 (enrdf_load_stackoverflow)
KR (1) KR102597252B1 (enrdf_load_stackoverflow)
CN (1) CN106486400B (enrdf_load_stackoverflow)
CH (1) CH711536B1 (enrdf_load_stackoverflow)
MY (1) MY176667A (enrdf_load_stackoverflow)
SG (1) SG10201606167WA (enrdf_load_stackoverflow)
TW (1) TWI700767B (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7164314B2 (ja) * 2017-04-28 2022-11-01 ベシ スウィッツァーランド エージー 部品を基板上に搭載する装置及び方法
CN109079367B (zh) * 2018-07-23 2020-07-24 中电科技(合肥)博微信息发展有限责任公司 一种芯片智能焊接方法
JP7582928B2 (ja) * 2021-11-25 2024-11-13 キヤノン株式会社 接合装置および接合方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5372294A (en) * 1994-01-27 1994-12-13 Motorola, Inc. Method of preparing a component for automated placement
JP2833996B2 (ja) * 1994-05-25 1998-12-09 日本電気株式会社 フレキシブルフィルム及びこれを有する半導体装置
JPH10209208A (ja) * 1997-01-23 1998-08-07 Hitachi Ltd 半導体製造方法および装置
US7842599B2 (en) * 1997-05-27 2010-11-30 Wstp, Llc Bumping electronic components using transfer substrates
JP2001060795A (ja) * 1999-08-20 2001-03-06 Matsushita Electric Ind Co Ltd 電子部品実装装置
US7033842B2 (en) * 2002-03-25 2006-04-25 Matsushita Electric Industrial Co., Ltd. Electronic component mounting apparatus and electronic component mounting method
JP4334892B2 (ja) * 2003-03-20 2009-09-30 パナソニック株式会社 部品実装方法
JP4516354B2 (ja) * 2004-05-17 2010-08-04 パナソニック株式会社 部品供給方法
JP2007173801A (ja) * 2005-12-22 2007-07-05 Unaxis Internatl Trading Ltd フリップチップを基板に取り付ける方法
JP2008168225A (ja) * 2007-01-12 2008-07-24 Fujifilm Corp スリット塗布方法及び装置、並びにカラーフィルタの製造方法
CH698718B1 (de) * 2007-01-31 2009-10-15 Oerlikon Assembly Equipment Ag Vorrichtung für die Montage eines Flipchips auf einem Substrat.
CH698720B1 (de) * 2007-02-14 2009-10-15 Oerlikon Assembly Equipment Ag Verfahren und Montageautomat für die Montage von Halbleiterchips als Flipchip auf einem Substrat.
CH698334B1 (de) * 2007-10-09 2011-07-29 Esec Ag Verfahren für die Entnahme und Montage von auf einem Wafertisch bereitgestellten Halbleiterchips auf einem Substrat.
JP5030843B2 (ja) * 2008-04-14 2012-09-19 芝浦メカトロニクス株式会社 電子部品の実装装置及び実装方法
JP4983737B2 (ja) * 2008-06-30 2012-07-25 株式会社日立プラントテクノロジー ハンダボール検査リペア装置およびハンダボール検査リペア方法
JP4766144B2 (ja) * 2009-04-08 2011-09-07 パナソニック株式会社 電子部品実装装置
KR101120129B1 (ko) * 2009-08-31 2012-03-23 (주) 에스에스피 기준값을 응용한 작업위치 자동 조정방법 및 이를 위한 자동화 장비
JP2011181675A (ja) * 2010-03-01 2011-09-15 Nec Corp 回路部品の実装装置
CH705802B1 (de) * 2011-11-25 2016-04-15 Esec Ag Einrichtung für die Montage von Halbleiterchips.
JP6000626B2 (ja) * 2012-05-01 2016-10-05 新光電気工業株式会社 電子装置の製造方法及び電子部品搭載装置
JP6391225B2 (ja) 2013-09-13 2018-09-19 ファスフォードテクノロジ株式会社 フリップチップボンダ及びフリップチップボンディング方法
JP6200737B2 (ja) * 2013-09-17 2017-09-20 ファスフォードテクノロジ株式会社 ダイボンダ用ディッピング機構及びフリップチップボンダ
JP2015076411A (ja) * 2013-10-04 2015-04-20 株式会社日立ハイテクインスツルメンツ ダイボンダ
JP6324772B2 (ja) * 2014-03-14 2018-05-16 ファスフォードテクノロジ株式会社 ダイボンダ用ディッピング機構及びフリップチップボンダ

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