JP6851831B2 - 加工装置 - Google Patents
加工装置 Download PDFInfo
- Publication number
- JP6851831B2 JP6851831B2 JP2017003538A JP2017003538A JP6851831B2 JP 6851831 B2 JP6851831 B2 JP 6851831B2 JP 2017003538 A JP2017003538 A JP 2017003538A JP 2017003538 A JP2017003538 A JP 2017003538A JP 6851831 B2 JP6851831 B2 JP 6851831B2
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- air
- processing
- curtain nozzle
- chuck table
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000007788 liquid Substances 0.000 claims description 42
- 238000000034 method Methods 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 65
- 238000003754 machining Methods 0.000 description 54
- 238000004140 cleaning Methods 0.000 description 45
- 238000002347 injection Methods 0.000 description 42
- 239000007924 injection Substances 0.000 description 42
- 239000002699 waste material Substances 0.000 description 29
- 239000012530 fluid Substances 0.000 description 16
- 239000002390 adhesive tape Substances 0.000 description 13
- 230000032258 transport Effects 0.000 description 11
- 238000005406 washing Methods 0.000 description 11
- 239000002173 cutting fluid Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000007664 blowing Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
Description
2 装置本体
2a 開口部
3 柱部
4 加工領域
5 搬出入領域
6 カバー部材
7 蛇腹部材
10 チャックテーブル
11 保持面
12 クランプ部
20 加工ユニット
21 切削ブレード
22 スピンドル
23 スピンドルハウジング
24 加工液供給ノズル
30 カセット
40 Y軸移動ユニット
50 Z軸移動ユニット
60 洗浄ユニット
61 スピンナテーブル
70 搬送ユニット
71 搬送アーム
72 パッド
80 加工液除去ユニット
81 ウォーターカーテンノズル
81a 洗浄水噴射口
82 第1エアーカーテンノズル
82a,83a エアー噴射口
83 第2エアーカーテンノズル
87 第1エアー流量調整バルブ
88 第2エアー流量調整バルブ
90 エアー供給源
100 制御ユニット
D デバイス
F 環状フレーム
K 加工屑
T 粘着テープ
W 被加工物
WR 裏面
WS 表面
Claims (2)
- 被加工物を保持するチャックテーブルと、該チャックテーブルに保持された該被加工物に加工液を供給しつつ加工する加工ユニットと、加工後の該被加工物に気体を吹き付け、該加工液を該被加工物から除去するエアーカーテンノズルと、を備える加工装置であって、
該エアーカーテンノズルは、該被加工物の加工の完了後、該気体を該被加工物に向かって間欠的に、パルス状に噴射することを特徴とする加工装置。 - 該エアーカーテンノズルは、該チャックテーブルが移動する移動経路を跨いで延在し、移動する該チャックテーブルに保持された該被加工物に該気体を噴射することを特徴とする請求項1記載の加工装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017003538A JP6851831B2 (ja) | 2017-01-12 | 2017-01-12 | 加工装置 |
CN201810001870.9A CN108305841B (zh) | 2017-01-12 | 2018-01-02 | 加工装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017003538A JP6851831B2 (ja) | 2017-01-12 | 2017-01-12 | 加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018113373A JP2018113373A (ja) | 2018-07-19 |
JP6851831B2 true JP6851831B2 (ja) | 2021-03-31 |
Family
ID=62868229
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017003538A Active JP6851831B2 (ja) | 2017-01-12 | 2017-01-12 | 加工装置 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP6851831B2 (ja) |
CN (1) | CN108305841B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7300842B2 (ja) * | 2019-02-07 | 2023-06-30 | 株式会社ディスコ | 被洗浄物の洗浄方法 |
SG11202112216YA (en) * | 2019-06-06 | 2021-12-30 | Tokuyama Corp | Method for cutting polycrystalline silicon rod, method for manufacturing cut rod of polycrystalline silicon rod, method for manufacturing nugget of polycrystalline silicon rod, and polycrystalline sil |
CN112405354A (zh) * | 2020-11-09 | 2021-02-26 | 广东韶钢松山股份有限公司 | 磨床除尘装置 |
CN115555946B (zh) * | 2022-12-05 | 2023-04-14 | 聚宝盆(苏州)特种玻璃股份有限公司 | 一种高应力防火玻璃倒圆角处理装置及方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3349339B2 (ja) * | 1996-04-24 | 2002-11-25 | シャープ株式会社 | 外観検査機能を備えたダイシング装置 |
JP4509243B2 (ja) * | 1999-03-04 | 2010-07-21 | 株式会社ディスコ | 積層被加工物の切削方法 |
JP3741655B2 (ja) * | 2002-03-04 | 2006-02-01 | 東京エレクトロン株式会社 | 液処理方法および液処理装置 |
JP2005147621A (ja) * | 2003-11-19 | 2005-06-09 | Tokyo Kakoki Kk | 基板材の乾燥装置 |
JP4486476B2 (ja) * | 2004-10-29 | 2010-06-23 | 東京エレクトロン株式会社 | レーザー処理装置及びレーザー処理方法 |
JP2007027545A (ja) * | 2005-07-20 | 2007-02-01 | Canon Inc | 半導体露光装置 |
JP2008218545A (ja) * | 2007-03-01 | 2008-09-18 | Sumco Corp | ウェーハの枚葉式エッチング装置 |
JP5078392B2 (ja) * | 2007-03-02 | 2012-11-21 | セイコーNpc株式会社 | 半導体ウエハのダイシング方法 |
JP2009027030A (ja) * | 2007-07-20 | 2009-02-05 | Disco Abrasive Syst Ltd | ウエーハの切削方法 |
CN102353238B (zh) * | 2011-08-01 | 2013-07-24 | 上海海事大学 | 间歇式真空微波干燥装置及其处理真空绝热板芯材的方法 |
CN203197466U (zh) * | 2013-04-24 | 2013-09-18 | 伊欧激光科技(苏州)有限公司 | 一种圆形晶片用激光加工装置 |
-
2017
- 2017-01-12 JP JP2017003538A patent/JP6851831B2/ja active Active
-
2018
- 2018-01-02 CN CN201810001870.9A patent/CN108305841B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN108305841B (zh) | 2023-03-28 |
CN108305841A (zh) | 2018-07-20 |
JP2018113373A (ja) | 2018-07-19 |
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