JP6827938B2 - 電子素子のための材料 - Google Patents
電子素子のための材料 Download PDFInfo
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- JP6827938B2 JP6827938B2 JP2017540608A JP2017540608A JP6827938B2 JP 6827938 B2 JP6827938 B2 JP 6827938B2 JP 2017540608 A JP2017540608 A JP 2017540608A JP 2017540608 A JP2017540608 A JP 2017540608A JP 6827938 B2 JP6827938 B2 JP 6827938B2
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- 239000000463 material Substances 0.000 title description 36
- 150000001875 compounds Chemical class 0.000 claims description 163
- 125000003118 aryl group Chemical group 0.000 claims description 101
- -1 indenocarbazole compound Chemical class 0.000 claims description 58
- 125000004432 carbon atom Chemical group C* 0.000 claims description 36
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims description 26
- 125000003545 alkoxy group Chemical group 0.000 claims description 25
- 125000001072 heteroaryl group Chemical group 0.000 claims description 23
- 229920000642 polymer Polymers 0.000 claims description 23
- 238000005401 electroluminescence Methods 0.000 claims description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims description 15
- 229910052805 deuterium Inorganic materials 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 13
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 13
- 239000000412 dendrimer Substances 0.000 claims description 13
- 229920000736 dendritic polymer Polymers 0.000 claims description 13
- 229910052710 silicon Inorganic materials 0.000 claims description 13
- 229910052731 fluorine Inorganic materials 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 12
- WUNJCKOTXFSWBK-UHFFFAOYSA-N indeno[2,1-a]carbazole Chemical group C1=CC=C2C=C3C4=NC5=CC=CC=C5C4=CC=C3C2=C1 WUNJCKOTXFSWBK-UHFFFAOYSA-N 0.000 claims description 10
- 230000000903 blocking effect Effects 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 7
- 230000002950 deficient Effects 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 6
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 238000009472 formulation Methods 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 2
- 239000000470 constituent Substances 0.000 claims description 2
- 230000005684 electric field Effects 0.000 claims description 2
- 230000005669 field effect Effects 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 89
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 57
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 42
- 239000011159 matrix material Substances 0.000 description 41
- 238000002360 preparation method Methods 0.000 description 34
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 28
- 150000003254 radicals Chemical class 0.000 description 26
- 238000000034 method Methods 0.000 description 24
- 239000011541 reaction mixture Substances 0.000 description 21
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 20
- 229910052799 carbon Inorganic materials 0.000 description 17
- 239000002019 doping agent Substances 0.000 description 17
- 239000000243 solution Substances 0.000 description 17
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 16
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 16
- 239000000725 suspension Substances 0.000 description 15
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 14
- 235000019341 magnesium sulphate Nutrition 0.000 description 14
- 239000012074 organic phase Substances 0.000 description 14
- 229910052760 oxygen Inorganic materials 0.000 description 13
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 13
- 0 Cc(cc1)ccc1-c1c2[n](*)c3ccccc3c2ccc1 Chemical compound Cc(cc1)ccc1-c1c2[n](*)c3ccccc3c2ccc1 0.000 description 12
- 150000001412 amines Chemical class 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 238000006116 polymerization reaction Methods 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 10
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 10
- 238000002347 injection Methods 0.000 description 10
- 239000007924 injection Substances 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 238000001816 cooling Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 8
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 8
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 8
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 8
- 238000010992 reflux Methods 0.000 description 8
- 229910052709 silver Inorganic materials 0.000 description 8
- 229910000029 sodium carbonate Inorganic materials 0.000 description 8
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 7
- 230000008878 coupling Effects 0.000 description 7
- 238000010168 coupling process Methods 0.000 description 7
- 238000005859 coupling reaction Methods 0.000 description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 6
- 125000003342 alkenyl group Chemical group 0.000 description 6
- 125000000304 alkynyl group Chemical group 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 125000004986 diarylamino group Chemical group 0.000 description 6
- 125000005842 heteroatom Chemical group 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 239000012044 organic layer Substances 0.000 description 6
- DXBHBZVCASKNBY-UHFFFAOYSA-N 1,2-Benz(a)anthracene Chemical compound C1=CC=C2C3=CC4=CC=CC=C4C=C3C=CC2=C1 DXBHBZVCASKNBY-UHFFFAOYSA-N 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 5
- 229910052794 bromium Inorganic materials 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- WDECIBYCCFPHNR-UHFFFAOYSA-N chrysene Chemical compound C1=CC=CC2=CC=C3C4=CC=CC=C4C=CC3=C21 WDECIBYCCFPHNR-UHFFFAOYSA-N 0.000 description 5
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 5
- 150000002576 ketones Chemical class 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 229910052727 yttrium Inorganic materials 0.000 description 5
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 4
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 4
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 4
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 4
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 4
- 150000004982 aromatic amines Chemical class 0.000 description 4
- 125000004104 aryloxy group Chemical group 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- 239000004305 biphenyl Substances 0.000 description 4
- ZADPBFCGQRWHPN-UHFFFAOYSA-N boronic acid Chemical compound OBO ZADPBFCGQRWHPN-UHFFFAOYSA-N 0.000 description 4
- TXCDCPKCNAJMEE-UHFFFAOYSA-N dibenzofuran Chemical compound C1=CC=C2C3=CC=CC=C3OC2=C1 TXCDCPKCNAJMEE-UHFFFAOYSA-N 0.000 description 4
- IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical compound C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 4
- 125000000623 heterocyclic group Chemical group 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 4
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 125000005259 triarylamine group Chemical group 0.000 description 4
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 3
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 3
- KJUGUADJHNHALS-UHFFFAOYSA-N 1H-tetrazole Chemical compound C=1N=NNN=1 KJUGUADJHNHALS-UHFFFAOYSA-N 0.000 description 3
- BPMFPOGUJAAYHL-UHFFFAOYSA-N 9H-Pyrido[2,3-b]indole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=N1 BPMFPOGUJAAYHL-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 3
- 229920000144 PEDOT:PSS Polymers 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 3
- 230000026030 halogenation Effects 0.000 description 3
- 238000005658 halogenation reaction Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 229910052741 iridium Inorganic materials 0.000 description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 3
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 3
- 229950000688 phenothiazine Drugs 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 150000003462 sulfoxides Chemical class 0.000 description 3
- 229930192474 thiophene Natural products 0.000 description 3
- ICPSWZFVWAPUKF-UHFFFAOYSA-N 1,1'-spirobi[fluorene] Chemical compound C1=CC=C2C=C3C4(C=5C(C6=CC=CC=C6C=5)=CC=C4)C=CC=C3C2=C1 ICPSWZFVWAPUKF-UHFFFAOYSA-N 0.000 description 2
- BFIMMTCNYPIMRN-UHFFFAOYSA-N 1,2,3,5-tetramethylbenzene Chemical compound CC1=CC(C)=C(C)C(C)=C1 BFIMMTCNYPIMRN-UHFFFAOYSA-N 0.000 description 2
- FYADHXFMURLYQI-UHFFFAOYSA-N 1,2,4-triazine Chemical compound C1=CN=NC=N1 FYADHXFMURLYQI-UHFFFAOYSA-N 0.000 description 2
- UUSUFQUCLACDTA-UHFFFAOYSA-N 1,2-dihydropyrene Chemical compound C1=CC=C2C=CC3=CCCC4=CC=C1C2=C43 UUSUFQUCLACDTA-UHFFFAOYSA-N 0.000 description 2
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical compound C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N 1,3-Dimethylbenzene Natural products CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- CHLICZRVGGXEOD-UHFFFAOYSA-N 1-Methoxy-4-methylbenzene Chemical compound COC1=CC=C(C)C=C1 CHLICZRVGGXEOD-UHFFFAOYSA-N 0.000 description 2
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 2
- TZMSYXZUNZXBOL-UHFFFAOYSA-N 10H-phenoxazine Chemical compound C1=CC=C2NC3=CC=CC=C3OC2=C1 TZMSYXZUNZXBOL-UHFFFAOYSA-N 0.000 description 2
- QWENRTYMTSOGBR-UHFFFAOYSA-N 1H-1,2,3-Triazole Chemical compound C=1C=NNN=1 QWENRTYMTSOGBR-UHFFFAOYSA-N 0.000 description 2
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 2
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 2
- JUUZQMUWOVDZSD-UHFFFAOYSA-N 1h-imidazole;pyrazine Chemical compound C1=CNC=N1.C1=CN=CC=N1 JUUZQMUWOVDZSD-UHFFFAOYSA-N 0.000 description 2
- IGHOZKDBCCFNNC-UHFFFAOYSA-N 1h-imidazole;quinoxaline Chemical compound C1=CNC=N1.N1=CC=NC2=CC=CC=C21 IGHOZKDBCCFNNC-UHFFFAOYSA-N 0.000 description 2
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 2
- UXGVMFHEKMGWMA-UHFFFAOYSA-N 2-benzofuran Chemical compound C1=CC=CC2=COC=C21 UXGVMFHEKMGWMA-UHFFFAOYSA-N 0.000 description 2
- LYTMVABTDYMBQK-UHFFFAOYSA-N 2-benzothiophene Chemical compound C1=CC=CC2=CSC=C21 LYTMVABTDYMBQK-UHFFFAOYSA-N 0.000 description 2
- DXYYSGDWQCSKKO-UHFFFAOYSA-N 2-methylbenzothiazole Chemical compound C1=CC=C2SC(C)=NC2=C1 DXYYSGDWQCSKKO-UHFFFAOYSA-N 0.000 description 2
- VHMICKWLTGFITH-UHFFFAOYSA-N 2H-isoindole Chemical compound C1=CC=CC2=CNC=C21 VHMICKWLTGFITH-UHFFFAOYSA-N 0.000 description 2
- HCCNHYWZYYIOFM-UHFFFAOYSA-N 3h-benzo[e]benzimidazole Chemical compound C1=CC=C2C(N=CN3)=C3C=CC2=C1 HCCNHYWZYYIOFM-UHFFFAOYSA-N 0.000 description 2
- GAMYYCRTACQSBR-UHFFFAOYSA-N 4-azabenzimidazole Chemical compound C1=CC=C2NC=NC2=N1 GAMYYCRTACQSBR-UHFFFAOYSA-N 0.000 description 2
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- FMMWHPNWAFZXNH-UHFFFAOYSA-N Benz[a]pyrene Chemical compound C1=C2C3=CC=CC=C3C=C(C=C3)C2=C2C3=CC=CC2=C1 FMMWHPNWAFZXNH-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LTEQMZWBSYACLV-UHFFFAOYSA-N Hexylbenzene Chemical compound CCCCCCC1=CC=CC=C1 LTEQMZWBSYACLV-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- PWATWSYOIIXYMA-UHFFFAOYSA-N Pentylbenzene Chemical compound CCCCCC1=CC=CC=C1 PWATWSYOIIXYMA-UHFFFAOYSA-N 0.000 description 2
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000006069 Suzuki reaction reaction Methods 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
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- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
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- 150000003754 zirconium Chemical class 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
- H10K85/636—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine comprising heteroaromatic hydrocarbons as substituents on the nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/10—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/14—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/14—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/04—Ortho-condensed systems
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
- C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
- C07D491/04—Ortho-condensed systems
- C07D491/044—Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring
- C07D491/048—Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring the oxygen-containing ring being five-membered
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
- C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
- C07D495/04—Ortho-condensed systems
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/027—Organoboranes and organoborohydrides
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
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Description
Yは、同一か異なり、NまたはCR1であり、ここで、6員環において少なくとも一つの基Yは、Nであらねばならず、
Wは、同一か異なり、CR1またはNであり、
Vは、同一か異なり、CR1またはNであり、ただし、2個の隣接する基V=Vは、式(2)の基であるか、
Xは、N(R2)2、B(R2)、O、C(R2)2、Si(R2)2、C=NR2、C=C(R2)2、S、S=O、SO2、P(R2)およびP(=O)R2から選ばれる2価ブリッジであり;
Ar1、Ar2は、同一か異なり、1以上の基R1で置換されてよい芳香族もしくは複素環式芳香族環構造であって;ここで、少なくとも一つの基Ar1またはAr2の少なくとも一つは、12〜30個の芳香族C原子を有する芳香族環構造、13〜30個の芳香族環原子を有するヘテロアリール基または10〜20個の芳香族C原子を有するアリール基であって;夫々、以上の基R1で置換されてよく、Ar1とAr2は、基Eにより互いに連結してもよく;
Ar3、Ar4は、出現毎に同一か異なり、6〜40個の芳香族C原子を有する芳香族環構造または5〜40個の芳香族環原子を有する複素環式芳香族環構造であって、1以上の基R1で置換されてよいが、ただし、Ar4はアントラセニレン基ではなく;
Eは、単結合、N(R3)、O、S、C(R3)2、C(R3)2-C(R3)2、Si(R3)2またはB(R3)2であり;
R1は、出現毎に同一か異なり、H、D、F、Br、Cl、I、C(=O)R3、CN、Si(R3)3、N(R3)2、P(=O)(R3)2、S(=O)R3、S(=O)2R3、1〜20個のC原子を有する直鎖アルキルもしくはアルコキシ基、3〜20個のC原子を有する分岐あるいは環状アルキルもしくはアルコキシ基、2〜20個のC原子を有するアルケニルもしくはアルキニル基(上記基は、夫々、1以上の基R3により置換されてよく、上記基中の1以上のCH2基は、-R3C=CR3-、-C≡C-、Si(R3)2、C=O、C=NR3、-C(=O)O-、-C(=O)NR3-、NR3、-P(=O)(R3)、-O-、-S-、SOもしくはSO2で置き代えられてよい。)または、各場合に、1以上の基R3により置換されてよい5〜30個の芳香族環原子を有する芳香族もしくは複素環式芳香族環構造、または1以上の基R3で置換されてよい5〜30個の芳香族環原子を有するアリールオキシもしくはヘテロアリールオキシ基であり;ここで、Ar1上に位置する2個の隣接する基R1もしくはAr2上に位置する2個の隣接する基R1は、互いに結合してよく、環を形成してよく;
R2は、出現毎に同一か異なり、H、D、F、Br、Cl、I、C(=O)R3、CN、Si(R3)3、N(R3)2、P(=O)(R3)2、S(=O)R3、S(=O)2R3、1〜20個のC原子を有する直鎖アルキルもしくはアルコキシ基、3〜20個のC原子を有する分岐あるいは環状アルキルもしくはアルコキシ基、2〜20個のC原子を有するアルケニルもしくはアルキニル基(上記基夫々は、1以上の基R3により置換されてよく、上記基中の1以上のCH2基は、-R3C=CR3-、-C≡C-、Si(R3)2、C=O、C=NR3、-C(=O)O-、-C(=O)NR3-、NR3-、P(=O)(R3)、-O-、-S-、SOもしくはSO2で置き代えられてよい。)または、各場合に、1以上の基R3により置換されてよい5〜30個の芳香族環原子を有する芳香族もしくは複素環式芳香族環構造、または1以上の基R3で置換されてよい5〜30個の芳香族環原子を有するアリールオキシもしくはヘテロアリールオキシ基であり;ここで、2個の基R2は、互いに結合してよく、環を形成してよく;
R3は、出現毎に同一か異なり、H、D、F、Br、Cl、I、C(=O)R4、CN、Si(R4)3、N(R4)2、P(=O)(R4)2、S(=O)R4、S(=O)2R4、1〜20個のC原子を有する直鎖アルキルもしくはアルコキシ基、3〜20個のC原子を有する分岐あるいは環状アルキルもしくはアルコキシ基、2〜20個のC原子を有するアルケニルもしくはアルキニル基(上記基夫々は、1以上の基R3により置換されてよく、上記基中の1以上のCH2基は、-R4C=CR4-、-C≡C-、Si(R4)2、C=O、C=NR4、-C(=O)O-、-C(=O)NR4-、NR4、-P(=O)(R4)、-O-、-S-、SOもしくはSO2で置き代えられてよい。)または、各場合に、1以上の基R4により置換されてよい5〜30個の芳香族環原子を有する芳香族もしくは複素環式芳香族環構造、または1以上の基R4で置換されてよい5〜30個の芳香族環原子を有するアリールオキシもしくはヘテロアリールオキシ基であり;ここで、2個の基R3は、互いに結合してよく、環を形成してよく;
R4は、出現毎に同一か異なり、H、D、F、1〜20個のC原子を有する脂肪族、芳香族もしくは複素環式芳香族基(ここで、1以上のH原子は、DもしくはFで置き代えられてよい。)であり、ここで、2個以上の置換基R4は、互いに結合してよく、環を形成してよく;
nは、0または1であり;
mは、0または1である。
Ar5は、出現毎に同一か異なり、1以上の基R1により置換されてよい6〜18個の芳香族環原子を有するアリールもしくはヘテロアリール基であり、ここで、R1は、上記で定義されるとおりであり;および
kは、1、2、3、または4であり、ここで、添え字kは、Ar4全体の基における芳香族環原子の数が、数40を超えないように選択される。
ここで、基は全ての自由な位置で基R1により置換されてよい。
Yは、式(Y−1)〜(Y−6)の一つであり;
Wは、CR1であり;
Xは、C(R2)であり;
Ar1、Ar2は、同一か異なり、式(11)〜(77)の一つの基であるか、
または-NAr1Ar2は、式(78)〜(81)の一つの基であり;
R1は、出現毎に同一か異なり、H、D、F、CN、Si(R3)3、N(R3)2、1〜10個のC原子を有する直鎖アルキルもしくはアルコキシ基、3〜10個のC原子を有する分岐あるいは環状アルキルもしくはアルコキシ基(上記基夫々は、1以上の基R3により置換されてよく、上記基中の1以上のCH2基は、-C≡C-、-R3C=CR3-、Si(R3)2、C=O、C=NR3、NR3、-O-、-S-、-C(=O)O-もしくは-C(=O)NR3-で置き代えられてよい。)または、各場合に、1以上の基R3により置換されてよい5〜20個の芳香族環原子を有する芳香族もしくは複素環式芳香族環構造より成る基から選ばれ;ここで、Ar1上に位置する2個の隣接する基R1もしくはAr2上に位置する2個の隣接する基R1は、互いに結合してよく、環を形成しもよく;
R2は、出現毎に同一か異なり、H、D、F、CN、Si(R3)3、N(R3)2、1〜10個のC原子を有する直鎖アルキルもしくはアルコキシ基、3〜10個のC原子を有する分岐あるいは環状アルキルもしくはアルコキシ基(上記基夫々は、1以上の基R3により置換されてよく、上記基中の1以上のCH2基は、-C≡C-、-R3C=CR3-、Si(R3)2、C=O、C=NR3、NR3、-O-、-S-、-C(=O)O-もしくは-C(=O)NR3-で置き代えられてよい。)または、各場合に、1以上の基R3により置換されてよい5〜20個の芳香族環原子を有する芳香族もしくは複素環式芳香族環構造より成る基から選ばれ、;ここで、2個の基R2は、互いに結合してよく、環を形成してよく;
R3は、出現毎に同一か異なり、H、D、F、CN、Si(R4)3、N(R4)2、1〜10個のC原子を有する直鎖アルキルもしくはアルコキシ基、3〜10個のC原子を有する分岐あるいは環状アルキルもしくはアルコキシ基(上記夫々は、1以上の基R4により置換されてよく、上記基中の1以上のCH2CH2基は、-C≡C-、-R4C=CR4-、Si(R4)2、C=O、C=NR4、NR4、-O-、-S-、-C(=O)O-もしくは-C(=O)NR4-で置き代えられてよい。)または、各場合に、1以上の基R4により置換されてよい5〜20個の芳香族環原子を有する芳香族もしくは複素環式芳香族環構造より成る基から選ばれ;ここで、2個以上の基R3は、互いに結合してよく、環を形成してよく;
mは、0または1であり;
nは、0である。
(A)スズキ重合;
(B)ヤマモト重合;
(C)スチル重合;
(D)ハートウイッグ-ブーフバルト重合;
これらの方法により重合を行うことができる方法およびポリマーを反応媒体から分離し、精製することのできる方法は、当業者に知られ、文献、たとえば、WO 2003/048225 A2、WO 2004/037887 A2およびWO 2004/037887 A2に詳細に記載されている。
−アノード−
−正孔注入層−
−正孔輸送層−
−随意にさらなる正孔輸送層−
−発光層−
−電子輸送層−
−電子注入層−
−カソード−。
ここで、前記層の全てが、必ずしも存在する必要はないこと、および/またはさらなる層が追加的に存在してよいことが再度指摘されねばならない。
以下の例は本発明を説明する役目を行う。これらは限定として解釈されることを意図していない。
化合物(V)の調製
化合物(V)の調製のための合成手順:
100mLのDMF中の2.4g(60.7ミリモル、オイル中60%)の懸濁液に対して、180mLのDMF中の20.0g(55.2ミリモル)の化合物(I)をゆっくりと添加し、室温で、1時間撹拌する。17.7g(66.4ミリモル)の化合物(II)を80mLのDMFに溶解させ、この懸濁液にゆっくりと添加し、反応混合物を16時間撹拌する。反応混合物を氷に注ぎ、有機相を分離させ、200mLのジクロロメタンで三度抽出し、硫酸マグネシウムで脱水させ、その後、蒸発乾固させる。残留物をエタノールで洗浄し、ろ過し、最後に減圧下で乾燥させる。収率は28.2g(47.6ミリモル)であり、理論値の78%に対応する。
30.0g(50.6ミリモル)の化合物(III)と、24.6g(55.8ミリモル)の化合物(IV)と、5.8g(5.5ミリモル)の炭酸ナトリウムとを、600mLのトルエンと220mLの水とに懸濁させる。590mg(0.51ミリモル)のテトラキス(トリフェニルホスフィン)パラジウム(0)をこの懸濁液に添加し、反応混合物を還流下で16時間撹拌する。冷ました後、有機相を分離させ、300mLのジクロロメタンで三度抽出し、硫酸マグネシウムで脱水させ、その後、蒸発乾固させる。残留物をヘプタンで洗浄し、ろ過し、最後に減圧下で乾燥させる。収率は37.2g(40.9ミリモル)であり、理論値の84%に対応する。
化合物(VII)の調製
化合物(VII)の調製のための合成手順:
28.5g(48.1ミリモル)の化合物(III)と、23.3g(52.9ミリモル)の化合物(VI)と、5.5g(52.1ミリモル)の炭酸ナトリウムとを、600mLのトルエンと220mLの水とに懸濁させる。0.56g(0.5ミリモル)のテトラキス(トリフェニル-ホスフィン)パラジウム(0)をこの懸濁液に添加し、反応混合物を還流下で16時間撹拌する。冷ました後、有機相を分離させ、300mLのジクロロメタンで三度抽出し、硫酸マグネシウムで脱水させ、その後、蒸発乾固させる。残留物をトルエンとヘプタンから再結晶化させる。収率は21.7g(23.9ミリモル)であり、理論値の50%に対応する。
化合物(IX)の調製
化合物(IX)の調製のための合成手順:
化合物(X)の調製
化合物(X)の調製のための合成手順:
30g(50.5ミリモル)の化合物(VIII)と、24.5g(55.6ミリモル)の化合物(VI)と、5.8g(54.7ミリモル)の炭酸ナトリウムとを、600mLのトルエンと220mLの水とに懸濁させる。0.58g(0.5ミリモル)のテトラキス(トリフェニル-ホスフィン)パラジウム(0)をこの懸濁液に添加し、反応混合物を還流下で16時間撹拌する。冷ました後、有機相を分離させ、300mLのジクロロメタンで三度抽出し、硫酸マグネシウムで脱水させ、その後、蒸発乾固させる。残留物をトルエンとヘプタンから再結晶化させる。収率は27g(29.7ミリモル)であり、理論値の64%に対応する。
化合物(XIV)の調製
化合物(XIV)の調製のための合成手順:
30.0g(50.8ミリモル)の化合物(XI)を、750mLのTHFに懸濁させる。12.6g(70.8ミリモル)のNBSをこの懸濁液にゆっくりと添加し、反応混合物を室温で終夜、撹拌する。反応混合物を水でクエンチする。有機相を分離させ、300mLのジクロロメタンで三度抽出し、硫酸マグネシウムで脱水させ、その後、蒸発乾固させる。残留物をトルエンから再結晶化させる。収率は21.6g(32.2ミリモル)であり、理論値の63%に対応する。
20g(29.9ミリモル)の化合物(III)と、14.5g(32.9ミリモル)の化合物(VIII)と、3.4g(32.4ミリモル)の炭酸ナトリウムとを、600mLのトルエンと220mLの水とに懸濁させる。0.35g(0.3ミリモル)のテトラキス(トリフェニル-ホスフィン)パラジウム(0)をこの懸濁液に添加し、反応混合物を還流下で16時間撹拌する。冷ました後、有機相を分離させ、300mLのジクロロメタンで三度抽出し、硫酸マグネシウムで脱水させ、その後、蒸発乾固させる。残留物をトルエンとヘプタンから再結晶化させる。収率は18g(18.3ミリモル)であり、理論値の61%に対応する。
化合物(XIX)の調製
化合物(XIX)の調製のための合成手順:
34.7g(153.5ミリモル)の化合物(XV)と、35.0g(153.5ミリモル)の化合物(XVI)と、17.9g(168.8ミリモル)の炭酸ナトリウムとを、120mLのトルエンと300mLのジオキサンと、300mLの水とに懸濁させる。1.8g(1.5ミリモル)のテトラキス(トリフェニルホスフィン)パラジウム(0)をこの懸濁液に添加し、反応混合物を110℃で16時間加熱する。冷ました後、有機相を分離させ、300mLのジクロロメタンで三度抽出し、硫酸マグネシウムで脱水させ、その後、蒸発乾固させる。残留物をトルエンとヘプタンから再結晶化させる。収率は32g(85.6ミリモル)であり、理論値の56%に対応する。
100mLのDMF中の2.4g(60.7ミリモル、オイル中60%)のNaHの懸濁液に対して、180mLのDMF中の20.0g(55.2ミリモル)の化合物(I)をゆっくりと添加し、室温で、1時間撹拌する。24.8g(66.4ミリモル)の化合物(II)を80mLのDMFに溶解させ、この懸濁液にゆっくりと添加し、反応混合物を16時間撹拌する。反応混合物を氷に注ぎ、有機相を分離させ、200mLのジクロロメタンで三度抽出し、硫酸マグネシウムで脱水させ、その後、蒸発乾固させる。残留物をエタノールで洗浄し、ろ過し、最後に減圧下で乾燥させる。収率は29g(41.4ミリモル)であり、理論値の75%に対応する。
20g(28.6ミリモル)の化合物(VIII)と、13.8g(31.5ミリモル)の化合物(IV)と、3.3g(31ミリモル)の炭酸ナトリウムとを、600mLのトルエンと220mLの水とに懸濁させる。0.33g(0.3ミリモル)のテトラキス(トリフェニルホスフィン)パラジウム(0)をこの懸濁液に添加し、反応混合物を還流下で16時間撹拌する。冷ました後、有機相を分離させ、300mLのジクロロメタンで三度抽出し、硫酸マグネシウムで脱水させ、その後、蒸発乾固させる。残留物をトルエンとヘプタンから再結晶化させる。収率は18g(17.7ミリモル)であり、理論値の62%に対応する。
化合物(XXIII)の調製
化合物(XXIII)の調製のための合成手順:
580mLのTHF中、50.8g(186.0ミリモル)の溶液を、4.5g(185.1ミリモル)の削り屑状Mgに添加し、反応混合物を16時間撹拌する。反応混合物を、190mLのTHF中、35.0g(154.8ミリモル)の化合物(XX)の溶液に0℃で添加する。反応混合物をゆっくりと室温に温める。24時間後、反応混合物を12%のHCl水溶液でクエンチし、次いで、有機相を分離させ、500mLのジクロロメタンで三度抽出し、硫酸マグネシウムで脱水させ、その後、蒸発乾固させる。残留物をジクロロメタン/ヘプタン(1/5)の混合物を用いて、シリカゲルにおいてカラムクロマトグラフィにより精製する。収率は24g(62.5モル)であり、理論値の40%に対応する。
100mLのDMF中の2.4g(60.7ミリモル、オイル中60%)のNaHの懸濁液に対して、180mLのDMF中の20.0g(55.2ミリモル)の化合物(I)をゆっくりと添加し、室温で、1時間撹拌する。25.4g(66.3ミリモル)の化合物(XXI)を80mLのDMFに溶解させ、この懸濁液にゆっくりと添加し、反応混合物を16時間撹拌する。反応混合物を氷に注ぎ、有機相を分離させ、200mLのジクロロメタンで三度抽出し、硫酸マグネシウムで脱水させ、その後、蒸発乾固させる。残留物をエタノールで洗浄し、ろ過し、最後に減圧下で乾燥させる。収率は30g(42.3ミリモル)であり、理論値の77%に対応する。
20g(28.21ミリモル)の化合物(XXII)と、13.7g(31.0ミリモル)の化合物(VI)と、3.23g(30.5ミリモル)の炭酸ナトリウムとを、600mLのトルエンと220mLの水とに懸濁させる。0.33g(0.3ミリモル)のテトラキス(トリフェニルホスフィン)パラジウム(0)をこの懸濁液に添加し、反応混合物を還流下で16時間撹拌する。冷ました後、有機相を分離させ、300mLのジクロロメタンで三度抽出し、硫酸マグネシウムで脱水させ、その後、蒸発乾固させる。残留物をトルエンとヘプタンから再結晶化させる。収率は21g(20.5ミリモル)であり、理論値の72%に対応する。
化合物(XXV)の調製
化合物(XXV)の調製のための合成手順:
30.0g(50.6ミリモル)の化合物(VIII)と、16.8g(50.6ミリモル)の化合物(XXIV)とを、Ar雰囲気下で、500mLのトルエンに懸濁させる。226mg(1.0ミリモル)のPd(OAc)2をフラスコに添加し、Ar雰囲気下で撹拌し、次いで2.0mLの1Mトリ-tert-ブチルホスフィン溶液と、7.3g(75.5ミリモル)のナトリウム t-ブトキシドとをフラスコに添加する。反応混合物を還流下で24時間撹拌する。冷ました後、有機相を分離させ、200mLの水で三度洗浄し、硫酸マグネシウムで脱水させ、ろ過し、その後、蒸発乾固させる。残留物を酢酸エチル/ヘプタン(1:3)の混合物を用いて、シリカゲルにおいてカラムクロマトグラフィにより精製する。収率は33.0g(39.6ミリモル)であり、理論値の78%に対応する。
溶液処理されたOLED素子の調製
本発明に関する化合物は、良好な性能を有する簡単なOLED素子を製造するために、溶液から処理されることができる。これらの溶液処理されたOLED素子の調製は、ポリマー発光ダイオード(PLED)の調製に類似しており、これは既に広く文献に記載されている(たとえばWO 2004/037887)。この場合、本発明による化合物(V)、(VII)、(IX)、(X)、(XIV)、(XIX)、(XXIII)および(XXV)はトルエンに溶解された。このような溶液の典型的な固形分は、典型的な素子でスピンコーティングにより層厚80nmを実現するには、16〜25g/Lの間である。OLED素子は次の構造を示し:ITO/PEDOT:PSS/中間層/EML/カソード、ここでEMLは発光層である。発光層(EML)は、80重量%の濃度で存在する、本発明に関する化合物(V)、(VII)、(IX)、(X)、(XIV)、(XIX)、(XXIII)、(XXV)を含むだけでなく、20%の濃度で存在する、ドーパント、TEG−001(Merck社で市販)を含んでいる。構造化されたITO基板と、いわゆる緩衝層(PEDOT、実際にはPEDOT:PSS)の材料は市場で入手可能である(Technoprintおよび他社のITO、H.C.Stack製の水性分散液Clevios Baytron(登録商標)としてのPEDOT:PSS)。中間層は正孔注入のために使用され、この場合、HIL−012(Merck社により市場で入手可能)を使用した。HIL−012は以下のモノマーからなるポリマーである:
Claims (9)
- 式(1)の化合物;
Yは、同一か異なり、NまたはCR1であり、ここで、式Yの基は、式(1)の構成成分としての以下の式(Y−1)〜(Y−6)の一つであり、ここで、破線は化合物の残部への結合を示し:
Vは、同一か異なり、CR1またはNであり、ただし、2個の隣接する基V=Vは、式(2)の基であるか、
Xは、C(R2)2から選ばれる2価ブリッジであり;
Ar1、Ar2は、同一か異なり、次の式(11)〜(51)および(53)〜(66)の基から選ばれ:
Ar3は、6〜24個の芳香族C原子を有する芳香族環構造であって、1以上の基R1で置換されてよく;
Ar4は、以下の式(Ar4−1)の基であり:
Ar5は、出現毎に同一か異なり、1以上の基R1により置換されてよいフェニル基またはフルオレニル基であり;
kは、1、2、3、または4であり、
R1は、出現毎に同一か異なり、H、D、F、CN、Si(R3)3、N(R3)2、1〜10個のC原子を有する直鎖アルキルもしくはアルコキシ基、3〜10個のC原子を有する分岐あるいは環状アルキルもしくはアルコキシ基(上記基夫々は、1以上の基R3により置換されてよい。)または、各場合に、1以上の基R3により置換されてよい5〜20個の芳香族環原子を有する芳香族もしくは複素環式芳香族環構造であり;
R2は、出現毎に同一か異なり、H、D、F、CN、Si(R3)3、N(R3)2、1〜10個のC原子を有する直鎖アルキルもしくはアルコキシ基、3〜10個のC原子を有する分岐あるいは環状アルキルもしくはアルコキシ基(上記基夫々は、1以上の基R3により置換されてよい。)または、各場合に、1以上の基R3により置換されてよい5〜20個の芳香族環原子を有する芳香族もしくは複素環式芳香族環構造であり;
R3は、出現毎に同一か異なり、H、D、F、CN、Si(R4)3、N(R4)2、1〜10個のC原子を有する直鎖アルキルもしくはアルコキシ基、3〜10個のC原子を有する分岐あるいは環状アルキルもしくはアルコキシ基(上記基夫々は、1以上の基R4により置換されてよい。)または、各場合に、1以上の基R4により置換されてよい5〜20個の芳香族環原子を有する芳香族もしくは複素環式芳香族環構造であり;
R4は、出現毎に同一か異なり、H、D、F、1〜20個のC原子を有する脂肪族、芳香族もしくは複素環式芳香族基(ここで、さらに、1以上のH原子は、DもしくはFで置き代えられてよい。)であり、ここで、2個以上の置換基R4は、互いに結合してよく、環を形成してよく;
nは、0または1であり;
mは、1である。 - 添え字nが、0であることを特徴とする、請求項1記載の化合物。
- ポリマー、オリゴマーもしくはデンドリマーへの結合が、R1もしくはR2により置換される式(1)における任意の所望の位置で局在化されてよい請求項1または2記載の1以上の化合物を含むオリゴマー、ポリマーもしくはデンドリマー。
- 請求項1または2記載の少なくとも一つ化合物または請求項3記載の少なくとも一つのポリマー、オリゴマーもしくはデンドリマーと少なくとも一つの溶媒とを含む調合物。
- 請求項1または2記載の少なくとも一つの化合物を含むことを特徴とする、有有機集積回路(OIC)、有機電界効果トランジスタ(OFET)、有機薄膜トランジスタ(OTFT)、有機発光トランジスタ(OLET)、有機ソーラーセル(O-SC)、有機光学検査器、有機光受容器、有機電場消光素子(OFQD)、有機発光電子化学セル(OLEC)、有機レーザーダイオード(O-laser)、有機エレクトロルミネセンス素子(OLED)より成る群から選ばれる、電子素子。
- アノード、カソードと少なくとも一つの発光層を含み、ここで、素子の少なくとも一つの層は、発光層、電子輸送層、電子注入層および正孔ブロック層から選ばれ、請求項1または2記載の少なくとも一つの化合物を含むことを特徴とする有機エレクトロルミネッセンス素子から選ばれる、請求項5記載の電子素子。
- 請求項1または2記載の化合物が、1以上の燐光エミッター化合物と組み合わせて、発光層中に存在することを特徴とする、請求項6記載の電子素子。
- インデノカルバゾール化合物が、電子不足ヘテロアリール基を含む芳香族もしくは複素環式芳香族環構造と反応し、ここで、芳香族もしくは複素環式芳香族環構造は、インデノカルバゾーの窒素原子とカップルすることを特徴とする、請求項1または2記載の化合物の製造方法。
- 請求項1または2記載の化合物の、電子素子での使用。
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-
2016
- 2016-01-07 CN CN201680006177.XA patent/CN107108578A/zh active Pending
- 2016-01-07 KR KR1020177023964A patent/KR102626977B1/ko active IP Right Grant
- 2016-01-07 WO PCT/EP2016/000011 patent/WO2016119992A1/en active Application Filing
- 2016-01-07 JP JP2017540608A patent/JP6827938B2/ja active Active
- 2016-01-07 US US15/547,281 patent/US20180006237A1/en not_active Abandoned
- 2016-01-07 EP EP16700236.9A patent/EP3250658B1/en active Active
- 2016-01-27 TW TW105102516A patent/TWI705062B/zh active
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JP2018507194A (ja) | 2018-03-15 |
TWI705062B (zh) | 2020-09-21 |
EP3250658A1 (en) | 2017-12-06 |
TW201700470A (zh) | 2017-01-01 |
US20180006237A1 (en) | 2018-01-04 |
CN107108578A (zh) | 2017-08-29 |
KR20170110641A (ko) | 2017-10-11 |
KR102626977B1 (ko) | 2024-01-19 |
EP3250658B1 (en) | 2019-06-19 |
WO2016119992A1 (en) | 2016-08-04 |
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