JP6641998B2 - 多孔質炭素材料及び多孔質炭素材料の製造方法 - Google Patents
多孔質炭素材料及び多孔質炭素材料の製造方法 Download PDFInfo
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- JP6641998B2 JP6641998B2 JP2015532994A JP2015532994A JP6641998B2 JP 6641998 B2 JP6641998 B2 JP 6641998B2 JP 2015532994 A JP2015532994 A JP 2015532994A JP 2015532994 A JP2015532994 A JP 2015532994A JP 6641998 B2 JP6641998 B2 JP 6641998B2
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Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
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Description
工程1:炭化可能樹脂10〜90重量%と、消失樹脂90〜10重量%を相溶させ、樹脂混合物とする工程;
工程2:化学反応を伴わない方法で相分離させ、固定化する工程;
工程3:焼成により炭化する工程;
工程4:賦活する工程;
をこの順に有する多孔質炭素材料の製造方法である。
〔共連続構造部分〕
本発明の多孔質炭素材料(以下、単に「材料」ということがある。)は、炭素骨格と空隙とがそれぞれ連続構造をなす共連続構造部分を有する。すなわち、例えば液体窒素中で充分に冷却した試料をピンセット等により割断した断面を走査型電子顕微鏡(SEM)などによって表面観察した際に、炭素骨格とその骨格以外の部分として形成された空隙とがいわゆる共連続構造となっており、具体的には図1の実施例1の多孔質炭素材料の走査型電子顕微鏡写真に例示される通り、奥行き方向に炭素骨格と空隙とがそれぞれ連続した構造として観察される部分を有する。
共連続構造部分の構造周期が0.002μm以上であると、空隙部に流体を充填及び/又は流すことができるほか、炭素骨格を通じて電気伝導性、熱伝導性を向上することが可能となる。構造周期は0.01μm以上であることが好ましく、0.1μm以上であることがより好ましい。また、構造周期が3μm以下であると、高い表面積や物性を得ることができる。構造周期は2μm以下であることが好ましく、1μm以下であることがより好ましい。さらに、均一な連続構造を有することで、流動抵抗を低減でき、理想的な分画材料としても利用が可能である。なお、X線による構造周期の解析に際して、共連続構造を有しない部分については、構造周期が上記範囲外となるため解析には影響なく、上記式で算出される構造周期を以って、共連続構造形成部の構造周期とするものとする。
平均空隙率は、高いほど他素材との複合の際に充填効率を高められるほか、ガスや液体の流路として圧力損失が小さく、流速を高めることができる一方、低いほど圧縮や曲げといった断面方向にかかる力に強くなるため、取り扱い性や加圧条件での使用に際して有利となる。これらのことを考慮し、共連続構造部分の平均空隙率は15〜75%の範囲であることが好ましく、18〜70%の範囲がさらに好ましい。
さらに、本発明の多孔質炭素材料は、表面に平均直径0.01〜10nmの細孔を有する。表面とは、炭素材料の共連続構造部分における炭素骨格の表面も含め、多孔質炭素材料のあらゆる外部との接触面を指す。細孔は、共連続構造部分における炭素骨格の表面および/または後述する共連続構造を実質的に有しない部分に形成することができるが、少なくとも共連続構造を有する部分における炭素骨格の表面に形成していることが好ましい。
本発明の多孔質炭素材料は、共連続構造を実質的に有しない部分(以下、単に「共連続構造を有しない部分」という場合がある。)を含んでいることも、好ましい態様である。共連続構造を実質的に有しない部分とは、クロスセクションポリッシャー法(CP法)により形成させた断面を、1±0.1(nm/画素)の拡大率で観察した際に、解像度以下であることにより明確な空隙が観察されない部分が、一辺が後述のX線から算出される構造周期Lの3倍に対応する正方形の領域以上の面積で存在することを意味する。
本発明の多孔質炭素材料の形状は特に限定されず、例えば塊状、棒状、平板状、円盤状、球状などが挙げられるが、中でも繊維状、フィルム状または粉末状の形態であることが好ましい。
本発明の多孔質炭素材料は、一例として、炭化可能樹脂10〜90重量%と消失樹脂90〜10重量%とを相溶させて樹脂混合物とする工程(工程1)と、相溶した状態の樹脂混合物を相分離させ、固定化する工程(工程2)、加熱焼成により炭化する工程(工程3)、炭化物を賦活する工程(工程4)とを有する製造方法により製造することができる。
工程1は、炭化可能樹脂10〜90重量%と、消失樹脂90〜10重量%と相溶させ、樹脂混合物とする工程である。
工程2は、工程1において相溶させた状態の樹脂混合物を、化学反応を伴わない方法で相分離させて微細構造を形成し、固定化する工程である。
工程2において相分離後の微細構造が固定化された樹脂混合物は、炭化工程(工程3)に供される前または炭化工程と同時、あるいはその両方で消失樹脂の除去処理を行うことが好ましい。除去処理の方法は特に限定されるものではなく、消失樹脂を除去することが可能であれば良い。具体的には、酸、アルカリや酵素を用いて消失樹脂を化学的に分解、低分子量化して除去する方法や、消失樹脂を溶解する溶媒により溶解除去する方法、電子線、ガンマ線や紫外線、赤外線などの放射線や熱を用いて消失樹脂を分解除去する方法などが好適である。
工程2において相分離後の微細構造が固定化された樹脂混合物である前駆体材料は、炭化工程(工程3)に供される前に不融化処理を行うことが好ましい。不融化処理の方法は特に限定されるものではなく、公知の方法を用いることができる。具体的な方法としては、酸素存在下で加熱することで酸化架橋を起こす方法、電子線、ガンマ線などの高エネルギー線を照射して架橋構造を形成する方法、反応性基を持つ物質を含浸、混合して架橋構造を形成する方法などが挙げられ、中でも酸素存在下で加熱することで酸化架橋を起こす方法が、プロセスが簡便であり製造コストを低く抑えることが可能である点から好ましい。これらの手法は単独もしくは組み合わせて使用しても、それぞれを同時に使用しても別々に使用しても良い。
工程3は、工程2において相分離後の微細構造が固定化された樹脂混合物、あるいは、消失樹脂を既に除去している場合には炭化可能樹脂を焼成し、炭化して炭化物を得る工程である。
工程4は、工程3において得た炭化物を、賦活して多孔質炭素材料を得る工程である。賦活の方法としては、ガス賦活法、薬品賦活法等、特に限定するものではない。ガス賦活法とは、賦活剤として酸素や水蒸気、炭酸ガス、空気等を用い、400〜1500℃、好ましくは500〜900℃にて、数分から数時間、加熱することにより細孔を形成させる方法である。また、薬品賦活法とは、賦活剤として塩化亜鉛、塩化鉄、リン酸カルシウム、水酸化カルシウム、水酸化カリウム、炭酸マグネシウム、炭酸ナトリウム、炭酸カリウム、硫酸、硫酸ナトリウム、硫酸カリウム等を1種または2種以上用いて数分から数時間、加熱処理する方法であり、必要に応じて水や塩酸等による洗浄を行った後、pHを調整して乾燥する。
工程3を経て炭化させた炭化物を粉砕処理した後に工程4の賦活を行った多孔質炭素材料、あるいは工程4の賦活を経て細孔が形成された多孔質炭素材料を、粉砕処理して粒子状とした多孔質炭素材料も、本発明の多孔質炭素材料の一態様である。粉砕処理は、従来公知の方法を選択することが可能であり、粉砕処理を施した後の粒度、処理量に応じて適宜選択されることが好ましい。粉砕処理方法の例としては、ボールミル、ビーズミル、ジェットミルなどを例示することができる。粉砕処理は、連続式でもバッチ式でも良いが、生産効率の観点から連続式であることが好ましい。ボールミルに充填する充填材は適宜選択されるが、金属材料の混入が好ましくない用途に対しては、アルミナ、ジルコニア、チタニアなどの金属酸化物によるもの、もしくはステンレス、鉄などを芯としてナイロン、ポリオレフィン、フッ化ポリオレフィンなどをコーティングしたものを用いることが好ましく、それ以外の用途であればステンレス、ニッケル、鉄などの金属が好適に用いられる。
〔連続構造部分の構造周期〕
多孔質炭素材料を試料プレートに挟み込み、CuKα線光源から得られたX線源から散乱角度10度未満の情報が得られるように、光源、試料及び二次元検出器の位置を調整した。二次元検出器から得られた画像データ(輝度情報)から、ビームストッパーの影響を受けている中心部分を除外して、ビーム中心から動径を設け、角度1°毎に360°の輝度値を合算して散乱強度分布曲線を得た。得られた曲線においてピークを持つ位置の散乱角度θより、連続構造部分の構造周期を下記の式によって得た。
〔平均空隙率〕
多孔質炭素材料を樹脂中に包埋し、その後カミソリ等で多孔質炭素材料の断面を露出させ、日本電子製SM−09010を用いて加速電圧5.5kVにて試料表面にアルゴンイオンビームを照射、エッチングを施す。得られた多孔質炭素材料の断面を走査型二次電子顕微鏡にて材料中心部を1±0.1(nm/画素)となるよう調整された拡大率で、70万画素以上の解像度で観察した画像から、計算に必要な着目領域を512画素四方で設定し、着目領域の面積A、孔部分または消失樹脂部分の面積をBとして、以下の式で算出されたものを言う。
〔BET比表面積、細孔直径〕
300℃で約5時間、減圧脱気した後、日本ベル社製の「BELSORP−18PLUS−HT」を使用し、液体窒素を用いて77Kの温度での窒素吸脱着を多点法で測定した。表面積はBET法、細孔分布解析(細孔直径、細孔容積)はMP法またはBJH法により行った。
70gのポリサイエンス社製ポリアクリロニトリル(MW15万、炭素収率58%)と70gのシグマ・アルドリッチ社製ポリビニルピロリドン(MW4万)、及び、溶媒として400gの和研薬製ジメチルスルホキシド(DMSO)をセパラブルフラスコに投入し、3時間攪拌および還流を行いながら150℃で均一かつ透明な溶液を調整した。このときポリアクリロニトリルの濃度、ポリビニルピロリドンの濃度はそれぞれ13重量%であった。
賦活処理において、水酸化カリウムに代えて水酸化ナトリウムを用いた以外は、実施例1と同様に行った。得られた多孔質炭素粒子は、実施例1と同様に共連続構造部分の平均空隙率は40%であり、構造周期は76nmであった。また共連続構造を有しない部分を粒子の一部に含む構造をしていた。一方、BET比表面積は2554m2/gとほぼ同等であったが、MP法による細孔の平均直径は1.5nmと倍に拡大し、細孔容積は1.9cm3/gであった。結果を表1に示す。
実施例1において、アルカリ賦活に変えて水蒸気賦活を行った。すなわち、実施例1と同様にして得られた炭素繊維をボールミルで粉砕した後、ロータリーキルン内に投入して窒素流通下で850℃まで昇温した。850℃に達してからロータリーキルン内に水蒸気を窒素とともに供給し、2時間水蒸気賦活を行った。賦活処理後、実施例1と同様に洗浄した。得られた多孔質炭素粉末は、実施例1と同様に共連続構造部分の平均空隙率は40%であり、構造周期は76nmであった。また共連続構造を有しない部分を粒子の一部に含む構造をしていた。一方、BET比表面積は405m2/gと低く、MP法による細孔の平均直径は0.4nmと約半分となり、細孔容積も0.2cm3/gと小さかった。結果を表1に示す。
ポリアクリロニトリルの濃度、ポリビニルピロリドンの濃度をそれぞれ7.5重量%とした以外は、実施例1と同様に炭素繊維を得た。得られた多孔質炭素繊維すなわち多孔質炭素材料の中心部の平均空隙率は45%であり、共連続構造部分の構造周期は230nmと実施例1より大きいものであった。共連続構造を有しない部分であるスキン層の厚みは実施例1と同様に5μmであった。また繊維中心部には均一な共連続構造が形成されていた。
実施例1において、凝固浴に変えてスプレーによる水付与とした以外は、実施例1と同様に行って多孔質炭素粒子を得た。共連続構造部分の平均空隙率は50%であり、構造周期は1800nmであった。また共連続構造を有しない部分を粒子の一部に含む構造をしていた。BET比表面積は1853m2/g、MP法による細孔の平均直径は0.8nm、細孔容積は2.0cm3/gであった。結果を表1に示す。
[実施例6]
実施例1において、焼成温度を1500℃とした以外は、実施例1と同様に行って多孔質炭素粒子を得た。共連続構造部分の平均空隙率は40%であり、構造周期は76nmであった。また共連続構造を有しない部分を粒子の一部に含む構造をしていた。BET比表面積は378m2/g、MP法による細孔の平均直径は1.4nm、細孔容積は0.2cm3/gであった。結果を表1に示す。
アクリロニトリル98モル%、メタクリル酸2モル%からなる比粘度0.24のアクリロニトリル共重合体(PAN共重合体)60重量%と、メチルメタクリレート99モル%、アクリル酸メチル1モル%、比粘度0.21の熱分解性共重合体(PMMA共重合体)40重量%とからなる両共重合体を混合し、溶剤としてジメチルホルムアミド(DMF)に両共重合体の混合物の溶液濃度が24.8重量%となるように溶解し、DMF混合溶液とした。得られた溶液は目視では均一であったが、光学顕微鏡で観察した場合、液滴が観測され、溶液の段階で既に相分離が進行していた。
ポリビニルアルコール(平均重合度2000)に酸化マグネシウム(平均粒径500nm)を1:1で加えた後、ロータリーキルン内に投入してアルゴン流通下で900℃まで昇温した。1時間処理した後、希硫酸水溶液と水で洗浄して多孔質炭素を得た。得られた多孔質炭素は、断面内の孔形状、サイズが均一ではなく、構造周期の算出を試みたが、得られたスペクトルにはピークが存在せず、構造の均一性に劣るものであった。結果を表1に示す。
賦活処理を行わない以外は、実施例1と同様に行った。得られた多孔質炭素粒子は、実施例1と同様に共連続構造部分の平均空隙率は40%であり、構造周期は76nmであった。また共連続構造を有しない部分を粒子の一部に含む構造をしていた。しかし、BET比表面積は35m2/gと小さく、MP法による細孔も確認できなかった。結果を表1に示す。
Claims (11)
- 炭素骨格と空隙とがそれぞれ連続構造をなす構造周期0.01μm〜3μmの共連続構造部分を有するとともに、表面に平均直径0.01〜10nmの細孔を有し、かつBET比表面積が100m2/g以上である多孔質炭素材料。
- 前記細孔が、少なくとも前記共連続構造部分の炭素骨格に形成されている、請求項1に記載の多孔質炭素材料。
- MP法で計測される細孔容積が0.1cm3/g以上である、請求項1または2に記載の多孔質炭素材料。
- BET比表面積が1000m2/g以上である、請求項1〜3のいずれかに記載の多孔質炭素材料。
- 共連続構造を実質的に有しない部分を有する、請求項1〜4のいずれかに記載の多孔質炭素材料。
- 請求項1〜5のいずれかに記載の多孔質炭素材料を用いた電極材料。
- 請求項1〜5のいずれかに記載の多孔質炭素材料を用いた吸着材料。
- 工程1:炭化可能樹脂10〜90重量%と、消失樹脂90〜10重量%を相溶させ、樹脂混合物とする工程;
工程2:化学反応を伴わない方法で相分離させ、固定化する工程;
工程3:焼成により炭化する工程;
工程4:賦活する工程;
をこの順に有する多孔質炭素材料の製造方法。 - 前記工程2の後、さらに不融化処理を行う、請求項8に記載の多孔質炭素材料の製造方法。
- 前記工程4において、前記賦活をアルカリ性薬剤によって行う、請求項8または9に記載の多孔質炭素材料の製造方法。
- 前記工程3の後であって、前記工程4の前または後に、さらに粉砕処理を行う、請求項8〜10のいずれかに記載の多孔質炭素材料の製造方法。
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